HK1193879A1 - 曝光設備和曝光方法 - Google Patents

曝光設備和曝光方法

Info

Publication number: HK1193879A1
Authority: HK; Hong Kong
Prior art keywords: exposure; exposure apparatus; exposure method
Prior art date: 2006-08-31

Application number

HK14107076.6A

Other languages

English (en)

Inventor

Yuichi Shibazaki

Original Assignee

Nikon Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2006-08-31

Filing date

2014-07-11

Publication date

2014-10-03

2014-07-11 Application filed by Nikon Corp filed Critical Nikon Corp

2014-10-03 Publication of HK1193879A1 publication Critical patent/HK1193879A1/zh

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70681—Metrology strategies
- G03F7/70683—Mark designs
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/706835—Metrology information management or control
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/706843—Metrology apparatus
- G03F7/706845—Calibration, e.g. tool-to-tool calibration, beam alignment, spot position or focus
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7019—Calibration
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Multimedia (AREA)
Manufacturing & Machinery (AREA)
Computer Hardware Design (AREA)
Microelectronics & Electronic Packaging (AREA)
Power Engineering (AREA)
Condensed Matter Physics & Semiconductors (AREA)
Epidemiology (AREA)
Environmental & Geological Engineering (AREA)
Health & Medical Sciences (AREA)
Public Health (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Length Measuring Devices By Optical Means (AREA)
Optical Transform (AREA)

HK14107076.6A 2006-08-31 2014-07-11 曝光設備和曝光方法 HK1193879A1 (zh)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP2006237045		2006-08-31
JP2006237606		2006-09-01
JP2006237491		2006-09-01

Publications (1)

Publication Number	Publication Date
HK1193879A1 true HK1193879A1 (zh)	2014-10-03

Family

ID=39136023

Family Applications (10)

Application Number	Title	Priority Date	Filing Date
HK09108556.0A HK1130944A1 (zh)	2006-08-31	2009-09-18	曝光裝置、曝光方法、以及設備製造方法
HK12109422.5A HK1168662A1 (zh)	2006-08-31	2012-09-25	曝光方法和裝置、以及組件製造方法
HK12110558.9A HK1169863A1 (zh)	2006-08-31	2012-10-24	移動體驅動方法和移動體驅動系統、以及曝光方法和裝置
HK14107076.6A HK1193879A1 (zh)	2006-08-31	2014-07-11	曝光設備和曝光方法
HK16106083.7A HK1218184A1 (zh)	2006-08-31	2016-05-30	移動體驅動方法和移動體驅動系統、圖案形成方法和裝置、曝光方法和裝置、以及組件製造方法
HK16106141.7A HK1218187A1 (zh)	2006-08-31	2016-05-31	可移動體驅動方法和可移動體驅動系統、模式形成方法和裝置、曝光方法和裝置以及設備製造方法
HK16112134.4A HK1224021A1 (zh)	2006-08-31	2016-10-20	曝光裝置，曝光方法和器件製造方法
HK16112168.3A HK1224022A1 (zh)	2006-08-31	2016-10-24	曝光裝置、曝光方法和設備製造方法
HK18107772.9A HK1248325B (zh)	2006-08-31	2018-06-15	曝光設備、曝光方法以及裝置製造方法
HK19101492.0A HK1259005A1 (zh)	2006-08-31	2019-01-29	曝光設備、曝光方法以及裝置製造方法

Family Applications Before (3)

Application Number	Title	Priority Date	Filing Date
HK09108556.0A HK1130944A1 (zh)	2006-08-31	2009-09-18	曝光裝置、曝光方法、以及設備製造方法
HK12109422.5A HK1168662A1 (zh)	2006-08-31	2012-09-25	曝光方法和裝置、以及組件製造方法
HK12110558.9A HK1169863A1 (zh)	2006-08-31	2012-10-24	移動體驅動方法和移動體驅動系統、以及曝光方法和裝置

Family Applications After (6)

