KR100392739B1 - 방사선 경화성 시아노아크릴레이트 함유 조성물 - Google Patents
방사선 경화성 시아노아크릴레이트 함유 조성물 Download PDFInfo
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- KR100392739B1 KR100392739B1 KR10-1999-7007875A KR19997007875A KR100392739B1 KR 100392739 B1 KR100392739 B1 KR 100392739B1 KR 19997007875 A KR19997007875 A KR 19997007875A KR 100392739 B1 KR100392739 B1 KR 100392739B1
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- South Korea
- Prior art keywords
- photocurable composition
- composition
- cyanoacrylate
- component
- photocurable
- Prior art date
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- 229920001651 Cyanoacrylate Polymers 0.000 title claims abstract description 52
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- 239000000203 mixture Substances 0.000 title claims description 260
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- FGBJXOREULPLGL-UHFFFAOYSA-N ethyl cyanoacrylate Chemical compound CCOC(=O)C(=C)C#N FGBJXOREULPLGL-UHFFFAOYSA-N 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 20
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- -1 cyano, methoxy, acetyl Chemical group 0.000 claims description 18
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- 229910052804 chromium Inorganic materials 0.000 claims description 7
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- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 claims description 3
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- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 claims description 2
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- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 claims description 2
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- ZTYMNUBYYQNBFP-UHFFFAOYSA-N propyl 2-cyanoprop-2-enoate Chemical compound CCCOC(=O)C(=C)C#N ZTYMNUBYYQNBFP-UHFFFAOYSA-N 0.000 claims description 2
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- IJVRPNIWWODHHA-UHFFFAOYSA-N 2-cyanoprop-2-enoic acid Chemical compound OC(=O)C(=C)C#N IJVRPNIWWODHHA-UHFFFAOYSA-N 0.000 claims 1
- VWHSLUXEUKWKGT-UHFFFAOYSA-N COc1cccc(OC)c1C(=O)C(C(C)CC(C)(C)C)P(=O)C(C(C)CC(C)(C)C)C(=O)c1c(OC)cccc1OC Chemical compound COc1cccc(OC)c1C(=O)C(C(C)CC(C)(C)C)P(=O)C(C(C)CC(C)(C)C)C(=O)c1c(OC)cccc1OC VWHSLUXEUKWKGT-UHFFFAOYSA-N 0.000 claims 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/30—Nitriles
- C08F22/32—Alpha-cyano-acrylic acid; Esters thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- Chemical & Material Sciences (AREA)
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- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerization Catalysts (AREA)
