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CR7888A - Composiciones acuosas para curar la radiacion - Google Patents

Composiciones acuosas para curar la radiacion

Info

Publication number
CR7888A
CR7888A CR7888A CR7888A CR7888A CR 7888 A CR7888 A CR 7888A CR 7888 A CR7888 A CR 7888A CR 7888 A CR7888 A CR 7888A CR 7888 A CR7888 A CR 7888A
Authority
CR
Costa Rica
Prior art keywords
radiation
cure radiation
watery compositions
watery
compositions
Prior art date
Application number
CR7888A
Other languages
English (en)
Inventor
Subhankar Chatterjee
Dominique Turguis Jean
Biro David
Laksin Mikhail
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Publication of CR7888A publication Critical patent/CR7888A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

Un metodo para producir un solvente resistente, de extractables bajos, un revestimiento de una composicion acuosa homogenea curada de radiacion actinica que tiene un compuesto soluble en agua, que tiene por lo menos un alfa, beta etilicamente de un enlace doble polimerizado sin saturacion de radiacion., y agua como los componentes esenciales.
CR7888A 2002-12-27 2005-06-27 Composiciones acuosas para curar la radiacion CR7888A (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/331,676 US7037953B2 (en) 2000-03-29 2002-12-27 Radiation curable aqueous compositions

Publications (1)

Publication Number Publication Date
CR7888A true CR7888A (es) 2007-08-28

Family

ID=32710842

Family Applications (1)

Application Number Title Priority Date Filing Date
CR7888A CR7888A (es) 2002-12-27 2005-06-27 Composiciones acuosas para curar la radiacion

Country Status (14)

