KR950008473A - 부가적인 관능기를 갖는 비닐 에테르 화합물 - Google Patents
부가적인 관능기를 갖는 비닐 에테르 화합물 Download PDFInfo
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- KR950008473A KR950008473A KR1019940023859A KR19940023859A KR950008473A KR 950008473 A KR950008473 A KR 950008473A KR 1019940023859 A KR1019940023859 A KR 1019940023859A KR 19940023859 A KR19940023859 A KR 19940023859A KR 950008473 A KR950008473 A KR 950008473A
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- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 title claims abstract 4
- 125000000524 functional group Chemical group 0.000 title claims abstract 3
- 150000001875 compounds Chemical class 0.000 claims abstract 24
- 239000000203 mixture Substances 0.000 claims abstract 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract 3
- 239000004593 Epoxy Substances 0.000 claims abstract 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims abstract 3
- 125000003342 alkenyl group Chemical group 0.000 claims abstract 2
- 125000000392 cycloalkenyl group Chemical group 0.000 claims abstract 2
- 150000003254 radicals Chemical class 0.000 claims 24
- 125000004432 carbon atom Chemical group C* 0.000 claims 21
- -1 cycloaliphatic Chemical group 0.000 claims 16
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 3
- 125000001931 aliphatic group Chemical group 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 3
- 239000001257 hydrogen Substances 0.000 claims 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 125000002723 alicyclic group Chemical group 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical group 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 2
- 125000000962 organic group Chemical group 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- 239000004721 Polyphenylene oxide Substances 0.000 claims 1
- YUDRVAHLXDBKSR-UHFFFAOYSA-N [CH]1CCCCC1 Chemical compound [CH]1CCCCC1 YUDRVAHLXDBKSR-UHFFFAOYSA-N 0.000 claims 1
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical compound [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 230000009977 dual effect Effects 0.000 claims 1
- 238000001459 lithography Methods 0.000 claims 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims 1
- 150000003018 phosphorus compounds Chemical class 0.000 claims 1
- 229920000728 polyester Polymers 0.000 claims 1
- 229920000570 polyether Polymers 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
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- C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
- C08F16/12—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
- C08F16/14—Monomers containing only one unsaturated aliphatic radical
- C08F16/26—Monomers containing oxygen atoms in addition to the ether oxygen
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- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
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- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
- C07C271/28—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a non-condensed six-membered aromatic ring
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- C07C271/06—Esters of carbamic acids
- C07C271/32—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of rings other than six-membered aromatic rings
- C07C271/38—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of rings other than six-membered aromatic rings with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
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- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
- C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
- C07D303/24—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds
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- C07D303/38—Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
- C07D303/40—Compounds containing oxirane rings with hydrocarbon radicals, substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals by ester radicals
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- C07C2603/58—Ring systems containing bridged rings containing three rings
- C07C2603/60—Ring systems containing bridged rings containing three rings containing at least one ring with less than six members
- C07C2603/66—Ring systems containing bridged rings containing three rings containing at least one ring with less than six members containing five-membered rings
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- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Epoxy Resins (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Macromonomer-Based Addition Polymer (AREA)
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Abstract
Description
Claims (21)
- 분자 내에 아크릴레이트, 메타크릴레이트, 에폭시, 알켄일, 시크로알켄일 및 비닐아릴기로부터 선정된 1이상의 관능기를 더 포함하는 1이상의 비닐 에테르기 함유 화합물.
- 제2항에 있어서, 하기식의 화합물:상기식에서, A는 하기 일반식(1)(2)(3) 및 (4)의 라디칼로부터 선정되는 z가 라디칼이고;[D]는 하기식(5)의 기이며;[E]는 C1-또는 C2-알킬렌기이고; R0는 수소원자 또는 메틸기이며; R1는 지방족, 지환족, 방향족, 지방방향족 및 지방-지환족 라디칼 및 폴리옥시알킬렌 라디칼로부터 선정된 z가 라디칼이고; R2는 일반식의 라디칼들로부터 선정된 라디칼이며; R4는 일반식의 기들로부터 선정된 기이고; R5는 하기식의 기들로부터 선정된 기이며;R6는 일반식(2) 라디칼에서 하기식(6)의 각 z기의 탄소원자 Cα및 Cβ와 함께 (2-z)가 유기기이며, 탄소 원자 5이상의 지환족 고리를 형성하고;R14및 R15는 각각 수소원자이거나 또는 [E]가 C2알킬렌기일 때, 각각 수소원자이거나 또는 함께 메틸렌기를 형성하며; i는 0내지20의 정수이고; m은 1 내지 20의 정수이며; s는 2내지 10의 정수이고; t은 0내지 10의 정수이며; 일반식(5)에서 일반식의 각 단위체의 u는 각각 0 독립적으로 1 내지 20의 정수이며; v는 0 내지 4의 정수이고; x 및 y는 각각 독립적으로 2내지 20의 정수이며; z는 1 또는 2의 숫자이다.
