CN104204945B - 感光性黑色树脂组合物及树脂黑色矩阵基板 - Google Patents

感光性黑色树脂组合物及树脂黑色矩阵基板 Download PDF

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Publication number: CN104204945B
Authority: CN; China
Prior art keywords: black; resin composition; resin; colored resin; methyl
Prior art date: 2012-03-26
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

CN201380014533.9A

Other languages

English (en)

Chinese (zh)

Other versions

CN104204945A (zh

Inventor

相原凉介

井上欣彦

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Toray Industries Inc

Original Assignee

Toray Industries Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2012-03-26

Filing date

2013-03-08

Publication date

2017-10-03

2013-03-08 Application filed by Toray Industries Inc filed Critical Toray Industries Inc

2014-12-10 Publication of CN104204945A publication Critical patent/CN104204945A/zh

2017-10-03 Application granted granted Critical

2017-10-03 Publication of CN104204945B publication Critical patent/CN104204945B/zh

Status Expired - Fee Related legal-status Critical Current

2033-03-08 Anticipated expiration legal-status Critical

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
- H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Materials For Photolithography (AREA)
Optical Filters (AREA)
Compositions Of Macromolecular Compounds (AREA)

CN201380014533.9A 2012-03-26 2013-03-08 感光性黑色树脂组合物及树脂黑色矩阵基板 Expired - Fee Related CN104204945B (zh)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP2012068902		2012-03-26
JP2012-068902		2012-03-26
PCT/JP2013/056437 WO2013146183A1 (ja)	2012-03-26	2013-03-08	感光性黒色樹脂組成物及び樹脂ブラックマトリックス基板

Publications (2)

Publication Number	Publication Date
CN104204945A CN104204945A (zh)	2014-12-10
CN104204945B true CN104204945B (zh)	2017-10-03

Family

ID=49259451

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CN201380014533.9A Expired - Fee Related CN104204945B (zh)	2012-03-26	2013-03-08	感光性黑色树脂组合物及树脂黑色矩阵基板

Country Status (6)

Country	Link
JP (1)	JP5333696B1 (ja)
KR (1)	KR101998449B1 (ja)
CN (1)	CN104204945B (ja)
SG (1)	SG11201405096WA (ja)
TW (1)	TWI575314B (ja)
WO (1)	WO2013146183A1 (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TWI544281B (zh) *	2014-11-25	2016-08-01	奇美實業股份有限公司	黑色矩陣用之感光性樹脂組成物及其應用
TWI613486B (zh) *	2014-08-01	2018-02-01	Toppan Printing Co Ltd	黑色電極基板、黑色電極基板之製造方法、及顯示裝置
TWI564657B (zh) *	2014-08-28	2017-01-01	Chi Mei Corp	Photosensitive resin composition for color filter and its application
JP6607682B2 (ja) *	2015-03-05	2019-11-20	日鉄ケミカル＆マテリアル株式会社	遮光膜用黒色樹脂組成物、当該組成物を硬化させた遮光膜を有する遮光膜付基板、並びに当該遮光膜付基板を有するカラーフィルター及びタッチパネル
WO2016194619A1 (ja) *	2015-05-29	2016-12-08	住友ベークライト株式会社	着色感光性樹脂組成物、着色パターンまたはブラックマトリクス、カラーフィルタ、液晶表示装置または固体撮像素子およびカラーフィルタの製造方法
KR102431444B1 (ko)	2015-07-14	2022-08-11	삼성디스플레이 주식회사	액정 표시 장치 및 그 제조 방법
JPWO2019059169A1 (ja) *	2017-09-22	2020-09-03	東レ株式会社	透明感光性樹脂組成物、フォトスペーサー、液晶表示装置、フォトスペーサーの製造方法、液晶表示装置の製造方法および透明感光性樹脂組成物のレンズスキャン露光への使用
JP6842560B2 (ja) *	2017-09-26	2021-03-17	富士フイルム株式会社	構造体、隔壁形成用組成物、固体撮像素子および画像表示装置
KR102229633B1 (ko) *	2017-12-26	2021-03-17	삼성에스디아이 주식회사	감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터
KR102284582B1 (ko) *	2018-04-04	2021-08-02	삼성에스디아이 주식회사	적색 감광성 수지 조성물, 이를 이용한 감광성 수지막 및 컬러필터
KR102727347B1 (ko) *	2020-03-16	2024-11-06	동우 화인켐 주식회사	흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치
TWI744014B (zh)	2020-09-29	2021-10-21	新應材股份有限公司	黑色樹脂組成物、硬化膜以及黑色濾光片

Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN1420998A (zh) *	2000-03-29	2003-05-28	学校法人神奈川大学	光固化性·热固化性树脂组合物、其感光性干薄膜及使用其的图型形成方法
CN101324755A (zh) *	2007-06-14	2008-12-17	Jsr株式会社	感放射线性树脂组合物、层间绝缘膜和微透镜及其形成方法
CN102103328A (zh) *	2009-12-16	2011-06-22	Jsr株式会社	着色组合物、滤色器和彩色液晶显示元件

