KR20130094715A - 폴리실록산계 조성물, 경화물, 및, 광학 디바이스 - Google Patents
폴리실록산계 조성물, 경화물, 및, 광학 디바이스 Download PDFInfo
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- KR20130094715A KR20130094715A KR1020127030204A KR20127030204A KR20130094715A KR 20130094715 A KR20130094715 A KR 20130094715A KR 1020127030204 A KR1020127030204 A KR 1020127030204A KR 20127030204 A KR20127030204 A KR 20127030204A KR 20130094715 A KR20130094715 A KR 20130094715A
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- South Korea
- Prior art keywords
- group
- polysiloxane
- compound
- composition
- integer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- -1 Polysiloxane Polymers 0.000 title claims abstract description 528
- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 275
- 239000000203 mixture Substances 0.000 title claims abstract description 156
- 239000000463 material Substances 0.000 title claims description 71
- 230000003287 optical effect Effects 0.000 title claims description 41
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 76
- 150000001875 compounds Chemical class 0.000 claims abstract description 57
- 125000003118 aryl group Chemical group 0.000 claims abstract description 49
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims abstract description 20
- 150000003961 organosilicon compounds Chemical class 0.000 claims abstract description 18
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims description 55
- 239000003054 catalyst Substances 0.000 claims description 25
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 24
- 125000000217 alkyl group Chemical group 0.000 claims description 22
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 19
- 239000003795 chemical substances by application Substances 0.000 claims description 18
- 239000011256 inorganic filler Substances 0.000 claims description 15
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 11
- 238000007789 sealing Methods 0.000 claims description 10
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- 238000003860 storage Methods 0.000 claims description 8
- 125000004429 atom Chemical group 0.000 claims description 7
- 125000002947 alkylene group Chemical group 0.000 claims description 6
- 230000004888 barrier function Effects 0.000 abstract description 27
- 230000035699 permeability Effects 0.000 abstract description 18
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 68
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
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- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 18
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- LDCRTTXIJACKKU-ARJAWSKDSA-N dimethyl maleate Chemical compound COC(=O)\C=C/C(=O)OC LDCRTTXIJACKKU-ARJAWSKDSA-N 0.000 description 17
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- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 15
- 229920000435 poly(dimethylsiloxane) Chemical group 0.000 description 15
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 15
