ATE186127T1 - Flüssige photohärtbare zusammensetzungen - Google Patents
Flüssige photohärtbare zusammensetzungenInfo
- Publication number
- ATE186127T1 ATE186127T1 AT96904961T AT96904961T ATE186127T1 AT E186127 T1 ATE186127 T1 AT E186127T1 AT 96904961 T AT96904961 T AT 96904961T AT 96904961 T AT96904961 T AT 96904961T AT E186127 T1 ATE186127 T1 AT E186127T1
- Authority
- AT
- Austria
- Prior art keywords
- parts
- pct
- meth
- compositions
- acrylate
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 3
- 239000007788 liquid Substances 0.000 title abstract 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 abstract 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 abstract 1
- 229920000193 polymethacrylate Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9504995.3A GB9504995D0 (en) | 1995-03-11 | 1995-03-11 | Compositions |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE186127T1 true ATE186127T1 (de) | 1999-11-15 |
Family
ID=10771094
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT96904961T ATE186127T1 (de) | 1995-03-11 | 1996-03-06 | Flüssige photohärtbare zusammensetzungen |
Country Status (8)
Country | Link |
---|---|
US (1) | US6025114A (de) |
EP (1) | EP0820609B1 (de) |
JP (1) | JP3787788B2 (de) |
AT (1) | ATE186127T1 (de) |
AU (1) | AU703806B2 (de) |
DE (1) | DE69604909T2 (de) |
GB (1) | GB9504995D0 (de) |
WO (1) | WO1996028763A1 (de) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5922821A (en) * | 1996-08-09 | 1999-07-13 | Alcon Laboratories, Inc. | Ophthalmic lens polymers |
EP0831372A1 (de) * | 1996-09-23 | 1998-03-25 | Siemens Aktiengesellschaft | Photopolymere |
EP0998696A2 (de) * | 1997-07-21 | 2000-05-10 | Ciba SC Holding AG | Viskositätsstabilisierung von strahlungshärtbaren zusammensetzungen |
US5891931A (en) * | 1997-08-07 | 1999-04-06 | Alcon Laboratories, Inc. | Method of preparing foldable high refractive index acrylic ophthalmic device materials |
US5994409A (en) * | 1997-12-09 | 1999-11-30 | U.S. Bioscience, Inc. | Methods for treatment of neuro--and nephro--disorders and therapeutic toxicities using aminothiol compounds |
US20060154175A9 (en) * | 1998-07-10 | 2006-07-13 | Lawton John A | Solid imaging compositions for preparing polypropylene-like articles |
US6287748B1 (en) | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
US6762002B2 (en) | 1998-07-10 | 2004-07-13 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polypropylene-like articles |
US6379866B2 (en) * | 2000-03-31 | 2002-04-30 | Dsm Desotech Inc | Solid imaging compositions for preparing polypropylene-like articles |
US20040225029A1 (en) * | 2000-02-17 | 2004-11-11 | Uwe Walz | Dental composition with improved light stability |
US8026295B2 (en) * | 2000-02-17 | 2011-09-27 | Dentsply International, Inc. | Dental composition with improved light stability |
US20030225182A1 (en) * | 2001-01-04 | 2003-12-04 | Dentsply Detrey Gmbh | Dental composition with improved light stability |
US6375887B1 (en) | 2000-04-18 | 2002-04-23 | Victor Joyner | Method and apparatus for creating cast parts and investment models |
US6875640B1 (en) | 2000-06-08 | 2005-04-05 | Micron Technology, Inc. | Stereolithographic methods for forming a protective layer on a semiconductor device substrate and substrates including protective layers so formed |
EP1307172B1 (de) * | 2000-08-11 | 2006-06-07 | Dentsply International, Inc. | Polyaminoestern und deren verwendung zur herstellung von dentalmassen |
