KR20150075367A - 표시 장치 및 전자 기기 - Google Patents
표시 장치 및 전자 기기 Download PDFInfo
- Publication number
- KR20150075367A KR20150075367A KR1020140182669A KR20140182669A KR20150075367A KR 20150075367 A KR20150075367 A KR 20150075367A KR 1020140182669 A KR1020140182669 A KR 1020140182669A KR 20140182669 A KR20140182669 A KR 20140182669A KR 20150075367 A KR20150075367 A KR 20150075367A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- display device
- layer
- display
- electrode
- Prior art date
Links
- 239000000758 substrate Substances 0.000 claims abstract description 357
- 239000003365 glass fiber Substances 0.000 claims abstract description 94
- 238000000034 method Methods 0.000 claims description 105
- 239000004065 semiconductor Substances 0.000 claims description 78
- 229920002379 silicone rubber Polymers 0.000 claims description 8
- 239000004945 silicone rubber Substances 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 386
- 239000010408 film Substances 0.000 description 96
- 239000000463 material Substances 0.000 description 72
- 230000015572 biosynthetic process Effects 0.000 description 46
- 239000012790 adhesive layer Substances 0.000 description 42
- 230000006870 function Effects 0.000 description 34
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 30
- 238000004519 manufacturing process Methods 0.000 description 29
- 150000004767 nitrides Chemical class 0.000 description 28
- 239000004973 liquid crystal related substance Substances 0.000 description 25
- 229910052721 tungsten Inorganic materials 0.000 description 23
- 239000010937 tungsten Substances 0.000 description 23
- 229920005989 resin Polymers 0.000 description 21
- 239000011347 resin Substances 0.000 description 21
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 20
- 229910052782 aluminium Inorganic materials 0.000 description 19
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 19
- 229910052751 metal Inorganic materials 0.000 description 18
- 230000008569 process Effects 0.000 description 17
- 229910052581 Si3N4 Inorganic materials 0.000 description 16
- 239000000835 fiber Substances 0.000 description 16
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 16
- 239000002184 metal Substances 0.000 description 15
- 229910052757 nitrogen Inorganic materials 0.000 description 15
- 238000005530 etching Methods 0.000 description 14
- 239000012535 impurity Substances 0.000 description 14
- 229910052719 titanium Inorganic materials 0.000 description 14
- 239000010936 titanium Substances 0.000 description 14
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 13
- 239000004020 conductor Substances 0.000 description 13
- 239000007789 gas Substances 0.000 description 13
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 12
- 239000001257 hydrogen Substances 0.000 description 12
- 229910052739 hydrogen Inorganic materials 0.000 description 12
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 12
- 239000012212 insulator Substances 0.000 description 12
- 239000011733 molybdenum Substances 0.000 description 12
- 230000007935 neutral effect Effects 0.000 description 12
- 229910052750 molybdenum Inorganic materials 0.000 description 11
- 239000002356 single layer Substances 0.000 description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 230000000903 blocking effect Effects 0.000 description 10
- 239000003990 capacitor Substances 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 10
- 239000010949 copper Substances 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000005452 bending Methods 0.000 description 9
- 230000007547 defect Effects 0.000 description 9
- 150000002894 organic compounds Chemical class 0.000 description 9
- 238000000206 photolithography Methods 0.000 description 9
- 238000007639 printing Methods 0.000 description 9
- 229910052814 silicon oxide Inorganic materials 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 8
- 239000000956 alloy Substances 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 230000004888 barrier function Effects 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 238000005286 illumination Methods 0.000 description 8
- 239000011159 matrix material Substances 0.000 description 8
- 229910044991 metal oxide Inorganic materials 0.000 description 8
- 150000004706 metal oxides Chemical class 0.000 description 8
- 230000004048 modification Effects 0.000 description 8
- 238000012986 modification Methods 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 7
- 238000001312 dry etching Methods 0.000 description 7
- 229910003437 indium oxide Inorganic materials 0.000 description 7
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 7
- -1 polyethylene naphthalate Polymers 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 7
- 229910052726 zirconium Inorganic materials 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 6
- 229910052783 alkali metal Inorganic materials 0.000 description 6
- 150000001340 alkali metals Chemical class 0.000 description 6
- 150000001342 alkaline earth metals Chemical class 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- 239000002131 composite material Substances 0.000 description 6