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- OOGRAMOPTBMVKO-UHFFFAOYSA-N bis[[ethenyl(dimethyl)silyl]oxy]-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](O[Si](C)(C)C=C)(O[Si](C)(C)C=C)C1=CC=CC=C1 OOGRAMOPTBMVKO-UHFFFAOYSA-N 0.000 description 7
- 125000003700 epoxy group Chemical group 0.000 description 7
- ODEXJPXBFISZCB-UHFFFAOYSA-N ethenyl-methyl-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](C=C)(C)C1=CC=CC=C1 ODEXJPXBFISZCB-UHFFFAOYSA-N 0.000 description 7
- 125000000524 functional group Chemical group 0.000 description 7
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
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- DSSYKIVIOFKYAU-XCBNKYQSSA-N (R)-camphor Chemical compound C1C[C@@]2(C)C(=O)C[C@@H]1C2(C)C DSSYKIVIOFKYAU-XCBNKYQSSA-N 0.000 description 5
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- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
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- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
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- 239000004973 liquid crystal related substance Substances 0.000 description 4
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- 238000003786 synthesis reaction Methods 0.000 description 4
- 229910002012 Aerosil® Inorganic materials 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
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- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
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- OKHRRIGNGQFVEE-UHFFFAOYSA-N methyl(diphenyl)silicon Chemical compound C=1C=CC=CC=1[Si](C)C1=CC=CC=C1 OKHRRIGNGQFVEE-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- POPVULPQMGGUMJ-UHFFFAOYSA-N octasilsesquioxane cage Chemical compound O1[SiH](O[SiH](O2)O[SiH](O3)O4)O[SiH]4O[SiH]4O[SiH]1O[SiH]2O[SiH]3O4 POPVULPQMGGUMJ-UHFFFAOYSA-N 0.000 description 3
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- WTARULDDTDQWMU-IUCAKERBSA-N (-)-Nopinene Natural products C1[C@@H]2C(C)(C)[C@H]1CCC2=C WTARULDDTDQWMU-IUCAKERBSA-N 0.000 description 2
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- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 2
- VEJOYRPGKZZTJW-FDGPNNRMSA-N (z)-4-hydroxypent-3-en-2-one;platinum Chemical compound [Pt].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O VEJOYRPGKZZTJW-FDGPNNRMSA-N 0.000 description 2
- VMAWODUEPLAHOE-UHFFFAOYSA-N 2,4,6,8-tetrakis(ethenyl)-2,4,6,8-tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical group C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 VMAWODUEPLAHOE-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 2
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- QUTYKIXIUDQOLK-PRJMDXOYSA-N 5-O-(1-carboxyvinyl)-3-phosphoshikimic acid Chemical compound O[C@H]1[C@H](OC(=C)C(O)=O)CC(C(O)=O)=C[C@H]1OP(O)(O)=O QUTYKIXIUDQOLK-PRJMDXOYSA-N 0.000 description 2
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- UOKUUKOEIMCYAI-UHFFFAOYSA-N trimethoxysilylmethyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C(C)=C UOKUUKOEIMCYAI-UHFFFAOYSA-N 0.000 description 2
