DE69435160D1 - Farbfilter - Google Patents
FarbfilterInfo
- Publication number
- DE69435160D1 DE69435160D1 DE69435160T DE69435160T DE69435160D1 DE 69435160 D1 DE69435160 D1 DE 69435160D1 DE 69435160 T DE69435160 T DE 69435160T DE 69435160 T DE69435160 T DE 69435160T DE 69435160 D1 DE69435160 D1 DE 69435160D1
- Authority
- DE
- Germany
- Prior art keywords
- color filter
- substrate
- resin layer
- colored portions
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/52—Macromolecular coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
- B41M3/003—Printing processes to produce particular kinds of printed work, e.g. patterns on optical devices, e.g. lens elements; for the production of optical devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M7/00—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
- B41M7/0045—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using protective coatings or film forming compositions cured by mechanical wave energy, e.g. ultrasonics, cured by electromagnetic radiation or waves, e.g. ultraviolet radiation, electron beams, or cured by magnetic or electric fields, e.g. electric discharge, plasma
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M7/00—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
- B41M7/0054—After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using protective coatings or film forming compositions cured by thermal means, e.g. infrared radiation, heat
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/09—Ink jet technology used for manufacturing optical filters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/52—Macromolecular coatings
- B41M5/5227—Macromolecular coatings characterised by organic non-macromolecular additives, e.g. UV-absorbers, plasticisers, surfactants
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/52—Macromolecular coatings
- B41M5/5254—Macromolecular coatings characterised by the use of polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Liquid Crystal Substances (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29339593 | 1993-11-24 | ||
JP32213393 | 1993-12-21 | ||
JP15087094 | 1994-07-01 | ||
JP15087494 | 1994-07-01 | ||
JP22004994 | 1994-09-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69435160D1 true DE69435160D1 (de) | 2008-12-11 |
Family
ID=27527933
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69432824T Expired - Lifetime DE69432824T2 (de) | 1993-11-24 | 1994-11-23 | Verfahren zur Herstellung eines Farbfilters und eines Flüssigkristall-Schirms |
DE69429969T Expired - Lifetime DE69429969T2 (de) | 1993-11-24 | 1994-11-23 | Verfahren zur Herstellung eines Farbfilters bzw. eines Flüssigkristallschirms |
DE69435160T Expired - Lifetime DE69435160D1 (de) | 1993-11-24 | 1994-11-23 | Farbfilter |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69432824T Expired - Lifetime DE69432824T2 (de) | 1993-11-24 | 1994-11-23 | Verfahren zur Herstellung eines Farbfilters und eines Flüssigkristall-Schirms |
DE69429969T Expired - Lifetime DE69429969T2 (de) | 1993-11-24 | 1994-11-23 | Verfahren zur Herstellung eines Farbfilters bzw. eines Flüssigkristallschirms |
Country Status (6)
Country | Link |
---|---|
US (2) | US5716740A (de) |
EP (3) | EP0942327B1 (de) |
KR (1) | KR0173149B1 (de) |
AT (3) | ATE412923T1 (de) |
DE (3) | DE69432824T2 (de) |
TW (1) | TW417034B (de) |
Families Citing this family (87)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6686104B1 (en) * | 1993-11-24 | 2004-02-03 | Canon Kabushiki Kaisha | Color filter, method for manufacturing it, and liquid crystal panel |
DE69523351T2 (de) * | 1994-01-28 | 2002-05-02 | Canon K.K., Tokio/Tokyo | Farbfilter, Verfahren zu seiner Herstellung, und Flüssigkristalltafel |
TW426806B (en) * | 1994-05-18 | 2001-03-21 | Toshiba Corp | Fabricating method of liquid crystal display apparatus |