Abstract
Description
시료No. | 방사선 노출(초) | 전단강도(24시간후, psi) |
1 | 5 | 4057 |
2 | 10 | 3835 |
3 | 15 | 4846 |
4 | 5 | 4984 |
5 | 10 | 4293 |
6 | 15 | 3062 |
시료No. | 광개시제 | 방사선경화유형 | 방사선노출(초) | |
유형 | 양 | |||
7 | "DAROCUR" 1173 | 4% | UV | 10 |
8 | "IRGACURE" 651 | 2% | UV | 5 |
9 | "IRGACURE" 1700 | 2% | UV/VIS | 2 |
10 | "PRISM" 접착제 4061(대조표준) | -- | -- | -- |
시료No. | 전단강도(psi) | |||
1-3분후 | 24시간후 | |||
기재 유형 | 기재 유형 | |||
UV 투과성 | UV 흡수성 | UV 투과성 | UV 흡수성 | |
7 | 3152 | 926 | 3591 | 2800 |
8 | 3352 | 1208 | 3021 | 3000 |
9 | 3292 | 2672 | 3,292 | 3198 |
10 | 42 | 147 | 1724 | 2624 |
시료No. | 성분 | 양(중량%) |
11 | 에틸-2-시아노아크릴레이트페로센"IRGACURE" 819 | 99.4950.0050.5 |
12 | 에틸-2-시아노아크릴레이트Cp2HfCl2"IRGACURE" 1700 | 98.990.01141 |
13 | 에틸-2-시아노아크릴레이트Cy2RuCl2"IRGACURE" 1700 | 99.480.02280.5 |
14 | 에틸-2-시아노아크릴레이트디페로센일에탄"IRGACURE" 1700 | 98.990.01081 |
15 | 에틸-2-시아노아크릴레이트Cp2MoCl2"IRGACURE" 1700 | 98.980.01661 |
16 | 에틸-2-시아노아크릴레이트Cp2TiCl2"IRGACURE" 1700 | 98.980.0161 |
17 | 에틸-2-시아노아크릴레이트Cp2ZrCl2"IRGACURE" 1700 | 98.970.02881 |
18 | 에틸-2-시아노아크릴레이트PtACAC"IRGACURE" 1700 | 99.480.020.5 |
19 | 에틸-2-시아노아크릴레이트페로센메틸피루베이트 | 98.990.011 |
시료 No. | 유발 시간(초) | 최대 피크 시간(초) | 엔탈피(J/G) |
11 | 1.1 | 4 | 164 |
12 | 14.5 | 629 | 406 |
13 | 6.1 | 11.2 | 278 |
14 | 1.7 | 4.8 | 204 |
15 | 4.3 | 8.2 | 277 |
16 | 16.6 | 531 | 224 |
17 | 18.6 | 221 | 309 |
18 | 12.2 | 88 | 419 |
19 | 24 | 172 | 355 |
시료No. | 성분 | 양(중량%) |
20 | 에틸-2-시아노아크릴레이트페로센PMMA"IRGACURE" 1700 | 88.9950.00510.50.5 |
21 | 에틸-2-시아노아크릴레이트페로센PMMA"IRGACURE" 1700 | 92.4950.00570.5 |
22 | 에틸-2-시아노아크릴레이트페로센PMMA"IRGACURE" 819 | 92.4950.00570.5 |
23 | 에틸-2-시아노아크릴레이트페로센"DAROCUR" 1173 | 98.9950.0051 |
24 | 에틸-2-시아노아크릴레이트페로센"IRGACURE" 1700 | 99.4950.0050.5 |
시료 No. | 유발 시간(초) | 최대 피크 시간(초) | 엔탈피(J/G) |
20 | 1.9 | 4.6 | 252 |
21 | 17 | 5 | 208 |
22 | 1.1 | 4 | 203 |
23 | 5 | 17 | 282 |
24 | 1.3 | 4.2 | 194 |
시료 No. | 차단 전단강도 | |
실온 경화@ 2분 | 실온 경화@ 24시간 | |
20 | 1407 | 1637 |
21 | 1416 | 1951 |
22 | 1851 | 1815 |
23 | -- | -- |
24 | -- | -- |
Claims (47)
- 삭제
- (a) 조성물의 총량이 100 중량%가 되게 하는 양으로 존재하는 2-시아노아크릴레이트 성분,(b) 조성물 총량의 약 0.005 중량% 내지 약 4 중량%의 양으로 존재하는 메탈로센 성분, 및(c) 조성물 총량의 약 0.125 중량% 내지 약 10 중량%의 양으로 존재하는 광개시제 성분을 포함하는 광경화성 조성물.
- 제 2 항에 있어서, 시아노아크릴레이트 성분이 H2C=C(CN)-COOR(여기서 R은 C1-15알킬, 알콕시알킬, 시클로알킬, 알켄일, 아랄킬, 아릴, 알릴 및 할로알킬기로 이루어지는 군으로부터 선택된다)로 표시되는 시아노아크릴레이트 단량체를 포함하는 것을 특징으로 하는 광경화성 조성물.
- 제 3 항에 있어서, 시아노아크릴레이트 단량체가 메틸시아노아크릴레이트, 에틸-2-시아노아크릴레이트, 프로필시아노아크릴레이트, 부틸시아노아크릴레이트, 옥틸시아노아크릴레이트, 알릴-2-시아노아크릴레이트, β-메톡시에틸-2-시아노아크릴레이트 및 그것의 조합으로 이루어지는 군으로부터 선택되는 것을 특징으로 하는 광경화성 조성물.
- 제 3 항에 있어서, 시아노아크릴레이트 단량체가 에틸-2-시아노아크릴레이트인 것을 특징으로 하는 광경화성 조성물.
