JPS566236A - Photosensitive material and pattern forming method using it - Google Patents
Photosensitive material and pattern forming method using itInfo
- Publication number
- JPS566236A JPS566236A JP8165979A JP8165979A JPS566236A JP S566236 A JPS566236 A JP S566236A JP 8165979 A JP8165979 A JP 8165979A JP 8165979 A JP8165979 A JP 8165979A JP S566236 A JPS566236 A JP S566236A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive material
- compound
- quinone
- diazide compound
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title abstract 7
- -1 quinone compound Chemical class 0.000 abstract 5
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract 2
- 239000003513 alkali Substances 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N para-benzoquinone Natural products O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 abstract 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 abstract 2
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 abstract 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 abstract 1
- 150000004056 anthraquinones Chemical class 0.000 abstract 1
- 150000008365 aromatic ketones Chemical class 0.000 abstract 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 1
- 239000012965 benzophenone Substances 0.000 abstract 1
- 239000003054 catalyst Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- WWBGWPHHLRSTFI-UHFFFAOYSA-N phenalen-1-one Chemical compound C1=CC(C(=O)C=C2)=C3C2=CC=CC3=C1 WWBGWPHHLRSTFI-UHFFFAOYSA-N 0.000 abstract 1
- 230000004304 visual acuity Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8165979A JPS566236A (en) | 1979-06-28 | 1979-06-28 | Photosensitive material and pattern forming method using it |
| US06/164,399 US4356255A (en) | 1979-06-28 | 1980-06-30 | Photosensitive members and a process for forming patterns using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8165979A JPS566236A (en) | 1979-06-28 | 1979-06-28 | Photosensitive material and pattern forming method using it |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS566236A true JPS566236A (en) | 1981-01-22 |
| JPS6249614B2 JPS6249614B2 (ja) | 1987-10-20 |
Family
ID=13752448
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8165979A Granted JPS566236A (en) | 1979-06-28 | 1979-06-28 | Photosensitive material and pattern forming method using it |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4356255A (ja) |
| JP (1) | JPS566236A (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57118238A (en) * | 1981-01-16 | 1982-07-23 | Konishiroku Photo Ind Co Ltd | Positive type photosensitive composition |
| FR2500645A1 (fr) * | 1981-02-20 | 1982-08-27 | Polychrome Corp | Composition sensible aux radiations, element sensible portant un revetement de cette composition et pellicule de reproduction preparee a partir de cet element |
| JPH02269347A (ja) * | 1989-04-10 | 1990-11-02 | Sumitomo Chem Co Ltd | フオトレジスト組成物 |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3110632A1 (de) * | 1981-03-19 | 1982-09-30 | Hoechst Ag, 6000 Frankfurt | Verfahren zum einbrennen von lichtempflindlichen schichten bei der herstellung von druckformen |
| US4377633A (en) * | 1981-08-24 | 1983-03-22 | International Business Machines Corporation | Methods of simultaneous contact and metal lithography patterning |
| JPS58502169A (ja) * | 1981-12-21 | 1983-12-15 | インステイテユ−ト ヒミイ アカデミイ ナウク エスエスエスア−ル | フォト−及び電子線レジスト |
| DE3151078A1 (de) * | 1981-12-23 | 1983-07-28 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung von reliefbildern |
| DE3325023A1 (de) * | 1983-07-11 | 1985-01-24 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden |
| US4626492A (en) * | 1985-06-04 | 1986-12-02 | Olin Hunt Specialty Products, Inc. | Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound |
| US4650745A (en) * | 1985-06-04 | 1987-03-17 | Philip A. Hunt Chemical Corporation | Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development |
