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KR101840055B1 - 터치 패널용 착색 감광성 수지 조성물, 터치 패널, 및 표시 장치 - Google Patents

터치 패널용 착색 감광성 수지 조성물, 터치 패널, 및 표시 장치 Download PDF

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Publication number
KR101840055B1
KR101840055B1 KR1020120001366A KR20120001366A KR101840055B1 KR 101840055 B1 KR101840055 B1 KR 101840055B1 KR 1020120001366 A KR1020120001366 A KR 1020120001366A KR 20120001366 A KR20120001366 A KR 20120001366A KR 101840055 B1 KR101840055 B1 KR 101840055B1
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KR
South Korea
Prior art keywords
group
touch panel
compound
meth
formula
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KR1020120001366A
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English (en)
Korean (ko)
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KR20120081557A (ko
Inventor
시게루 스즈키
나오토 야마구치
다이 시오타
Original Assignee
도오꾜오까고오교 가부시끼가이샤
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Epoxy Resins (AREA)
  • Position Input By Displaying (AREA)
KR1020120001366A 2011-01-11 2012-01-05 터치 패널용 착색 감광성 수지 조성물, 터치 패널, 및 표시 장치 Active KR101840055B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2011-003136 2011-01-11
JP2011003136A JP5744528B2 (ja) 2011-01-11 2011-01-11 タッチパネル用着色感光性樹脂組成物、タッチパネル、及び表示装置

Publications (2)

Publication Number Publication Date
KR20120081557A KR20120081557A (ko) 2012-07-19
KR101840055B1 true KR101840055B1 (ko) 2018-03-19

Family

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Family Applications (1)

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KR1020120001366A Active KR101840055B1 (ko) 2011-01-11 2012-01-05 터치 패널용 착색 감광성 수지 조성물, 터치 패널, 및 표시 장치

Country Status (4)

Country Link
JP (1) JP5744528B2 (ja)
KR (1) KR101840055B1 (ja)
CN (1) CN102591148B (ja)
TW (1) TWI578104B (ja)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201435495A (zh) * 2011-09-30 2014-09-16 Taiyo Ink Mfg Co Ltd 感光性樹脂組成物、其之硬化皮膜及印刷配線板
KR102138381B1 (ko) 2012-11-02 2020-07-27 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 터치 패널용 차광성 조성물 및 터치 패널
JP6529213B2 (ja) * 2012-11-02 2019-06-12 日鉄ケミカル＆マテリアル株式会社 タッチパネル用遮光性組成物及びタッチパネル
JP6139894B2 (ja) 2013-01-28 2017-05-31 新日鉄住金化学株式会社 タッチパネル用黒色感光性組成物及びタッチパネル
KR102162595B1 (ko) * 2013-03-21 2020-10-07 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 절연막용 감광성 수지 조성물 및 경화물
US9690197B2 (en) 2013-07-25 2017-06-27 Toray Industries, Inc. Negative-type photosensitive white composition for touch panel, touch panel and touch panel production method
CN105531626B (zh) * 2013-09-25 2020-01-14 东丽株式会社 感光性遮光糊剂和接触式传感器用层叠图案的制造方法
JP6307237B2 (ja) * 2013-09-30 2018-04-04 新日鉄住金化学株式会社 黒色感光性樹脂組成物及びその硬化膜、並びに当該硬化膜を有するカラーフィルター及びタッチパネル
JP6375236B2 (ja) * 2014-02-04 2018-08-15 新日鉄住金化学株式会社 遮光膜用感光性組成物、及びその硬化物
JP6708365B2 (ja) * 2014-03-07 2020-06-10 日鉄ケミカル＆マテリアル株式会社 遮光膜用黒色感光性樹脂組成物、それを用いた硬化物、並びに当該硬化物を遮光膜とするカラーフィルター及びタッチパネル
TWI659265B (zh) * 2014-03-07 2019-05-11 日商日鐵化學材料股份有限公司 遮光膜用黑色樹脂組成物、帶遮光膜的基板、彩色濾光片及觸控面板
JP6388776B2 (ja) * 2014-03-12 2018-09-12 新日鉄住金化学株式会社 白色感光性樹脂組成物、それを用いた硬化物、及びその硬化物を構成成分として含むタッチパネル
JP6479549B2 (ja) * 2014-04-21 2019-03-06 日鉄ケミカル＆マテリアル株式会社 アルカリ可溶性樹脂、それを含む感光性樹脂組成物、それを用いた硬化物、並びにその硬化物を構成成分として含むタッチパネル及びカラーフィルター
TWI536103B (zh) * 2014-05-08 2016-06-01 達興材料股份有限公司 感光性樹脂組合物、固化膜和電子元件
JP2016160420A (ja) * 2015-03-05 2016-09-05 Jnc株式会社 熱硬化性組成物、硬化膜、硬化膜付基板、電子部品および表示装置
JP2017021346A (ja) 2015-07-10 2017-01-26 Jsr株式会社 硬化性組成物、硬化膜、ベゼル及び表示装置
JP6886782B2 (ja) * 2016-06-30 2021-06-16 東京応化工業株式会社 感光性樹脂組成物、硬化膜、有機ｅｌ素子における発光層の区画用のバンク、有機ｅｌ素子用の基板、有機ｅｌ素子、硬化膜の製造方法、バンクの製造方法、及び有機ｅｌ素子の製造方法
JP6912695B2 (ja) * 2016-12-16 2021-08-04 ナガセケムテックス株式会社 複合樹脂組成物及び複合樹脂硬化物
JP6432075B2 (ja) * 2017-02-10 2018-12-05 東洋インキＳｃホールディングス株式会社 感光性樹脂組成物および硬化膜
CN110268328B (zh) * 2017-03-31 2022-02-08 东友精细化工有限公司 蓝色感光性树脂组合物、利用该组合物制造的滤色器及图像显示装置
CN107179651A (zh) * 2017-06-07 2017-09-19 常州慧杰电气技术有限公司 一种水溶性感光胶
JP7664682B2 (ja) * 2019-03-29 2025-04-18 日鉄ケミカル＆マテリアル株式会社 感光性樹脂組成物、感光性樹脂組成物を硬化してなる硬化膜、硬化膜付き基板および硬化膜付き基板の製造方法
CN111752102A (zh) * 2019-03-29 2020-10-09 日铁化学材料株式会社 感光性树脂组合物、硬化膜、带有硬化膜的基板及带有硬化膜的基板的制造方法
CN111752101A (zh) * 2019-03-29 2020-10-09 日铁化学材料株式会社 感光性树脂组合物、硬化膜、带有硬化膜的基板及带有硬化膜的基板的制造方法
KR102483993B1 (ko) * 2019-09-02 2023-01-02 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 감광성 수지막, 컬러필터 및 디스플레이 장치
JP2023031733A (ja) * 2021-08-25 2023-03-09 富士フイルム株式会社 感光性組成物、パターン形成方法、回路配線の製造方法、タッチパネルの製造方法、転写フィルム