- JPPHEZSCZWYTOP-UHFFFAOYSA-N trimethoxysilylmethyl prop-2-enoate Chemical compound CO[Si](OC)(OC)COC(=O)C=C JPPHEZSCZWYTOP-UHFFFAOYSA-N 0.000 description 2
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 2
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- DXJZZRSMGLGFPW-UHFFFAOYSA-N triphenyl(prop-2-enyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(CC=C)C1=CC=CC=C1 DXJZZRSMGLGFPW-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
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Abstract
Description
Claims (20)
- (A) 알케닐기 함유 다면체 구조 폴리실록산계 화합물(a)에 대하여, 히드로실릴기를 갖는 화합물(b)을 변성하여 얻어진 다면체 구조 폴리실록산 변성체, 및,
(B) 1분자 중에 알케닐기를 2개 이상 갖는 오르가노폴리실록산
을 함유하는 폴리실록산계 조성물로서,
경화 후의 투습도가 30g/㎡/24h 이하이며,
상기 (B)성분의 오르가노폴리실록산이, 아릴기 함유 오르가노폴리실록산(B1)인, 및/또는,
또한, (C)성분으로서, 1분자 중에 알케닐기 또는 히드로실릴기를 1개 갖는 유기 규소 화합물(C1), 혹은, 1분자 중에 탄소-탄소 2중 결합을 1개 갖는 환상 올레핀 화합물(C2)을 함유하는
것을 특징으로 하는 폴리실록산계 조성물. - 제1항에 있어서,
다면체 구조 폴리실록산 변성체(A)가, 온도 20℃에 있어서 액상인 폴리실록산계 조성물. - 제1항 또는 제2항에 있어서,
히드로실릴기를 갖는 화합물(b)이, 히드로실릴기를 함유하는 환상 실록산인 폴리실록산계 조성물. - 제1항 내지 제3항 중 어느 한 항에 있어서,
히드로실릴기를 갖는 화합물(b)이, 분자 말단에 히드로실릴기를 함유하는 직쇄상 실록산인 폴리실록산계 조성물. - 제1항 내지 제4항 중 어느 한 항에 있어서,
알케닐기 함유 다면체 구조 폴리실록산계 화합물(a)이, 식
[AR1 2SiO-SiO3 /2]a[R2 3SiO-SiO3 /2]b
(a+b는 6∼24의 정수, a는 1 이상의 정수, b는 0 또는 1 이상의 정수; A는, 알케닐기; R1은, 알킬기 또는 아릴기; R2는, 수소 원자, 알킬기, 아릴기, 또는, 다른 다면체 골격 폴리실록산과 연결하여 있는 기)
으로 표시되는 실록산 단위로 구성된 알케닐기 함유 다면체 구조 폴리실록산계 화합물인 폴리실록산계 조성물. - 제1항 내지 제5항 중 어느 한 항에 있어서,
다면체 구조 폴리실록산 변성체(A)가, 알케닐기를 함유하는 다면체 구조 폴리실록산계 화합물(a)의 알케닐기 1개당 Si 원자에 직결한 수소 원자가 2.5∼20개가 되는 범위에서, 히드로실릴기를 갖는 화합물(b)을 과잉량 가하여 변성하고, 미반응의 히드로실릴기를 갖는 화합물(b)을 유거(留去)하여 얻어지는 폴리실록산계 조성물. - 제1항 내지 제6항 중 어느 한 항에 있어서,
다면체 구조 폴리실록산 변성체(A)가, 분자 중에 적어도 3개의 히드로실릴기를 갖는 폴리실록산계 조성물. - 제1항 내지 제7항 중 어느 한 항에 있어서,
다면체 구조 폴리실록산 변성체(A)가,
[XR3 2SiO-SiO3 /2]a[R4 3SiO-SiO3 /2]b
(a+b는 6∼24의 정수, a는 1 이상의 정수, b는 0 또는 1 이상의 정수; R3은, 알킬기 또는 아릴기; R4는, 알케닐기, 수소 원자, 알킬기, 아릴기, 또는, 다른 다면체 골격 폴리실록산과 연결하여 있는 기; X는, 하기 일반식(1) 혹은 일반식(2)의 어느 구조를 가지고, X가 복수 있는 경우에는 각각의 X의 구조는 동일해도 되며 달라도 된다
(l은 2 이상의 정수; m은 0 이상의 정수; n은 2 이상의 정수; Y는 수소 원자, 알케닐기, 알킬기, 아릴기, 혹은, 알킬렌쇄를 개재하여 다면체 구조 폴리실록산과 결합하고 있는 부위이며, 동일해도 달라도 된다; Z는, 수소 원자, 알케닐기, 알킬기, 아릴기, 혹은, 알킬렌쇄를 개재하여 다면체 구조 폴리실록산과 결합하고 있는 부위이며, 동일해도 달라도 된다. 단, Y 혹은 Z의 적어도 1개는 수소 원자이다))를 구성 단위로 하는 폴리실록산계 조성물. - 제1항 내지 제8항 중 어느 한 항에 있어서,
아릴기 함유 오르가노폴리실록산(B1)의 중량 평균 분자량이 3500 이하인 폴리실록산계 조성물. - 제1항 내지 제9항 중 어느 한 항에 있어서,
유기 규소 화합물(C1)이, 아릴기를 적어도 1개 이상 함유하는 유기 규소 화합물인 폴리실록산계 조성물. - 제1항 내지 제9항 중 어느 한 항에 있어서,
환상 올레핀 화합물(C2)의 중량 평균 분자량이 1000 미만인 폴리실록산계 조성물. - 제1항 내지 제9항, 제11항 중 어느 한 항에 있어서,
환상 올레핀 화합물(C2)이, 식 CnH2 (n-x)
(n은 4∼20의 정수, x는 1∼5의 정수, n-x는 3 이상의 정수)으로 표시되는 폴리실록산계 조성물. - 제1항 내지 제12항 중 어느 한 항에 있어서,
히드로실릴화 촉매를 함유하는 폴리실록산계 조성물. - 제1항 내지 제13항 중 어느 한 항에 있어서,
경화 지연제를 함유하는 폴리실록산계 조성물. - 제1항 내지 제14항 중 어느 한 항에 있어서,
접착성 부여제를 함유하는 폴리실록산계 조성물. - 제1항 내지 제15항 중 어느 한 항에 있어서,
무기 필러를 함유하는 폴리실록산계 조성물. - 제1항 내지 제16항 중 어느 한 항에 기재된 폴리실록산계 조성물을 사용하여 이루어지는 것을 특징으로 하는 경화물.
- 제17항에 있어서,
주파수 10㎐에서 측정한 손실 정접의 극대값이 -40℃∼50℃의 온도 범위에 적어도 1개 있고, 저장 탄성률이 50℃에 있어서 10㎫ 이하인 것을 특징으로 하는 경화물. - 제1항 내지 제16항 중 어느 한 항에 기재된 폴리실록산계 조성물을 사용하여 이루어지는 것을 특징으로 하는 광학 디바이스.
- 제19항에 있어서,
상기 폴리실록산계 조성물을 사용하여 이루어지는 광소자 봉지제(封止劑)를 구비한 광학 디바이스.