- 제 2 항에 있어서, 메탈로센 성분이 다음 구조 내의 물질을 포함하는 것을 특징으로 하는 광경화성 조성물.상기 식에서, R1및 R2는 각 고리에 적어도 한번 존재하고, 동일 또는 상이하고, H; 탄소원자수 1 내지 약 8의 모든 직쇄 또는 분지쇄 알킬 성분; 아세틸; 비닐; 알릴; 히드록실; 카르복실; -(CH2)n-OH(여기서 n은 1 내지 약 8 범위의 정수이다); -(CH2)n-COOR3(여기서 n은 1 내지 약 8 범위의 정수이고 R3은 H; Li; Na; 탄소원자수 1 내지 약 8의 모든 직쇄 또는 분지쇄 알킬 성분; -(CH2)n'(여기서 n'는 2 내지 약 8 범위의 정수이다)이다); -(CH2)n-OR4(여기서 n은 1 내지 약 8 범위의 정수이고 R4는 탄소원자수 1 내지 약 8의 모든 직쇄 또는 분지쇄 알킬 성분이다); 및 -(CH2)n-N+(CH3)3X-(여기서 n은 1 내지 약 8 범위의 정수이고 X는 Cl-, Br-, I-, ClO4 -및 BF4 -로부터 선택된다)로부터 선택되고;Y1및 Y2는 존재하거나 또는 존재하지 않을 수 있으나, 적어도 한번 존재할 때는 동일 또는 상이하고 H, Cl-, Br-, I-, 시아노, 메톡시, 아세틸, 히드록시, 니트로, 트리알킬아민, 트리아릴아민, 트리알킬포스핀, 트리페닐아민 및 토실로부터 선택되고;A 및 A'는 동일 또는 상이하고 C 또는 N이고;m 및 m'는 동일 또는 상이하고 1 또는 2이고;Me는 Fe, Ti, Ru, Co, Ni, Cr, Cu, Mn, Pd, Ag, Rh, Pt, Zr, Hf, Nb, V 및 Mo로부터 선택된다.
- 제 2 항에 있어서, 메탈로센 성분이 다음 구조 내의 물질을 포함하는 것을 특징으로 하는 광경화성 조성물.상기 식에서, R1및 R2는 동일 또는 상이하고, 각각 H; 탄소원자수 1 내지 약 8의 모든 직쇄 또는 분지쇄 알킬 성분; 아세틸; 비닐; 알릴; 히드록실; 카르복실; -(CH2)n-OH(여기서 n은 1 내지 약 8 범위의 정수이다); -(CH2)n-COOR3(여기서 n은 1 내지 약 8 범위의 정수이고 R3은 탄소원자수 1 내지 약 8의 모든 직쇄 또는 분지쇄 알킬 성분, H, Li, Na 또는 -(CH2)n'(여기서 n'는 2 내지 약 8 범위의 정수이다)이다); -(CH2)n-OR4(여기서 n은 1 내지 약 8 범위의 정수이고 R4는 탄소원자수 1 내지 약 8의 모든 직쇄 또는 분지쇄 알킬 성분이다); 및 -(CH2)n-N+(CH3)3X-(여기서 n은 1 내지 약 8 범위의 정수이고 X는 Cl-, Br-, I-, ClO4 -및 BF4 -로부터 선택된다)로부터 선택되는 1종이고;Me는 Fe, Ti, Ru, Co, Ni, Cr, Zr, Hf, Nb, V 및 Mo로부터 선택된다.
- 제 6 항에 있어서, Me가 Ti, Cr, Cu, Mn, Ag, Zr, Hf 및 Mo로 이루어지는 군으로부터 선택되는 것을 특징으로 하는 광경화성 조성물.