US20030069327A1 (en) * | 2001-08-09 | 2003-04-10 | Uwe Walz | Dental compostions comprising bisacrylamides and use thereof |
US20040171716A1 (en) * | 2002-12-03 | 2004-09-02 | Uwe Walz | Dental compositions comprising bisacrylamides and use thereof |
CA2419136A1 (en) * | 2000-08-23 | 2002-02-28 | Dana Corporation | Epoxy nitrile insulator and seal for fuel cell assemblies |
US7220786B1 (en) | 2000-08-23 | 2007-05-22 | Dana Corporation | Ultraviolet radiation curable coating for MLS head gasket applications |
US7300690B2 (en) * | 2001-03-29 | 2007-11-27 | General Electric Company | Radial tilt reduced media |
WO2003015718A1 (en) * | 2001-08-13 | 2003-02-27 | Dentsply International Inc. | Dental root canal filling cones |
US6716505B2 (en) * | 2001-08-31 | 2004-04-06 | General Electric Company | Storage medium for data with improved dimensional stability |
US7196120B2 (en) * | 2002-08-29 | 2007-03-27 | Dana Corporation | Ultraviolet radiation curable coating for MLS head gasket applications |
US20040209990A1 (en) * | 2003-04-15 | 2004-10-21 | Uwe Walz | Low shrinking polymerizable dental material |
DE10328302A1 (de) * | 2003-06-23 | 2005-01-27 | Dreve Otoplastik Gmbh | Niedrigviskose, strahlungshärtbare Formulierung, insbesondere für die Stereolithographie, zum Einsatz in der Medizintechnik, insbesondere zur Herstellung von Ohrstücken |
US20050165127A1 (en) * | 2003-12-31 | 2005-07-28 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polyethylene-like articles |
US8303746B2 (en) * | 2005-02-01 | 2012-11-06 | Friel Timothy P | Ocular prosthesis and fabrication method of same |
US7479247B2 (en) * | 2005-05-12 | 2009-01-20 | Victor Joyner | Method and apparatus for creating sacrificial patterns and cast parts |
JP5111880B2 (ja) * | 2007-02-02 | 2013-01-09 | シーメット株式会社 | 面露光による光学的立体造形用樹脂組成物 |
EP2185977A4 (de) * | 2007-07-20 | 2013-03-06 | Agency Science Tech & Res | Zweiphotonen-stereolithographie unter verwendung lichtaushärtbarer zusammensetzungen |
EP2232245A1 (de) * | 2007-12-06 | 2010-09-29 | Agency for Science, Technology And Research | Integrierte vorrichtung zur durchführung und überwachung chemischer reaktionen |
WO2009123565A1 (en) * | 2008-03-31 | 2009-10-08 | Agency For Science, Technology And Research | Fluid processing and transfer using inter-connected multi-chamber device |
US9999509B2 (en) * | 2011-11-17 | 2018-06-19 | Stratasys Ltd. | System and method for fabricating a body part model using multi-material additive manufacturing |
US10357435B2 (en) * | 2012-12-18 | 2019-07-23 | Dentca, Inc. | Photo-curable resin compositions and method of using the same in three-dimensional printing for manufacturing artificial teeth and denture base |
PT2986654T (pt) * | 2013-04-18 | 2020-06-17 | Dentca Inc | Composições de resinas fotocuráveis e método para as utilizar em impressão tridimensional para o fabrico de dentes artificiais e de bases de próteses dentárias |
JP2020075941A (ja) * | 2016-12-05 | 2020-05-21 | Dic株式会社 | サージカルガイド用の立体造形物を形成するために用いられる光学的立体造形用光硬化性樹脂組成物 |
JP2020528479A (ja) | 2017-07-25 | 2020-09-24 | スリーエム イノベイティブ プロパティズ カンパニー | ウレタン成分及び反応性希釈剤を含む光重合性組成物、物品、並びに方法 |
RU2685211C2 (ru) * | 2017-10-10 | 2019-04-16 | Федеральное государственное учреждение "Федеральный научно-исследовательский центр "Кристаллография и фотоника" Российской академии наук" | Жидкая фотополимеризующаяся композиция для лазерной стереолитографии |
