KR100321284B1 - 높은이산화규소함량을갖는형상체및상기형상체의제조방법 - Google Patents
높은이산화규소함량을갖는형상체및상기형상체의제조방법 Download PDFInfo
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- KR100321284B1 KR100321284B1 KR1019940029261A KR19940029261A KR100321284B1 KR 100321284 B1 KR100321284 B1 KR 100321284B1 KR 1019940029261 A KR1019940029261 A KR 1019940029261A KR 19940029261 A KR19940029261 A KR 19940029261A KR 100321284 B1 KR100321284 B1 KR 100321284B1
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 34
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 235000012239 silicon dioxide Nutrition 0.000 title description 4
- 239000000377 silicon dioxide Substances 0.000 title description 2
- 238000000034 method Methods 0.000 claims abstract description 42
- 239000000126 substance Substances 0.000 claims abstract description 17
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 claims abstract description 15
- 239000011148 porous material Substances 0.000 claims abstract description 15
- 230000003595 spectral effect Effects 0.000 claims abstract description 15
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 10
- 238000010438 heat treatment Methods 0.000 claims description 17
- 238000005245 sintering Methods 0.000 claims description 14
- 238000001816 cooling Methods 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 9
- 239000007858 starting material Substances 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 7
- 239000000843 powder Substances 0.000 claims description 7
- 239000011521 glass Substances 0.000 claims description 2
- 239000002344 surface layer Substances 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 2
- 230000001590 oxidative effect Effects 0.000 claims 1
- 230000008595 infiltration Effects 0.000 abstract description 3
- 238000001764 infiltration Methods 0.000 abstract description 3
- 230000035939 shock Effects 0.000 abstract description 3
- 230000017525 heat dissipation Effects 0.000 abstract description 2
- 238000001228 spectrum Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 10
- 238000005452 bending Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000003801 milling Methods 0.000 description 6
- 238000007569 slipcasting Methods 0.000 description 6
- 238000000227 grinding Methods 0.000 description 5
- 239000010440 gypsum Substances 0.000 description 4
- 229910052602 gypsum Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000006004 Quartz sand Substances 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000009749 continuous casting Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000007524 flame polishing Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- CUPFNGOKRMWUOO-UHFFFAOYSA-N hydron;difluoride Chemical compound F.F CUPFNGOKRMWUOO-UHFFFAOYSA-N 0.000 description 1
- 238000005495 investment casting Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920003225 polyurethane elastomer Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 150000003839 salts Chemical group 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22C—FOUNDRY MOULDING
- B22C9/00—Moulds or cores; Moulding processes
- B22C9/12—Treating moulds or cores, e.g. drying, hardening
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/429—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to measurement of ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
- Y10T428/1317—Multilayer [continuous layer]
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- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Glass Melting And Manufacturing (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Producing Shaped Articles From Materials (AREA)
- Silicon Compounds (AREA)
- Glass Compositions (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Optical Measuring Cells (AREA)
Abstract
Description
Claims (23)
- 99.9% 이상의 화확적 순도 및 1% 이하의 크리스토발라이트 함량을 가지며 가스가 스며들지 않는 비정질 이산화 규소로 된 형상체에 있어서,상기 형상체는 불투명하고 기공들을 함유하며 1 mm 의 벽 두께에서 λ = 190nm 내지 λ = 2650nm 의 파장영역에서 사실상 일정하고 10% 이하인 다이렉트 스펙트럼 전도성을 가지고 또 2.15g/㎤ 이상의 밀도를 갖는 것을 특징으로 하는 비정질 이산화 규소로 된 형상체.
- 제 1 항에 있어서,상기 기공들의 80% 이상이 20㎛미만의 최대 구멍 치수를 갖는 것을 특징으로 하는 형상체.
- 제 1 항에 있어서,상기 형상체의 기공 함량은 단위 체적당 0.5 내지 2.5%인 것을 특징으로 하는 형상체.
- 제 1 항에 있어서,상기 형상체는 1 내지 100mm 의 벽 두께를 구비하는 것을 특징으로하는 형상체.
- 제 1 항에 있어서,상기 형상체는 속이 빈 형태를 갖는 것을 특징으로 하는 형상체.
