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JPS5511301A - Method of forming fine pattern - Google Patents

Method of forming fine pattern

Info

Publication number
JPS5511301A
JPS5511301A JP6987978A JP6987978A JPS5511301A JP S5511301 A JPS5511301 A JP S5511301A JP 6987978 A JP6987978 A JP 6987978A JP 6987978 A JP6987978 A JP 6987978A JP S5511301 A JPS5511301 A JP S5511301A
Authority
JP
Japan
Prior art keywords
base
ketone
alkyl
fine pattern
isopropenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6987978A
Other languages
Japanese (ja)
Inventor
Tateo Kitamura
Yasuhiro Yoneda
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6987978A priority Critical patent/JPS5511301A/en
Publication of JPS5511301A publication Critical patent/JPS5511301A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To prevent the decrease of film thickness in unexposed part and the lowering of resolution, by prebaking a base coated with a resist consisting of polymethyl-isopropenyl-ketone, exposing it to ionizing radiation and developing it.
CONSTITUTION: A base is coated with a resist consisting of polymethyl-isopropenyl- ketone PMIPK, exposed to ionizing radiation, and developed in a mixed solution consisting of alkyl ketone containing a low-class alkyl base, or monohydric alcohol or dihydric alcohol having alkyl ketone and a low-class alkyl base. By this, it is possible to prevent the decrease of film thickness in unexposed parts and the lowering of resolution.
COPYRIGHT: (C)1980,JPO&Japio
JP6987978A 1978-06-12 1978-06-12 Method of forming fine pattern Pending JPS5511301A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6987978A JPS5511301A (en) 1978-06-12 1978-06-12 Method of forming fine pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6987978A JPS5511301A (en) 1978-06-12 1978-06-12 Method of forming fine pattern

Publications (1)

Publication Number Publication Date
JPS5511301A true JPS5511301A (en) 1980-01-26

Family

ID=13415496

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6987978A Pending JPS5511301A (en) 1978-06-12 1978-06-12 Method of forming fine pattern

Country Status (1)

Country Link
JP (1) JPS5511301A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57155965A (en) * 1981-03-19 1982-09-27 Ajinomoto Co Inc Low-calorie sweetening composition

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5148279A (en) * 1974-09-26 1976-04-24 Ibm

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5148279A (en) * 1974-09-26 1976-04-24 Ibm

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57155965A (en) * 1981-03-19 1982-09-27 Ajinomoto Co Inc Low-calorie sweetening composition
JPH0217146B2 (en) * 1981-03-19 1990-04-19 Ajinomoto Kk

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