KR20080066899A - 전기 퓨즈 회로 및 전자 부품 - Google Patents
전기 퓨즈 회로 및 전자 부품 Download PDFInfo
- Publication number
- KR20080066899A KR20080066899A KR1020080049639A KR20080049639A KR20080066899A KR 20080066899 A KR20080066899 A KR 20080066899A KR 1020080049639 A KR1020080049639 A KR 1020080049639A KR 20080049639 A KR20080049639 A KR 20080049639A KR 20080066899 A KR20080066899 A KR 20080066899A
- Authority
- KR
- South Korea
- Prior art keywords
- circuit
- signal
- capacitor
- write
- electric fuse
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
- G11C17/14—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM
- G11C17/16—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM using electrically-fusible links
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
- G11C17/14—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM
- G11C17/18—Auxiliary circuits, e.g. for writing into memory
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49175—Parallel arrangements
Landscapes
- Read Only Memory (AREA)
- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Abstract
Description
Claims (5)
- 적어도 2개의 전기 퓨즈의 제1 및 제2 커패시터와;상기 제1 및 제2 커패시터의 저항을 기초로 1 비트의 데이터를 출력하는 출력 회로를 포함하는 것을 특징으로 하는 전기 퓨즈 회로.
- 제1항에 있어서,제1 라이트 신호에 따라 상기 제1 커패시터의 단자에 전압을 인가함으로써, 상기 제1 커패시터의 절연막을 파괴하는 제1 라이트 회로와;제2 라이트 신호에 따라 상기 제2 커패시터의 단자에 전압을 인가함으로써, 상기 제2 커패시터의 절연막을 파괴하는 제2 라이트 회로를 더 포함하고,상기 제1 및 제2 라이트 회로는 상이한 타이밍으로 상기 제1 커패시터 및 상기 제2 커패시터에 상기 전압을 인가하는 것을 특징으로 하는 전기 퓨즈 회로.
- 제1항에 있어서, 상기 출력 회로는 상기 제1 및 제2 커패시터 중 어느 하나라도 도통 상태로 판정될 정도로 저항이 낮으면, 저저항인 것을 나타내는 신호를 출력하는 것을 특징으로 하는 전기 퓨즈 회로.
- 제2항에 있어서,상기 제1 커패시터 및 상기 제1 라이트 회로 사이에 직렬 접속되는 적어도 2개의 제1 및 제2 트랜지스터와;상기 제2 커패시터 및 상기 제2 라이트 회로 사이에 직렬 접속되는 적어도 2개의 제3 및 제4 트랜지스터를 더 포함하는 것을 특징으로 하는 전기 퓨즈 회로.
- 제1항에 기재된 전기 퓨즈 회로를 탑재한 반도체 메모리 칩과;상기 반도체 메모리 칩과는 상이한 반도체 칩과;상기 반도체 메모리 칩 및 상기 반도체 칩을 함께 패키징하는 패키지를 포함하는 것을 특징으로 하는 전자 부품.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2006-00223428 | 2006-08-18 | ||
JP2006223428A JP5119626B2 (ja) | 2006-08-18 | 2006-08-18 | 電気ヒューズ回路 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070050229A Division KR100884843B1 (ko) | 2006-08-18 | 2007-05-23 | 전기 퓨즈 회로 및 전자 부품 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20080066899A true KR20080066899A (ko) | 2008-07-17 |
KR101027734B1 KR101027734B1 (ko) | 2011-04-07 |
Family
ID=38904742
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070050229A Expired - Fee Related KR100884843B1 (ko) | 2006-08-18 | 2007-05-23 | 전기 퓨즈 회로 및 전자 부품 |
KR1020080049639A Expired - Fee Related KR101027734B1 (ko) | 2006-08-18 | 2008-05-28 | 전기 퓨즈 회로 및 전자 부품 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070050229A Expired - Fee Related KR100884843B1 (ko) | 2006-08-18 | 2007-05-23 | 전기 퓨즈 회로 및 전자 부품 |
Country Status (5)
Country | Link |
---|---|
US (2) | US20080042234A1 (ko) |
EP (2) | EP2105933A1 (ko) |
JP (1) | JP5119626B2 (ko) |
KR (2) | KR100884843B1 (ko) |
CN (3) | CN101807435A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101068571B1 (ko) * | 2009-07-03 | 2011-09-30 | 주식회사 하이닉스반도체 | 반도체 메모리 장치 |
Families Citing this family (15)
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JP2010146636A (ja) * | 2008-12-18 | 2010-07-01 | Toshiba Corp | 半導体集積回路装置及びメモリシステム |
US8254186B2 (en) * | 2010-04-30 | 2012-08-28 | Freescale Semiconductor, Inc. | Circuit for verifying the write enable of a one time programmable memory |
US8790804B2 (en) | 2012-01-12 | 2014-07-29 | International Business Machines Corporation | Battery with self-programming fuse |
CN102709288B (zh) * | 2012-05-18 | 2016-03-30 | 电子科技大学 | 一种总剂量辐射加固的半导体存储器 |
US9601499B2 (en) | 2013-05-16 | 2017-03-21 | Ememory Technology Inc. | One-time programmable memory cell capable of reducing leakage current and preventing slow bit response, and method for programming a memory array comprising the same |
US9281074B2 (en) * | 2013-05-16 | 2016-03-08 | Ememory Technology Inc. | One time programmable memory cell capable of reducing leakage current and preventing slow bit response |
EP2869304B1 (en) | 2013-11-05 | 2019-01-02 | The Swatch Group Research and Development Ltd. | Memory cell and memory device |