- 239000002346 layers by function Substances 0.000 description 6
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 6
- 239000012788 optical film Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 229910000077 silane Inorganic materials 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- 229910001930 tungsten oxide Inorganic materials 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 5
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 229910052735 hafnium Inorganic materials 0.000 description 5
- 229910000449 hafnium oxide Inorganic materials 0.000 description 5
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 5
- 150000002431 hydrogen Chemical class 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 229910052715 tantalum Inorganic materials 0.000 description 5
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 5
- 238000001039 wet etching Methods 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 230000010365 information processing Effects 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 239000009719 polyimide resin Substances 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 230000037303 wrinkles Effects 0.000 description 4
- 229910052727 yttrium Inorganic materials 0.000 description 4
- 239000011787 zinc oxide Substances 0.000 description 4
- HEZMWWAKWCSUCB-PHDIDXHHSA-N (3R,4R)-3,4-dihydroxycyclohexa-1,5-diene-1-carboxylic acid Chemical compound O[C@@H]1C=CC(C(O)=O)=C[C@H]1O HEZMWWAKWCSUCB-PHDIDXHHSA-N 0.000 description 3
- 229910052779 Neodymium Inorganic materials 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- 238000004040 coloring Methods 0.000 description 3
- 230000000295 complement effect Effects 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 229910001195 gallium oxide Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229920000049 Carbon (fiber) Polymers 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000004983 Polymer Dispersed Liquid Crystal Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000004917 carbon fiber Substances 0.000 description 2
- 230000001413 cellular effect Effects 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000005202 decontamination Methods 0.000 description 2
- 230000003588 decontaminative effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000004020 luminiscence type Methods 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000011017 operating method Methods 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- UWCWUCKPEYNDNV-LBPRGKRZSA-N 2,6-dimethyl-n-[[(2s)-pyrrolidin-2-yl]methyl]aniline Chemical compound CC1=CC=CC(C)=C1NC[C@H]1NCCC1 UWCWUCKPEYNDNV-LBPRGKRZSA-N 0.000 description 1
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910004129 HfSiO Inorganic materials 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 229910007610 Zn—Sn Inorganic materials 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- GPBUGPUPKAGMDK-UHFFFAOYSA-N azanylidynemolybdenum Chemical compound [Mo]#N GPBUGPUPKAGMDK-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 125000000609 carbazolyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 1
- 150000001925 cycloalkenes Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000000412 dendrimer Substances 0.000 description 1
- 229920000736 dendritic polymer Polymers 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000005262 ferroelectric liquid crystals (FLCs) Substances 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 238000012905 input function Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- SJCKRGFTWFGHGZ-UHFFFAOYSA-N magnesium silver Chemical compound [Mg].[Ag] SJCKRGFTWFGHGZ-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920006350 polyacrylonitrile resin Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- VEDJZFSRVVQBIL-UHFFFAOYSA-N trisilane Chemical compound [SiH3][SiH2][SiH3] VEDJZFSRVVQBIL-UHFFFAOYSA-N 0.000 description 1
- 150000003657 tungsten Chemical class 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 238000009941 weaving Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/421—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer
- H10D86/423—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer comprising semiconductor materials not belonging to the Group IV, e.g. InGaZnO
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/01—Manufacture or treatment
- H10D86/021—Manufacture or treatment of multiple TFTs
- H10D86/0214—Manufacture or treatment of multiple TFTs using temporary substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/411—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs characterised by materials, geometry or structure of the substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/84—Parallel electrical configurations of multiple OLEDs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
- H10K77/111—Flexible substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/311—Flexible OLED
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
가요성을 가지는 2개의 기판을 포함하는 표시 장치, 조명 장치, 또는 전자 기기로, 가요성을 가지는 2개의 기판 중 적어도 한쪽 기판은 한 방향으로 연장된 복수의 유리 섬유를 포함한다. 이에 의하여 한 방향으로의 가요성이 낮고 취급 중에 파손되기 어려운 표시 장치, 조명 장치, 또는 전자 기기를 제공할 수 있다.