- 제 2 항에 있어서, 메탈로센 성분이 다음 구조 내의 물질을 포함하는 것을 특징으로 하는 광경화성 조성물.상기 식에서, R1및 R2는 각 고리에 적어도 한번 존재하고, 동일 또는 상이하고, H; 탄소원자수 1 내지 약 8의 모든 직쇄 또는 분지쇄 알킬 성분; 아세틸; 비닐; 알릴; 히드록실; 카르복실; -(CH2)n-OH(여기서 n은 1 내지 약 8 범위의 정수이다); -(CH2)n-COOR3(여기서 n은 1 내지 약 8 범위의 정수이고 R3은 H; Li; Na; 탄소원자수 1 내지 약 8의 모든 직쇄 또는 분지쇄 알킬 성분; -(CH2)n'(여기서 n'는 2 내지 약 8 범위의 정수이다)이다); -(CH2)n-OR4(여기서 n은 1 내지 약 8 범위의 정수이고 R4는 탄소원자수 1 내지 약 8의 모든 직쇄 또는 분지쇄 알킬 성분이다); 및 -(CH2)n-N+(CH3)3X-(여기서 n은 1 내지 약 8 범위의 정수이고 X는 Cl-, Br-, I-, ClO4 -및 BF4 -로부터 선택된다)로부터 선택되고;Y1및 Y2는 존재하거나 또는 존재하지 않을 수 있으나, 적어도 한번 존재할 때는 동일 또는 상이하고 H, Cl-, Br-, I-, 시아노, 메톡시, 아세틸, 히드록시, 니트로, 트리알킬아민, 트리아릴아민, 트리알킬포스핀, 트리페닐아민 및 토실로부터 선택되고;A 및 A'는 동일 또는 상이하고 C 또는 N이고;m 및 m'는 동일 또는 상이하고 1 또는 2이고;Me는 Fe, Ti, Ru, Co, Ni, Cr, Cu, Mn, Pd, Ag, Rh, Pt, Zr, Hf, Nb, V 및 Mo로부터 선택된다.
- 제 9 항에 있어서, R1및 R2가 각각 H이고; Y1및 Y2가 각각 Cl이고; A 및 A'가 각각 N이고; m 및 m'가 각각 2이고; Me가 Ru인 것을 특징으로 하는 광경화성 조성물.
- 제 2 항에 있어서, 메탈로센이 디아릴포스피노금속 착화 페로센, 비스알킬 페로센, 및 Me[CW3-CO-CH=C(O-)-CW'3]2(여기서 Me는 Fe, Ti, Ru, Co, Ni, Cr, Cu, Mn, Pd, Ag, Rh, Pt, Zr, Hf, Nb, V 및 Mo로부터 선택되고, W 및 W'는 동일 또는 상이하고 H 및 할로겐으로부터 선택된다)로 이루어지는 군으로부터 선택되는 것을 특징으로 하는 광경화성 조성물.
- 제 2 항에 있어서, 메탈로센 성분이 페로센, 티타노센, 그리고 그것의 유도체 및 조합으로 이루어지는 군으로부터 선택되는 1종인 것을 특징으로 하는 광경화성 조성물.
- 제 2 항에 있어서, 메탈로센이 페로센인 것을 특징으로 하는 광경화성 조성물.
- 제 2 항에 있어서, 광개시제 성분이 1-히드록시시클로헥실페닐케톤, 2-메틸-1-[4-(메틸티오)페닐]-2-모르폴리노프로판-1-온, 벤조페논, 2-벤질-2-N,N-디메틸아미노-1-(4-모르폴리노페닐)-1-부탄온, 2,2-디메톡시-2-페닐아세토페논, 비스(2,6-디메톡시벤조일-2,4,4-트리메틸펜틸)포스핀옥사이드, 2-히드록시-2-메틸-1-페닐-프로판-1-온, 2-히드록시-2-메틸-1-페닐-1-프로판, 2,4,6-트리메틸벤조일디페닐-포스핀옥사이드, 비스(2,4,6-트리메틸벤조일)페닐포스핀옥사이드, 2-히드록시-2-메틸-1-페닐-프로판-1-온, 가시광선 [블루] 광개시제, dl-캄포르퀴논, 알킬피루베이트, 아릴피루베이트 및 그것의 조합으로 이루어지는 군으로부터 선택되는 것을 특징으로 하는 광경화성 조성물.
- 제 2 항 내지 제 14 항 중 어느 한 항에 있어서, 상기 조성물이 자외선, 가시광선, 전자빔, x선, 적외방사선 및 그것의 조합으로 이루어지는 군으로부터 선택되는 전자기 방사선원에 노출되었을 때 경화될 수 있는 것인 광경화성 조성물.
- 제 2 항 내지 제 14 항 중 어느 한 항에 있어서, 점도조절제, 고무강화제, 요변성부여제, 열안정제 및 그것의 조합으로 이루어지는 군으로부터 선택된 1종을 더 포함하는 것을 특징으로 하는 광경화성 조성물.
- 제 2 항 내지 제 14 항 중 어느 한 항에 있어서, 접착제, 밀봉제 또는 코팅제로서 유용한 것을 특징으로 하는 광경화성 조성물.