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JP2010153296A JP5643009B2 (ja) | 2010-07-05 | 2010-07-05 | オルガノポリシロキサン系組成物を用いた光学デバイス |
JPJP-P-2010-153296 | 2010-07-05 | ||
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PCT/JP2011/061757 WO2011148896A1 (ja) | 2010-05-28 | 2011-05-23 | ポリシロキサン系組成物、硬化物、及び、光学デバイス |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200024231A (ko) * | 2017-06-29 | 2020-03-06 | 다우 글로벌 테크놀로지스 엘엘씨 | 광전지 봉지재 필름용 폴리올레핀 조성물 |
KR20200070328A (ko) * | 2017-10-31 | 2020-06-17 | 다우 글로벌 테크놀로지스 엘엘씨 | 광전지 봉지재 필름용 폴리올레핀 조성물 |
KR20200070326A (ko) * | 2017-10-31 | 2020-06-17 | 다우 글로벌 테크놀로지스 엘엘씨 | 광전지 봉지재 필름용 폴리올레핀 조성물 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8399592B2 (en) | 2007-04-17 | 2013-03-19 | Kaneka Corporation | Polyhedral polysiloxane modified product and composition using the modified product |
KR101774306B1 (ko) | 2010-05-28 | 2017-09-04 | 가부시키가이샤 가네카 | 폴리실록산계 조성물, 경화물, 및, 광학 디바이스 |
KR101886173B1 (ko) * | 2010-09-22 | 2018-08-08 | 가부시키가이샤 가네카 | 다면체 구조 폴리실록산 변성체, 다면체 구조 폴리실록산계 조성물, 경화물, 및 광반도체 디바이스 |
JP5877081B2 (ja) * | 2011-02-08 | 2016-03-02 | 株式会社カネカ | 多面体構造ポリシロキサン変性体、該変性体を含有する組成物、該組成物を用いてなる封止剤、および光学デバイス |
JP5923331B2 (ja) * | 2011-02-24 | 2016-05-24 | 株式会社カネカ | ポリシロキサン系組成物、該組成物を用いてなる封止剤、および光学デバイス |
JP6075939B2 (ja) * | 2011-09-14 | 2017-02-08 | 株式会社カネカ | ポリシロキサン系組成物 |
US9260571B2 (en) * | 2012-05-24 | 2016-02-16 | Lawrence Livermore National Security, Llc | Hybrid polymer networks as ultra low ‘k’ dielectric layers |
WO2013176238A1 (ja) | 2012-05-25 | 2013-11-28 | 株式会社ダイセル | 硬化性樹脂組成物及びその硬化物、封止剤、並びに光半導体装置 |
EP3528046B1 (en) | 2012-07-04 | 2020-09-09 | Kaneka Corporation | Positive photosensitive composition and thin film transistor |
KR102172115B1 (ko) * | 2012-10-22 | 2020-10-30 | 제이엔씨 주식회사 | 열경화성 수지 조성물 |
CN104781345B (zh) * | 2012-11-13 | 2017-06-06 | 捷恩智株式会社 | 热硬化性树脂组合物、硬化物、光半导体用组合物以及光半导体元件 |
JPWO2017110468A1 (ja) * | 2015-12-24 | 2018-10-18 | Jnc株式会社 | 熱硬化性樹脂組成物 |
JP7457450B2 (ja) * | 2017-10-20 | 2024-03-28 | 信越化学工業株式会社 | シリコーン組成物、シリコーンゴム硬化物、及び電力ケーブル |
CN110903695B (zh) * | 2019-12-23 | 2022-06-24 | 江门市阪桥电子材料有限公司 | 一种具有高反射性能的硅胶油墨 |
CN113429911B (zh) * | 2021-08-26 | 2021-11-19 | 杭州福斯特应用材料股份有限公司 | 架桥剂、组合物、母料、封装胶膜及电子元器件 |
Family Cites Families (69)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4618657A (en) | 1985-03-11 | 1986-10-21 | Desoto, Inc. | Heat curable polysiloxane release coatings which stratify when baked and paper coated therewith |
EP0348705A3 (de) * | 1988-06-29 | 1991-02-27 | Akademie der Wissenschaften der DDR | Organophile Doppelringkieselsäurederivate mit käfigartigen Strukturen, Verfahren zu ihrer Herstellung und ihre Verwendung |