Description
도 2는 표시 장치를 휠 때의 예를 설명하기 위한 단면도.
도 3은 표시 장치의 일 형태를 설명하기 위한 도면.
도 4는 표시 장치의 일 형태를 설명하기 위한 단면도.
도 5는 표시 장치의 일 형태를 설명하기 위한 단면도.
도 6은 표시 장치의 일 형태를 설명하기 위한 도면.
도 7은 표시 장치의 일 형태를 설명하기 위한 단면도.
도 8은 표시 장치의 일 형태를 설명하기 위한 블록 다이어그램 및 회로도.
도 9는 표시 장치의 제작 방법의 예를 설명하기 위한 단면도.
도 10은 표시 장치의 제작 방법의 예를 설명하기 위한 단면도.
도 11은 표시 장치의 제작 방법의 예를 설명하기 위한 단면도.
도 12는 표시 장치의 제작 방법의 예를 설명하기 위한 단면도.
도 13은 표시 장치의 제작 방법의 예를 설명하기 위한 단면도.
도 14는 표시 장치의 제작 방법의 예를 설명하기 위한 단면도.
도 15는 표시 장치의 제작 방법의 예를 설명하기 위한 단면도.
도 16은 표시 장치의 제작 방법의 예를 설명하기 위한 단면도.
도 17은 발광 소자의 구성예를 설명하기 위한 도면.
도 18은 표시 장치의 일 형태를 설명하기 위한 단면도.
도 19는 표시 장치의 일 형태를 설명하기 위한 단면도.
도 20은 표시 장치의 일 형태를 설명하기 위한 단면도.
도 21은 표시 장치의 일 형태를 설명하기 위한 단면도.
도 22는 표시 장치의 일 형태를 설명하기 위한 단면도.
도 23은 표시 장치의 일 형태를 설명하기 위한 단면도.
도 24는 표시 장치의 일 형태를 설명하기 위한 단면도.
도 25는 표시 장치의 일 형태를 설명하기 위한 단면도.
도 26은 표시 장치의 일 형태를 설명하기 위한 단면도.
도 27은 표시 장치의 일 형태를 설명하기 위한 도면.
도 28은 표시 장치의 일 형태를 설명하기 위한 도면.
도 29는 표시 장치의 일 형태를 설명하기 위한 단면도.
도 30은 전자 기기 및 조명 장치의 일례를 설명하기 위한 도면.
도 31은 전자 기기의 일례를 설명하기 위한 도면.
도 32는 전자 기기의 일례를 설명하기 위한 도면.
도 33은 조명 장치의 일 형태를 설명하기 위한 단면도.
도 34는 표시 장치의 일 형태를 설명하기 위한 도면.