Country Link
US (1) US7037953B2 (es)
EP (1) EP1592752B1 (es)
JP (2) JP2006512458A (es)
CN (1) CN1732238A (es)
AT (1) ATE388207T1 (es)
AU (1) AU2003303558A1 (es)
BR (1) BR0317191B1 (es)
CA (1) CA2511790C (es)
CR (1) CR7888A (es)
DE (1) DE60319591T2 (es)
EC (1) ECSP055889A (es)
MX (1) MXPA05006995A (es)
WO (1) WO2004061019A1 (es)
ZA (1) ZA200504999B (es)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040180226A1 (en) * 2000-03-29 2004-09-16 Subhankar Chatterjee Radiation curable aqueous compositions for low extractable film packaging
EP1412441B8 (en) * 2001-07-20 2005-11-23 Cytec Surface Specialties, S.A. Radiation curable polymeric ink compositions
DE102004005824A1 (de) * 2004-02-06 2005-08-25 Degussa Ag Organosiliciumeinheiten enthaltende Zubereitung auf Acrylatbasis, deren Herstellung und deren Verwendung
US7479511B2 (en) * 2005-04-12 2009-01-20 Sun Chemical Corporation Water based energy curable hybrid systems with improved properties
CN100351289C (zh) * 2005-07-13 2007-11-28 安徽大学 水系聚氨酯－含硅丙烯酸树脂织物涂层胶的制备方法
WO2007010820A1 (ja) * 2005-07-15 2007-01-25 Dainippon Ink And Chemicals, Inc. 紫外線硬化型樹脂組成物および光情報記録媒体
GB0519941D0 (en) * 2005-09-30 2005-11-09 Xennia Technology Ltd Inkjet printing
GB2450975B (en) * 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
US8877298B2 (en) * 2008-05-27 2014-11-04 The Hong Kong University Of Science And Technology Printing using a structure coated with ultraviolet radiation responsive material
EP2303932A1 (en) * 2008-06-11 2011-04-06 Basf Se Method for tack free surface photocuring of free radically polymerizable resins under visible light photoexcitation
US8378002B2 (en) * 2008-07-16 2013-02-19 Fujifilm Corporation Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method
CN102099383B (zh) * 2008-07-17 2013-06-19 可乐丽则武齿科株式会社 适于led光源的聚合性组合物
US20130101837A1 (en) * 2010-07-09 2013-04-25 Dsm Ip Assets B.V. Radiation curable coatings for concrete floors
JP2014504950A (ja) * 2010-12-13 2014-02-27 サン ケミカル コーポレイション コーティングまたはインク組成物を基材に塗布し、放射線照射する方法、およびその産物
CN102153899B (zh) * 2011-01-28 2014-07-23 创兴精细化学(上海)有限公司 紫外线可固化水性有色涂料组合物
EP2703459B1 (en) * 2012-08-31 2015-01-21 Hewlett-Packard Industrial Printing Ltd. Process for curing photo-curable ink compositions
CN103725087B (zh) * 2013-12-19 2016-03-16 深圳市嘉卓成科技发展有限公司 一种无卤紫外光辐射固化导光油墨及制备、使用方法
CN104017470A (zh) * 2014-02-25 2014-09-03 李穆生 一种光固化涂料及其制备方法
WO2015148094A1 (en) 2014-03-28 2015-10-01 Sun Chemical Corporation Low migration radiation curable inks
US9649272B2 (en) 2014-10-13 2017-05-16 L'oréal Latex nail compositions having low amounts of photo-initiator
US9636293B2 (en) 2014-10-13 2017-05-02 L'oréal Latex nail compositions having low amounts of photo-initiator
US9820931B2 (en) 2014-10-13 2017-11-21 L'oreal Latex nail compositions having low amounts of photo-initiator
EP3491081A4 (en) * 2016-07-27 2020-04-08 Sun Chemical Corporation FREE-RADICAL POLYMERIZABLE AQUEOUS INK-JET COMPOSITIONS
JP6557799B1 (ja) * 2017-10-02 2019-08-07 Ｄｉｃグラフィックス株式会社 電子線硬化型表刷り用水性フレキソインキ、及びそれを用いたボイル・レトルト用パウチ
JP2019064699A (ja) * 2017-10-02 2019-04-25 東洋アルミニウム株式会社 蓋材及びその製造方法
CN108117616B (zh) * 2017-11-22 2019-08-09 惠州市华泓新材料股份有限公司 二丁基芴基衍生物与其作为光引发剂的应用
JP2019147889A (ja) * 2018-02-27 2019-09-05 Ｄｉｃグラフィックス株式会社 表刷り印刷用リキッドインキ組成物
US11236244B2 (en) * 2018-09-10 2022-02-01 Sun Chemical Corporation Energy curable compositions comprising partially acrylated polyols
CN110669425A (zh) * 2019-10-16 2020-01-10 江苏巨珩新材料科技有限公司 一种eb固化涂料及其制备方法
IT202000001963A1 (it) 2020-01-31 2021-07-31 Lamberti Spa Metodo per rivestire un substrato mediante polimerizzazione a fascio di elettroni