US9257196B2 (en) * | 2014-02-06 | 2016-02-09 | SK Hynix Inc. | Semiconductor devices including E-fuse arrays |
US9455222B1 (en) * | 2015-12-18 | 2016-09-27 | Texas Instruments Incorporated | IC having failsafe fuse on field dielectric |
CN108242251B (zh) * | 2016-12-23 | 2019-08-16 | 联华电子股份有限公司 | 动态随机存取存储器 |
US10102921B1 (en) * | 2017-08-17 | 2018-10-16 | Nanya Technology Corporation | Fuse blowing method and fuse blowing system |
CN107992157B (zh) * | 2017-12-14 | 2021-01-05 | 上海艾为电子技术股份有限公司 | 一种电熔丝状态读取电路 |
JP2021149996A (ja) * | 2020-03-23 | 2021-09-27 | 株式会社東芝 | 半導体記憶装置、及び半導体記憶装置の制御方法 |
CN113948141B (zh) * | 2020-07-16 | 2024-03-29 | 长鑫存储技术有限公司 | 反熔丝存储单元状态检测电路及存储器 |
US11735266B2 (en) * | 2021-08-13 | 2023-08-22 | Ememory Technology Inc. | Antifuse-type one time programming memory cell and cell array structure with same |
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EP0709890B1 (en) * | 1994-10-27 | 1999-09-08 | Co.Ri.M.Me. Consorzio Per La Ricerca Sulla Microelettronica Nel Mezzogiorno | Driving circuit for electronic semiconductor devices including at least a power transistor |
US5712577A (en) * | 1996-04-18 | 1998-01-27 | Electronics And Telecommunications Research Institute | Anti-fuse programming circuit for user programmable integrated |
JP2000155620A (ja) * | 1998-11-20 | 2000-06-06 | Mitsubishi Electric Corp | 基準電圧発生回路 |
US6240033B1 (en) * | 1999-01-11 | 2001-05-29 | Hyundai Electronics Industries Co., Ltd. | Antifuse circuitry for post-package DRAM repair |
US6346846B1 (en) * | 1999-12-17 | 2002-02-12 | International Business Machines Corporation | Methods and apparatus for blowing and sensing antifuses |
KR100376265B1 (ko) * | 1999-12-29 | 2003-03-17 | 주식회사 하이닉스반도체 | 모스 구조의 안티퓨즈를 이용한 메모리 리페어 회로 |
JP2001250394A (ja) | 2000-03-08 | 2001-09-14 | Citizen Watch Co Ltd | 半導体不揮発性記憶装置およびその書き込み方法 |
JP2001338495A (ja) | 2000-05-26 | 2001-12-07 | Mitsubishi Electric Corp | 半導体記憶装置 |
JP3629187B2 (ja) * | 2000-06-28 | 2005-03-16 | 株式会社東芝 | 電気フューズ、この電気フューズを備えた半導体装置及びその製造方法 |
JP2002133895A (ja) * | 2000-08-17 | 2002-05-10 | Toshiba Corp | アンチフューズを用いたリダンダンシ回路及び半導体メモリにおける不良アドレス検索方法 |
US6960819B2 (en) * | 2000-12-20 | 2005-11-01 | Broadcom Corporation | System and method for one-time programmed memory through direct-tunneling oxide breakdown |
JP3569225B2 (ja) | 2000-12-25 | 2004-09-22 | Necエレクトロニクス株式会社 | 半導体記憶装置 |
JP2002203901A (ja) * | 2000-12-27 | 2002-07-19 | Toshiba Microelectronics Corp | フューズ回路 |
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-
2006
- 2006-08-18 JP JP2006223428A patent/JP5119626B2/ja not_active Expired - Fee Related
-
2007
- 2007-05-23 KR KR1020070050229A patent/KR100884843B1/ko not_active Expired - Fee Related
- 2007-08-10 US US11/889,254 patent/US20080042234A1/en not_active Abandoned
- 2007-08-13 CN CN201010141743A patent/CN101807435A/zh active Pending
- 2007-08-13 CN CN2007101420147A patent/CN101127246B/zh not_active Expired - Fee Related
- 2007-08-13 CN CN201010141756.XA patent/CN101794620B/zh not_active Expired - Fee Related
- 2007-08-13 EP EP09165920A patent/EP2105933A1/en not_active Withdrawn
- 2007-08-13 EP EP07114261.6A patent/EP1895543B1/en not_active Not-in-force
-
2008
- 2008-05-28 KR KR1020080049639A patent/KR101027734B1/ko not_active Expired - Fee Related
-
2009
- 2009-10-23 US US12/604,847 patent/US20100038748A1/en not_active Abandoned
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101068571B1 (ko) * | 2009-07-03 | 2011-09-30 | 주식회사 하이닉스반도체 | 반도체 메모리 장치 |
Also Published As
Publication number | Publication date |
---|---|
EP2105933A1 (en) | 2009-09-30 |
KR101027734B1 (ko) | 2011-04-07 |
CN101794620A (zh) | 2010-08-04 |
KR100884843B1 (ko) | 2009-02-20 |
EP1895543B1 (en) | 2014-03-05 |
EP1895543A3 (en) | 2008-08-20 |
CN101127246A (zh) | 2008-02-20 |
US20100038748A1 (en) | 2010-02-18 |
JP2008047248A (ja) | 2008-02-28 |
CN101794620B (zh) | 2014-06-11 |
CN101807435A (zh) | 2010-08-18 |
JP5119626B2 (ja) | 2013-01-16 |
US20080042234A1 (en) | 2008-02-21 |
CN101127246B (zh) | 2010-11-03 |
KR20080016442A (ko) | 2008-02-21 |
EP1895543A2 (en) | 2008-03-05 |
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