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JPS53135844A - Photochemical etching procee - Google Patents

Photochemical etching procee

Info

Publication number
JPS53135844A
JPS53135844A JP5046377A JP5046377A JPS53135844A JP S53135844 A JPS53135844 A JP S53135844A JP 5046377 A JP5046377 A JP 5046377A JP 5046377 A JP5046377 A JP 5046377A JP S53135844 A JPS53135844 A JP S53135844A
Authority
JP
Japan
Prior art keywords
procee
photochemical etching
etching
photochemical
linearity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5046377A
Other languages
Japanese (ja)
Other versions
JPS6046715B2 (en
Inventor
Tomoaki Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP52050463A priority Critical patent/JPS6046715B2/en
Publication of JPS53135844A publication Critical patent/JPS53135844A/en
Publication of JPS6046715B2 publication Critical patent/JPS6046715B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Holo Graphy (AREA)
  • ing And Chemical Polishing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To improve the linearity of etching depth to exposure amt. and extending difference in etching by exposing both the upper and back sides of a photosensitive material on a transparent substrate.
COPYRIGHT: (C)1978,JPO&Japio
JP52050463A 1977-04-30 1977-04-30 Photochemical etching method Expired JPS6046715B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52050463A JPS6046715B2 (en) 1977-04-30 1977-04-30 Photochemical etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52050463A JPS6046715B2 (en) 1977-04-30 1977-04-30 Photochemical etching method

Publications (2)

Publication Number Publication Date
JPS53135844A true JPS53135844A (en) 1978-11-27
JPS6046715B2 JPS6046715B2 (en) 1985-10-17

Family

ID=12859561

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52050463A Expired JPS6046715B2 (en) 1977-04-30 1977-04-30 Photochemical etching method

Country Status (1)

Country Link
JP (1) JPS6046715B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57190984A (en) * 1981-05-20 1982-11-24 Dainippon Printing Co Ltd Production of hologram
JPH0644181B2 (en) * 1985-02-27 1994-06-08 ヒュ−ズ・エアクラフト・カンパニ− Efficient hologram and method of making the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57190984A (en) * 1981-05-20 1982-11-24 Dainippon Printing Co Ltd Production of hologram
JPH0151191B2 (en) * 1981-05-20 1989-11-01 Dainippon Printing Co Ltd
JPH0644181B2 (en) * 1985-02-27 1994-06-08 ヒュ−ズ・エアクラフト・カンパニ− Efficient hologram and method of making the same

Also Published As

Publication number Publication date
JPS6046715B2 (en) 1985-10-17

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