JP3014923B2 (ja) * | 1994-06-24 | 2000-02-28 | キヤノン株式会社 | カラーフィルターおよびその製造方法ならびにそのフィルターを用いた液晶表示装置 |
JPH08227011A (ja) * | 1994-09-30 | 1996-09-03 | Canon Inc | カラーフィルタ、その製造方法、液晶パネル、及びこれを備えた情報処理装置 |
US5736278A (en) * | 1995-06-20 | 1998-04-07 | Canon Kabushiki Kaisha | Color filter having light screening resin layer and filter resin layer |
JP3133949B2 (ja) | 1995-08-25 | 2001-02-13 | キヤノン株式会社 | カラーフィルタの製造方法及び製造装置 |
JPH09171953A (ja) * | 1995-12-20 | 1997-06-30 | Sony Corp | 基板加熱装置、基板加熱方法および半導体集積回路装置、フォトマスクならびに液晶表示装置 |
EP0855614A4 (de) * | 1996-05-15 | 2001-12-19 | Seiko Epson Corp | Dünnfilmbauelement mit beschichtungsfilm, flüssigkristallfeld, elektronikvorrichtung und herstellungsmethode des dünnfilmbauelements |
DE69735022T2 (de) * | 1996-09-19 | 2006-08-10 | Seiko Epson Corp. | Verfahren zur Herstellung einer Matrixanzeigevorrichtung |
US20020075422A1 (en) * | 1996-09-19 | 2002-06-20 | Seiko Epson Corporation | Matrix type display device and manufacturing method thereof |
US5956487A (en) * | 1996-10-25 | 1999-09-21 | Hewlett-Packard Company | Embedding web access mechanism in an appliance for user interface functions including a web server and web browser |
WO1998019188A1 (fr) * | 1996-10-30 | 1998-05-07 | Seiko Epson Corporation | Filtre colore et son procede de fabrication |
JP3899566B2 (ja) | 1996-11-25 | 2007-03-28 | セイコーエプソン株式会社 | 有機el表示装置の製造方法 |
JP3106110B2 (ja) * | 1997-03-17 | 2000-11-06 | キヤノン株式会社 | カラーフィルタの製造方法及び製造装置及び表示装置の製造方法 |
JP3302296B2 (ja) * | 1997-05-30 | 2002-07-15 | キヤノン株式会社 | カラーフィルタの製造方法 |
JPH10332925A (ja) * | 1997-06-02 | 1998-12-18 | Canon Inc | カラーフィルタ基板とその製造方法、該基板を用いた液晶素子 |
US5948577A (en) * | 1997-06-02 | 1999-09-07 | Canon Kabushiki Kaisha | Color filter substrate, liquid crystal display device using the same and method of manufacturing color filter substrate |
JPH112716A (ja) * | 1997-06-13 | 1999-01-06 | Canon Inc | カラーフィルタ、これを用いた液晶素子及びこれらの製造方法、並びに該製造方法に用いられるインクジェット用インク |
DE69841947D1 (de) * | 1997-08-08 | 2010-11-25 | Dainippon Printing Co Ltd | Verfahren zur Herstellung einer Linse |
JP3332822B2 (ja) * | 1997-09-05 | 2002-10-07 | キヤノン株式会社 | カラーフィルタ基板の製造方法 |
JP3559697B2 (ja) * | 1997-12-01 | 2004-09-02 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
JP2000009916A (ja) | 1998-06-18 | 2000-01-14 | Canon Inc | カラーフィルタ、液晶パネル、コンピュータ及びカラーフィルタの製造方法 |
GB9824818D0 (en) * | 1998-11-12 | 1999-01-06 | Zeneca Ltd | Composition,process and use |
US6630274B1 (en) | 1998-12-21 | 2003-10-07 | Seiko Epson Corporation | Color filter and manufacturing method therefor |
KR100506068B1 (ko) * | 1998-12-21 | 2005-08-05 | 세이코 엡슨 가부시키가이샤 | 컬러필터 및 그 제조방법 |
US6309783B1 (en) | 1998-12-22 | 2001-10-30 | Canon Kabushiki Kaisha | Color filter and method of manufacturing the same |
JP2000189880A (ja) | 1998-12-28 | 2000-07-11 | Canon Inc | 塗布方法および装置ならびにカラ―フィルタの製造方法 |
JP4377984B2 (ja) | 1999-03-10 | 2009-12-02 | キヤノン株式会社 | カラーフィルタとその製造方法、該カラーフィルタを用いた液晶素子 |
US6221543B1 (en) | 1999-05-14 | 2001-04-24 | 3M Innovatives Properties | Process for making active substrates for color displays |
US6501527B1 (en) | 1999-07-29 | 2002-12-31 | Canon Kabushiki Kaisha | Liquid crystal elemental device, production process thereof and spacer-bearing substrate |
US6245469B1 (en) | 1999-09-09 | 2001-06-12 | Canon Kabushiki Kaisha | Manufacturing method for color filter and liquid crystal element using color filter manufactured thereby |
DE60119025T8 (de) | 2000-06-02 | 2007-04-12 | Canon K.K. | Herstellungsverfahren für ein optisches Element |
JP2002169291A (ja) * | 2000-12-04 | 2002-06-14 | Canon Inc | 感光性樹脂組成物、レジスト組成物、パターン形成方法およびデバイス |
JP4431958B2 (ja) * | 2001-06-01 | 2010-03-17 | セイコーエプソン株式会社 | カラーフィルタ及び電気光学装置 |