- 광경화성 조성물의 중합방법으로서,(a) 제 2 항 내지 제 17 항 중 어느 한 항에 따른 조성물의 일정량을 제공하는 단계; 및(b) 조성물을 경화시키는데 유효한 전자기 방사선원에 조성물을 노출시키는 단계를 포함하는 것을 특징으로 하는 방법.
- 제 2 항 내지 제 14 항 중 어느 한 항에 있어서, 1부분 제제인것을 특징으로 하는 광경화성 조성물.
- 제 2 항에 있어서, 시아노아크릴레이트 성분이 전체 조성물의 약 97.9중량% 내지 약 99.4중량% 범위내의 양으로 존재하는 에틸-2-시아노아크릴레이트를 포함하고, 메탈로센 성분이 전체 조성물의 약 0.1중량%의 양으로 존재하는 페로센이고, 광개시제 성분이 전체 조성물의 약 0.5중량% 내지 약 2중량%의 양으로 존재하는 비스(2,6-디메톡시벤조일-2,4,4-트리메틸)펜틸포스핀옥사이드와 2-히드록시-2-메틸-1-페닐-프로판-1-온의 조합을 포함하는 것을 특징으로 하는 광경화성 조성물.
- 제 2 항에 있어서, 시아노아크릴레이트 성분이 전체 조성물의 약 98.715중량% 내지 약 98.75중량% 범위내의 양으로 존재하는 에틸-2-시아노아크릴레이트 및 전체 조성물의 약 0.04중량% 내지 약 0.075중량% 범위내의 양의 BF3를 포함하고, 메탈로센 성분이 전체 조성물의 약 0.02중량%의 양으로 존재하는 페로센이고, 광개시제 성분이 전체 조성물의 약 1.2중량%의 양으로 존재하는 비스(2,6-디메톡시벤조일-2,4,4-트리메틸)펜틸포스핀옥사이드와 2-히드록시-2-메틸-1-페닐-프로판-1-온의 조합을 포함하는 것을 특징으로 하는 광경화성 조성물.
- 제 2 항 내지 제 17 항 및 제 19 항 내지 제 21 항 중 어느 한 항에 따른 조성물로부터 형성되는 반응생성물로서, 상기 조성물을 경화시키는데 유효한 전자기 방사선원에 상기 조성물을 노출시킨 후 형성되는 것을 특징으로 하는 반응생성물.
- 제 2 항 내지 제 17 항 및 제 19 항 내지 제 21 항 중 어느 한 항에 따른 조성물로 조립된 물품으로서, 니들, 시린지, 란셋, 피하주사기, 주사기, 체액채취세트, 캐뉼라/허브 조립체, 캐뉼라/튜브 조립체, 튜브세트, 정맥내 세트, 체액전달 및 회수 세트, 흡인튜브, 마취마스크, 안면마스크, 수술용마스크, 혈관형성용 카테테르, 발룬 카테테르, 디스크 드라이브, 자기 센서, 배터리 유지용 카트리지, 확성기, 위상 홀로그램, 렌즈 및 보석으로 이루어지는 군으로부터 선택되는 것을 특징으로 하는 물품.
- 제 2 항 내지 제 17 항 및 제 19 항 내지 제 21 항 중 어느 한 항에 따른 조성물의 사용방법으로서, 니들, 시린지, 란셋, 피하주사기, 주사기, 체액채취세트, 캐뉼라/허브 조립체, 캐뉼라/튜브 조립체, 튜브세트, 정맥내 세트, 체액전달 및 회수 세트, 흡인튜브, 마취마스크, 안면마스크, 수술용마스크, 혈관형성용 카테테르, 발룬 카테테르, 디스크 드라이브, 자기 센서, 배터리 유지용 카트리지, 확성기, 위상 홀로그램, 렌즈 및 보석으로 이루어지는 군으로부터 선택된 물품을 제조하는데 사용하는 것을 특징으로 하는 방법.