DE3837397A1 (de) | 1988-11-03 | 1990-05-10 | Wacker Chemie Gmbh | Neue organooligosilsesquioxane |
US5160787A (en) | 1989-01-12 | 1992-11-03 | Mitsubishi Gas Chemical Company, Inc. | Electrical laminate having ability to absorb ultraviolet rays |
DE4316101A1 (de) | 1993-05-13 | 1994-11-17 | Wacker Chemie Gmbh | Organosiliciumverbindungen mit käfigartiger Struktur |
JPH11124502A (ja) * | 1997-08-21 | 1999-05-11 | Kanegafuchi Chem Ind Co Ltd | 封止材料用硬化性組成物 |
JPH1171462A (ja) | 1997-08-29 | 1999-03-16 | Toshiba Silicone Co Ltd | 新規な含ケイ素重合体 |
JP3511127B2 (ja) | 1997-11-05 | 2004-03-29 | 信越化学工業株式会社 | 接着性シリコーン組成物 |
US5939576A (en) | 1998-01-05 | 1999-08-17 | The United States Of America As Represented By The Secretary Of The Air Force | Method of functionalizing polycyclic silicones and the compounds so formed |
JP2979145B1 (ja) | 1998-11-18 | 1999-11-15 | 工業技術院長 | 新型含シルセスキオキサンポリマー及びその製造方法 |
JP2000265066A (ja) | 1999-03-17 | 2000-09-26 | Dow Corning Asia Ltd | 有機溶剤可溶性の水素化オクタシルセスキオキサン−ビニル基含有化合物共重合体及び同共重合体からなる絶縁材料 |
US6252030B1 (en) | 1999-03-17 | 2001-06-26 | Dow Corning Asia, Ltd. | Hydrogenated octasilsesquioxane-vinyl group-containing copolymer and method for manufacture |
US7553904B2 (en) | 1999-08-04 | 2009-06-30 | Hybrid Plastics, Inc. | High use temperature nanocomposite resins |
WO2002100867A1 (en) | 2000-10-27 | 2002-12-19 | The Regents Of The University Of Michigan | Well-defined nanosized building blocks for organic/inorganic nanocomposites |
US6623711B2 (en) | 2001-03-27 | 2003-09-23 | Samsung Electronics Co., Ltd. | Siloxane-based resin and method for forming insulating film between interconnect layers in semiconductor devices by using the same |
JP2002363414A (ja) | 2001-06-12 | 2002-12-18 | Asahi Kasei Corp | 籠状シルセスキオキサン含有組成物 |
JP4381636B2 (ja) | 2001-11-05 | 2009-12-09 | 新日鐵化学株式会社 | シリコーン樹脂組成物及びシリコーン樹脂成形体 |
WO2003042292A2 (de) | 2001-11-17 | 2003-05-22 | Creavis Gesellschaft Für Technologie Und Innovation Mbh | Polyolefinzusammensetzungen, verfahren zu deren herstellung und verwendung dieser zusammensetzungen |
WO2004011525A1 (en) | 2002-07-30 | 2004-02-05 | University Of Connecticut | Nonionic telechelic polymers incorporating polyhedral oligosilsesquioxane (poss) and uses thereof |
AU2003263308A1 (en) | 2002-09-04 | 2004-03-29 | Johnson Matthey Plc | Catalysts |
US7319129B2 (en) | 2002-09-13 | 2008-01-15 | Chisso Corporation | Silsesquioxane derivative and process for producing the same |
JP4256756B2 (ja) | 2002-09-30 | 2009-04-22 | 新日鐵化学株式会社 | 官能基を有するかご型シルセスキオキサン樹脂の製造方法 |
JP4142385B2 (ja) | 2002-10-03 | 2008-09-03 | 新日鐵化学株式会社 | シリコーン樹脂組成物及びシリコーン樹脂成形体 |
JP2004175887A (ja) | 2002-11-26 | 2004-06-24 | Kanegafuchi Chem Ind Co Ltd | 硬化性組成物 |
