JP5910833B2 - 排ガス浄化触媒 - Google Patents
排ガス浄化触媒 Download PDFInfo
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- JP5910833B2 JP5910833B2 JP2013235837A JP2013235837A JP5910833B2 JP 5910833 B2 JP5910833 B2 JP 5910833B2 JP 2013235837 A JP2013235837 A JP 2013235837A JP 2013235837 A JP2013235837 A JP 2013235837A JP 5910833 B2 JP5910833 B2 JP 5910833B2
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- 239000003054 catalyst Substances 0.000 title claims description 245
- 238000000746 purification Methods 0.000 title claims description 73
- 239000000463 material Substances 0.000 claims description 172
- 239000007789 gas Substances 0.000 claims description 118
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 65
- 229910052760 oxygen Inorganic materials 0.000 claims description 65
- 239000001301 oxygen Substances 0.000 claims description 65
- 238000003860 storage Methods 0.000 claims description 40
- 238000011144 upstream manufacturing Methods 0.000 claims description 19
- 229910000510 noble metal Inorganic materials 0.000 claims description 18
- 229910052763 palladium Inorganic materials 0.000 claims description 17
- 229910052697 platinum Inorganic materials 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 description 27
- 239000002184 metal Substances 0.000 description 26
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 24
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 23
- 239000000446 fuel Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 12
- 239000002131 composite material Substances 0.000 description 12
- 239000013078 crystal Substances 0.000 description 11
- 230000003197 catalytic effect Effects 0.000 description 9
- 239000000843 powder Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 239000010948 rhodium Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 229910002091 carbon monoxide Inorganic materials 0.000 description 6
- 238000006555 catalytic reaction Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000002002 slurry Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 229930195733 hydrocarbon Natural products 0.000 description 5
- 150000002430 hydrocarbons Chemical class 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000006104 solid solution Substances 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical group [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 4
- 210000004027 cell Anatomy 0.000 description 4
- 229910052746 lanthanum Inorganic materials 0.000 description 4
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 4
- 229910052761 rare earth metal Inorganic materials 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229910052727 yttrium Inorganic materials 0.000 description 4
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 3
