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JPS52139375A - Mask for x-ray exposure - Google Patents

Mask for x-ray exposure

Info

Publication number
JPS52139375A
JPS52139375A JP5607776A JP5607776A JPS52139375A JP S52139375 A JPS52139375 A JP S52139375A JP 5607776 A JP5607776 A JP 5607776A JP 5607776 A JP5607776 A JP 5607776A JP S52139375 A JPS52139375 A JP S52139375A
Authority
JP
Japan
Prior art keywords
mask
ray exposure
damages
patterns
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5607776A
Other languages
Japanese (ja)
Inventor
Shinichiro Takasu
Shusuke Kotake
Tetsunori Wada
Sadao Sakurai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5607776A priority Critical patent/JPS52139375A/en
Publication of JPS52139375A publication Critical patent/JPS52139375A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To mask a mask for X-ray exposure of decreased damages in patterns and resist by making the mask in such construction wherein it is buried in a pattern support to reduce the damages of the patterns and covering the bottom surface with a protecting film at the time of contact exposure.
COPYRIGHT: (C)1977,JPO&Japio
JP5607776A 1976-05-18 1976-05-18 Mask for x-ray exposure Pending JPS52139375A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5607776A JPS52139375A (en) 1976-05-18 1976-05-18 Mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5607776A JPS52139375A (en) 1976-05-18 1976-05-18 Mask for x-ray exposure

Publications (1)

Publication Number Publication Date
JPS52139375A true JPS52139375A (en) 1977-11-21

Family

ID=13017010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5607776A Pending JPS52139375A (en) 1976-05-18 1976-05-18 Mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS52139375A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5487223A (en) * 1977-12-23 1979-07-11 Dainippon Printing Co Ltd Mask for soft x rays lithography and its preparation
JPS54142072A (en) * 1978-04-27 1979-11-05 Cho Lsi Gijutsu Kenkyu Kumiai Method of fabricating xxray exposure mask
JPS5552442A (en) * 1978-10-12 1980-04-16 Tsuonguraato Mejiei Tanatsui E Universal building frame construction
JPS5858545A (en) * 1981-10-02 1983-04-07 Nippon Telegr & Teleph Corp <Ntt> X-ray exposure mask and its manufacture
JPS5957433A (en) * 1982-09-27 1984-04-03 Nippon Telegr & Teleph Corp <Ntt> X-ray mask and its manufacture
JPS59193456A (en) * 1983-04-18 1984-11-02 Shuzo Hattori Manufacture of mask for x-ray lithography
JPS62155518A (en) * 1977-12-23 1987-07-10 Dainippon Printing Co Ltd Mask for soft x-ray lithography
WO2021221123A1 (en) * 2020-04-30 2021-11-04 凸版印刷株式会社 Reflective photomask blank and reflective photomask

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5487223A (en) * 1977-12-23 1979-07-11 Dainippon Printing Co Ltd Mask for soft x rays lithography and its preparation
JPH0441487B2 (en) * 1977-12-23 1992-07-08 Dainippon Printing Co Ltd
JPS62155518A (en) * 1977-12-23 1987-07-10 Dainippon Printing Co Ltd Mask for soft x-ray lithography
JPS6045419B2 (en) * 1977-12-23 1985-10-09 大日本印刷株式会社 Soft X-ray lithography mask and its manufacturing method
JPS54142072A (en) * 1978-04-27 1979-11-05 Cho Lsi Gijutsu Kenkyu Kumiai Method of fabricating xxray exposure mask
JPS6139456B2 (en) * 1978-10-12 1986-09-04 Tsuonguraato Mejei Tanatsui Epitoipari Fuararato
JPS5552442A (en) * 1978-10-12 1980-04-16 Tsuonguraato Mejiei Tanatsui E Universal building frame construction
JPS5858545A (en) * 1981-10-02 1983-04-07 Nippon Telegr & Teleph Corp <Ntt> X-ray exposure mask and its manufacture
JPH0115136B2 (en) * 1982-09-27 1989-03-15 Nippon Telegraph & Telephone
JPS5957433A (en) * 1982-09-27 1984-04-03 Nippon Telegr & Teleph Corp <Ntt> X-ray mask and its manufacture
JPS59193456A (en) * 1983-04-18 1984-11-02 Shuzo Hattori Manufacture of mask for x-ray lithography
JPH0427685B2 (en) * 1983-04-18 1992-05-12 Shuzo Hatsutori
WO2021221123A1 (en) * 2020-04-30 2021-11-04 凸版印刷株式会社 Reflective photomask blank and reflective photomask

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