- 제 1 항에 있어서,상기 형상체는 플랜지의 형태를 갖는 것을 특징으로 하는 형상체.
- 제 1 항에 있어서,상기 형상체는 도가니의 형태를 갖는 것을 특징으로 하는 형상체.
- 99.9% 이상의 화학적 순도 및 1% 이하의 크리스토발라이트 함량을 가지며 가스가 스며들지 않는 비정질 이산화 규소로 된 형상체를 제조하는 방법에 있어서,99.9% 이상의 순도를 갖는 비정질 석영 유리 출발 물질이 70㎛ 이하의 입자 크기를 가지는 분말을 제공하도록 분쇄되고, 슬립이 준비되며, 상기 슬립은 녹색 형상체를 생산하기 위하여 상기 형상체에 대응하는 다공성 모울드에 집어넣고 미리 정한 시간 동안 상기 모울드에 남겨두며 상기 모울드를 제거한 후에는 녹색 형상체를 건조시키고 다음에는 용광로에서 1200℃이상으로 가열한 후 냉각시키는데, 이러한 일들은 1mm의 벽두께에서의 다이렉트 스펙트럼 전도가 λ = 190nm 내지 λ = 2650nm 의 파장영역에서 사실상 일정하고 10% 이하인, 불투명하고 기공을 함유하는 형상체를 제조하기위하여 슬립을 다공 모울드에 넣기 전에 1 내지 240 시간 계속적으로 운동시켜 상기 슬립을 안정화시키는 단계, 건조된 녹색 형상체를 5 내지 60K/min의 가열 비율로 용광로에서 1350 내지 1450℃의 소결 온도로 가열하는 단계, 40분 이상 1300℃ 이상의 온도에 노출시키는 단계, 상기 소결된 형상체를 5K/min 이상의 냉각 비율로 1000℃까지 냉각시키는 단계로 구성되는 비정질 이산화규소로 된 형상체의 제조 방법.
- 제 8 항에 있어서,상기 슬립을 상기 모울드에 넣기 전에 상기 슬립이 감소된 압력을 잠시 받도록 하는 것을 특징으로 하는 제조 방법.
- 제 8 항에 있어서,상기 슬립을 상기 모울드에 집어넣는 동안 또는 상기 슬립을 상기 모울드에 남겨두는 동안 압력 차이가 상기 슬립의 자유 표면과 슬립에 의하여 적셔지지 않은 모울드의 바깥 표면 사이에서 바깥 표면의 압력이 슬립의 자유 표면 압력보다 낮은 방법으로 유지되는 것을 특징으로 하는 제조 방법.
- 제 10 항에 있어서,0.8 바아 이하의 압력이 상기 모울드의 바깥 표면에 유지되는 것을 특징으로 하는 제조 방법.
- 제 10 항에 있어서,상기 모울드는 대기압보다 낮은 압력으로 유지되는 컨테이너에 삽입되는 것을 특징으로 하는 제조 방법.
- 제 8 항에 있어서,상기 녹색 형상체를 형성하기 위하여 5 내지 400분간 상기 슬립을 상기 모울드에 남겨두는 것을 특징으로 하는 제조 방법.
- 제 8 항에 있어서,상기 녹색 형상체를 실온에서 300℃로 가열하여 건조시키는 것을 특징으로 하는 제조 방법.
- 제 14 항에 있어서,상기 온도가 300℃까지 단계적으로 증가하는 것을 특징으로 하는 제조 방법.
- 제 15 항에 있어서.상기 온도 단계가 100 내지 300℃의 범위에서 보다 100℃ 이하의 온도 범위에서 더 작아지도록 선택되는 것을 특징으로 하는 제조 방법.
- 제 8 항에 있어서,상기 녹색 형상체의 건조를 감소된 압력하에서 행하는 것을 특징으로 하는 제조 방법.
- 제 8 항에 있어서,건조된 상기 녹색 형상체를 900 내지 1100℃의 온도에 30 내지 200 분간 노출시키는 것을 특징으로 하는 제조 방법.
- 제 8 항에 있어서,상기 녹색 형상체를 가열 비율의 증가에 따라 증가되는 시간동안 소결온도에서 유지하는 것을 특징으로 하는 제조 방법.
