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ZA757984B - Polymers for aqueous processed photoresists - Google Patents

Polymers for aqueous processed photoresists

Info

Publication number
ZA757984B
ZA757984B ZA00757984A ZA757984A ZA757984B ZA 757984 B ZA757984 B ZA 757984B ZA 00757984 A ZA00757984 A ZA 00757984A ZA 757984 A ZA757984 A ZA 757984A ZA 757984 B ZA757984 B ZA 757984B
Authority
ZA
South Africa
Prior art keywords
polymers
photoresists
aqueous processed
aqueous
processed photoresists
Prior art date
Application number
ZA00757984A
Inventor
M Lipson
E Zador
Original Assignee
Dynachem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dynachem Corp filed Critical Dynachem Corp
Priority to ZA00757984A priority Critical patent/ZA757984B/en
Priority to SE7600431A priority patent/SE7600431L/en
Priority to DE2602410A priority patent/DE2602410C2/en
Priority to FR7602048A priority patent/FR2339185B1/en
Priority to NL7600794.A priority patent/NL160004C/en
Priority to GB3624/76A priority patent/GB1521372A/en
Priority to BE163988A priority patent/BE838135A/en
Priority to JP994776A priority patent/JPS5294388A/en
Priority to DD191055A priority patent/DD125491A5/xx
Priority to BR7601434A priority patent/BR7601434A/en
Publication of ZA757984B publication Critical patent/ZA757984B/en
Priority to JP59257283A priority patent/JPS61134756A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
ZA00757984A 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists ZA757984B (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists
SE7600431A SE7600431L (en) 1974-10-04 1976-01-16 PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS
DE2602410A DE2602410C2 (en) 1974-10-04 1976-01-23 Photopolymerizable material
FR7602048A FR2339185B1 (en) 1974-10-04 1976-01-26 PHOTORESISTANT COMPOSITION
NL7600794.A NL160004C (en) 1974-10-04 1976-01-27 DRY FILM PHOTORESIST.
GB3624/76A GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists
BE163988A BE838135A (en) 1974-10-04 1976-01-30 POLYMERS FOR PHOTOGRAPHIC MASKS DEVELOPED IN AQUEOUS MEDIUM
JP994776A JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
DD191055A DD125491A5 (en) 1974-10-04 1976-02-02
BR7601434A BR7601434A (en) 1974-10-04 1976-03-10 PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT
JP59257283A JPS61134756A (en) 1974-10-04 1984-12-05 Making of photoresist

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
US51192974A 1974-10-04 1974-10-04
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists
SE7600431A SE7600431L (en) 1974-10-04 1976-01-16 PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS
DE2602410A DE2602410C2 (en) 1974-10-04 1976-01-23 Photopolymerizable material
FR7602048A FR2339185B1 (en) 1974-10-04 1976-01-26 PHOTORESISTANT COMPOSITION
NL7600794.A NL160004C (en) 1974-10-04 1976-01-27 DRY FILM PHOTORESIST.
GB3624/76A GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists
BE163988A BE838135A (en) 1974-10-04 1976-01-30 POLYMERS FOR PHOTOGRAPHIC MASKS DEVELOPED IN AQUEOUS MEDIUM
JP994776A JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
DD191055A DD125491A5 (en) 1974-10-04 1976-02-02
BR7601434A BR7601434A (en) 1974-10-04 1976-03-10 PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT
JP59257283A JPS61134756A (en) 1974-10-04 1984-12-05 Making of photoresist

Publications (1)

Publication Number Publication Date
ZA757984B true ZA757984B (en) 1976-12-29

Family

ID=27582848

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists

Country Status (10)

Country Link
JP (2) JPS5294388A (en)
BE (1) BE838135A (en)
BR (1) BR7601434A (en)
DD (1) DD125491A5 (en)
DE (1) DE2602410C2 (en)
FR (1) FR2339185B1 (en)
GB (1) GB1521372A (en)
NL (1) NL160004C (en)
SE (1) SE7600431L (en)
ZA (1) ZA757984B (en)

Families Citing this family (142)

* Cited by examiner, † Cited by third party
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DE3120052A1 (en) * 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt POLYMERIZABLE MIXTURE BY RADIATION AND COPYING MATERIAL MADE THEREOF
DE3223104A1 (en) * 1982-06-21 1983-12-22 Hoechst Ag, 6230 Frankfurt PHOTOPOLYMERIZABLE MIXTURE AND PHOTOPOLYMERIZABLE COPY MATERIAL MADE THEREOF
DE3367683D1 (en) * 1982-06-21 1987-01-02 Hoechst Ag Photopolymerizable mixture and photopolymerizable copying material produced therewith
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
DD250593A1 (en) * 1984-04-03 1987-10-14 Wolfen Filmfab Veb PHOTOPOLYMERIZABLE MATERIAL
JPH0642073B2 (en) * 1984-04-10 1994-06-01 三菱レイヨン株式会社 Photopolymerizable resin composition
JPS638735A (en) * 1986-06-30 1988-01-14 Tokyo Ohka Kogyo Co Ltd Photosensitive resin plate for pattern formation
JPH0820735B2 (en) * 1987-08-26 1996-03-04 日立化成工業株式会社 Photosensitive resin composition
JPS6456442A (en) * 1987-08-27 1989-03-03 Okamoto Kagaku Kogyo Kk Production of printing plate
DE3805706A1 (en) * 1988-02-24 1989-09-07 Hoechst Ag RADIATION POLYMERIZABLE MIXTURE AND RECORDING MATERIAL MANUFACTURED THEREFROM
JP2697738B2 (en) * 1988-02-26 1998-01-14 マックダーミッド イメージング テクノロジー，インコーポレイテッド Photopolymerizable composition
JP2856746B2 (en) * 1988-12-15 1999-02-10 ダイセル化学工業株式会社 Photopolymerizable composition
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NL160004C (en) 1979-09-17
NL160004B (en) 1979-04-17
JPH0359416B2 (en) 1991-09-10
FR2339185A1 (en) 1977-08-19
JPS5425957B2 (en) 1979-08-31
SE7600431L (en) 1977-07-17
BE838135A (en) 1976-05-14
DE2602410C2 (en) 1985-11-21
JPS61134756A (en) 1986-06-21
FR2339185B1 (en) 1980-03-14
GB1521372A (en) 1978-08-16
JPS5294388A (en) 1977-08-08
DE2602410A1 (en) 1977-07-28
DD125491A5 (en) 1977-04-20
BR7601434A (en) 1977-09-06
NL7600794A (en) 1977-07-29

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