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2575572B2 (ja) * 1992-06-19 1997-01-29 新日本製鐵株式会社 アルカリ現像型感光性カラーフィルター用インク及びそれを用いたカラーフィルター
TW200519535A (en) * 2003-11-27 2005-06-16 Taiyo Ink Mfg Co Ltd Hardenable resin composition, hardened body thereof, and printed circuit board
JP4489566B2 (ja) * 2003-11-27 2010-06-23 太陽インキ製造株式会社 硬化性樹脂組成物、その硬化物、およびプリント配線板
TWI279644B (en) * 2004-01-19 2007-04-21 Chi Mei Corp Photo-sensitive resin composite for black matrix
JP4809006B2 (ja) * 2005-07-05 2011-11-02 太陽ホールディングス株式会社 着色感光性樹脂組成物及びその硬化物
JP4745110B2 (ja) * 2006-04-19 2011-08-10 東京応化工業株式会社 感光性組成物及びこの感光性組成物により形成されたカラーフィルタ
JP4949809B2 (ja) * 2006-11-14 2012-06-13 東京応化工業株式会社 着色感光性樹脂組成物
JP5535692B2 (ja) * 2009-03-17 2014-07-02 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP2011227467A (ja) * 2010-03-31 2011-11-10 Toray Ind Inc 感光性黒色樹脂組成物、樹脂ブラックマトリクス基板
JP2012078528A (ja) * 2010-09-30 2012-04-19 Fujifilm Corp 感光性組成物、感光性樹脂転写フィルム、樹脂パターン及び樹脂パターンの製造方法、並びに液晶表示装置用基板及び液晶表示装置

Also Published As

Publication number Publication date
TW201232176A (en) 2012-08-01
KR20120081557A (ko) 2012-07-19
JP2012145699A (ja) 2012-08-02
CN102591148B (zh) 2016-12-14
JP5744528B2 (ja) 2015-07-08
TWI578104B (zh) 2017-04-11
CN102591148A (zh) 2012-07-18

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