- 제2항에 있어서, 하기식 (7) 또는 (8)중 하나를 갖는 화합물;상기식에서, R1, R2, R6, x 및 z는 제2항에 정의한 바와 같다.
- 제2항에 있어서, R1이 a)탄소 원자 2 내지 20의 지방족 라디칼, b)각각 탄소 원자 6 내지 14의 지환족 및 방향족 라디칼 c)각각 탄소 원자 7 내지 25의 지방-방향족 및 지방-지환족 라디칼, 및 d)일반식 R7-[OCgH2g]n- 및-(CgH2g)-[OCgH2g]n-1-의 폴리옥시알킬렌 라디칼로부터 선정된 z가 라디칼이고; R7이 탄소 원자 1 내지 8의 알킬기이며, g는폴리옥시알킬렌 라디칼의 알킬렌 단위체 탄소 원자의 평균 개수에 따른 1내지 8의 숫자이며, n이 2내지 20의 정수이고, 라디칼R1이 비치환되거나 또는 1이상의 치환체를 가질 수 있는데, 이 지방족 라디칼 R1이 C1-C4알콕시 및 할로겐 치환체로부터 선정되는 경우, 및 기타 유형의 라디칼 R1이 C1-C4알킬, C1-C|4알콕시 및 할로겐 치환체로부터 선정되는 경우인 화합물.
- 제4항에 있어서, R1이 하기식의 라디칼로부터 선정된 라디칼이며;R 및 R3은 각각 독립적으로 수소원자 또는 데틸이며, f는 2내지 20의 정수인 화합물.
- 제5항에 있어서, R1이 하기식의 라디칼로부터 선정된 라디칼이며;R4는 하기식의 기들로부터 선정된 기이고;R5는 하기식의 기들로부터 선정된 기이며;R 및 R3은 모두 수소원자 또는 메틸이고; k은 2내지 10의 정수이며, 지수 m의 상한은 10인 화합물.
- 제6항에 있어서, R1이 탄소 원자 2내지 4의 알킬렌 라디칼로부터 선정된 라디칼, 페닐 라디칼 및 일반식의 라디칼이고, R4가 일반식의 기이며, R5가 하기식의 기들로부터 선정된 기인 화합물;
- 제2항에 있어서, R6이 탄소 운자 3내지 50의 유기기인 화합물.
- 제8항에 있어서, z가 1이고, R6가 일반식(6)기의 탄소 원자 Cα및 Cβ와 함께 5내지 7의 고리 탄소원자를 갖는 시클로알킬 라디칼을 형성하며 여기에 5내지 7의 고리 탄소원자를 갖는 시클로알킬 라디칼이 더 융합될 수 있는 화합물.
- 제9항에 있어서, R6이 일반식(6)기의 탄소 원자 Cα및 Cβ와 함께 시클로펜틸 또는 시클로헥실 라디칼을 형성하는 화합물.
- 제8항에 있어서, R6는 일반식 R8-[G]-R9의 기이며, R8은 상기한 바와 같은 일반식(6)기의 탄소 원자 Cα및 Cβ와 함께 5내지 7의 고리 탄소원자를 갖는 시클로알킬 라디칼을 형성하며 여기에 5내지 7의 고리 탄소원자의 시클로알킬 라디칼이 더 융합될 수 있고; R9은 일반식(6)의 다른 기의 탄소 원자 Cα및 Cβ와 함께 5내지 7의 고리 탄소원자를 갖는 시클로알킬 라디칼을 형성하며, 여기에 5내지 7원 고리 탄소원자의 시클로알킬 라디칼이 더 융합될 수 있고, 또는 5 내지 7의 고리 탄소원다의 시클로알킬 라디칼이며, 여기에 5내지 7원 고리탄소 원자의 시클로알킬 라디칼이 더 융합될 수 있고, [G]는 하기식의 기 및 단일 결합으로부터 선정된 구조적 단위체이며;h는 1내지 6, 특히 2내지 4의 정수인 화합물.
- 제11항에 있어서, 하기식을 갖는 화합물:상기식에서, 라디칼 R10및 R13중 하나는 일반식 H2C=CH-O-(CH2)|x-O-의 기이고 또 다른 하나는 일반식 R2O-의 기이며, 이와 유사하게 R11및 R12중 하나는 일반식H2C=CH-O-(CH2)x-O-의 기이고 또 다른 하나는 일반식 R2O-의 기이며 x 및 h는 각각 독립적으로 2내지 4의 정수인 화합물.
- 제2항에 있어서, R2가인 화합물.
- 제2항에 있어서, A가 일반식(3) 또는 (4)의 라디칼이며, s는 2내지 4의 정수이고, t는 0내지 2의 정수이며, u는 숫자 1이고, v는 0 또는 1이며, x 및 y는 각각 2내지 10의 정수인 화합물.