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3230800B2 (ja)	1997-03-06	2001-11-19	日本化薬株式会社	黒色感放射線性樹脂組成物、黒色硬化膜及びブラックマトリックス
JP3921730B2 (ja)	1997-04-08	2007-05-30	三菱化学株式会社	カラーフィルター用光重合性組成物
JP2005258460A (ja)	1999-09-17	2005-09-22	Hitachi Chem Co Ltd	感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JP2001228610A (ja)	2000-02-15	2001-08-24	Showa Denko Kk	感光性樹脂組成物及び硬化皮膜の製造方法
JP4034588B2 (ja) *	2001-12-25	2008-01-16	旭化成ケミカルズ株式会社	感光性を有する着色性組成物およびその硬化物
JP2004347916A (ja)	2003-05-23	2004-12-09	Toyo Ink Mfg Co Ltd	カラーフィルタ形成用感光性着色組成物およびカラーフィルタ
JP2006008740A (ja) *	2004-06-22	2006-01-12	Nitto Denko Corp	紫外線硬化型樹脂組成物
JP4809006B2 (ja) *	2005-07-05	2011-11-02	太陽ホールディングス株式会社	着色感光性樹脂組成物及びその硬化物
JP4763390B2 (ja) *	2005-09-05	2011-08-31	東京応化工業株式会社	感光性樹脂組成物
JP4706560B2 (ja)	2006-05-29	2011-06-22	Ｊｓｒ株式会社	着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP5454571B2 (ja) *	2009-03-30	2014-03-26	Ｊｓｒ株式会社	着色組成物、カラーフィルタ及びカラー液晶表示素子
JP2011048064A (ja) *	2009-08-26	2011-03-10	Asahi Kasei E-Materials Corp	感光性樹脂組成物及び積層体、並びにこれを用いた電磁波シールド及び透明導電性基板
KR20110130151A (ko) *	2010-05-27	2011-12-05	동우 화인켐 주식회사	흑색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 액정 표시 장치
JP2012008262A (ja) *	2010-06-23	2012-01-12	Fujifilm Corp	着色感光性樹脂組成物、パターン形成方法、カラーフィルタの製造方法、カラーフィルタ、およびそれを備えた表示装置
KR20120002864A (ko) *	2010-07-01	2012-01-09	동우 화인켐 주식회사	흑색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 액정 표시 장치
US8946852B2 (en) *	2010-07-02	2015-02-03	Toray Industries, Inc.	Photosensitive resin composition, photosensitive resin composition film, and semiconductor device using the photosensitive resin composition or photosensitive resin composition film

2013
- 2013-03-08 SG SG11201405096WA patent/SG11201405096WA/en unknown
- 2013-03-08 JP JP2013514481A patent/JP5333696B1/ja not_active Expired - Fee Related
- 2013-03-08 WO PCT/JP2013/056437 patent/WO2013146183A1/ja active Application Filing
- 2013-03-08 KR KR1020147025452A patent/KR101998449B1/ko not_active Expired - Fee Related
- 2013-03-08 CN CN201380014533.9A patent/CN104204945B/zh not_active Expired - Fee Related
- 2013-03-25 TW TW102110423A patent/TWI575314B/zh not_active IP Right Cessation

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN1420998A (zh) *	2000-03-29	2003-05-28	学校法人神奈川大学	光固化性·热固化性树脂组合物、其感光性干薄膜及使用其的图型形成方法
CN101324755A (zh) *	2007-06-14	2008-12-17	Jsr株式会社	感放射线性树脂组合物、层间绝缘膜和微透镜及其形成方法
CN102103328A (zh) *	2009-12-16	2011-06-22	Jsr株式会社	着色组合物、滤色器和彩色液晶显示元件

Also Published As

Publication number	Publication date
KR101998449B1 (ko)	2019-07-09
TW201348864A (zh)	2013-12-01
SG11201405096WA (en)	2014-11-27
KR20140148377A (ko)	2014-12-31
JP5333696B1 (ja)	2013-11-06
JPWO2013146183A1 (ja)	2015-12-10
WO2013146183A1 (ja)	2013-10-03
TWI575314B (zh)	2017-03-21
CN104204945A (zh)	2014-12-10

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Legal Events

Date	Code	Title	Description
2014-12-10	C06	Publication
2014-12-10	PB01	Publication
2015-01-07	C10	Entry into substantive examination
2015-01-07	SE01	Entry into force of request for substantive examination
2017-10-03	GR01	Patent grant
2017-10-03	GR01	Patent grant
2024-03-19	CF01	Termination of patent right due to non-payment of annual fee	Granted publication date: 20171003
2024-03-19	CF01	Termination of patent right due to non-payment of annual fee