US11904031B2 (en) | 2017-11-22 | 2024-02-20 | 3M Innovative Properties Company | Orthodontic articles comprising polymerized composition comprising at least two free-radical initiators |
CN111372959B (zh) | 2017-11-22 | 2022-09-02 | 3M创新有限公司 | 包含氨基甲酸酯组分和单官能反应性稀释剂的光致聚合型组合物、制品和方法 |
CN112313577B (zh) | 2018-04-20 | 2024-07-09 | 斯特拉塔西斯公司 | 用于增材制造的辐射可固化组合物 |
CN112367959A (zh) | 2018-06-29 | 2021-02-12 | 3M创新有限公司 | 包含在水性环境中具有改善的强度的固化的可自由基聚合组合物的正畸制品 |
US12209150B2 (en) * | 2021-02-08 | 2025-01-28 | James R. Glidewell Dental Ceramics, Inc. | Photocurable resin composition with low shrinkage and high accuracy for use in additive manufacturing processes |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4575330A (en) * | 1984-08-08 | 1986-03-11 | Uvp, Inc. | Apparatus for production of three-dimensional objects by stereolithography |
US4789620A (en) * | 1986-03-03 | 1988-12-06 | Mitsubishi Rayon Co. Ltd. | Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates |
WO1989008021A1 (en) * | 1988-03-02 | 1989-09-08 | Desoto, Inc. | Stereolithography using composition providing reduced distortion |
US4945032A (en) * | 1988-03-31 | 1990-07-31 | Desoto, Inc. | Stereolithography using repeated exposures to increase strength and reduce distortion |
EP0378144B1 (de) * | 1989-01-10 | 1995-03-08 | Ciba-Geigy Ag | Photohärtbare Zusammensetzungen |
DE59010008D1 (de) * | 1989-10-27 | 1996-02-08 | Ciba Geigy Ag | Photoempfindliches Gemisch |
EP0425440B1 (de) * | 1989-10-27 | 1994-11-17 | Ciba-Geigy Ag | Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen |
DE59209143D1 (de) * | 1991-03-27 | 1998-02-26 | Ciba Geigy Ag | Photoempfindliches Gemisch auf Basis von Acrylaten |
EP0525578A1 (de) * | 1991-08-02 | 1993-02-03 | E.I. Du Pont De Nemours And Company | Photopolymerzusammensetzung zur Herstellung von dreidimensionalen Objekten |
EP0536086A1 (de) * | 1991-10-03 | 1993-04-07 | Ciba-Geigy Ag | Photoempfindliche Gemische |
TW311923B (de) * | 1992-01-27 | 1997-08-01 | Ciba Sc Holding Ag | |
CA2092131A1 (en) * | 1992-03-27 | 1993-09-28 | Victor Kadziela (Nmi) | Low viscosity self-toughening acrylate composition |
FR2689876B1 (fr) * | 1992-04-08 | 1994-09-02 | Hoechst France | Dispersions silico-acryliques, leur procédé d'obtention, leur application en stéréophotolithographie et procédé de préparation d'objets en résine. |
-
1995
- 1995-03-11 GB GBGB9504995.3A patent/GB9504995D0/en active Pending
-
1996
- 1996-03-06 AT AT96904961T patent/ATE186127T1/de not_active IP Right Cessation
- 1996-03-06 EP EP96904961A patent/EP0820609B1/de not_active Expired - Lifetime
- 1996-03-06 DE DE69604909T patent/DE69604909T2/de not_active Expired - Lifetime
- 1996-03-06 US US08/913,466 patent/US6025114A/en not_active Expired - Lifetime
- 1996-03-06 JP JP52735796A patent/JP3787788B2/ja not_active Expired - Lifetime
- 1996-03-06 WO PCT/GB1996/000518 patent/WO1996028763A1/en active IP Right Grant
- 1996-03-06 AU AU48871/96A patent/AU703806B2/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
DE69604909T2 (de) | 2000-02-17 |
JPH11503770A (ja) | 1999-03-30 |
JP3787788B2 (ja) | 2006-06-21 |
AU4887196A (en) | 1996-10-02 |
EP0820609A1 (de) | 1998-01-28 |
EP0820609B1 (de) | 1999-10-27 |
WO1996028763A1 (en) | 1996-09-19 |
US6025114A (en) | 2000-02-15 |
AU703806B2 (en) | 1999-04-01 |
DE69604909D1 (de) | 1999-12-02 |
GB9504995D0 (en) | 1995-04-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |