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DE69604909D1 - Flüssige photohärtbare zusammensetzungen - Google Patents

Flüssige photohärtbare zusammensetzungen

Info

Publication number
DE69604909D1
DE69604909D1 DE69604909T DE69604909T DE69604909D1 DE 69604909 D1 DE69604909 D1 DE 69604909D1 DE 69604909 T DE69604909 T DE 69604909T DE 69604909 T DE69604909 T DE 69604909T DE 69604909 D1 DE69604909 D1 DE 69604909D1
Authority
DE
Germany
Prior art keywords
parts
pct
meth
acrylate
date sep
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69604909T
Other languages
English (en)
Other versions
DE69604909T2 (de
Inventor
Ajay Popat
John Lawson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3D Systems Inc
Original Assignee
Zeneca Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeneca Ltd filed Critical Zeneca Ltd
Application granted granted Critical
Publication of DE69604909D1 publication Critical patent/DE69604909D1/de
Publication of DE69604909T2 publication Critical patent/DE69604909T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69604909T 1995-03-11 1996-03-06 Flüssige photohärtbare zusammensetzungen Expired - Lifetime DE69604909T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB9504995.3A GB9504995D0 (en) 1995-03-11 1995-03-11 Compositions
PCT/GB1996/000518 WO1996028763A1 (en) 1995-03-11 1996-03-06 Liquid photocurable compositions

Publications (2)

Publication Number Publication Date
DE69604909D1 true DE69604909D1 (de) 1999-12-02
DE69604909T2 DE69604909T2 (de) 2000-02-17

Family

ID=10771094

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69604909T Expired - Lifetime DE69604909T2 (de) 1995-03-11 1996-03-06 Flüssige photohärtbare zusammensetzungen

Country Status (8)

Country Link
US (1) US6025114A (de)
EP (1) EP0820609B1 (de)
JP (1) JP3787788B2 (de)
AT (1) ATE186127T1 (de)
AU (1) AU703806B2 (de)
DE (1) DE69604909T2 (de)
GB (1) GB9504995D0 (de)
WO (1) WO1996028763A1 (de)

