KR101473812B1 - 안료 분산 조성물, 광경화성 조성물 및 컬러필터와 그 제조방법 - Google Patents
안료 분산 조성물, 광경화성 조성물 및 컬러필터와 그 제조방법 Download PDFInfo
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Abstract
[일반식(2) 중 R3은 (m+n)가의 유기 연결기를 나타내고, R4, R5는 각각 독립적으로 단일 결합 또는 2가의 유기 연결기를 나타낸다. A2는 유기 색소 구조, 복소환 구조, 산성기, 염기성 질소 원자를 갖는 기, 우레아기, 우레탄기, 배위성 산소 원자를 갖는 기, 탄소수 4개 이상의 탄화수소기, 알콕시실릴기, 에폭시기, 이소시아네이트기, 및 수산기로부터 선택되는 부위를 1종 이상 포함하는 1가의 유기기를 나타낸다. n개의 A2, R4는 각각 독립적으로는 동일하거나 달라도 좋다. m은 1∼8, n은 2∼9를 나타내고, m+n은 3∼10을 만족시킨다. P2는 고분자 골격을 나타낸다. m개의 P2, R5는 각각 독립적으로 동일하거나 달라도 좋다.]
Description
Claims (15)
- 안료와, 하기 일반식(2)로 나타내어지는 고분자 화합물을 함유하는 안료 분산 조성물.
[일반식(2) 중 R3은 (m+n)가의 유기 연결기를 나타내고, R4, R5는 각각 독립적으로 단일 결합 또는 2가의 유기 연결기를 나타낸다. A2는 유기 색소 구조, 복소환 구조, 산성기, 염기성 질소 원자를 갖는 기, 우레아기, 우레탄기, 배위성 산소 원자를 갖는 기, 탄소수 4개 이상의 탄화수소기, 알콕시실릴기, 에폭시기, 이소시아네이트기, 및 수산기로부터 선택되는 안료에 대한 흡착능을 갖는 부위를 1종 이상 포함하는 1가의 유기기를 나타낸다. n개의 A2, R4는 각각 독립적으로 동일하거나 달라도 좋다. m은 1∼8, n은 2∼9를 나타내고, m+n은 3∼10을 만족시킨다. P2는 고분자 골격을 나타낸다. m개의 P2, R5는 각각 독립적으로 동일하거나 달라도 좋다.] - 제 1 항에 있어서,
유기 용매를 더욱 함유하는 것을 특징으로 하는 안료 분산 조성물. - 제 1 항에 있어서,
상기 일반식(2)에 있어서의 n은 3~6을 나타내고, m은 1~7을 나타내고, m+n은 4~10을 만족시키는 것을 특징으로 하는 안료 분산 조성물. - 제 1 항에 있어서,
상기 일반식(2)에 있어서의 A2는 유기 색소 구조, 복소환 구조, 산성기, 염기성 질소 원자를 갖는 기, 우레아기, 우레탄기, 탄소수 4개 이상의 탄화수소기, 알콕시실릴기, 에폭시기, 이소시아네이트기, 및 수산기로부터 선택되는 안료에 대한 흡착능을 갖는 부위를 1종 이상 포함하는 1가의 유기기를 나타내는 것을 특징으로 하는 안료 분산 조성물. - 제 1 항에 있어서,
상기 일반식(2)에 있어서의 A2는 유기 색소 구조, 복소환 구조, 산성기, 염기성 질소 원자를 갖는 기, 및 우레아기로부터 선택되는 안료에 대한 흡착능을 갖는 부위를 1종 이상 포함하는 1가의 유기기를 나타내는 것을 특징으로 하는 안료 분산 조성물. - 제 1 항에 있어서,
상기 일반식(2)에 있어서의 P2로 나타내어지는 고분자 골격은 비닐 모노머의 중합체 또는 공중합체, 에스테르계 폴리머, 에테르계 폴리머, 우레탄계 폴리머, 아미드계 폴리머, 에폭시계 폴리머, 실리콘계 폴리머, 및 이들의 변성물 또는 공중합체로부터 선택되는 1종 이상으로부터 유래되는 것을 특징으로 하는 안료 분산 조성물. - 제 1 항에 있어서,
상기 일반식(2)에 있어서의 P2로 나타내어지는 고분자 골격은 비닐 모노머의 중합체 또는 공중합체로부터 유래되는 것을 특징으로 하는 안료 분산 조성물. - 제 1 항에 있어서,
상기 고분자 화합물은 중량 평균 분자량이 3000∼100000인 것을 특징으로 하는 안료 분산 조성물. - 제 1 항에 있어서,
상기 고분자 화합물은 산가가 200mgKOH/g이하인 것을 특징으로 하는 안료 분산 조성물. - 제 1 항에 있어서,
상기 고분자 화합물은 하기 일반식(3)으로 나타내어지는 화합물의 존재 하에서 라디칼 중합 반응을 행함으로써 얻어진 것을 특징으로 하는 안료 분산 조성물.