Family Cites Families (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE160660C (es)
FR443699A (es) 1911-09-04
DE1621820B1 (de) 1967-11-02 1972-03-09 Bergolin Lack Und Farbenfabrik Verfahren zum Grundieren von Holz
GB1354436A (en) 1971-02-22 1974-06-05 Hoechst Ag Alkyd resin-modified dispersions
JPS5245757B2 (es) * 1971-12-13 1977-11-18
JPS5233929A (en) 1975-09-12 1977-03-15 Nippon Erekutorokiyua Kk Method for rishin finishing
US4035273A (en) * 1976-05-24 1977-07-12 Scm Corporation Cathodic electrocoating process
US4107013A (en) 1976-12-13 1978-08-15 Scm Corporation Ultraviolet curable latexes
US4171387A (en) * 1978-02-06 1979-10-16 Champion International Corporation Coating wood substrates
JPS5539239A (en) 1978-09-11 1980-03-19 Matsushita Electric Works Ltd Surface treating method for wood
DE2853921A1 (de) * 1978-12-14 1980-07-03 Basf Ag Strahlungshaertbare waessrige bindemitteldispersionen
US4269749A (en) * 1979-04-30 1981-05-26 The Dow Chemical Company Method of imparting salt and/or mechanical stability to aqueous polymer microsuspensions
GB2070047B (en) 1979-08-31 1984-05-02 Staybond Pty Ltd Polymerizable water-based composition
DE3114341A1 (de) * 1981-04-09 1982-11-11 Basf Ag, 6700 Ludwigshafen Acylphosphinverbindungen, ihre herstellung und verwendung
DE3200907A1 (de) * 1982-01-14 1983-07-21 Bayer Ag, 5090 Leverkusen Strahlungshaertbare waessrige bindemittelemulsionen
DE3235610A1 (de) * 1982-09-25 1984-03-29 Bayer Ag, 5090 Leverkusen Strahlenhaertbares grundiermittel und seine verwendung
DE3316593A1 (de) 1983-05-06 1984-11-08 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von (meth)-acrylsaeureestern und deren verwendung
DE3502944A1 (de) * 1985-01-30 1986-07-31 Basf Ag, 6700 Ludwigshafen Waessrige grundierung fuer holzanstriche
DE3512179A1 (de) * 1985-04-03 1986-12-04 Merck Patent Gmbh, 6100 Darmstadt Fotoinitiatoren fuer die fotopolymerisation in waessrigen systemen
DE3616434A1 (de) 1986-05-15 1987-11-19 Bayer Ag Verfahren zur grundierung von holz
US4782109A (en) * 1986-06-26 1988-11-01 Lindsay Finishes, Incorporated Latex paint formulations and methods
DE3704098A1 (de) * 1987-02-11 1988-08-25 Basf Ag Strahlungshaertbare acrylate
DE3740139A1 (de) 1987-11-26 1989-06-08 Helmut Sallinger Gmbh Verfahren zur grundierung von wasserlacken auf holz
US5824717A (en) * 1988-05-27 1998-10-20 Exxon Chemical Patents Inc. Peroxide and radiation curable compositions containing isobutylenene copolymers having acrylate functionality
JPH01304935A (ja) 1988-06-03 1989-12-08 Dainippon Ink & Chem Inc 難燃性木質材料
IT1228982B (it) * 1989-03-07 1991-07-11 Lamberti Flli Spa Dispersioni acquose di fotoiniziatori e loro impiego.
CA2033293C (en) * 1989-12-28 2002-04-09 Yutaka Hashimoto Active energy ray-curable composition and applicable method
DE4007146A1 (de) * 1990-03-07 1991-09-12 Basf Ag Strahlungshaertbare amin- und harnstoffgruppen enthaltende urethanacrylatverbindungen
DE59108989D1 (de) * 1990-12-18 1998-06-25 Ciba Geigy Ag Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel
US5387642A (en) * 1991-01-19 1995-02-07 Bayer Aktiengesellschaft Aqueous binder composition and a process for its preparation
DE4114518C2 (de) 1991-05-03 1995-09-14 Ls Industrielacke Gmbh Oberflächenbeschichtungsmaterial und Verfahren zu dessen Auftragung sowie Vorrichtung dafür