- 제 2 항 내지 제 17 항 및 제 19 항 내지 제 21 항 중 어느 한 항에 따른 조성물의 사용방법으로서, 니들, 시린지, 란셋, 피하주사기, 주사기, 체액채취세트, 캐뉼라/허브 조립체, 캐뉼라/튜브 조립체, 튜브세트, 정맥내 세트, 체액전달 및 회수 세트, 흡인튜브, 마취마스크, 안면마스크, 수술용마스크, 혈관형성용 카테테르, 발룬 카테테르, 디스크 드라이브, 자기 센서, 배터리 유지용 카트리지, 확성기, 위상 홀로그램, 렌즈 및 보석으로 이루어지는 군으로부터 선택된 물품을 수리하는데 사용하는 것을 특징으로 하는 방법.
- 통상적으로 기재에 프라이머를 도포하고 이어서 접착제 조성물을 도포하여조립되는 물품의 조립체에 제 19 항에 따른 1부분 조성물을 사용하는 방법.
- 제 16 항에 있어서, 약 1 내지 약 15cps 범위내의 점도를 갖는 것을 특징으로 하는 광경화성 조성물.
- 제 16 항에 있어서, 약 100 내지 약 300cps 범위내의 점도를 갖는 것을 특징으로 하는 광경화성 조성물.
- 제 16 항에 있어서, 약 600 내지 약 1000cps 범위내의 점도를 갖는 것을 특징으로 하는 광경화성 조성물.
- 삭제
- 삭제
- 삭제
- 제 17 항에 있어서, 약 1 내지 약 15cps 범위내의 점도를 갖는 것을 특징으로 하는 광경화성 조성물.
- 제 17 항에 있어서, 약 100 내지 약 300cps 범위내의 점도를 갖는 것을 특징으로 하는 광경화성 조성물.
- 제 17 항에 있어서, 약 600 내지 약 1000cps 범위내의 점도를 갖는 것을 특징으로 하는 광경화성 조성물.
- 제 19 항에 있어서, 약 1 내지 약 15cps 범위내의 점도를 갖는 것을 특징으로 하는 광경화성 조성물.
- 제 19 항에 있어서, 약 100 내지 약 300cps 범위내의 점도를 갖는 것을 특징으로 하는 광경화성 조성물.
- 제 19 항에 있어서, 약 600 내지 약 1000cps 범위내의 점도를 갖는 것을 특징으로 하는 광경화성 조성물.
- 제 27 항에 있어서, 윅킹 도포를 사용하는 물품의 제조에 사용되는 것을 특징으로 하는 광경화성 조성물.
- 제 33 항에 있어서, 윅킹 도포를 사용하는 물품의 제조에 사용되는 것을 특징으로 하는 광경화성 조성물.
- 제 36 항에 있어서, 윅킹 도포를 사용하는 물품의 제조에 사용되는 것을 특징으로 하는 광경화성 조성물.
- 제 28 항에 있어서, 성형된 중합체 부품들이 서로 결합되는 물품의 제조에 사용되는 것을 특징으로 하는 광경화성 조성물.
- 제 34 항에 있어서, 성형된 중합체 부품들이 서로 결합되는 물품의 제조에 사용되는 것을 특징으로 하는 광경화성 조성물.
- 제 37 항에 있어서, 성형된 중합체 부품들이 서로 결합되는 물품의 제조에 사용되는 것을 특징으로 하는 광경화성 조성물.
- 제 29 항에 있어서, 다공성 기재 및/또는 약 0.5밀 이상의 겝이 있는 기재를 갖는 물품의 제조에 사용되는 것을 특징으로 하는 광경화성 조성물.
- 제 35 항에 있어서, 다공성 기재 및/또는 약 0.5밀 이상의 겝이 있는 기재를 갖는 물품의 제조에 사용되는 것을 특징으로 하는 광경화성 조성물.