| US5286609A (en) * | 1988-11-01 | 1994-02-15 | Yamatoya & Co., Ltd. | Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray |
| CA2001852A1 (en) * | 1988-11-01 | 1990-05-01 | Iwao Numakura | Process and apparatus for the formation of negative resist pattern |
| JPH02124220U (ja) * | 1989-03-23 | 1990-10-12 | ||
| DE4004719A1 (de) * | 1990-02-15 | 1991-08-22 | Hoechst Ag | Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
| US6017661A (en) | 1994-11-09 | 2000-01-25 | Kimberly-Clark Corporation | Temporary marking using photoerasable colorants |
| CA2120838A1 (en) | 1993-08-05 | 1995-02-06 | Ronald Sinclair Nohr | Solid colored composition mutable by ultraviolet radiation |
| US5865471A (en) | 1993-08-05 | 1999-02-02 | Kimberly-Clark Worldwide, Inc. | Photo-erasable data processing forms |
| US5721287A (en) | 1993-08-05 | 1998-02-24 | Kimberly-Clark Worldwide, Inc. | Method of mutating a colorant by irradiation |
| US5645964A (en) | 1993-08-05 | 1997-07-08 | Kimberly-Clark Corporation | Digital information recording media and method of using same |
| US5773182A (en) | 1993-08-05 | 1998-06-30 | Kimberly-Clark Worldwide, Inc. | Method of light stabilizing a colorant |
| US6211383B1 (en) | 1993-08-05 | 2001-04-03 | Kimberly-Clark Worldwide, Inc. | Nohr-McDonald elimination reaction |
| US5700850A (en) | 1993-08-05 | 1997-12-23 | Kimberly-Clark Worldwide | Colorant compositions and colorant stabilizers |
| US5643356A (en) | 1993-08-05 | 1997-07-01 | Kimberly-Clark Corporation | Ink for ink jet printers |
| US5733693A (en) | 1993-08-05 | 1998-03-31 | Kimberly-Clark Worldwide, Inc. | Method for improving the readability of data processing forms |
| US6017471A (en) | 1993-08-05 | 2000-01-25 | Kimberly-Clark Worldwide, Inc. | Colorants and colorant modifiers |
| US5681380A (en) | 1995-06-05 | 1997-10-28 | Kimberly-Clark Worldwide, Inc. | Ink for ink jet printers |
| WO1997001605A1 (en) | 1995-06-28 | 1997-01-16 | Kimberly-Clark Worldwide, Inc. | Novel colorants and colorant modifiers |
| US6242057B1 (en) | 1994-06-30 | 2001-06-05 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition and applications therefor |
| US5685754A (en) * | 1994-06-30 | 1997-11-11 | Kimberly-Clark Corporation | Method of generating a reactive species and polymer coating applications therefor |
| US5739175A (en) | 1995-06-05 | 1998-04-14 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer |
| US6071979A (en) | 1994-06-30 | 2000-06-06 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition method of generating a reactive species and applications therefor |
| US6008268A (en) | 1994-10-21 | 1999-12-28 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition, method of generating a reactive species, and applications therefor |
| US5798015A (en) | 1995-06-05 | 1998-08-25 | Kimberly-Clark Worldwide, Inc. | Method of laminating a structure with adhesive containing a photoreactor composition |
| US5786132A (en) | 1995-06-05 | 1998-07-28 | Kimberly-Clark Corporation | Pre-dyes, mutable dye compositions, and methods of developing a color |
| US5747550A (en) | 1995-06-05 | 1998-05-05 | Kimberly-Clark Worldwide, Inc. | Method of generating a reactive species and polymerizing an unsaturated polymerizable material |
| US5849411A (en) | 1995-06-05 | 1998-12-15 | Kimberly-Clark Worldwide, Inc. | Polymer film, nonwoven web and fibers containing a photoreactor composition |
| DE69609967T2 (de) | 1995-06-05 | 2001-04-12 | Kimberly-Clark Worldwide, Inc. | Farbstoffvorläufer und diese enthaltende zusammensetzungen |
| US5811199A (en) | 1995-06-05 | 1998-09-22 | Kimberly-Clark Worldwide, Inc. | Adhesive compositions containing a photoreactor composition |
| US6099628A (en) | 1996-03-29 | 2000-08-08 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US5782963A (en) | 1996-03-29 | 1998-07-21 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| ATE215588T1 (de) | 1995-11-28 | 2002-04-15 | Kimberly Clark Co | Lichtstabilisierte fabstoffzusammensetzungen |
| US5855655A (en) | 1996-03-29 | 1999-01-05 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US5891229A (en) | 1996-03-29 | 1999-04-06 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US6524379B2 (en) | 1997-08-15 | 2003-02-25 | Kimberly-Clark Worldwide, Inc. | Colorants, colorant stabilizers, ink compositions, and improved methods of making the same |
| JP3796982B2 (ja) * | 1998-06-02 | 2006-07-12 | 住友化学株式会社 | ポジ型レジスト組成物 |
| KR20010022593A (ko) | 1998-06-03 | 2001-03-26 | 로날드 디. 맥크레이 | 신규 광개시제 및 그 이용 |
| WO1999063006A2 (en) | 1998-06-03 | 1999-12-09 | Kimberly-Clark Worldwide, Inc. | Neonanoplasts produced by microemulsion technology and inks for ink jet printing |
| JP2002520470A (ja) | 1998-07-20 | 2002-07-09 | キンバリー クラーク ワールドワイド インコーポレイテッド | 改良されたインクジェットインク組成物 |
| DE69930948T2 (de) | 1998-09-28 | 2006-09-07 | Kimberly-Clark Worldwide, Inc., Neenah | Chelate mit chinoiden gruppen als photoinitiatoren |
| ATE238393T1 (de) | 1999-01-19 | 2003-05-15 | Kimberly Clark Co | Farbstoffe, farbstoffstabilisatoren, tintenzusammensetzungen und verfahren zu deren herstellung |
| US6331056B1 (en) | 1999-02-25 | 2001-12-18 | Kimberly-Clark Worldwide, Inc. | Printing apparatus and applications therefor |
| JP3739227B2 (ja) * | 1999-03-04 | 2006-01-25 | 信越化学工業株式会社 | フォトレジスト材料およびパターン形成方法 |
| US6294698B1 (en) | 1999-04-16 | 2001-09-25 | Kimberly-Clark Worldwide, Inc. | Photoinitiators and applications therefor |
| US6368395B1 (en) | 1999-05-24 | 2002-04-09 | Kimberly-Clark Worldwide, Inc. | Subphthalocyanine colorants, ink compositions, and method of making the same |
| US6486227B2 (en) | 2000-06-19 | 2002-11-26 | Kimberly-Clark Worldwide, Inc. | Zinc-complex photoinitiators and applications therefor |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE441985A (ja) * | 1939-12-27 | |||
| US2694010A (en) * | 1951-11-20 | 1954-11-09 | Gen Aniline & Film Corp | Light-sensitive diazotype layers containing magnesium salts |
| US3567453A (en) * | 1967-12-26 | 1971-03-02 | Eastman Kodak Co | Light sensitive compositions for photoresists and lithography |
| US3984250A (en) * | 1970-02-12 | 1976-10-05 | Eastman Kodak Company | Light-sensitive diazoketone and azide compositions and photographic elements |
| JPS4918809B1 (ja) * | 1970-04-08 | 1974-05-13 | ||
| US3844793A (en) * | 1970-10-19 | 1974-10-29 | American Cyanamid Co | Photosensitive azido material |
| US4164421A (en) * | 1972-12-09 | 1979-08-14 | Fuji Photo Film Co., Ltd. | Photocurable composition containing an o-quinonodiazide for printing plate |
| US4196003A (en) * | 1974-02-01 | 1980-04-01 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinone diazide copying composition |
| US4259430A (en) * | 1974-05-01 | 1981-03-31 | International Business Machines Corporation | Photoresist O-quinone diazide containing composition and resist mask formation process |
| DE2547905C2 (de) * | 1975-10-25 | 1985-11-21 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Aufzeichnungsmaterial |
| DE2847878A1 (de) * | 1978-11-04 | 1980-05-22 | Hoechst Ag | Lichtempfindliches gemisch |
-
1979
- 1979-06-28 JP JP8165979A patent/JPS566236A/ja active Granted
-
1980
- 1980-06-30 US US06/164,399 patent/US4356255A/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57118238A (en) * | 1981-01-16 | 1982-07-23 | Konishiroku Photo Ind Co Ltd | Positive type photosensitive composition |
| JPS6358336B2 (ja) * | 1981-01-16 | 1988-11-15 | Konishiroku Photo Ind | |
| FR2500645A1 (fr) * | 1981-02-20 | 1982-08-27 | Polychrome Corp | Composition sensible aux radiations, element sensible portant un revetement de cette composition et pellicule de reproduction preparee a partir de cet element |
| JPH02269347A (ja) * | 1989-04-10 | 1990-11-02 | Sumitomo Chem Co Ltd | フオトレジスト組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4356255A (en) | 1982-10-26 |
| JPS6249614B2 (ja) | 1987-10-20 |
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