Application Number	Title	Priority Date	Filing Date
HK16106083.7A HK1218184A1 (zh)	2006-08-31	2016-05-30	移動體驅動方法和移動體驅動系統、圖案形成方法和裝置、曝光方法和裝置、以及組件製造方法
HK16106141.7A HK1218187A1 (zh)	2006-08-31	2016-05-31	可移動體驅動方法和可移動體驅動系統、模式形成方法和裝置、曝光方法和裝置以及設備製造方法
HK16112134.4A HK1224021A1 (zh)	2006-08-31	2016-10-20	曝光裝置，曝光方法和器件製造方法
HK16112168.3A HK1224022A1 (zh)	2006-08-31	2016-10-24	曝光裝置、曝光方法和設備製造方法
HK18107772.9A HK1248325B (zh)	2006-08-31	2018-06-15	曝光設備、曝光方法以及裝置製造方法
HK19101492.0A HK1259005A1 (zh)	2006-08-31	2019-01-29	曝光設備、曝光方法以及裝置製造方法

Country Status (9)

Country	Link
US (6)	US20080094592A1 (zh)
EP (8)	EP2991101B1 (zh)
JP (13)	JP5035245B2 (zh)
KR (14)	KR101585370B1 (zh)
CN (3)	CN102520588B (zh)
HK (10)	HK1130944A1 (zh)
SG (2)	SG10201407395SA (zh)
TW (8)	TWI602032B (zh)
WO (1)	WO2008026742A1 (zh)

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KR101565272B1 (ko) *	2006-08-31	2015-11-02	가부시키가이샤 니콘	이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
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Publication number	Publication date
EP2065920A4 (en)	2014-05-14
JP6143138B2 (ja)	2017-06-07
TW201802615A (zh)	2018-01-16
JP2016128929A (ja)	2016-07-14
KR20170007549A (ko)	2017-01-18
KR101711323B1 (ko)	2017-02-28
CN101405840B (zh)	2012-01-18
HK1224021A1 (zh)	2017-08-11
US10353301B2 (en)	2019-07-16
KR20160006805A (ko)	2016-01-19
EP3418807A1 (en)	2018-12-26
KR20180011878A (ko)	2018-02-02
CN102520588B (zh)	2014-10-15
JP6029037B2 (ja)	2016-11-24
JP6143125B2 (ja)	2017-06-07
US20180246421A1 (en)	2018-08-30
JP6143122B2 (ja)	2017-06-07
US9958792B2 (en)	2018-05-01
JP5999392B2 (ja)	2016-09-28
KR20130105910A (ko)	2013-09-26
JP2016106254A (ja)	2016-06-16
KR101670638B1 (ko)	2016-11-09
TW201614391A (en)	2016-04-16
CN102520588A (zh)	2012-06-27
TWI594083B (zh)	2017-08-01
EP2991101B1 (en)	2017-04-12
JP2016028285A (ja)	2016-02-25
US20190004440A1 (en)	2019-01-03
TW201614392A (en)	2016-04-16
EP2991101A3 (en)	2016-04-20
JP2015109457A (ja)	2015-06-11
HK1218187A1 (zh)	2017-02-03
KR20140098829A (ko)	2014-08-08
HK1169863A1 (zh)	2013-02-08
KR101585370B1 (ko)	2016-01-14
KR101400615B1 (ko)	2014-05-27
WO2008026742A1 (fr)	2008-03-06
US20190011843A1 (en)	2019-01-10
US20080094592A1 (en)	2008-04-24
JP2013258418A (ja)	2013-12-26
JP5729578B2 (ja)	2015-06-03
KR20130105909A (ko)	2013-09-26
KR101477448B1 (ko)	2014-12-29
EP2991101A2 (en)	2016-03-02
KR20150008897A (ko)	2015-01-23
EP2065920A1 (en)	2009-06-03
EP3312676A1 (en)	2018-04-25
KR101933360B1 (ko)	2018-12-27
KR20160006238A (ko)	2016-01-18
KR20150008898A (ko)	2015-01-23
EP3067748A1 (en)	2016-09-14
KR20150092342A (ko)	2015-08-12
HK1259005A1 (zh)	2019-11-22
CN101405840A (zh)	2009-04-08
TW201403263A (zh)	2014-01-16
JP2018041090A (ja)	2018-03-15
KR101670639B1 (ko)	2016-10-28
HK1168662A1 (zh)	2013-01-04
KR20090045885A (ko)	2009-05-08
EP2738608B9 (en)	2016-08-17
EP3064999B1 (en)	2017-07-26
JP2012147026A (ja)	2012-08-02
JP6508285B2 (ja)	2019-05-08
CN102520589A (zh)	2012-06-27
KR101565275B1 (ko)	2015-11-02
KR101824374B1 (ko)	2018-01-31
KR20160006804A (ko)	2016-01-19
HK1248325B (zh)	2020-04-09
US20140049759A1 (en)	2014-02-20
US20140049758A1 (en)	2014-02-20
JP5522489B2 (ja)	2014-06-18
TWI653511B (zh)	2019-03-11
KR20160006237A (ko)	2016-01-18
JP2012138621A (ja)	2012-07-19
EP3312676B1 (en)	2019-05-15
JP5686164B2 (ja)	2015-03-18
JP2017010043A (ja)	2017-01-12
JP2016027414A (ja)	2016-02-18
KR20180137600A (ko)	2018-12-27
US10338482B2 (en)	2019-07-02
EP2993688B1 (en)	2017-04-05
CN102520589B (zh)	2015-07-15
TW201403262A (zh)	2014-01-16
EP2065920B1 (en)	2016-07-06
JPWO2008026742A1 (ja)	2010-01-21
KR101698291B1 (ko)	2017-02-01
EP2738608B1 (en)	2016-06-01
HK1224022A1 (zh)	2017-08-11
SG10201407395SA (en)	2014-12-30
JP2014199933A (ja)	2014-10-23
JP5035245B2 (ja)	2012-09-26
KR101409011B1 (ko)	2014-06-18
JP2015179290A (ja)	2015-10-08
TWI649631B (zh)	2019-02-01
HK1218184A1 (zh)	2017-02-03
TWI537687B (zh)	2016-06-11
TW201614393A (en)	2016-04-16
EP2738608A1 (en)	2014-06-04
KR101645909B1 (ko)	2016-08-12
EP2993688A2 (en)	2016-03-09
HK1130944A1 (zh)	2010-01-08
JP5522488B2 (ja)	2014-06-18
TW201631409A (zh)	2016-09-01
JP6241632B2 (ja)	2017-12-06
TW200830055A (en)	2008-07-16
EP3064999A1 (en)	2016-09-07
TWI416269B (zh)	2013-11-21
EP2993688A3 (en)	2016-04-20
TWI602032B (zh)	2017-10-11
JP6339599B2 (ja)	2018-06-06
TWI596444B (zh)	2017-08-21
KR101529845B1 (ko)	2015-06-17
TWI529501B (zh)	2016-04-11
EP3067748B1 (en)	2017-12-20
SG174091A1 (en)	2011-09-29
US10353302B2 (en)	2019-07-16
US9983486B2 (en)	2018-05-29