- 제 38 항에 있어서, 다공성 기재 및/또는 약 0.5밀 이상의 겝이 있는 기재를 갖는 물품의 제조에 사용되는 것을 특징으로 하는 광경화성 조성물.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US8/805,193 | 1997-02-27 | ||
US08/805,193 | 1997-02-27 | ||
US08/805,193 US5922783A (en) | 1997-02-27 | 1997-02-27 | Radiation-curable, cyanoacrylate-containing compositions |
Publications (2)
Publication Number | Publication Date |
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KR20000075802A KR20000075802A (ko) | 2000-12-26 |
KR100392739B1 true KR100392739B1 (ko) | 2003-07-28 |
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KR10-1999-7007875A KR100392739B1 (ko) | 1997-02-27 | 1998-02-26 | 방사선 경화성 시아노아크릴레이트 함유 조성물 |
Country Status (26)
Country | Link |
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US (4) | US5922783A (ko) |
EP (1) | EP0963420B1 (ko) |
KR (1) | KR100392739B1 (ko) |
CN (1) | CN1302081C (ko) |
AR (1) | AR011175A1 (ko) |
AT (2) | ATE360670T1 (ko) |
AU (1) | AU726757B2 (ko) |
BR (1) | BR9807804A (ko) |
CA (1) | CA2320114C (ko) |
CH (1) | CH689787A5 (ko) |
CO (1) | CO5040144A1 (ko) |
CR (1) | CR5749A (ko) |
DE (2) | DE19880965T1 (ko) |
DK (1) | DK199801384A (ko) |
ES (2) | ES2286849T3 (ko) |
FI (1) | FI982310L (ko) |
GB (1) | GB2331101B (ko) |
ID (1) | ID22231A (ko) |
NO (1) | NO994145L (ko) |
NZ (1) | NZ337905A (ko) |
PT (1) | PT963420E (ko) |
RU (1) | RU2207358C2 (ko) |
SE (1) | SE511995C2 (ko) |
TW (1) | TW458990B (ko) |
WO (1) | WO1998038260A1 (ko) |
ZA (1) | ZA981622B (ko) |
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1998
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- 1998-02-26 RU RU99120391/04A patent/RU2207358C2/ru not_active IP Right Cessation
- 1998-02-26 WO PCT/US1998/003819 patent/WO1998038260A1/en active IP Right Grant
- 1998-02-26 GB GB9822838A patent/GB2331101B/en not_active Expired - Lifetime
- 1998-02-26 AT AT98914231T patent/ATE360670T1/de not_active IP Right Cessation
- 1998-02-26 KR KR10-1999-7007875A patent/KR100392739B1/ko not_active IP Right Cessation
- 1998-02-26 BR BR9807804-6A patent/BR9807804A/pt not_active IP Right Cessation
- 1998-02-26 CA CA2320114A patent/CA2320114C/en not_active Expired - Fee Related
- 1998-02-26 AT AT0900198A patent/AT414126B/de not_active IP Right Cessation
- 1998-02-26 CH CH02139/98A patent/CH689787A5/de not_active IP Right Cessation
- 1998-02-26 ZA ZA981622A patent/ZA981622B/xx unknown
- 1998-02-26 ES ES98914231T patent/ES2286849T3/es not_active Expired - Lifetime
- 1998-02-26 ES ES009850017A patent/ES2204202B1/es not_active Expired - Fee Related
- 1998-02-26 ID IDW990938A patent/ID22231A/id unknown
- 1998-02-26 DE DE19880965T patent/DE19880965T1/de not_active Ceased
- 1998-02-26 PT PT98914231T patent/PT963420E/pt unknown
- 1998-02-26 EP EP98914231A patent/EP0963420B1/en not_active Expired - Lifetime
- 1998-02-26 DE DE69837655T patent/DE69837655T2/de not_active Expired - Lifetime
- 1998-02-26 NZ NZ337905A patent/NZ337905A/en unknown
- 1998-02-26 CN CNB98802912XA patent/CN1302081C/zh not_active Expired - Lifetime
- 1998-02-27 AR ARP980100908A patent/AR011175A1/es not_active Application Discontinuation
- 1998-02-27 CO CO98010946A patent/CO5040144A1/es unknown
- 1998-03-10 TW TW087102891A patent/TW458990B/zh not_active IP Right Cessation
- 1998-04-02 CR CR5749A patent/CR5749A/es unknown
- 1998-10-26 FI FI982310A patent/FI982310L/fi not_active IP Right Cessation
- 1998-10-27 SE SE9803680A patent/SE511995C2/sv not_active IP Right Cessation
- 1998-10-27 DK DK199801384A patent/DK199801384A/da not_active Application Discontinuation
-
1999
- 1999-08-26 NO NO994145A patent/NO994145L/no not_active Application Discontinuation
- 1999-10-20 US US09/486,423 patent/US6433036B1/en not_active Expired - Lifetime
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2002
- 2002-02-20 US US10/078,005 patent/US6726795B1/en not_active Expired - Lifetime
- 2002-03-12 US US10/094,816 patent/US6906112B1/en not_active Expired - Lifetime
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