101: 소자 형성 기판
102: 절연체
103: 유리 섬유
104: 섬유
111: 기판
112: 접착층
113: 박리층
114: 격벽
115: 전극
117: EL층
118: 전극
120: 접착층
121: 기판
122: 개구
123: 이방성 도전 접속층
124: 외부 전극
125: 발광 소자
128: 개구
129: 개구
131: 표시 영역
132: 구동 회로
133: 구동 회로
134: 화소
135: 주사선
136: 신호선
137: 기판
138: 접착층
141: 소자 형성 기판
142: 접착층
143: 박리층
145: 절연층
147: 기판
148: 접착층
150: 표시 장치
160: 표시 장치
170: 표시 장치
200: 표시 장치
205: 절연층
206: 게이트 전극
207: 게이트 절연층
208: 반도체층
210: 절연층
211: 절연층
216: 단자 전극
219: 배선
232: 트랜지스터
233: 용량 소자
235: 광
252: 트랜지스터
263: 전극
264: 차광층
266: 착색층
268: 오버코트층
272: 트랜지스터
318: 전극
320: EL층
322: 전극
330: 발광 소자
331: 발광 소자
431: 트랜지스터
432: 액정 소자
435: 노드
436: 노드
437: 노드
910: 반도체 칩
911: 광학 필름
991: 도전층
992: 절연층
993: 도전층
994: 기판
7100: 휴대 표시 장치
7101: 하우징
7102: 표시부
7103: 조작용 버튼
7104: 송수신 장치
7200: 조명 장치
7201: 스테이지부
7202: 발광부
7203: 조작 스위치
7210: 조명 장치
7212: 발광부
7220: 조명 장치
7222: 발광부
7300: 표시 장치
7301: 하우징
7302: 표시부
7303: 조작용 버튼
7304: 손잡이
7305: 제어부
7400: 휴대 전화기
7401: 하우징
7402: 표시부
7403: 조작용 버튼
7404: 외부 접속 포트
7405: 스피커
7406: 마이크로폰
9600: 태블릿형 단말
9625: 절전 모드 전환 스위치
9626: 표시 모드 전환 스위치
9627: 전원 스위치
9628: 조작 스위치
9629: 여밈부
9630: 하우징
9631: 표시부
9632: 영역
9633: 태양 전지
9634: 충방전 제어 회로
9635: 배터리
9636: DCDC 컨버터
9637: 컨버터
9638: 조작 키
9639: 힌지부
117A: EL층
117B: EL층
117C: EL층
131a: 영역
132a: 영역
133a: 영역
148A: 접착층
209a: 소스 전극
209b: 드레인 전극
235A: 광
235B: 광
235C: 광
320a: 전하 발생층
9630a: 하우징
9630b: 하우징
Claims (23)
- 표시 장치에 있어서,
복수의 유리 섬유를 포함하는 가요성을 가지는 기판과;
상기 가요성을 가지는 기판 위의 표시 소자를 포함하고,
상기 복수의 유리 섬유는 한 방향으로 연장되고,
상기 한 방향으로의 가요성은, 상기 한 방향과 교차되는 다른 방향으로의 가요성보다 낮은, 표시 장치. - 제 1 항에 있어서,
상기 한 방향은 상기 표시 장치의 짧은 쪽 방향이고,
상기 다른 방향은 상기 표시 장치의 긴 쪽 방향인, 표시 장치. - 제 1 항에 있어서,
상기 가요성을 가지는 기판은 실리콘 고무(silicone rubber)를 포함하는, 표시 장치. - 제 1 항에 있어서,
상기 표시 소자는 발광 소자인, 표시 장치. - 제 1 항에 있어서,
상기 표시 소자는 트랜지스터에 전기적으로 접속되는, 표시 장치. - 제 5 항에 있어서,
상기 트랜지스터는 산화물 반도체를 포함하고,
상기 산화물 반도체는 채널 형성 영역을 포함하는, 표시 장치. - 전자 기기에 있어서,
제 1 항에 따른 표시 장치와;
하우징, 조작용 버튼, 및 스피커 중 적어도 하나를 포함하는, 전자 기기. - 표시 장치에 있어서,
가요성을 가지는 제 1 기판과;
가요성을 가지는 제 2 기판과;
표시 소자를 포함하고,
상기 가요성을 가지는 제 1 기판과 상기 가요성을 가지는 제 2 기판은 상기 표시 소자를 개재하여 서로 중첩되고,
상기 가요성을 가지는 제 1 기판은 복수의 유리 섬유를 포함하고,
상기 복수의 유리 섬유는 한 방향으로 연장되고,
상기 한 방향으로의 가요성은, 상기 한 방향과 교차되는 다른 방향으로의 가요성보다 낮은, 표시 장치. - 제 8 항에 있어서,
상기 한 방향은 상기 표시 장치의 짧은 쪽 방향이고,
상기 다른 방향은 상기 표시 장치의 긴 쪽 방향인, 표시 장치. - 제 8 항에 있어서,
상기 가요성을 가지는 제 1 기판은 비표시면 측에 있는, 표시 장치. - 제 8 항에 있어서,
상기 가요성을 가지는 제 1 기판은 실리콘 고무를 포함하는, 표시 장치. - 제 8 항에 있어서,
상기 표시 소자는 발광 소자인, 표시 장치. - 제 8 항에 있어서,
상기 표시 소자는 트랜지스터에 전기적으로 접속되는, 표시 장치. - 제 13 항에 있어서,
상기 트랜지스터는 산화물 반도체를 포함하고,
상기 산화물 반도체는 채널 형성 영역을 포함하는, 표시 장치. - 전자 기기에 있어서,
제 8 항에 따른 표시 장치와;
하우징, 조작용 버튼, 및 스피커 중 적어도 하나를 포함하는, 전자 기기. - 표시 장치에 있어서,
가요성을 가지는 제 1 기판과;
가요성을 가지는 제 2 기판과;
제 3 기판과;
제 4 기판과;