EP1271243A3 (de) * | 2001-06-19 | 2003-10-15 | Fuji Photo Film Co., Ltd. | Bilderzeugungsmaterial, Farbfilteroriginalschablone und Farbfilter |
DE60309762T2 (de) * | 2002-02-19 | 2007-09-13 | Canon K.K. | Herstellungsverfahren für einen Verlaufsgraufilter, Blende mit Verlaufsgraufilter und photographischer Apparat mit dieser Blende |
JP2003288030A (ja) * | 2002-03-27 | 2003-10-10 | Seiko Epson Corp | 電気光学装置とその製造方法及びデバイス並びに電子機器 |
JP2004212814A (ja) * | 2003-01-07 | 2004-07-29 | Sharp Corp | カラーフィルタ製造方法、カラーフィルタ、及び表示装置 |
US7514149B2 (en) * | 2003-04-04 | 2009-04-07 | Corning Incorporated | High-strength laminated sheet for optical applications |
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JP2005118769A (ja) * | 2003-10-15 | 2005-05-12 | Rohm & Haas Electronic Materials Llc | パターン形成 |
US20050164122A1 (en) * | 2004-01-26 | 2005-07-28 | Matsushita Electric Industrial Co., Ltd. | Chemically amplified resist and pattern formation method |
US7011529B2 (en) * | 2004-03-01 | 2006-03-14 | Anritsu Company | Hermetic glass bead assembly having high frequency compensation |
US20050253917A1 (en) * | 2004-05-13 | 2005-11-17 | Quanyuan Shang | Method for forming color filters in flat panel displays by inkjetting |
US20050255253A1 (en) * | 2004-05-13 | 2005-11-17 | White John M | Apparatus and methods for curing ink on a substrate using an electron beam |
JP4480141B2 (ja) | 2004-06-28 | 2010-06-16 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
US7413272B2 (en) * | 2004-11-04 | 2008-08-19 | Applied Materials, Inc. | Methods and apparatus for precision control of print head assemblies |
US7556334B2 (en) * | 2004-11-04 | 2009-07-07 | Applied Materials, Inc. | Methods and apparatus for aligning print heads |
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US20060109296A1 (en) * | 2004-11-04 | 2006-05-25 | Bassam Shamoun | Methods and apparatus for inkjet printing color filters for displays |
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US8586154B2 (en) | 2007-03-09 | 2013-11-19 | 3M Innovative Properties Company | Triphenyl monomers suitable for microstructured optical films |
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-
1994
- 1994-11-22 TW TW083110881A patent/TW417034B/zh not_active IP Right Cessation
- 1994-11-23 AT AT99110504T patent/ATE412923T1/de not_active IP Right Cessation
- 1994-11-23 EP EP99110504A patent/EP0942327B1/de not_active Expired - Lifetime
- 1994-11-23 AT AT94118432T patent/ATE213845T1/de not_active IP Right Cessation
- 1994-11-23 EP EP99110503A patent/EP0942326B1/de not_active Expired - Lifetime
- 1994-11-23 DE DE69432824T patent/DE69432824T2/de not_active Expired - Lifetime
- 1994-11-23 DE DE69429969T patent/DE69429969T2/de not_active Expired - Lifetime
- 1994-11-23 AT AT99110503T patent/ATE242889T1/de not_active IP Right Cessation
- 1994-11-23 EP EP94118432A patent/EP0655647B1/de not_active Expired - Lifetime
- 1994-11-23 DE DE69435160T patent/DE69435160D1/de not_active Expired - Lifetime
- 1994-11-24 KR KR1019940031035A patent/KR0173149B1/ko not_active IP Right Cessation
-
1996
- 1996-08-08 US US08/695,667 patent/US5716740A/en not_active Expired - Lifetime
-
1997
- 1997-11-06 US US08/965,466 patent/US6180294B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
ATE213845T1 (de) | 2002-03-15 |
EP0655647A1 (de) | 1995-05-31 |
EP0942327B1 (de) | 2008-10-29 |
DE69429969D1 (de) | 2002-04-04 |
EP0942326B1 (de) | 2003-06-11 |
EP0655647B1 (de) | 2002-02-27 |
ATE242889T1 (de) | 2003-06-15 |
DE69432824D1 (de) | 2003-07-17 |
US5716740A (en) | 1998-02-10 |
TW417034B (en) | 2001-01-01 |
KR0173149B1 (ko) | 1999-03-20 |
DE69429969T2 (de) | 2002-08-29 |
ATE412923T1 (de) | 2008-11-15 |
DE69432824T2 (de) | 2004-05-19 |
US6180294B1 (en) | 2001-01-30 |
EP0942326A1 (de) | 1999-09-15 |
EP0942327A1 (de) | 1999-09-15 |
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