ES2189048T3 - Elemento fotovoltaico y metodo de produccion del mismo. - Google Patents
Elemento fotovoltaico y metodo de produccion del mismo.Info
- Publication number
- ES2189048T3 ES2189048T3 ES98114310T ES98114310T ES2189048T3 ES 2189048 T3 ES2189048 T3 ES 2189048T3 ES 98114310 T ES98114310 T ES 98114310T ES 98114310 T ES98114310 T ES 98114310T ES 2189048 T3 ES2189048 T3 ES 2189048T3
- Authority
- ES
- Spain
- Prior art keywords
- type
- pin
- photovoltaic element
- union
- microcrystalline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/162—Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
- H10F77/164—Polycrystalline semiconductors
- H10F77/1642—Polycrystalline semiconductors including only Group IV materials
- H10F77/1645—Polycrystalline semiconductors including only Group IV materials including microcrystalline silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/17—Photovoltaic cells having only PIN junction potential barriers
- H10F10/172—Photovoltaic cells having only PIN junction potential barriers comprising multiple PIN junctions, e.g. tandem cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
- H10F71/1215—The active layers comprising only Group IV materials comprising at least two Group IV elements, e.g. SiGe
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/137—Batch treatment of the devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/162—Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
- H10F77/164—Polycrystalline semiconductors
- H10F77/1642—Polycrystalline semiconductors including only Group IV materials
- H10F77/1648—Polycrystalline semiconductors including only Group IV materials including microcrystalline Group IV-IV materials, e.g. microcrystalline SiGe
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/545—Microcrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
Abstract
LA PRESENTE INVENCION SE REFIERE A UN ELEMENTO FOTOVOLTAICO QUE TIENE VARIAS UNIONES ''PIN'', CADA UNA FORMADA POR UNA CAPA DE SEMICONDUCTOR TIPO K, UNA DE SEMICONDUCTOR TIPO I, Y UNA CAPA DE SEMICONDUCTOR TIPO N, COMPRENDIENDO CADA UNA UN MATERIAL NO MONOCRISTALINO QUE COMPRENDE UN ELEMENTO DEL GRUPO IV COMO COMPONENTE PRINCIPAL, TENIENDO EL ELEMENTO FOTOVOLTAICO UNA PRIMERA UNION ''PIN'' QUE COMPRENDE CARBURO DE SILICIO MICROCRISTALINO (EN LO SUCESIVO REFERIDO COMO SIC MICROCRISTALINO) COMO COMPONENTE PRINCIPAL DE LA CAPA DE SEMICONDUCTOR TIPO I Y UNA SEGUNDA UNION DE ''PIN'' QUE COMPRENDE SILICIO MICROCRISTALINO (EN LO SUCESIVO REFERIDO COMO SI MICROCRISTALINO) COMO COMPONENTE PRINCIPAL DE LA CAPA DE SEMICONDUCTOR TIPO I, CARACTERIZADO PORQUE LA PRIMERA UNION DE ''PIN'' SE PROPORCIONA MAS PROXIMA AL LADO DE LA INCIDENCIA DE LA LUZ QUE LA SEGUNDA UNION ''PIN''. CON LA PRESENTE INVENCION SE OBTIENE UN ELEMENTO FOTOVOLTAICO DE BAJO COSTE, CON POCO FOTODETERIORO Y CON UN ALTO RENDIMIENTO, DE CONVERSION FOTOELECTRICA Y UN METODO DE OBTENCION DEL ELEMENTO FOTOVOLTAICO CAPAZ DE CONFORMAR SILICIO MICROCRISTALINO DE TIPO I Y SIC MICROCRISTALINO A UNA TASA DE DEPOSICION FACTIBLE.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9208131A JPH1154773A (ja) | 1997-08-01 | 1997-08-01 | 光起電力素子及びその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2189048T3 true ES2189048T3 (es) | 2003-07-01 |
Family
ID=16551156
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES98114310T Expired - Lifetime ES2189048T3 (es) | 1997-08-01 | 1998-07-30 | Elemento fotovoltaico y metodo de produccion del mismo. |
Country Status (8)
Country | Link |
---|---|
US (2) | US6166319A (es) |
EP (2) | EP1255304A3 (es) |
JP (1) | JPH1154773A (es) |
KR (1) | KR100374263B1 (es) |
CN (1) | CN1140933C (es) |
AU (1) | AU734676B2 (es) |
DE (1) | DE69811010T2 (es) |
ES (1) | ES2189048T3 (es) |
Families Citing this family (132)
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---|---|---|---|---|
US7907319B2 (en) * | 1995-11-06 | 2011-03-15 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light with optical compensation |
JPH1154773A (ja) * | 1997-08-01 | 1999-02-26 | Canon Inc | 光起電力素子及びその製造方法 |
JP4208281B2 (ja) | 1998-02-26 | 2009-01-14 | キヤノン株式会社 | 積層型光起電力素子 |
US8928967B2 (en) | 1998-04-08 | 2015-01-06 | Qualcomm Mems Technologies, Inc. | Method and device for modulating light |
KR100703140B1 (ko) | 1998-04-08 | 2007-04-05 | 이리다임 디스플레이 코포레이션 | 간섭 변조기 및 그 제조 방법 |