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AU751062B2 (en) 1997-07-21 2002-08-08 Vantico Ag Viscosity stabilization of radiation-curable filled compositions
US5891931A (en) * 1997-08-07 1999-04-06 Alcon Laboratories, Inc. Method of preparing foldable high refractive index acrylic ophthalmic device materials
US5994409A (en) * 1997-12-09 1999-11-30 U.S. Bioscience, Inc. Methods for treatment of neuro--and nephro--disorders and therapeutic toxicities using aminothiol compounds
US6762002B2 (en) 1998-07-10 2004-07-13 Dsm Desotech, Inc. Solid imaging compositions for preparing polypropylene-like articles
US6379866B2 (en) * 2000-03-31 2002-04-30 Dsm Desotech Inc Solid imaging compositions for preparing polypropylene-like articles
US20060154175A9 (en) * 1998-07-10 2006-07-13 Lawton John A Solid imaging compositions for preparing polypropylene-like articles
US6287748B1 (en) 1998-07-10 2001-09-11 Dsm N.V. Solid imaging compositions for preparing polyethylene-like articles
US20030225182A1 (en) * 2001-01-04 2003-12-04 Dentsply Detrey Gmbh Dental composition with improved light stability
US8026295B2 (en) * 2000-02-17 2011-09-27 Dentsply International, Inc. Dental composition with improved light stability
US20040225029A1 (en) * 2000-02-17 2004-11-11 Uwe Walz Dental composition with improved light stability
US6375887B1 (en) 2000-04-18 2002-04-23 Victor Joyner Method and apparatus for creating cast parts and investment models
US6875640B1 (en) 2000-06-08 2005-04-05 Micron Technology, Inc. Stereolithographic methods for forming a protective layer on a semiconductor device substrate and substrates including protective layers so formed
EP1307172B1 (de) * 2000-08-11 2006-06-07 Dentsply International, Inc. Polyaminoestern und deren verwendung zur herstellung von dentalmassen
US20030069327A1 (en) * 2001-08-09 2003-04-10 Uwe Walz Dental compostions comprising bisacrylamides and use thereof
US20040171716A1 (en) * 2002-12-03 2004-09-02 Uwe Walz Dental compositions comprising bisacrylamides and use thereof
MXPA03001507A (es) * 2000-08-23 2003-06-09 Dana Corp Aislante y sellador de epoxi-nitilo para montaje de celda de combustible.
US7220786B1 (en) 2000-08-23 2007-05-22 Dana Corporation Ultraviolet radiation curable coating for MLS head gasket applications
US7300690B2 (en) * 2001-03-29 2007-11-27 General Electric Company Radial tilt reduced media
EP1416901B1 (de) * 2001-08-13 2005-10-26 Dentsply International, Inc. Kegel zur füllung von zahnwurzelkanälen
US6716505B2 (en) * 2001-08-31 2004-04-06 General Electric Company Storage medium for data with improved dimensional stability
US7196120B2 (en) * 2002-08-29 2007-03-27 Dana Corporation Ultraviolet radiation curable coating for MLS head gasket applications
RU2244335C2 (ru) * 2002-12-10 2005-01-10 Московский государственный технический университет им. Н.Э. Баумана Фотополимеризующая композиция для лазерной стереолитографии видимого диапазона
US20040209990A1 (en) * 2003-04-15 2004-10-21 Uwe Walz Low shrinking polymerizable dental material
DE10328302A1 (de) * 2003-06-23 2005-01-27 Dreve Otoplastik Gmbh Niedrigviskose, strahlungshärtbare Formulierung, insbesondere für die Stereolithographie, zum Einsatz in der Medizintechnik, insbesondere zur Herstellung von Ohrstücken
US20050165127A1 (en) * 2003-12-31 2005-07-28 Dsm Desotech, Inc. Solid imaging compositions for preparing polyethylene-like articles
CA2593860C (en) * 2005-02-01 2013-09-10 Timothy P. Friel Ocular prosthesis and fabrication method of same
US7479247B2 (en) * 2005-05-12 2009-01-20 Victor Joyner Method and apparatus for creating sacrificial patterns and cast parts
JP5111880B2 (ja) * 2007-02-02 2013-01-09 シーメット株式会社 面露光による光学的立体造形用樹脂組成物
WO2009014500A1 (en) * 2007-07-20 2009-01-29 Agency For Science, Technology And Research Device and method for focusing a beam of light with reduced focal plane distortion
JP2011506926A (ja) * 2007-12-06 2011-03-03 エージェンシー フォー サイエンス， テクノロジー アンド リサーチ 化学反応を実施しモニターするための一体型装置
JP5049404B2 (ja) * 2008-03-31 2012-10-17 エージェンシー フォー サイエンス， テクノロジー アンド リサーチ 相互接続マルチチャンバデバイスを使用する流体処理および移送の方法
KR102058955B1 (ko) * 2011-11-17 2019-12-26 스트라타시스 엘티디. 다중-재료 적층 가공을 사용하여 신체 부분 모델을 제조하기 위한 시스템 및 방법
US10357435B2 (en) * 2012-12-18 2019-07-23 Dentca, Inc. Photo-curable resin compositions and method of using the same in three-dimensional printing for manufacturing artificial teeth and denture base
PL2986654T3 (pl) * 2013-04-18 2020-09-07 Dentca, Inc. Kompozycje żywicy fotoutwardzalnej i sposób ich zastosowania w drukowaniu trójwymiarowym do wytwarzania sztucznych zębów i podstawy protezy zębowej
JP2020075941A (ja) * 2016-12-05 2020-05-21 Dic株式会社 サージカルガイド用の立体造形物を形成するために用いられる光学的立体造形用光硬化性樹脂組成物
KR102673971B1 (ko) 2017-07-25 2024-06-12 솔벤텀 인텔렉추얼 프로퍼티즈 캄파니 우레탄 성분 및 반응성 희석제를 포함하는 광중합성 조성물, 물품, 및 방법
RU2685211C2 (ru) * 2017-10-10 2019-04-16 Федеральное государственное учреждение "Федеральный научно-исследовательский центр "Кристаллография и фотоника" Российской академии наук" Жидкая фотополимеризующаяся композиция для лазерной стереолитографии
WO2019103855A1 (en) 2017-11-22 2019-05-31 3M Innovative Properties Company Photopolymerizable compositions including a urethane component and a monofunctional reactive diluent, articles, and methods
US11904031B2 (en) 2017-11-22 2024-02-20 3M Innovative Properties Company Orthodontic articles comprising polymerized composition comprising at least two free-radical initiators
CN112313577B (zh) 2018-04-20 2024-07-09 斯特拉塔西斯公司 用于增材制造的辐射可固化组合物
EP3813763A1 (de) 2018-06-29 2021-05-05 3M Innovative Properties Company Kieferorthopädische artikel mit einer gehärteten, freiradikalisch polymerisierbaren zusammensetzung mit verbesserter festigkeit in wässriger umgebung
US12209150B2 (en) * 2021-02-08 2025-01-28 James R. Glidewell Dental Ceramics, Inc. Photocurable resin composition with low shrinkage and high accuracy for use in additive manufacturing processes