[일반식(3) 중 R6은 (m+n)가의 유기 연결기를 나타내고, R7은 단일 결합 또는 2가의 유기 연결기를 나타낸다. A3은 유기 색소 구조, 복소환 구조, 산성기, 염기성 질소 원자를 갖는 기, 우레아기, 우레탄기, 배위성 산소 원자를 갖는 기, 탄소수 4개 이상의 탄화수소기, 알콕시실릴기, 에폭시기, 이소시아네이트기, 및 수산기로부터 선택되는 안료에 대한 흡착능을 갖는 부위를 1종 이상 포함하는 1가의 유기기를 나타낸다. n개의 A3, R7은 각각 독립적으로 동일하거나 달라도 좋다. m은 1∼8, n은 2∼9를 나타내고, m+n은 3∼10을 만족시킨다.] - 제 1 항 내지 제 10 항 중 어느 한 항에 기재된 안료 분산 조성물과 알칼리 가용성 수지와 광중합성 화합물과 광중합 개시제를 함유하는 것을 특징으로 하는 광경화성 조성물.
- 제 11 항에 기재된 광경화성 조성물을 사용하여 이루어지는 것을 특징으로 하는 컬러필터.
- 제 11 항에 기재된 광경화성 조성물을 직접 또는 다른 층을 통하여 기판 상에 부여해서 감광성 막을 형성하고, 형성된 감광성 막에 패턴 노광 및 현상을 행함으로써 착색 패턴을 형성하는 것을 특징으로 하는 컬러필터의 제조방법.
- 제 1 항에 있어서,
상기 일반식(2)에 있어서의 A2는 유기 색소 구조, 염기성 질소 원자를 갖는 기, 우레아기, 우레탄기, 알콕시실릴기, 에폭시기, 이소시아네이트기, 및 수산기로부터 선택되는 안료에 대한 흡착능을 갖는 부위를 1종 이상 포함하는 1가의 유기기를 나타내는 것을 특징으로 하는 안료 분산 조성물. - 제 1 항에 있어서,
상기 일반식(2)에 있어서 m개의 P2, R5는 동일한 고분자 골격을 나타내는 것을 특징으로 하는 안료 분산 조성물.
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- 2007-03-13 KR KR1020087025198A patent/KR101395070B1/ko active Active
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- 2007-03-13 US US12/293,226 patent/US8808947B2/en active Active
- 2007-03-13 EP EP07738420A patent/EP2006310A2/en not_active Withdrawn
- 2007-03-13 KR KR1020137033876A patent/KR101473812B1/ko active Active
- 2007-03-16 TW TW096109027A patent/TW200745183A/zh unknown
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Also Published As
Publication number | Publication date |
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EP2006310A2 (en) | 2008-12-24 |
JP2007277514A (ja) | 2007-10-25 |
EP2006310A9 (en) | 2009-07-22 |
CN101405310B (zh) | 2011-04-20 |
TW200745183A (en) | 2007-12-16 |
US8808947B2 (en) | 2014-08-19 |
US20100233595A1 (en) | 2010-09-16 |
JP5171005B2 (ja) | 2013-03-27 |
KR20140007966A (ko) | 2014-01-20 |
US20140175348A1 (en) | 2014-06-26 |
CN101405310A (zh) | 2009-04-08 |
KR20090007705A (ko) | 2009-01-20 |
US8921018B2 (en) | 2014-12-30 |
WO2007108367A1 (ja) | 2007-09-27 |
KR101395070B1 (ko) | 2014-05-16 |
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