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FI955395A - Shottky-kynnysjännitediodi - Google Patents

Shottky-kynnysjännitediodi Download PDF

Info

Publication number
FI955395A
FI955395A FI955395A FI955395A FI955395A FI 955395 A FI955395 A FI 955395A FI 955395 A FI955395 A FI 955395A FI 955395 A FI955395 A FI 955395A FI 955395 A FI955395 A FI 955395A
Authority
FI
Finland
Prior art keywords
schottky barrier
barrier diode
diode
schottky
barrier
Prior art date
Application number
FI955395A
Other languages
English (en)
Swedish (sv)
Other versions
FI955395A0 (fi
Inventor
Tomoyasu Miyata
Koichi Sakamoto
Katsutoshi Toyama
Masaaki Sueyoshi
Original Assignee
Murata Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co filed Critical Murata Manufacturing Co
Publication of FI955395A0 publication Critical patent/FI955395A0/fi
Publication of FI955395A publication Critical patent/FI955395A/fi

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/103Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
    • H10D62/104Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices having particular shapes of the bodies at or near reverse-biased junctions, e.g. having bevels or moats
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/111Field plates
    • H10D64/117Recessed field plates, e.g. trench field plates or buried field plates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • H10D8/60Schottky-barrier diodes 
FI955395A 1994-11-11 1995-11-09 Shottky-kynnysjännitediodi FI955395A (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6278035A JPH08139341A (ja) 1994-11-11 1994-11-11 ショットキ−バリアダイオ−ド

Publications (2)

Publication Number Publication Date
FI955395A0 FI955395A0 (fi) 1995-11-09
FI955395A true FI955395A (fi) 1996-05-12

Family

ID=17591746

Family Applications (1)

Application Number Title Priority Date Filing Date
FI955395A FI955395A (fi) 1994-11-11 1995-11-09 Shottky-kynnysjännitediodi

Country Status (4)

Country Link
EP (1) EP0712167A3 (fi)
JP (1) JPH08139341A (fi)
KR (1) KR100212203B1 (fi)
FI (1) FI955395A (fi)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0964381A (ja) * 1995-08-25 1997-03-07 Murata Mfg Co Ltd ショットキーバリアダイオード
KR101072992B1 (ko) 2004-12-30 2011-10-12 매그나칩 반도체 유한회사 쇼트키 다이오드 및 그 형성 방법
CN101542736A (zh) * 2007-03-26 2009-09-23 住友电气工业株式会社 肖特基势垒二极管及其产生方法
JP2009194225A (ja) * 2008-02-15 2009-08-27 Sumitomo Electric Ind Ltd ショットキバリアダイオード、及びショットキバリアダイオードを作製する方法
KR101461886B1 (ko) 2013-09-10 2014-11-13 현대자동차 주식회사 쇼트키 배리어 다이오드 및 그 제조 방법
KR102099438B1 (ko) * 2013-10-07 2020-04-09 엘지이노텍 주식회사 반도체 소자
JP6344264B2 (ja) * 2015-02-27 2018-06-20 豊田合成株式会社 半導体装置およびその製造方法
JP6260553B2 (ja) * 2015-02-27 2018-01-17 豊田合成株式会社 半導体装置およびその製造方法
JP2017139289A (ja) * 2016-02-02 2017-08-10 トヨタ自動車株式会社 ダイオード
JP2018037585A (ja) 2016-09-02 2018-03-08 豊田合成株式会社 半導体装置およびその製造方法
CN111129165B (zh) * 2019-12-05 2023-11-28 中国电子科技集团公司第十三研究所 肖特基二极管及其制备方法
CN111129164B (zh) * 2019-12-05 2023-09-26 中国电子科技集团公司第十三研究所 肖特基二极管及其制备方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55128879A (en) * 1979-03-27 1980-10-06 Nec Corp Semiconductor device
CA2064146C (en) * 1991-03-28 1997-08-12 Hisashi Ariyoshi Schottky barrier diode and a method of manufacturing thereof
US5365102A (en) * 1993-07-06 1994-11-15 North Carolina State University Schottky barrier rectifier with MOS trench

Also Published As

Publication number Publication date
EP0712167A2 (en) 1996-05-15
JPH08139341A (ja) 1996-05-31
EP0712167A3 (en) 1996-07-31
FI955395A0 (fi) 1995-11-09
KR960019807A (ko) 1996-06-17
KR100212203B1 (ko) 1999-08-02

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