- 제2항에 있어서, A가 일반식(4)의 라디칼이고, R14및 R15가 각각 수소 원자이며 z가 숫자 1인 화합물.
- 제2항에 있어서, 하기식을 갖는 화합물:
- 방사선에 의해 경화가능한 조성물의 중합성 성분으로서의 제1항에 따른 비닐 에테르 화합물의 용도.
- 서로 다른 중합성 화합물 1이상, 및 화합물 가교용 광개시제 1이상을 포함하는, 제1항에 따른 비닐 에테르화합물 1이상을 포함하는 조성물.
- 제18항에 있어서, 제1항에 따른 1이상의 비닐 에테르 화합물 5내지 60중량%; 단일, 이중 또는 다관능성 아크릴레이트 또는 메타크릴레이트 0내지 40중량%; 이중 또는 다기능성 에폭시 화합물 30 내지 80중량%; 라디칼 광개시제 0내지 5중량%; 히드록시-말단 폴리에테르 또는 폴리에스테르 0 내지 40중량%; 및 1이상의 부가제 0 내지 10중량%를 포함하는 조성물.
- 제18항에 따른 조성물이 화학 방사선으로 처리된 경화 제품 제조방법.
- UV/VIS 광원으로 조성물의 층표면 전체에 걸쳐 또는 소정 패턴에 조사하여 조사영역에서 원하는 층 두께로 층을 고형화하고, 조성물의 새로운 층을 고형화된 층 위에 형성시킨 다음 새로운 층의 표면 전체에 걸쳐 또는 소정 패턴을 조사하고, 피복 및 조사를 반복함으로써 다수의 상호 접착된 고형 층으로 구성된 3차원 제품을 제조하는 단계를 포함하는, 리소그래피에 의해 제18항에 따른 조성물로부터 3차원 제품을 제조하는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
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CH278693 | 1993-09-16 | ||
CH93-3/2786 | 1993-09-16 | ||
DE93-3/2786 | 1993-09-16 | ||
CH68494 | 1994-03-08 | ||
DE94-3/0684 | 1994-03-08 |
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KR950008473A true KR950008473A (ko) | 1995-04-17 |
KR100355313B1 KR100355313B1 (ko) | 2003-03-04 |
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KR1019940023859A KR100355313B1 (ko) | 1993-09-16 | 1994-09-15 | 부가적인관능기를갖는비닐에테르화합물 |
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EP (1) | EP0646580B1 (ko) |
JP (1) | JPH07233112A (ko) |
KR (1) | KR100355313B1 (ko) |
AT (1) | ATE193532T1 (ko) |
AU (1) | AU685824B2 (ko) |
CA (1) | CA2132064C (ko) |
DE (1) | DE59409385D1 (ko) |
ES (1) | ES2147777T3 (ko) |
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- 1994-09-07 EP EP94810517A patent/EP0646580B1/de not_active Expired - Lifetime
- 1994-09-07 DE DE59409385T patent/DE59409385D1/de not_active Expired - Fee Related
- 1994-09-07 ES ES94810517T patent/ES2147777T3/es not_active Expired - Lifetime
- 1994-09-07 AT AT94810517T patent/ATE193532T1/de not_active IP Right Cessation
- 1994-09-12 US US08/304,464 patent/US5605941A/en not_active Expired - Lifetime
- 1994-09-14 CA CA002132064A patent/CA2132064C/en not_active Expired - Fee Related
- 1994-09-15 KR KR1019940023859A patent/KR100355313B1/ko not_active IP Right Cessation
- 1994-09-15 AU AU73003/94A patent/AU685824B2/en not_active Ceased
- 1994-09-16 JP JP6248625A patent/JPH07233112A/ja active Pending
-
1995
- 1995-11-09 US US08/555,821 patent/US5705316A/en not_active Expired - Fee Related
-
1996
- 1996-08-13 US US08/689,747 patent/US5783712A/en not_active Expired - Lifetime
-
1997
- 1997-04-16 US US08/834,404 patent/US5783615A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA2132064C (en) | 1999-12-28 |
KR100355313B1 (ko) | 2003-03-04 |
ATE193532T1 (de) | 2000-06-15 |
AU7300394A (en) | 1995-03-30 |
JPH07233112A (ja) | 1995-09-05 |
US5783615A (en) | 1998-07-21 |
EP0646580A2 (de) | 1995-04-05 |
ES2147777T3 (es) | 2000-10-01 |
EP0646580B1 (de) | 2000-05-31 |
US5605941A (en) | 1997-02-25 |
US5783712A (en) | 1998-07-21 |
AU685824B2 (en) | 1998-01-29 |
EP0646580A3 (de) | 1995-10-11 |
US5705316A (en) | 1998-01-06 |
DE59409385D1 (de) | 2000-07-06 |
CA2132064A1 (en) | 1995-03-17 |
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