표시 소자를 포함하고,
상기 가요성을 가지는 제 1 기판과 상기 가요성을 가지는 제 2 기판은 상기 제 3 기판 및 상기 제 4 기판을 개재하여 서로 중첩되고,
상기 제 3 기판과 상기 제 4 기판은 상기 표시 소자를 개재하여 서로 중첩되고,
상기 가요성을 가지는 제 1 기판은 복수의 유리 섬유를 포함하고,
상기 복수의 유리 섬유는 한 방향으로 연장되고,
상기 한 방향으로의 가요성은, 상기 한 방향과 교차되는 다른 방향으로의 가요성보다 낮은, 표시 장치. - 제 16 항에 있어서,
상기 한 방향은 상기 표시 장치의 짧은 쪽 방향이고,
상기 다른 방향은 상기 표시 장치의 긴 쪽 방향인, 표시 장치. - 제 16 항에 있어서,
상기 가요성을 가지는 제 1 기판은 비표시면 측에 있는, 표시 장치. - 제 16 항에 있어서,
상기 가요성을 가지는 제 1 기판은 실리콘 고무를 포함하는, 표시 장치. - 제 16 항에 있어서,
상기 표시 소자는 발광 소자인, 표시 장치. - 제 16 항에 있어서,
상기 표시 소자는 트랜지스터에 전기적으로 접속되는, 표시 장치. - 제 21 항에 있어서,
상기 트랜지스터는 산화물 반도체를 포함하고,
상기 산화물 반도체는 채널 형성 영역을 포함하는, 표시 장치. - 전자 기기에 있어서,
제 16 항에 따른 표시 장치와;
하우징, 조작용 버튼, 및 스피커 중 적어도 하나를 포함하는, 전자 기기.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013267177 | 2013-12-25 | ||
JPJP-P-2013-267177 | 2013-12-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20150075367A true KR20150075367A (ko) | 2015-07-03 |
Family
ID=53400953
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020140182669A KR20150075367A (ko) | 2013-12-25 | 2014-12-17 | 표시 장치 및 전자 기기 |
Country Status (3)
Country | Link |
---|---|
US (2) | US9356246B2 (ko) |
JP (2) | JP2015143846A (ko) |
KR (1) | KR20150075367A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190035919A (ko) * | 2016-08-23 | 2019-04-03 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 일반화된 층 기계적 적합성을 가진 폴더블 디스플레이 설계 |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150021000A (ko) | 2013-08-19 | 2015-02-27 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 장치 |
US9229481B2 (en) | 2013-12-20 | 2016-01-05 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
KR20150075367A (ko) * | 2013-12-25 | 2015-07-03 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 장치 및 전자 기기 |
CN112904941A (zh) | 2014-02-28 | 2021-06-04 | 株式会社半导体能源研究所 | 电子设备 |
JP6515537B2 (ja) * | 2014-04-08 | 2019-05-22 | セイコーエプソン株式会社 | 有機el装置の製造方法、有機el装置、電子機器 |
US9769929B1 (en) * | 2014-09-30 | 2017-09-19 | Apple Inc. | Interconnect structures for electronic devices with component arrays |
KR102417119B1 (ko) * | 2015-02-11 | 2022-07-06 | 삼성디스플레이 주식회사 | 플렉서블 디스플레이 장치 |
KR102273053B1 (ko) | 2015-02-16 | 2021-07-06 | 삼성디스플레이 주식회사 | 디스플레이 장치 |
US10001876B2 (en) * | 2015-04-01 | 2018-06-19 | Shanghai Tianma Micro-electronics Co., Ltd. | Touch display panel, and driving method and driving circuit for the same |
US10204535B2 (en) * | 2015-04-06 | 2019-02-12 | Semiconductor Energy Laboratory Co., Ltd. | Display device and electronic device |
KR101821782B1 (ko) * | 2016-03-11 | 2018-01-25 | 삼성디스플레이 주식회사 | 디스플레이 장치 제조방법 및 디스플레이 장치 |
KR102610769B1 (ko) * | 2016-06-09 | 2023-12-07 | 삼성디스플레이 주식회사 | 박막태양전지를 구비한 유기발광 표시장치 및 그 제조방법 |