Publication	Publication Date	Title
HK1252345A1 (zh)	2019-05-24	曝光裝置和曝光方法
HK1193879A1 (zh)	2014-10-03	曝光設備和曝光方法
HK1197695A1 (zh)	2015-02-06	曝光裝置與曝光方法
HK1220516A1 (zh)	2017-05-05	曝光裝置與曝光方法
TWI348596B (en)	2011-09-11	Exposure apparatus and method
HK1199771A1 (zh)	2015-07-17	曝光裝置和方法
TWI317807B (en)	2009-12-01	Positioning apparatus and method
HK1127961A1 (en)	2009-10-09	Exposure apparatus and device manufacturing method
GB0625526D0 (en)	2007-01-31	Apparatus and method
GB2438875B (en)	2009-04-15	Photo apparatus and method
EP1993121A4 (en)	2011-12-07	EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD
GB0616555D0 (en)	2006-09-27	Apparatus and method
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EP2092454A4 (en)	2013-06-19	METHOD AND DEVICE FOR GEOMODELL SHARING
GB2442608B (en)	2009-03-11	Apparatus and method
TWI347597B (en)	2011-08-21	Recording-and-reproducing apparatus and content-managing method
GB0623475D0 (en)	2007-01-03	Imaging method and apparatus
GB0701010D0 (en)	2007-02-28	Method and apparatus
GB0615752D0 (en)	2006-09-20	Method and apparatus
GB0609349D0 (en)	2006-06-21	Method and apparatus
GB2437303B (en)	2008-04-09	Fixing apparatus and method
GB0618942D0 (en)	2006-11-08	Apparatus and method
GB0704868D0 (en)	2007-04-18	Method and apparatus
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