JPH05155952A (ja) 1991-12-06 1993-06-22 Nippon Kayaku Co Ltd 印刷インキ用樹脂組成物及びその硬化物
DE4227355A1 (de) 1992-08-19 1994-02-24 Hoechst Ag Wasserverdünnbare Zweikomponenten-Überzugsmasse
DE4228713A1 (de) * 1992-08-28 1994-03-03 Hoechst Ag Wäßrige, strahlenhärtbare Bindemitteldispersionen
JPH08504383A (ja) 1992-12-09 1996-05-14 ヘキスト・アクチェンゲゼルシャフト 照射硬化性被覆組成物を下塗した二軸延伸ｐｅｎｂｂフィルム
EP0658607B1 (en) 1993-12-14 1998-09-16 Canon Kabushiki Kaisha Ink, and ink-jet recording method and instrument using the same
DE4343885A1 (de) * 1993-12-22 1995-06-29 Hoechst Ag Wäßrige, strahlenhärtbare Bindemitteldispersionen
FR2739838A3 (fr) 1993-12-31 1997-04-18 Thiebaut Chantal Procede de fabrication de vernis a sechage ultra violet destine a l'application blisier et vernis barriere dans les dommaines graphiques et particulierement dans l'emballage et la fabrication des etiquettes
EP0756609A4 (en) * 1994-04-19 1998-12-02 Univ Lehigh PRINTING INK COMPOSITIONS, METHODS OF MAKING AND USES THEREOF
IL111014A (en) * 1994-09-21 1999-05-09 Scitex Corp Ltd Ink compositions and a method for making same
DE4434554A1 (de) 1994-09-28 1996-04-04 Basf Ag Strahlungshärtbare wäßrige Polyurethandispersionen
GB9606966D0 (en) 1996-04-02 1996-06-05 Sericol Ltd Printing ink
JPH10219158A (ja) * 1997-01-31 1998-08-18 Teikoku Ink Seizo Kk 高性能インクジェット印刷用水性インク
DE19718948A1 (de) * 1997-05-05 1998-11-12 Basf Ag Wässrige, strahlungshärtbare Beschichtungsmassen
EP1023360B1 (en) 1997-10-16 2011-03-09 Sun Chemical Corporation PHOTONEUTRALIZATION OF pH SENSITIVE AQUEOUS POLYMERIC DISPERSIONS AND METHODS FOR USING SAME
US6087417A (en) * 1998-01-16 2000-07-11 The Valspar Corporation Epoxy resin/acid/tertiary amine reaction product with reactive diluent
US6232361B1 (en) 1998-12-11 2001-05-15 Sun Chemical Corporation Radiation curable water based cationic inks and coatings
JP2000248023A (ja) * 1999-03-01 2000-09-12 Kyoeisha Chem Co Ltd インク受像層用硬化性組成物
AU6820301A (en) * 2000-06-06 2001-12-17 Cryovac Inc Printed thermoplastic film with radiation-cured overprint varnish
JP3893262B2 (ja) * 2000-09-14 2007-03-14 キヤノン株式会社 水性光硬化型樹脂組成物、水性インク、インクカートリッジ、記録ユニット及びインクジェット記録装置
JP2002346473A (ja) * 2001-03-19 2002-12-03 Gen Gijutsu Kenkyusho:Kk 硬化塗膜の形成方法
EP1373414A1 (en) * 2001-04-03 2004-01-02 Sun Chemical Corporation Radiaton curable aqueous compositions for low extractable film packaging
WO2002081577A1 (en) * 2001-04-03 2002-10-17 Sun Chemical Corporation Radiation curable aqueous compositions
JP2003147230A (ja) * 2001-11-02 2003-05-21 Sun Chemical Corp 輻射線硬化性水性組成物

Also Published As

Publication number Publication date
EP1592752B1 (en) 2008-03-05
JP2013082930A (ja) 2013-05-09
EP1592752A1 (en) 2005-11-09
ZA200504999B (en) 2006-06-28
CA2511790A1 (en) 2004-07-22
CA2511790C (en) 2014-03-04
ATE388207T1 (de) 2008-03-15
DE60319591D1 (de) 2008-04-17
MXPA05006995A (es) 2005-08-18
BR0317191B1 (pt) 2013-06-25
WO2004061019A1 (en) 2004-07-22
US20030134931A1 (en) 2003-07-17
CN1732238A (zh) 2006-02-08
JP2006512458A (ja) 2006-04-13
AU2003303558A1 (en) 2004-07-29
US7037953B2 (en) 2006-05-02
ECSP055889A (es) 2005-09-20
BR0317191A (pt) 2005-11-01
DE60319591T2 (de) 2009-03-26

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