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
US4789620A (en) * 1986-03-03 1988-12-06 Mitsubishi Rayon Co. Ltd. Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates
WO1989008021A1 (en) * 1988-03-02 1989-09-08 Desoto, Inc. Stereolithography using composition providing reduced distortion
US4945032A (en) * 1988-03-31 1990-07-31 Desoto, Inc. Stereolithography using repeated exposures to increase strength and reduce distortion
KR0147812B1 (ko) * 1989-01-10 1998-08-17 베르너 발대크 감광성 액체 수지 조성물 및 그로부터 3차원 물체를 제조하는 방법
EP0425440B1 (de) * 1989-10-27 1994-11-17 Ciba-Geigy Ag Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen
DE59010008D1 (de) * 1989-10-27 1996-02-08 Ciba Geigy Ag Photoempfindliches Gemisch
EP0506616B1 (de) * 1991-03-27 1998-01-21 Ciba SC Holding AG Photoempfindliches Gemisch auf Basis von Acrylaten
EP0525578A1 (de) * 1991-08-02 1993-02-03 E.I. Du Pont De Nemours And Company Photopolymerzusammensetzung zur Herstellung von dreidimensionalen Objekten
EP0536086A1 (de) * 1991-10-03 1993-04-07 Ciba-Geigy Ag Photoempfindliche Gemische
TW311923B (de) * 1992-01-27 1997-08-01 Ciba Sc Holding Ag
CA2092131A1 (en) * 1992-03-27 1993-09-28 Victor Kadziela (Nmi) Low viscosity self-toughening acrylate composition
FR2689876B1 (fr) * 1992-04-08 1994-09-02 Hoechst France Dispersions silico-acryliques, leur procédé d'obtention, leur application en stéréophotolithographie et procédé de préparation d'objets en résine.

Also Published As

Publication number Publication date
AU703806B2 (en) 1999-04-01
GB9504995D0 (en) 1995-04-26
DE69604909T2 (de) 2000-02-17
JPH11503770A (ja) 1999-03-30
JP3787788B2 (ja) 2006-06-21
EP0820609B1 (de) 1999-10-27
EP0820609A1 (de) 1998-01-28
AU4887196A (en) 1996-10-02
ATE186127T1 (de) 1999-11-15
WO1996028763A1 (en) 1996-09-19
US6025114A (en) 2000-02-15

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: AVECIA LTD., MANCHESTER, GB

8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: VANTICO LTD., DUXFORD, CAMBRIDGE, GB

8328 Change in the person/name/address of the agent

Free format text: ZUMSTEIN & KLINGSEISEN, 80331 MUENCHEN

8328 Change in the person/name/address of the agent

Representative=s name: PFENNING MEINIG & PARTNER GBR, 80339 MUENCHEN

8328 Change in the person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC

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