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 2
- 229910052878 cordierite Inorganic materials 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010436 fluorite Substances 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 229910052809 inorganic oxide Inorganic materials 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- UJVRJBAUJYZFIX-UHFFFAOYSA-N nitric acid;oxozirconium Chemical compound [Zr]=O.O[N+]([O-])=O.O[N+]([O-])=O UJVRJBAUJYZFIX-UHFFFAOYSA-N 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- GPNDARIEYHPYAY-UHFFFAOYSA-N palladium(ii) nitrate Chemical compound [Pd+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O GPNDARIEYHPYAY-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 231100000572 poisoning Toxicity 0.000 description 1
- 230000000607 poisoning effect Effects 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000012041 precatalyst Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- VXNYVYJABGOSBX-UHFFFAOYSA-N rhodium(3+);trinitrate Chemical compound [Rh+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VXNYVYJABGOSBX-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
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- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
- B01J23/44—Palladium
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- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/024—Multiple impregnation or coating
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/92—Chemical or biological purification of waste gases of engine exhaust gases
- B01D53/94—Chemical or biological purification of waste gases of engine exhaust gases by catalytic processes
- B01D53/9445—Simultaneously removing carbon monoxide, hydrocarbons or nitrogen oxides making use of three-way catalysts [TWC] or four-way-catalysts [FWC]
- B01D53/945—Simultaneously removing carbon monoxide, hydrocarbons or nitrogen oxides making use of three-way catalysts [TWC] or four-way-catalysts [FWC] characterised by a specific catalyst
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- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
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- Combustion & Propulsion (AREA)
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- Environmental & Geological Engineering (AREA)
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- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Exhaust Gas After Treatment (AREA)
Description
(1)Pd及びPtの少なくとも1種を含む触媒層が基材上に形成された排ガス浄化触媒であって、触媒層の排ガス上流側端部から触媒層の全長の50%以下の長さの範囲内である触媒層前段に、パイロクロア型構造を有するOSC材及びパイロクロア型構造を有するOSC材よりも酸素吸蔵速度が速いOSC材を含む、排ガス浄化触媒。
(2) 触媒層前段におけるパイロクロア型構造を有するOSC材及びパイロクロア型構造を有するOSC材よりも酸素吸蔵速度が速いOSC材の合計含有量が、基材1L当たり80g以下である(1)の排ガス浄化触媒。
(3) 触媒層前段において、パイロクロア型構造を有するOSC材の含有量が、パイロクロア型構造を有するOSC材及びパイロクロア型構造を有するOSC材よりも酸素吸蔵速度が速いOSC材の合計含有量に対して2〜10重量%である(1)又は(2)の排ガス浄化触媒。