CN106206613B (zh) | 2016-08-24 | 2020-12-29 | 昆山工研院新型平板显示技术中心有限公司 | 一种柔性显示基板及其制备方法 |
JP6762167B2 (ja) * | 2016-08-29 | 2020-09-30 | 株式会社ジャパンディスプレイ | 表示装置 |
JP6900160B2 (ja) * | 2016-08-31 | 2021-07-07 | エルジー ディスプレイ カンパニー リミテッド | フレキシブル表示装置 |
US20190363304A1 (en) * | 2017-03-30 | 2019-11-28 | Sharp Kabushiki Kaisha | El device producing method and el device producing device |
CN107342375B (zh) * | 2017-08-21 | 2019-05-31 | 深圳市华星光电半导体显示技术有限公司 | 柔性显示面板的制作方法及柔性显示面板 |
JP6556812B2 (ja) * | 2017-11-28 | 2019-08-07 | Nissha株式会社 | ハードコート付フィルムタイプタッチセンサとこれを用いたフレキシブルディバイス |
KR102429769B1 (ko) | 2017-12-11 | 2022-08-04 | 엘지디스플레이 주식회사 | 디스플레이 장치 및 이를 포함하는 롤러블 디스플레이 시스템 |
JP7077001B2 (ja) * | 2017-12-15 | 2022-05-30 | 株式会社ジャパンディスプレイ | 表示装置 |
KR102547854B1 (ko) | 2018-05-04 | 2023-06-26 | 삼성디스플레이 주식회사 | 폴더블 표시 장치 및 폴더블 표시 장치의 제조 방법 |
JP7271114B2 (ja) * | 2018-09-11 | 2023-05-11 | エルジー ディスプレイ カンパニー リミテッド | 表示装置 |
CN109345959A (zh) * | 2018-10-12 | 2019-02-15 | 京东方科技集团股份有限公司 | 一种柔性衬底、柔性显示面板、柔性显示装置和制作方法 |
JP7178867B2 (ja) * | 2018-10-25 | 2022-11-28 | 三菱電機株式会社 | 湾曲型表示装置 |
WO2020200409A1 (en) * | 2019-03-29 | 2020-10-08 | Huawei Technologies Co., Ltd. | Symmetrically foldable display stack for electronic device |
CN110544431B (zh) * | 2019-07-25 | 2021-02-12 | 华为技术有限公司 | 一种复合结构、柔性屏组件及折叠显示终端 |
JP7529455B2 (ja) | 2020-06-22 | 2024-08-06 | 株式会社ジャパンディスプレイ | 検出装置 |
US20240120852A1 (en) * | 2021-02-15 | 2024-04-11 | Sharp Kabushiki Kaisha | Support system and flexible display device comprising support system |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4934306A (en) * | 1987-10-15 | 1990-06-19 | Wilson Greatbatch Ltd. | Anode coating for lithium cell |
JP4059731B2 (ja) | 2002-08-19 | 2008-03-12 | シャープ株式会社 | アクティブマトリクス基板および表示装置 |
JP2007103671A (ja) * | 2005-10-04 | 2007-04-19 | Katsuya Hiroshige | 引き揃え線を用いた導電配線基板 |
JP2009087928A (ja) * | 2007-09-13 | 2009-04-23 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
JP5358324B2 (ja) * | 2008-07-10 | 2013-12-04 | 株式会社半導体エネルギー研究所 | 電子ペーパー |
JP2011003522A (ja) * | 2008-10-16 | 2011-01-06 | Semiconductor Energy Lab Co Ltd | フレキシブル発光装置、電子機器及びフレキシブル発光装置の作製方法 |
KR101702329B1 (ko) * | 2008-12-17 | 2017-02-03 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광 장치 및 전자 기기 |
TWI607670B (zh) * | 2009-01-08 | 2017-12-01 | 半導體能源研究所股份有限公司 | 發光裝置及電子裝置 |
JP5458691B2 (ja) | 2009-06-25 | 2014-04-02 | セイコーエプソン株式会社 | 電気光学装置、および電子機器 |
TW201110802A (en) | 2009-06-24 | 2011-03-16 | Seiko Epson Corp | Electro-optical device, electronic device, and illumination apparatus |
JP2012230491A (ja) * | 2011-04-25 | 2012-11-22 | Nitto Denko Corp | タッチパネル用透明導電性フィルムおよび画像表示装置 |