DE10258126B3 (de) | 2002-12-12 | 2004-01-29 | Wacker-Chemie Gmbh | Alkinolgruppen aufweisende Organosiliciumverbindungen sowie diese enthaltend vernetzbare Massen und daraus herstellbare Formkörper |
JP4734832B2 (ja) | 2003-05-14 | 2011-07-27 | ナガセケムテックス株式会社 | 光素子用封止材 |
JP2005023256A (ja) | 2003-07-04 | 2005-01-27 | Toagosei Co Ltd | カチオン硬化性組成物 |
DE112005000177T5 (de) | 2004-01-20 | 2006-12-28 | World Properties, Inc., Lincolnwood | Schaltungsmaterialien, Schaltungen, Mehrschichtschaltungen und Verfahren zu ihrer Herstellung |
JP2005290352A (ja) | 2004-03-12 | 2005-10-20 | Asahi Kasei Corp | カゴ状シルセスキオキサン構造を有する化合物 |
JP4742216B2 (ja) | 2004-07-08 | 2011-08-10 | Jnc株式会社 | ケイ素化合物 |
JP4645803B2 (ja) | 2004-10-05 | 2011-03-09 | 信越化学工業株式会社 | かご状オリゴシロキサン構造を有する一官能性モノマー及びその製造方法 |
JP2006131850A (ja) | 2004-11-09 | 2006-05-25 | Toagosei Co Ltd | 熱硬化性組成物 |
US7915369B2 (en) | 2004-12-07 | 2011-03-29 | Panasonic Electric Works Co., Ltd. | Ultraviolet transmissive polyhedral silsesquioxane polymers |
JP2006265514A (ja) | 2005-02-25 | 2006-10-05 | Asahi Kasei Corp | 共重合体およびその製造方法 |
JP2006269402A (ja) | 2005-02-28 | 2006-10-05 | Fuji Photo Film Co Ltd | 絶縁材料形成用組成物および絶縁膜 |
JP2006233155A (ja) | 2005-02-28 | 2006-09-07 | Chisso Corp | 平坦化膜用塗布液および平坦化膜 |
JP2006299149A (ja) | 2005-04-22 | 2006-11-02 | Asahi Kasei Corp | 封止材用組成物及び光学デバイス |
JP2006299150A (ja) | 2005-04-22 | 2006-11-02 | Asahi Kasei Corp | 封止材用組成物及び光学デバイス |
JP4826160B2 (ja) | 2005-07-28 | 2011-11-30 | ナガセケムテックス株式会社 | 光素子封止用樹脂組成物 |
RU2008110068A (ru) | 2005-08-16 | 2009-09-27 | Хайбрид Плэстикс, Инк. (Us) | Получение олигомерных полиэдрических силсесквиоксан силанолов и силоксидов, функционализированных олефиновыми группами |
TW200708528A (en) * | 2005-08-24 | 2007-03-01 | Nippon Catalytic Chem Ind | Radiation-curable composition and cured product thereof |
KR101156426B1 (ko) | 2005-08-25 | 2012-06-18 | 삼성모바일디스플레이주식회사 | 실세스퀴옥산계 화합물 및 이를 구비한 유기 발광 소자 |
JP2007091935A (ja) | 2005-09-29 | 2007-04-12 | Fujifilm Corp | ポリマー、膜形成用組成物、絶縁膜およびその製造方法 |
US7576140B2 (en) | 2005-10-18 | 2009-08-18 | Sabic Innovative Plastics Ip B.V. | Method of improving abrasion resistance of plastic article and article produced thereby |
JP4935972B2 (ja) | 2005-12-21 | 2012-05-23 | Jsr株式会社 | 光半導体封止用組成物、その製造法および光半導体封止材 |
JP5666775B2 (ja) | 2006-07-21 | 2015-02-12 | 株式会社カネカ | ポリシロキサン系組成物およびそれから得られる成形体、オプトデバイス部材 |
TWI361205B (en) | 2006-10-16 | 2012-04-01 | Rohm & Haas | Heat stable aryl polysiloxane compositions |
US8013345B2 (en) | 2006-11-20 | 2011-09-06 | 3M Innovative Properties Company | Optical bonding composition for LED light source |