(4) 貴金属触媒層が触媒層上にさらに形成された、(1)〜(3)のいずれかの排ガス浄化触媒。
OSC材として、CeO2-ZrO2複合酸化物を用いた。
[パイロクロア型構造を有するOSC材の調製]
CeO2換算で28重量%の硝酸セリウム水溶液49.1gと、ZrO2換算で18重量%のオキシ硝酸ジルコニウム水溶液54.7gと、市販の界面活性剤とをイオン交換水90mLに溶解した後、NH3が25重量%のアンモニア水を陰イオンに対して1.2倍当量添加して共沈殿を生成し、得られた共沈殿をろ過しそして洗浄した。次に、得られた共沈殿を110℃で乾燥した後、500℃で5時間大気中にて焼成してセリウムとジルコニウムの固溶体を得た。その後、得られた固溶体を粉砕機を用いてその平均粒子径が1000nmとなるように粉砕して、CeO2とZrO2の含有モル比(CeO2/ZrO2)が1.09のCeO2-ZrO2固溶体粉末を得た。続いて、このCeO2-ZrO2固溶体粉末をポリエチレン製のバッグに充填し、内部を脱気した後、バッグの口を加熱してシールした。次に静水圧プレス装置を用いて300MPaの圧力で1分間加圧して成形し、CeO2-ZrO2固溶体粉末の固形状原料を得た。次に、得られた固形状原料を黒鉛製の坩堝に入れ、黒鉛製のフタをしてArガス中1700℃で5時間還元した。還元後の試料を粉砕機で粉砕して、平均粒子径が約5μmのパイロクロア型構造を有するCeO2-ZrO2複合酸化物の粉末を得た。
40g/基材1Lのランタン添加アルミナ(La2O3/Al2O3=4/96重量%)に対して金属パラジウムが1g/基材Lの比率になるよう、硝酸パラジウム溶液を含浸担持した。120℃で30分間乾燥させた後、500℃で2時間焼成し、Pd担持粉末を得た。前記で調製したPd担持粉末(41g/基材1L)と、前記で調製したパイロクロア型構造を有するOSC材:4.8g/基材1L、パイロクロア型構造を有するOSC材よりも酸素吸蔵速度が速いOSC材:35.2g/基材1Lを、水及びバインダー(5g/基材1L)と混合し、酢酸などを用いてpHや粘度を調製して下触媒層前段用スラリーを得た。
パイロクロア型構造を有するOSC材を使用しない以外は、前記の下触媒層前段と同様の手順でスラリーを調製し、次いで、得られたスラリーをウォッシュコート法により、下触媒層前段が形成された前記ハニカム基材の排ガス下流部にハニカム基材の全長に対して50%の幅でコートし、その後、乾燥及び焼成してハニカム基材のセル表面に下触媒層後段を形成した。
次に、パイロクロア型構造を有するOSC材よりも酸素吸蔵速度が速いOSC材40g/基材1Lに硝酸ロジウム溶液を用いてRh(0.2g/基材1L)を含浸担持した。120℃で30分間乾燥させた後、500℃で2時間焼成し、Rh担持粉末を得た。次いで、このRh担持粉末(40.2g/基材1L)を、下触媒層前段に使用したランタン添加アルミナ40g/基材1L、水及びバインダー(5g/基材1L)と混合し、酢酸などを用いてpHや粘度を調製して上触媒層用スラリーを得た。次いで、得られたスラリーをウォッシュコート法により、下触媒層前段及び下触媒層後段が形成された前記ハニカム基材の全体にコートし、その後、乾燥及び焼成して下触媒層前段と下触媒層後段からなる下触媒層上に上触媒層が形成された排ガス浄化触媒を得た。
比較例の触媒として、実施例1の下触媒層前段からパイロクロア型構造を有するOCS材を除いた触媒を、実施例1と同様にして調製した。
実施例1で得られた排ガス浄化触媒及び比較例の排ガス浄化触媒について、15万マイル相当の耐久試験を行った後、耐久試験後の各排ガス浄化触媒を2.5Lの排気量のL4エンジンに取り付け、触媒への入りガス温度が600℃であり、触媒に流入する排ガスの空燃比(A/F)が14.6である排ガスを吸入空気量(Ga)20g/秒で15秒間供給した後、空燃比を14.1に切り替えて排ガスを30秒間供給し、触媒出口側におけるNOx量を測定することによって各排ガス浄化触媒のNOx浄化能を評価した。結果を図4に示す。図4中、実線は実施例1の排ガス浄化触媒のNOx排出量を表し、点線は比較例の排ガス浄化触媒のNOx排出量を表し、一点鎖線は空燃比(A/F)を表す。
排ガス浄化触媒について、2種のOSC材(パイロクロア型構造を有するOSC材及びパイロクロア型構造を有するOSC材よりも酸素吸蔵速度が速いOSC材)の下触媒層前段における合計含有量を変化させた場合のNOx排出量、並びに、下触媒層前段における、パイロクロア型構造を有するOSC材の2種のOSC材の合計含有量に対する含有量を変化させた場合のNOx排出量を調べた。
2 触媒層(下触媒層)
21触媒層前段(下触媒層前段)
22触媒層後段(下触媒層後段)
2a排ガス上流側端部
3上触媒層(貴金属触媒層)
Claims (4)
- Pd及びPtの少なくとも1種を含む触媒層が基材上に形成された排ガス浄化触媒であって、触媒層の排ガス上流側端部から触媒層の全長の50%以下の長さの範囲内である触媒層前段が、パイロクロア型構造を有するOSC材及びパイロクロア型構造を有するOSC材よりも酸素吸蔵速度が速いOSC材を含み、触媒層前段以外の排ガス下流部である触媒層後段が、パイロクロア型構造を有するOSC材よりも酸素吸蔵速度が速いOSC材を含み、パイロクロア型構造を有するOSC材を含まず、触媒層前段において、パイロクロア型構造を有するOSC材の含有量が、パイロクロア型構造を有するOSC材及びパイロクロア型構造を有するOSC材よりも酸素吸蔵速度が速いOSC材の合計含有量に対して2〜9重量%である、排ガス浄化触媒。
- 触媒層前段におけるパイロクロア型構造を有するOSC材及びパイロクロア型構造を有するOSC材よりも酸素吸蔵速度が速いOSC材の合計含有量が基材1L当たり80g以下である請求項1の排ガス浄化触媒。
- 触媒層前段において、パイロクロア型構造を有するOSC材の含有量が、パイロクロア型構造を有するOSC材及びパイロクロア型構造を有するOSC材よりも酸素吸蔵速度が速いOSC材の合計含有量に対して6〜9重量%である請求項1又は2の排ガス浄化触媒。
- 貴金属触媒層が触媒層上にさらに形成された、請求項1〜3のいずれか1項の排ガス浄化触媒。
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