WO2003007049A1 (en) | 1999-10-05 | 2003-01-23 | Iridigm Display Corporation | Photonic mems and structures |
US6858308B2 (en) * | 2001-03-12 | 2005-02-22 | Canon Kabushiki Kaisha | Semiconductor element, and method of forming silicon-based film |
EP1503427A4 (en) * | 2002-04-09 | 2011-09-28 | Kaneka Corp | PROCESS FOR MANUFACTURING THIN FILM PHOTOELECTRIC CONVERTER IN TANDEM |
EP1361437A1 (en) * | 2002-05-07 | 2003-11-12 | Centre National De La Recherche Scientifique (Cnrs) | A novel biological cancer marker and methods for determining the cancerous or non-cancerous phenotype of cells |
US20050233091A1 (en) * | 2002-05-08 | 2005-10-20 | Devendra Kumar | Plasma-assisted coating |
BR0309813A (pt) * | 2002-05-08 | 2005-03-01 | Dana Corp | Sistemas e método de união de pelo menos uma primeira área de junção de uma primeira parte a uma segunda área de junção de uma segunda parte |
US7494904B2 (en) * | 2002-05-08 | 2009-02-24 | Btu International, Inc. | Plasma-assisted doping |
US20060228497A1 (en) * | 2002-05-08 | 2006-10-12 | Satyendra Kumar | Plasma-assisted coating |
US20060233682A1 (en) * | 2002-05-08 | 2006-10-19 | Cherian Kuruvilla A | Plasma-assisted engine exhaust treatment |
US7560657B2 (en) * | 2002-05-08 | 2009-07-14 | Btu International Inc. | Plasma-assisted processing in a manufacturing line |
CN1278874C (zh) * | 2002-05-08 | 2006-10-11 | 雷恩哈德库兹两合公司 | 装饰三维的大的塑料物体的方法 |
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US7498066B2 (en) * | 2002-05-08 | 2009-03-03 | Btu International Inc. | Plasma-assisted enhanced coating |
US7497922B2 (en) * | 2002-05-08 | 2009-03-03 | Btu International, Inc. | Plasma-assisted gas production |
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US7432470B2 (en) | 2002-05-08 | 2008-10-07 | Btu International, Inc. | Surface cleaning and sterilization |
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US20060057016A1 (en) * | 2002-05-08 | 2006-03-16 | Devendra Kumar | Plasma-assisted sintering |
US7189940B2 (en) | 2002-12-04 | 2007-03-13 | Btu International Inc. | Plasma-assisted melting |
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JP2005005639A (ja) * | 2003-06-16 | 2005-01-06 | Canon Inc | 太陽電池素子の光電変換特性の測定方法及び測定装置 |
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WO2006127037A2 (en) * | 2004-11-05 | 2006-11-30 | Dana Corporation | Atmospheric pressure processing using microwave-generated plasmas |
DE102005010790A1 (de) * | 2005-03-09 | 2006-09-14 | Basf Ag | Photovoltaische Zelle mit einem darin enthaltenen photovoltaisch aktiven Halbleitermaterial |
JP2007180364A (ja) * | 2005-12-28 | 2007-07-12 | Mitsubishi Heavy Ind Ltd | 光電変換素子及びその製造方法並びに薄膜形成装置 |
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US8017860B2 (en) | 2006-05-15 | 2011-09-13 | Stion Corporation | Method and structure for thin film photovoltaic materials using bulk semiconductor materials |
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1997
- 1997-08-01 JP JP9208131A patent/JPH1154773A/ja active Pending
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1998
- 1998-07-28 US US09/123,329 patent/US6166319A/en not_active Expired - Lifetime
- 1998-07-30 EP EP02017307A patent/EP1255304A3/en not_active Withdrawn
- 1998-07-30 DE DE69811010T patent/DE69811010T2/de not_active Expired - Lifetime
- 1998-07-30 ES ES98114310T patent/ES2189048T3/es not_active Expired - Lifetime
- 1998-07-30 EP EP98114310A patent/EP0895291B1/en not_active Expired - Lifetime
- 1998-07-31 CN CNB981179509A patent/CN1140933C/zh not_active Expired - Fee Related
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- 1998-08-01 KR KR10-1998-0031439A patent/KR100374263B1/ko not_active IP Right Cessation
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EP0895291A2 (en) | 1999-02-03 |
EP0895291A3 (en) | 1999-12-15 |
CN1213861A (zh) | 1999-04-14 |
EP1255304A3 (en) | 2003-10-01 |
CN1140933C (zh) | 2004-03-03 |
JPH1154773A (ja) | 1999-02-26 |
DE69811010T2 (de) | 2003-07-31 |
AU734676B2 (en) | 2001-06-21 |
US6166319A (en) | 2000-12-26 |
EP0895291B1 (en) | 2003-01-29 |
EP1255304A2 (en) | 2002-11-06 |
DE69811010D1 (de) | 2003-03-06 |
KR100374263B1 (ko) | 2003-04-21 |
KR19990023298A (ko) | 1999-03-25 |
US6383576B1 (en) | 2002-05-07 |
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