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ZA200504999B - Radiation curable aqueous compositions - Google Patents

Radiation curable aqueous compositions Download PDF

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Publication number
ZA200504999B
ZA200504999B ZA200504999A ZA200504999A ZA200504999B ZA 200504999 B ZA200504999 B ZA 200504999B ZA 200504999 A ZA200504999 A ZA 200504999A ZA 200504999 A ZA200504999 A ZA 200504999A ZA 200504999 B ZA200504999 B ZA 200504999B
Authority
ZA
South Africa
Prior art keywords
composition
acrylate
cured film
ppb
water
Prior art date
Application number
ZA200504999A
Other languages
English (en)
Inventor
Subhankar Chatterjee
Mikhail Laksin
David Biro
Jean D Turgis
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Publication of ZA200504999B publication Critical patent/ZA200504999B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
ZA200504999A 2002-12-27 2005-06-20 Radiation curable aqueous compositions ZA200504999B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/331,676 US7037953B2 (en) 2000-03-29 2002-12-27 Radiation curable aqueous compositions

Publications (1)

Publication Number Publication Date
ZA200504999B true ZA200504999B (en) 2006-06-28

Family

ID=32710842

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA200504999A ZA200504999B (en) 2002-12-27 2005-06-20 Radiation curable aqueous compositions

Country Status (14)

Country Link
US (1) US7037953B2 (zh)
EP (1) EP1592752B1 (zh)
JP (2) JP2006512458A (zh)
CN (1) CN1732238A (zh)
AT (1) ATE388207T1 (zh)
AU (1) AU2003303558A1 (zh)
BR (1) BR0317191B1 (zh)
CA (1) CA2511790C (zh)
CR (1) CR7888A (zh)
DE (1) DE60319591T2 (zh)
EC (1) ECSP055889A (zh)
MX (1) MXPA05006995A (zh)
WO (1) WO2004061019A1 (zh)
ZA (1) ZA200504999B (zh)

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US9820931B2 (en) 2014-10-13 2017-11-21 L'oreal Latex nail compositions having low amounts of photo-initiator
US9636293B2 (en) 2014-10-13 2017-05-02 L'oréal Latex nail compositions having low amounts of photo-initiator
US9649272B2 (en) 2014-10-13 2017-05-16 L'oréal Latex nail compositions having low amounts of photo-initiator
WO2018022584A1 (en) * 2016-07-27 2018-02-01 Sun Chemical Corporation Water-based electrically-insulating energy-curable fluids
JP2019064699A (ja) * 2017-10-02 2019-04-25 東洋アルミニウム株式会社 蓋材及びその製造方法
WO2019069736A1 (ja) * 2017-10-02 2019-04-11 Ｄｉｃグラフィックス株式会社 電子線硬化型表刷り用水性フレキソインキ、及びそれを用いたボイル・レトルト用パウチ
CN108117616B (zh) * 2017-11-22 2019-08-09 惠州市华泓新材料股份有限公司 二丁基芴基衍生物与其作为光引发剂的应用
JP2019147889A (ja) * 2018-02-27 2019-09-05 Ｄｉｃグラフィックス株式会社 表刷り印刷用リキッドインキ組成物
US11339303B2 (en) * 2018-09-10 2022-05-24 Sun Chemical Corporation Energy curable compositions comprising reaction products of poly(alkylene oxide)-containing glycidyl ethers and acrylic acid
CN110669425A (zh) * 2019-10-16 2020-01-10 江苏巨珩新材料科技有限公司 一种eb固化涂料及其制备方法
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Also Published As

Publication number Publication date
JP2006512458A (ja) 2006-04-13
JP2013082930A (ja) 2013-05-09
US7037953B2 (en) 2006-05-02
BR0317191A (pt) 2005-11-01
BR0317191B1 (pt) 2013-06-25
ECSP055889A (es) 2005-09-20
MXPA05006995A (es) 2005-08-18
WO2004061019A1 (en) 2004-07-22
DE60319591T2 (de) 2009-03-26
CA2511790A1 (en) 2004-07-22
DE60319591D1 (de) 2008-04-17
CN1732238A (zh) 2006-02-08
ATE388207T1 (de) 2008-03-15
CA2511790C (en) 2014-03-04
CR7888A (es) 2007-08-28
US20030134931A1 (en) 2003-07-17
EP1592752B1 (en) 2008-03-05
AU2003303558A1 (en) 2004-07-29
EP1592752A1 (en) 2005-11-09

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