- 제 8 항에 있어서,상기 녹색 형상체를 고온 소결하기 위하여 용광로에 산화 대기를 유지하는 것을 특징으로 하는 제조 방법.
- 제 8 항에 있어서,얇고 거친은 소결 표면층을 기계적으로 또는 플루오르화수소산으로 처리하여 냉각된 형상체로부터 제거하는 것을 특징으로 하는 제조 방법.
- 제 8 항에 있어서,상기 모울드에 넣어진 슬립이 3 내지 5의 pH를 갖는 것을 특징으로 하는 제조 방법.
- 제 8 항에 있어서,사용된 출발 물질이 석영 유리 파편인 것을 특징으로 하는 제조 방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEP4338807.8 | 1993-11-12 | ||
DE4338807A DE4338807C1 (de) | 1993-11-12 | 1993-11-12 | Formkörper mit hohem Gehalt an Siliziumdioxid und Verfahren zur Herstellung solcher Formkörper |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950014027A KR950014027A (ko) | 1995-06-15 |
KR100321284B1 true KR100321284B1 (ko) | 2002-06-28 |
Family
ID=6502525
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940029261A Expired - Lifetime KR100321284B1 (ko) | 1993-11-12 | 1994-11-09 | 높은이산화규소함량을갖는형상체및상기형상체의제조방법 |
KR1019960702414A Expired - Lifetime KR100349412B1 (ko) | 1993-11-12 | 1994-11-10 | 석영유리성형체및그제조방법 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960702414A Expired - Lifetime KR100349412B1 (ko) | 1993-11-12 | 1994-11-10 | 석영유리성형체및그제조방법 |
Country Status (8)
Country | Link |
---|---|
US (1) | US5736206A (ko) |
EP (1) | EP0653381B1 (ko) |
JP (2) | JP3763420B2 (ko) |
KR (2) | KR100321284B1 (ko) |
CN (1) | CN1066696C (ko) |
CA (1) | CA2135542C (ko) |
DE (4) | DE4338807C1 (ko) |
WO (1) | WO1995013248A1 (ko) |
Families Citing this family (76)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19523954C2 (de) * | 1995-07-05 | 1998-01-29 | Heraeus Quarzglas | Rohrförmiges Bauteil aus transparentem Quarzglas |
JP3649802B2 (ja) * | 1995-12-27 | 2005-05-18 | 信越石英株式会社 | 石英ガラス製フランジ及びその製造方法 |
GB9603128D0 (en) * | 1996-02-15 | 1996-04-17 | Tsl Group Plc | Improved vitreous silica product and method of manufacture |
US5972488A (en) * | 1996-07-04 | 1999-10-26 | Tosoh Corporation | Opaque quartz glass and process for production thereof |
DE19738464A1 (de) * | 1997-09-03 | 1999-03-04 | Basf Ag | Verwendung von Formkörpern als Katalysator zur Herstellung von Caprolactam |
DE69803643T3 (de) * | 1997-10-16 | 2006-11-30 | Tosoh Corp., Shinnanyo | Undurchsichtiger Silikatglasgegenstand mit durchsichtigem Bereich und Verfahren zu dessen Herstellung |
US6405563B1 (en) | 1997-10-16 | 2002-06-18 | Tosoh Corporation | Opaque silica glass article having transparent portion and process for producing same |
DE19801454C2 (de) * | 1998-01-16 | 1999-12-09 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zur Bestimmung eines UV-Strahlungs-Indexes |
JP3793553B2 (ja) * | 1999-03-31 | 2006-07-05 | 京セラ株式会社 | 黒色SiO2質耐食性部材及びその製造方法 |
DE19930817C1 (de) | 1999-07-01 | 2001-05-03 | Sico Jena Gmbh Quarzschmelze | Verfahren zur Herstellung von Verbundkörpern aus Quarzmaterial |
DE19943103A1 (de) | 1999-09-09 | 2001-03-15 | Wacker Chemie Gmbh | Hochgefüllte SiO2-Dispersion, Verfahren zu ihrer Herstellung und Verwendung |
DE19962451C1 (de) * | 1999-12-22 | 2001-08-30 | Heraeus Quarzglas | Verfahren für die Herstellung von opakem Quarzglas und für die Durchführung des Verfahrens geeignetes Si0¶2¶-Granulat |
DE19962449C2 (de) * | 1999-12-22 | 2003-09-25 | Heraeus Quarzglas | Quarzglastiegel und Verfahren für seine Herstellung |