JP5609941B2 (ja) * | 2012-09-26 | 2014-10-22 | セイコーエプソン株式会社 | 表示装置および電子機器 |
US9543533B2 (en) * | 2013-03-07 | 2017-01-10 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
TWI611582B (zh) | 2013-04-10 | 2018-01-11 | 半導體能源研究所股份有限公司 | 半導體裝置及其製造方法 |
KR20140123420A (ko) | 2013-04-12 | 2014-10-22 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 장치 |
KR102250061B1 (ko) * | 2013-04-15 | 2021-05-07 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광 장치 |
KR102405992B1 (ko) | 2013-04-24 | 2022-06-10 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 장치 |
TWI647559B (zh) | 2013-04-24 | 2019-01-11 | 日商半導體能源研究所股份有限公司 | 顯示裝置 |
CN103531724B (zh) * | 2013-09-29 | 2015-09-09 | 京东方科技集团股份有限公司 | 一种显示装置、柔性基板及其制作方法 |
KR20150075367A (ko) * | 2013-12-25 | 2015-07-03 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 장치 및 전자 기기 |
-
2014
- 2014-12-17 KR KR1020140182669A patent/KR20150075367A/ko not_active Application Discontinuation
- 2014-12-19 US US14/577,166 patent/US9356246B2/en active Active
- 2014-12-22 JP JP2014258752A patent/JP2015143846A/ja not_active Withdrawn
-
2016
- 2016-05-20 US US15/160,168 patent/US9768198B2/en not_active Expired - Fee Related
-
2019
- 2019-04-05 JP JP2019072452A patent/JP2019113869A/ja not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190035919A (ko) * | 2016-08-23 | 2019-04-03 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 일반화된 층 기계적 적합성을 가진 폴더블 디스플레이 설계 |
Also Published As
Publication number | Publication date |
---|---|
US20150179717A1 (en) | 2015-06-25 |
JP2019113869A (ja) | 2019-07-11 |
JP2015143846A (ja) | 2015-08-06 |
US20160268315A1 (en) | 2016-09-15 |
US9356246B2 (en) | 2016-05-31 |
US9768198B2 (en) | 2017-09-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102662276B1 (ko) | 전자 기기 | |
US9768198B2 (en) | Display device and electronic device | |
JP7018157B2 (ja) | 発光装置の作製方法 | |
KR102470900B1 (ko) | 표시 장치 | |
JP6580403B2 (ja) | 表示装置 | |
TWI682534B (zh) | 顯示裝置、顯示裝置的製造方法以及電子裝置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20141217 |
|
PG1501 | Laying open of application | ||
A201 | Request for examination | ||
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20191113 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20141217 Comment text: Patent Application |
|
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20210129 Patent event code: PE09021S01D |
|
E601 | Decision to refuse application | ||
PE0601 | Decision on rejection of patent |
Patent event date: 20210923 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20210129 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |