JPS55127552A - Photosensitive laminate - Google Patents
Photosensitive laminateInfo
- Publication number
- JPS55127552A JPS55127552A JP3521079A JP3521079A JPS55127552A JP S55127552 A JPS55127552 A JP S55127552A JP 3521079 A JP3521079 A JP 3521079A JP 3521079 A JP3521079 A JP 3521079A JP S55127552 A JPS55127552 A JP S55127552A
- Authority
- JP
- Japan
- Prior art keywords
- mixture
- soluble
- layer
- polyamide
- alcohol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 abstract 3
- 239000004952 Polyamide Substances 0.000 abstract 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract 3
- 239000000203 mixture Substances 0.000 abstract 3
- 229920002647 polyamide Polymers 0.000 abstract 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 229920003986 novolac Polymers 0.000 abstract 2
- 239000005011 phenolic resin Substances 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000000243 solution Substances 0.000 abstract 2
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 abstract 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 abstract 1
- 230000001476 alcoholic effect Effects 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 235000019445 benzyl alcohol Nutrition 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000011259 mixed solution Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 229920006267 polyester film Polymers 0.000 abstract 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To enable development and etching by a single treatment after exposure by forming an organic covering layer composed of alcohol-soluble polyamide and alkali-soluble resin and a photosensitive photoresist layer on a support in order.
CONSTITUTION: A biaxially-oriented polyester film or the like is coated with a mixed solution of alcohol-soluble linear polyamide, a mixture thereof, a methylol derivative of polyamide or the like and alkali-soluble resin such as novolak type phenol resin or styrene-maleic anhydride copolymer to form a covering layer. This layer is further coated with a solution of novolak type phenol resin, an o-quinone diazide compound or the like or a mixture thereof and dried to form a photosensitive layer. By imagewise exposing the resulting photosensitive laminate and treating it with an alcoholic aqueous alkali solution such as a mixture of NaOH and benzyl alcohol development and etching are accomplished by a single treatment. Thus, a material suitable for use in printing master formation, etc. is obtained easily.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3521079A JPS55127552A (en) | 1979-03-26 | 1979-03-26 | Photosensitive laminate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3521079A JPS55127552A (en) | 1979-03-26 | 1979-03-26 | Photosensitive laminate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55127552A true JPS55127552A (en) | 1980-10-02 |
| JPS6316727B2 JPS6316727B2 (en) | 1988-04-11 |
Family
ID=12435474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3521079A Granted JPS55127552A (en) | 1979-03-26 | 1979-03-26 | Photosensitive laminate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55127552A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57105735A (en) * | 1980-12-23 | 1982-07-01 | Daicel Chem Ind Ltd | Photosensitive image-forming material |
| JPS638735A (en) * | 1986-06-30 | 1988-01-14 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin plate for pattern formation |
| JPH02132443A (en) * | 1987-11-02 | 1990-05-21 | Matsushita Electric Ind Co Ltd | Pattern forming material |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0225115A (en) * | 1988-07-14 | 1990-01-26 | Fuji Electric Co Ltd | Analog-digital converter |
-
1979
- 1979-03-26 JP JP3521079A patent/JPS55127552A/en active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57105735A (en) * | 1980-12-23 | 1982-07-01 | Daicel Chem Ind Ltd | Photosensitive image-forming material |
| JPS638735A (en) * | 1986-06-30 | 1988-01-14 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin plate for pattern formation |
| JPH02132443A (en) * | 1987-11-02 | 1990-05-21 | Matsushita Electric Ind Co Ltd | Pattern forming material |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6316727B2 (en) | 1988-04-11 |
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