DE19962452B4 (de) * | 1999-12-22 | 2004-03-18 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung von opakem Quarzglas |
DE10019693B4 (de) * | 2000-04-20 | 2006-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben |
EP1187170B1 (en) * | 2000-08-29 | 2007-05-09 | Heraeus Quarzglas GmbH & Co. KG | Plasma resistant quartz glass jig |
DE10044163A1 (de) * | 2000-09-07 | 2002-04-04 | Wacker Chemie Gmbh | Elektrophoretisch nachverdichtete SiO2-Formkörper, Verfahren zu ihrer Herstellung und Verwendung |
AUPR054000A0 (en) * | 2000-10-04 | 2000-10-26 | Austai Motors Designing Pty Ltd | A planetary gear apparatus |
DE10052072B4 (de) * | 2000-10-19 | 2005-06-16 | Heraeus Tenevo Ag | Verfahren zur Bearbeitung eines langgestreckten hohlzylindrischen Bauteils aus Quarzglas mittels Laserstrahlung |
US20020083740A1 (en) * | 2000-12-29 | 2002-07-04 | Pandelisev Kiril A. | Process and apparatus for production of silica grain having desired properties and their fiber optic and semiconductor application |
US20020083739A1 (en) * | 2000-12-29 | 2002-07-04 | Pandelisev Kiril A. | Hot substrate deposition fiber optic preforms and preform components process and apparatus |
US7797966B2 (en) * | 2000-12-29 | 2010-09-21 | Single Crystal Technologies, Inc. | Hot substrate deposition of fused silica |
DE10158521B4 (de) * | 2001-11-29 | 2005-06-02 | Wacker-Chemie Gmbh | In Teilbereichen oder vollständig verglaster SiO2-Formkörper und Verfahren zu seiner Herstellung |
US6829908B2 (en) * | 2002-02-27 | 2004-12-14 | Corning Incorporated | Fabrication of inclusion free homogeneous glasses |
TW200307652A (en) | 2002-04-04 | 2003-12-16 | Tosoh Corp | Quartz glass thermal sprayed parts and method for producing the same |
DE10260320B4 (de) * | 2002-12-20 | 2006-03-30 | Wacker Chemie Ag | Verglaster SiO2-Formkörper, Verfahren zu seiner Herstellung und Vorrichtung |
DE10319300B4 (de) * | 2003-04-29 | 2006-03-30 | Wacker Chemie Ag | Verfahren zur Herstellung eines Formkörpers aus Kieselglas |
DE10339676A1 (de) * | 2003-08-28 | 2005-03-24 | Wacker-Chemie Gmbh | SiO2-Formkörper, Verfahren zu ihrer Herstellung und Verwendung |
US7563512B2 (en) * | 2004-08-23 | 2009-07-21 | Heraeus Quarzglas Gmbh & Co. Kg | Component with a reflector layer and method for producing the same |
DE102004051846B4 (de) * | 2004-08-23 | 2009-11-05 | Heraeus Quarzglas Gmbh & Co. Kg | Bauteil mit einer Reflektorschicht sowie Verfahren für seine Herstellung |
CN101023041B (zh) * | 2004-08-23 | 2012-08-01 | 赫罗伊斯石英玻璃股份有限两合公司 | 具有反射体层的组件及其生产方法 |
DE102004052312A1 (de) * | 2004-08-23 | 2006-03-02 | Heraeus Quarzglas Gmbh & Co. Kg | Beschichtetes Bauteil aus Quarzglas sowie Verfahren zur Herstellung des Bauteils |
DE102004054392A1 (de) * | 2004-08-28 | 2006-03-02 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zum Verbinden von Bauteilen aus hochkieselsäurehaltigem Werkstoff, sowie aus derartigen Bauteilen zusammengefügter Bauteil-Verbund |
JP4484748B2 (ja) * | 2005-04-08 | 2010-06-16 | 信越石英株式会社 | シリカガラス製品の製造方法 |
DE602006016759D1 (de) * | 2005-04-15 | 2010-10-21 | Asahi Glass Co Ltd | Verfahren zur verringerung des durchmessers einer blase in einer glasplatte |
DE102005059291B4 (de) * | 2005-12-09 | 2009-02-12 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Quarzglas-Bauteils |
DE102006052512A1 (de) * | 2006-11-06 | 2008-05-08 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von opakem Quarzglas, nach dem Verfahren erhaltenes Halbzeug sowie daraus hergestelltes Bauteil |
DE102007030698B4 (de) * | 2007-06-30 | 2009-06-10 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Verbundkörpers aus einem Basiskörper aus opakem Quarzglas und einer dichten Versiegelungsschicht sowie Verwendung des Verbundkörpers |
DE102008049325B4 (de) * | 2008-09-29 | 2011-08-25 | Heraeus Quarzglas GmbH & Co. KG, 63450 | Verfahren zur Herstellung eines rohrförmigen Halbzeugs aus Quarzglas sowie Halbzeug aus Quarzglas |
IT1392068B1 (it) | 2008-11-24 | 2012-02-09 | Lpe Spa | Camera di reazione di un reattore epitassiale |
DE102009059015B4 (de) | 2009-12-17 | 2014-02-13 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglasbauteil mit opaker Innenzone sowie Verfahren zur Herstellung desselben |
DE202010018292U1 (de) | 2010-06-02 | 2015-07-14 | Thomas Kreuzberger | Quarzglaskörper und Gelbkörper zur Herstellung eines Quarzglaskörpers |
DE102010045934B4 (de) * | 2010-09-21 | 2012-04-05 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Quarzglastiegels mit transparenter Innenschicht aus synthetisch erzeugtem Quarzglas |
JP5467418B2 (ja) * | 2010-12-01 | 2014-04-09 | 株式会社Sumco | 造粒シリカ粉の製造方法、シリカガラスルツボの製造方法 |
JP5605902B2 (ja) * | 2010-12-01 | 2014-10-15 | 株式会社Sumco | シリカガラスルツボの製造方法、シリカガラスルツボ |
CN102167500B (zh) * | 2011-01-10 | 2013-01-09 | 圣戈班石英(锦州)有限公司 | 一种不透明石英实验室器皿的制备方法 |
US9193620B2 (en) * | 2011-03-31 | 2015-11-24 | Raytheon Company | Fused silica body with vitreous silica inner layer, and method for making same |
US9221709B2 (en) * | 2011-03-31 | 2015-12-29 | Raytheon Company | Apparatus for producing a vitreous inner layer on a fused silica body, and method of operating same |
DE102011120932A1 (de) * | 2011-12-14 | 2013-06-20 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines Quarzglasbauteils miteiner transparenten Oberflächenschicht |
US10370304B2 (en) * | 2012-11-29 | 2019-08-06 | Corning Incorporated | Fused silica based cellular structures |
SG11201508512PA (en) * | 2013-05-23 | 2015-12-30 | Applied Materials Inc | A coated liner assembly for a semiconductor processing chamber |
US9957431B2 (en) | 2013-11-11 | 2018-05-01 | Heraeus Quarzglas Gmbh & Co. Kg | Composite material, heat-absorbing component, and method for producing the composite material |
KR101853035B1 (ko) | 2013-12-23 | 2018-04-27 | 헤래우스 쿼츠 아메리카 엘엘씨 | 불투명한 석영 유리 부품을 형성하기 위한 방법 |
TWI652240B (zh) * | 2014-02-17 | 2019-03-01 | 日商東曹股份有限公司 | 不透明石英玻璃及其製造方法 |
JP6591034B2 (ja) * | 2015-07-15 | 2019-10-16 | ヘレーウス クオーツ アメリカ エルエルシーHeraeus Quartz America LLC | 不透明溶融石英ガラスを透明溶融石英ガラスに接合するためのプロセス |
JP7048053B2 (ja) | 2015-12-18 | 2022-04-05 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | マルチチャンバ炉内での石英ガラス体の調製 |
KR20180095614A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 | 낮은 OH, Cl, 및 Al 함량을 갖는 석영 유리로 제조된 유리 섬유 및 프리폼 |
KR20180095880A (ko) | 2015-12-18 | 2018-08-28 | 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 | 합성 석영 유리 결정립의 제조 |
CN108698888A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备 |
TWI813534B (zh) | 2015-12-18 | 2023-09-01 | 德商何瑞斯廓格拉斯公司 | 利用露點監測在熔融烘箱中製備石英玻璃體 |
TWI794150B (zh) | 2015-12-18 | 2023-03-01 | 德商何瑞斯廓格拉斯公司 | 自二氧化矽顆粒製備石英玻璃體 |
JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
WO2017103124A2 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Erhöhen des siliziumgehalts bei der herstellung von quarzglas |
US11236002B2 (en) | 2015-12-18 | 2022-02-01 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of an opaque quartz glass body |
WO2017103125A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas |
DE102016012003A1 (de) | 2016-10-06 | 2018-04-12 | Karlsruher Institut für Technologie | Zusammensetzung und Verfahren zur Herstellung eines Formkörpers aus hochreinem, transparentem Quarzglas mittels additiver Fertigung |
EP3339256A1 (de) * | 2016-12-23 | 2018-06-27 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von opakem quarzglas, und rohling aus dem opaken quarzglas |
RU2650970C1 (ru) * | 2017-05-04 | 2018-04-20 | Акционерное общество "Научно-производственное объединение Государственный оптический институт им. С.И. Вавилова" (АО "НПО ГОИ им. С.И. Вавилова") | Способ получения кварцевой керамики |
JP6676826B1 (ja) | 2018-12-14 | 2020-04-08 | 東ソー・クォーツ株式会社 | 不透明石英ガラスの製造方法 |
DE102020120565A1 (de) | 2020-08-04 | 2022-02-10 | Sick Ag | Optoelektronischer Sensor, Glaslinse und Verfahren zur Herstellung einer Glaslinse |
DE102020128337A1 (de) | 2020-10-28 | 2022-04-28 | Heraeus Noblelight Gmbh | Strahlerbauteil mit einer Reflektorschicht sowie Verfahren für seine Herstellung |
CN116648436B (zh) | 2021-01-30 | 2024-06-14 | 东曹石英股份有限公司 | 不透明石英玻璃及其制造方法 |
EP4108641A1 (de) | 2021-06-24 | 2022-12-28 | Heraeus Quarzglas GmbH & Co. KG | Formkörper aus opakem quarzglas sowie verfahren zur herstellung desselben |
WO2023166547A1 (ja) | 2022-03-01 | 2023-09-07 | 東ソ-・エスジ-エム株式会社 | 不透明石英ガラスおよびその製造方法 |
DE102022105673A1 (de) | 2022-03-10 | 2023-09-14 | PFW Aerospace GmbH | Verfahren zur Herstellung eines mindestens zweischichtigen Sandwichbauelements |
DE102022134350A1 (de) | 2022-12-21 | 2024-06-27 | Fraunhofer-Institut für Lasertechnik ILT | Werkstück aus Quarzglas für den Einsatz in einem plasmaunterstützten Fertigungsprozess sowie Verfahren zur Herstellung des Werkstücks |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US506303A (en) * | 1893-10-10 | Joseph j | ||
DE543957C (de) * | 1928-03-01 | 1932-02-12 | Heraeus Gmbh W C | Verfahren zum Herstellen von Rohren oder anderen Hohlkoerpern aus Quarz und anderen schwer schmelzbaren Stoffen |
US3972704A (en) * | 1971-04-19 | 1976-08-03 | Sherwood Refractories, Inc. | Apparatus for making vitreous silica receptacles |
DE2218766C2 (de) * | 1971-04-19 | 1982-06-03 | Sherwood Refractories Inc., Cleveland, Ohio | Verfahren und Vorrichtung zum Herstellen dünnwandiger Gefäße aus feinzerkleinerten Teilchen glasiger Kieselsäure hohen Reinheitsgrades |
GB1384319A (en) * | 1971-04-19 | 1975-02-19 | Sherwood Refractories | Vitreous silica and process and apparatus for making same |
CH566077A5 (ko) * | 1972-08-05 | 1975-08-29 | Heraeus Schott Quarzschmelze | |
US4040795A (en) * | 1974-06-04 | 1977-08-09 | Lothar Jung | Method for the conversion of crystalline silica raw materials into amorphous silica |
US4086489A (en) * | 1977-02-04 | 1978-04-25 | Piltingsrud Harley V | Ultra violet radiation personnel hazard meter |
JPS5812280A (ja) * | 1981-07-16 | 1983-01-24 | 松下電器産業株式会社 | シ−ズヒ−タ |
US5389582A (en) * | 1985-11-06 | 1995-02-14 | Loxley; Ted A. | Cristobalite reinforcement of quartz glass |
US4703173A (en) * | 1986-03-06 | 1987-10-27 | Fusion Systems Corporation | Probe for collecting light for a radiation monitoring device |
US4935046A (en) * | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
DE8800850U1 (de) * | 1988-01-25 | 1988-03-24 | Gerstel, Eberhard, 4330 Muelheim | UV-Sensor |
CN1045758A (zh) * | 1989-03-22 | 1990-10-03 | 长沙市电子材料二厂 | 气炼法生产不透明乳白石英玻璃 |
DD300159A7 (de) * | 1990-09-03 | 1992-05-27 | Universal Quarzgut Schmelze | Verfahren zur Herstellung von Erzeugnissen mit hohem SiO2-Gehalt |
US5330941A (en) * | 1991-07-24 | 1994-07-19 | Asahi Glass Company Ltd. | Quartz glass substrate for polysilicon thin film transistor liquid crystal display |
-
1993
- 1993-11-12 DE DE4338807A patent/DE4338807C1/de not_active Expired - Lifetime
-
1994
- 1994-08-31 EP EP94113614A patent/EP0653381B1/de not_active Expired - Lifetime
- 1994-09-29 DE DE4434858A patent/DE4434858C2/de not_active Expired - Lifetime
- 1994-10-13 DE DE59404672T patent/DE59404672D1/de not_active Expired - Lifetime
- 1994-11-09 KR KR1019940029261A patent/KR100321284B1/ko not_active Expired - Lifetime
- 1994-11-10 KR KR1019960702414A patent/KR100349412B1/ko not_active Expired - Lifetime
- 1994-11-10 DE DE4440104A patent/DE4440104C2/de not_active Expired - Lifetime
- 1994-11-10 WO PCT/EP1994/003722 patent/WO1995013248A1/de active Application Filing
- 1994-11-10 US US08/640,759 patent/US5736206A/en not_active Expired - Lifetime
- 1994-11-10 JP JP27653794A patent/JP3763420B2/ja not_active Expired - Lifetime
- 1994-11-10 CA CA002135542A patent/CA2135542C/en not_active Expired - Fee Related
- 1994-11-10 JP JP51289695A patent/JP3241046B2/ja not_active Expired - Fee Related
- 1994-11-11 CN CN94117916A patent/CN1066696C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA2135542A1 (en) | 1995-05-13 |
KR100349412B1 (ko) | 2002-11-14 |
KR960705742A (ko) | 1996-11-08 |
CA2135542C (en) | 2007-10-23 |
JPH07267724A (ja) | 1995-10-17 |
DE4434858A1 (de) | 1995-05-18 |
WO1995013248A1 (de) | 1995-05-18 |
JP3763420B2 (ja) | 2006-04-05 |
CN1105650A (zh) | 1995-07-26 |
DE4440104C2 (de) | 1996-04-25 |
US5736206A (en) | 1998-04-07 |
CN1066696C (zh) | 2001-06-06 |
JPH09506324A (ja) | 1997-06-24 |
DE4440104A1 (de) | 1995-05-18 |
DE4338807C1 (de) | 1995-01-26 |
KR950014027A (ko) | 1995-06-15 |
DE59404672D1 (de) | 1998-01-08 |
EP0653381A1 (de) | 1995-05-17 |
JP3241046B2 (ja) | 2001-12-25 |
EP0653381B1 (de) | 1998-04-29 |
DE4434858C2 (de) | 1997-05-22 |
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