KR102727347B1 - 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 - Google Patents
흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 Download PDFInfo
- Publication number
- KR102727347B1 KR102727347B1 KR1020200032102A KR20200032102A KR102727347B1 KR 102727347 B1 KR102727347 B1 KR 102727347B1 KR 1020200032102 A KR1020200032102 A KR 1020200032102A KR 20200032102 A KR20200032102 A KR 20200032102A KR 102727347 B1 KR102727347 B1 KR 102727347B1
- Authority
- KR
- South Korea
- Prior art keywords
- black
- photosensitive resin
- resin composition
- group
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
- H10K50/865—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
실시예 1 | 실시예 2 | 실시예 3 | 비교예 1 | 비교예 2 | 비교예 3 | 비교예 4 | 비교예 5 | ||
착색제 분산액 | A-1 | 30.0 | 30.0 | 30.0 | 30.0 | 30.0 | 30.0 | 30.0 | 30.0 |
알칼리 가용성 수지 | B-1 | 3.30 | 3.30 | 3.30 | 3.30 | 3.30 | 3.30 | 3.90 | 3.90 |
광중합성 화합물 | C-1 | 4.90 | |||||||
C-2 | 4.90 | 5.80 | 5.80 | ||||||
C-3 | 4.90 | ||||||||
C-4 | 4.90 | ||||||||
C-5 | 4.90 | ||||||||
C-6 | 4.90 | ||||||||
광중합 개시제 | D-1 | 0.56 | 0.56 | 0.56 | 0.56 | 0.56 | 0.56 | 0.70 | 0.70 |
에폭시 화합물 | E-1 | 1.64 | 1.64 | 1.64 | 1.64 | 1.64 | 1.64 | - | 1.64 |
티올기를 가지는 화합물 | F-1 | 0.40 | 0.40 | 0.40 | 0.40 | 0.40 | 0.40 | 0.40 | - |
첨가제 | H-1 | 0.20 | 0.20 | 0.20 | 0.20 | 0.20 | 0.20 | 0.20 | 0.20 |
용제 | G-1 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 | 잔량 |
실시예 1 | 실시예 2 | 실시예 3 | 비교예 1 | 비교예 2 | 비교예 3 | 비교예 4 | 비교예 5 | |
테이퍼 각도 | 85 | 55 | 70 | 120 | 120 | 140 | 40 | 50 |
내용제성 | ◎ | ◎ | ○ | X | ○ | X | X | X |
밀착성 | ○ | ○ | ○ | △ | X | △ | X | △ |
Claims (8)
- 흑색 착색제, 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제, 에폭시 화합물 및 티올기를 가지는 화합물을 포함하고,
상기 광중합성 화합물은 히드록시기를 갖는 4관능 이하의 광중합성 화합물을 포함하며,
상기 에폭시 화합물은 하기 화학식 2 내지 3 중 하나 이상의 화합물을 포함하는 흑색 감광성 수지 조성물:
[화학식 2]
[화학식 3]
상기 식에서,
n은 0 또는 1의 정수이다. - 삭제
- 제1항에 있어서, 상기 히드록시기를 갖는 4관능 이하의 광중합성 화합물은 펜타에리스리톨트리(메타)아크릴레이트인 흑색 감광성 수지 조성물.
- 제1항에 있어서, 상기 에폭시 화합물의 함량은 흑색 감광성 수지 조성물 중 고형분 전체 100 중량%에 대하여 1 내지 20 중량%인 흑색 감광성 수지 조성물.
- 제1항에 있어서, 상기 티올기를 가지는 화합물의 함량은 흑색 감광성 수지 조성물 중 고형분 전체 100 중량%에 대하여 0.1 내지 4 중량%인 흑색 감광성 수지 조성물.
- 제1항에 있어서, 플렉서블 기판용인 흑색 감광성 수지 조성물.
- 제1항 및 제3항 내지 제6항 중 어느 한 항에 따른 흑색 감광성 수지 조성물을 이용하여 형성되는 블랙 매트릭스.