WO2008066116A1 (en) | 2006-12-01 | 2008-06-05 | Kaneka Corporation | Polysiloxane composition |
JP2008163260A (ja) | 2006-12-28 | 2008-07-17 | Showa Denko Kk | 発光素子封止用樹脂組成物およびランプ |
US8399592B2 (en) | 2007-04-17 | 2013-03-19 | Kaneka Corporation | Polyhedral polysiloxane modified product and composition using the modified product |
JP2008291137A (ja) * | 2007-05-25 | 2008-12-04 | Kaneka Corp | 硬化性組成物 |
KR101800015B1 (ko) | 2007-12-10 | 2017-11-21 | 카네카 코포레이션 | 알칼리 현상성을 갖는 경화성 조성물 및 그것을 사용한 절연성 박막 및 박막 트랜지스터 |
JP2009173759A (ja) * | 2008-01-23 | 2009-08-06 | Kaneka Corp | 多面体構造ポリシロキサン変性体および該変性体を用いた組成物、硬化物 |
JP5149022B2 (ja) | 2008-01-25 | 2013-02-20 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | 光半導体封止用シリコーン組成物及びそれを用いた光半導体装置 |
JP2009206124A (ja) | 2008-02-26 | 2009-09-10 | Shin Etsu Chem Co Ltd | Led装置の封止方法及びled装置 |
JP2010031254A (ja) | 2008-06-27 | 2010-02-12 | Showa Denko Kk | ヒドロシリル化反応物およびその製造方法、該ヒドロシリル化反応物を含有する転写材料用硬化性組成物、ならびに該ヒドロシリル化反応物または該転写材料用硬化性組成物を用いた転写層の製造方法 |
WO2010007898A1 (ja) | 2008-07-17 | 2010-01-21 | 住友金属工業株式会社 | 混合炭素材料および非水系二次電池用負極 |
EP2151433A1 (en) | 2008-08-05 | 2010-02-10 | Institut Pasteur | Alkoxypyrazoles and the process for their preparation |
JP5329904B2 (ja) * | 2008-10-16 | 2013-10-30 | 株式会社カネカ | ポリシロキサン系組成物およびそれから得られる硬化物 |
CN102449824B (zh) | 2009-03-30 | 2015-06-10 | 新日铁住金株式会社 | 混合碳材料和非水系二次电池用负极 |
JP2010254927A (ja) | 2009-04-28 | 2010-11-11 | Kaneka Corp | 光硬化可能な組成物 |
JP2010265410A (ja) | 2009-05-15 | 2010-11-25 | Kaneka Corp | Led封止剤 |
JP5571329B2 (ja) | 2009-06-24 | 2014-08-13 | 株式会社カネカ | 多面体構造ポリシロキサン変性体、及び該変性体を含有する組成物。 |
JP2011016968A (ja) | 2009-07-10 | 2011-01-27 | Kaneka Corp | 多面体構造ポリシロキサン変性体、その製造方法および該変性体を含む組成物 |
JP2011042732A (ja) | 2009-08-20 | 2011-03-03 | Kaneka Corp | Led封止剤 |
JP5616042B2 (ja) | 2009-09-25 | 2014-10-29 | 株式会社カネカ | 多面体構造ポリシロキサン系変性体及び組成物 |
KR101774306B1 (ko) * | 2010-05-28 | 2017-09-04 | 가부시키가이샤 가네카 | 폴리실록산계 조성물, 경화물, 및, 광학 디바이스 |
JP5877081B2 (ja) | 2011-02-08 | 2016-03-02 | 株式会社カネカ | 多面体構造ポリシロキサン変性体、該変性体を含有する組成物、該組成物を用いてなる封止剤、および光学デバイス |
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2011
- 2011-05-23 KR KR1020127030204A patent/KR101774306B1/ko active Active
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KR20200024231A (ko) * | 2017-06-29 | 2020-03-06 | 다우 글로벌 테크놀로지스 엘엘씨 | 광전지 봉지재 필름용 폴리올레핀 조성물 |
KR20200070328A (ko) * | 2017-10-31 | 2020-06-17 | 다우 글로벌 테크놀로지스 엘엘씨 | 광전지 봉지재 필름용 폴리올레핀 조성물 |
KR20200070326A (ko) * | 2017-10-31 | 2020-06-17 | 다우 글로벌 테크놀로지스 엘엘씨 | 광전지 봉지재 필름용 폴리올레핀 조성물 |
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US9688851B2 (en) | 2017-06-27 |
CN102918110A (zh) | 2013-02-06 |
US20130131264A1 (en) | 2013-05-23 |
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