- 제7항에 따른 블랙 매트릭스를 포함하는 화상표시장치.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020200032102A KR102727347B1 (ko) | 2020-03-16 | 2020-03-16 | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 |
CN202110245555.2A CN113406862A (zh) | 2020-03-16 | 2021-03-05 | 黑色感光性树脂组合物、黑矩阵及图像显示装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020200032102A KR102727347B1 (ko) | 2020-03-16 | 2020-03-16 | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20210115795A KR20210115795A (ko) | 2021-09-27 |
KR102727347B1 true KR102727347B1 (ko) | 2024-11-06 |
Family
ID=77691398
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020200032102A Active KR102727347B1 (ko) | 2020-03-16 | 2020-03-16 | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR102727347B1 (ko) |
CN (1) | CN113406862A (ko) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019065902A1 (ja) * | 2017-09-29 | 2019-04-04 | 東レ株式会社 | 感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び有機elディスプレイ、並びに有機elディスプレイの製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5529370B2 (ja) * | 2007-10-03 | 2014-06-25 | 新日鉄住金化学株式会社 | 多官能チオール化合物を含んだブラックレジスト用感光性樹脂組成物、それを用いたカラーフィルター用ブラックマトリクス、及びカラーフィルター |
JP2010032683A (ja) * | 2008-07-28 | 2010-02-12 | Toppan Printing Co Ltd | 着色アルカリ現像型感光性樹脂組成物及びカラーフィルタ |
WO2013146183A1 (ja) * | 2012-03-26 | 2013-10-03 | 東レ株式会社 | 感光性黒色樹脂組成物及び樹脂ブラックマトリックス基板 |
KR20140086493A (ko) * | 2012-12-28 | 2014-07-08 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 이를 사용하여 제조된 블랙 매트릭스 및 상기 블랙 매트릭스를 포함하는 칼라필터 |
KR20150062889A (ko) | 2013-11-29 | 2015-06-08 | 주식회사 엘지화학 | 블랙 컬럼 스페이서용 감광성 수지 조성물 |
JP6617703B2 (ja) * | 2014-07-11 | 2019-12-11 | 三菱ケミカル株式会社 | 感光性樹脂組成物、硬化物、ブラックマトリックス及び画像表示装置 |
KR101813911B1 (ko) * | 2015-03-05 | 2018-01-02 | 동우 화인켐 주식회사 | 네가티브형 감광성 수지 조성물 |
KR20170071757A (ko) * | 2015-12-16 | 2017-06-26 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물, 블랙 매트릭스 및 터치 패널 |
TWI739989B (zh) * | 2018-01-19 | 2021-09-21 | 南韓商東友精細化工有限公司 | 感光性樹脂組成物、包括使用感光性樹脂組成物製造之黑色矩陣、柱間隔物或黑色柱間隔物的彩色濾光片、以及包括彩色濾光片的顯示裝置 |
KR102383697B1 (ko) * | 2018-03-26 | 2022-04-05 | 동우 화인켐 주식회사 | 네가티브형 감광성 수지 조성물 |
KR102349083B1 (ko) * | 2018-07-27 | 2022-01-07 | 코오롱인더스트리 주식회사 | 감광성 수지 조성물 |
-
2020
- 2020-03-16 KR KR1020200032102A patent/KR102727347B1/ko active Active
-
2021
- 2021-03-05 CN CN202110245555.2A patent/CN113406862A/zh active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019065902A1 (ja) * | 2017-09-29 | 2019-04-04 | 東レ株式会社 | 感光性樹脂組成物、硬化膜、硬化膜を具備する素子及び有機elディスプレイ、並びに有機elディスプレイの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20210115795A (ko) | 2021-09-27 |
CN113406862A (zh) | 2021-09-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6315673B2 (ja) | 着色感光性樹脂組成物 | |
KR101961219B1 (ko) | 착색 감광성 수지 조성물 | |
KR101938427B1 (ko) | 감광성 수지 조성물, 이를 이용하는 컬러필터 및 액정표시장치 | |
KR101526678B1 (ko) | 착색 감광성 수지 조성물, 컬러필터 및 이를 포함하는 액정표시장치 | |
KR102558671B1 (ko) | 청색 감광성 수지 조성물, 이를 포함하는 청색 컬러필터 및 디스플레이 소자 | |
KR102363457B1 (ko) | 착색 감광성 수지 조성물 및 이를 포함하는 컬럼 스페이서 | |
CN106019845B (zh) | 着色感光树脂组合物、彩色滤光片和图像显示装置 | |
KR102410852B1 (ko) | 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치 | |
CN108333871B (zh) | 着色感光性树脂组合物、滤色器及包含其的显示装置 | |
KR102356582B1 (ko) | 녹색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치 | |
KR102012523B1 (ko) | 착색 감광성 수지 조성물, 컬러필터 및 이를 포함하는 액정표시장치 | |
KR102741573B1 (ko) | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 | |
KR102727347B1 (ko) | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 | |
KR20150106665A (ko) | 착색 감광성 수지 조성물 | |
KR102028483B1 (ko) | 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치 | |
KR102017246B1 (ko) | 다관능 (메타)아크릴계 화합물, 이를 포함하는 착색 감광성 수지 조성물, 컬러 필터 및 표시 장치 | |
KR102691815B1 (ko) | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 | |
KR102545896B1 (ko) | 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치 | |
KR102697800B1 (ko) | 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 표시장치 | |
KR20190106499A (ko) | 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치 | |
KR102136357B1 (ko) | 착색 감광성 수지 조성물 및 이를 이용하는 컬러 필터 | |
KR101403242B1 (ko) | 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치 | |
KR102383520B1 (ko) | 적색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치 | |
KR20240131817A (ko) | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 | |
KR20240132681A (ko) | 흑색 감광성 수지 조성물, 블랙 매트릭스 및 화상표시장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20200316 |
|
PG1501 | Laying open of application | ||
A201 | Request for examination | ||
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20220207 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20200316 Comment text: Patent Application |
|
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20231130 Patent event code: PE09021S01D |
|
E601 | Decision to refuse application | ||
PE0601 | Decision on rejection of patent |
Patent event date: 20240720 Comment text: Decision to Refuse Application Patent event code: PE06012S01D |
|
PX0701 | Decision of registration after re-examination |
Patent event date: 20241025 Comment text: Decision to Grant Registration Patent event code: PX07013S01D |
|
X701 | Decision to grant (after re-examination) | ||
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20241104 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20241104 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration |