DE60119025T8 - Herstellungsverfahren für ein optisches Element - Google Patents
Herstellungsverfahren für ein optisches Element Download PDFInfo
- Publication number
- DE60119025T8 DE60119025T8 DE60119025T DE60119025T DE60119025T8 DE 60119025 T8 DE60119025 T8 DE 60119025T8 DE 60119025 T DE60119025 T DE 60119025T DE 60119025 T DE60119025 T DE 60119025T DE 60119025 T8 DE60119025 T8 DE 60119025T8
- Authority
- DE
- Germany
- Prior art keywords
- image
- partition walls
- substrate
- plasma
- optical element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optical Filters (AREA)
- Electroluminescent Light Sources (AREA)
- Glass Compositions (AREA)
- Optical Integrated Circuits (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000165584A JP3854782B2 (ja) | 2000-06-02 | 2000-06-02 | 光学素子とその製造方法 |
JP2000165584 | 2000-06-02 | ||
JP2000311411 | 2000-10-12 | ||
JP2000311411A JP4677085B2 (ja) | 2000-10-12 | 2000-10-12 | 光学素子の製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
DE60119025D1 DE60119025D1 (de) | 2006-06-01 |
DE60119025T2 DE60119025T2 (de) | 2006-12-07 |
DE60119025T8 true DE60119025T8 (de) | 2007-04-12 |
Family
ID=26593204
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60119025T Active DE60119025T8 (de) | 2000-06-02 | 2001-05-31 | Herstellungsverfahren für ein optisches Element |
Country Status (7)
Country | Link |
---|---|
US (2) | US6677243B2 (de) |
EP (1) | EP1160590B1 (de) |
KR (1) | KR100424030B1 (de) |
CN (2) | CN1205489C (de) |
AT (1) | ATE324603T1 (de) |
DE (1) | DE60119025T8 (de) |
TW (1) | TW514592B (de) |
Families Citing this family (64)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9713074D0 (en) * | 1997-06-21 | 1997-08-27 | Cambridge Display Tech Ltd | Electrically-conducting colour filters for use in organic light-emitting displays |
DE60119025T8 (de) * | 2000-06-02 | 2007-04-12 | Canon K.K. | Herstellungsverfahren für ein optisches Element |
JP2003084123A (ja) * | 2001-06-29 | 2003-03-19 | Seiko Epson Corp | カラーフィルタ基板、カラーフィルタ基板の製造方法、液晶表示装置、電気光学装置、電気光学装置の製造方法及び電子機器 |
US6810919B2 (en) | 2002-01-11 | 2004-11-02 | Seiko Epson Corporation | Manufacturing method for display device, display device, manufacturing method for electronic apparatus, and electronic apparatus |
KR100786835B1 (ko) * | 2002-01-21 | 2007-12-20 | 삼성에스디아이 주식회사 | 액정 표시 소자와 이의 제조 방법 |
KR20020025918A (ko) * | 2002-02-15 | 2002-04-04 | 박병주 | 습식 공정으로 제작된 유기 반도체 디바이스 및 유기전계발광 소자 |
JP2003237060A (ja) * | 2002-02-20 | 2003-08-26 | Seiko Epson Corp | デバイスの製造装置及び製造方法、デバイスの製造装置の駆動方法 |
JP3838964B2 (ja) | 2002-03-13 | 2006-10-25 | 株式会社リコー | 機能性素子基板の製造装置 |
JP2003273111A (ja) * | 2002-03-14 | 2003-09-26 | Seiko Epson Corp | 成膜方法及びその方法を用いて製造したデバイス、並びにデバイスの製造方法 |
DE10236404B4 (de) * | 2002-08-02 | 2008-01-10 | Samsung SDI Co., Ltd., Suwon | Verfahren zur Herstellung eines Substrates |
JP4165692B2 (ja) * | 2002-08-05 | 2008-10-15 | 大日本印刷株式会社 | エレクトロルミネッセント素子の製造方法 |
KR100542740B1 (ko) * | 2002-11-11 | 2006-01-11 | 삼성전자주식회사 | 가스 플라즈마 생성 방법 및 장치, 플라즈마 생성용 가스조성물 및 이를 이용한 반도체 장치의 제조 방법 |
DE10310524A1 (de) * | 2003-03-11 | 2004-09-23 | Micronas Gmbh | Verfahren zum Ätzen einer Probe sowie Ätzanlage |
JP4628109B2 (ja) * | 2003-04-25 | 2011-02-09 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
JP2004363560A (ja) * | 2003-05-09 | 2004-12-24 | Seiko Epson Corp | 基板、デバイス、デバイス製造方法、アクティブマトリクス基板の製造方法及び電気光学装置並びに電子機器 |
US7833612B2 (en) | 2003-09-12 | 2010-11-16 | Samsung Mobile Display Co., Ltd. | Substrate for inkjet printing and method of manufacturing the same |
DE10343351B4 (de) * | 2003-09-12 | 2017-01-05 | Samsung Display Co., Ltd. | Substrat zum Tintenstrahldrucken und Verfahren zu dessen Herstellung |
US20050069713A1 (en) * | 2003-09-30 | 2005-03-31 | Rahul Gupta | Capillary coating method |
CN100568457C (zh) * | 2003-10-02 | 2009-12-09 | 株式会社半导体能源研究所 | 半导体装置的制造方法 |
US20050153114A1 (en) * | 2004-01-14 | 2005-07-14 | Rahul Gupta | Printing of organic electronic devices |
US20050170643A1 (en) * | 2004-01-29 | 2005-08-04 | Semiconductor Energy Laboratory Co., Ltd. | Forming method of contact hole, and manufacturing method of semiconductor device, liquid crystal display device and EL display device |
GB0402559D0 (en) * | 2004-02-05 | 2004-03-10 | Cambridge Display Tech Ltd | Molecular electronic device fabrication methods and structures |
US7416977B2 (en) * | 2004-04-28 | 2008-08-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing display device, liquid crystal television, and EL television |
JP4464210B2 (ja) * | 2004-06-29 | 2010-05-19 | 東北パイオニア株式会社 | 有機elパネルの形成方法 |
JP4175298B2 (ja) * | 2004-07-07 | 2008-11-05 | セイコーエプソン株式会社 | カラーフィルタとその製造方法及び電気光学装置並びに電子機器 |
JP2006098555A (ja) * | 2004-09-28 | 2006-04-13 | Dainippon Printing Co Ltd | カラーフィルタおよびその製造方法 |
US20060084276A1 (en) * | 2004-10-14 | 2006-04-20 | Janet Yu | Methods for surface treatment and structure formed therefrom |
US20060108905A1 (en) | 2004-11-25 | 2006-05-25 | Samsung Electronics Co., Ltd. | Mold for fabricating barrier rib and method of fabricating two-layered barrier rib using same |
US8334012B2 (en) * | 2004-12-20 | 2012-12-18 | Palo Alto Research Center Incorporated | Method for preprinting and/or reliquifying subpixels to achieve color uniformity in color filters |
CN100439980C (zh) * | 2005-01-07 | 2008-12-03 | 财团法人工业技术研究院 | 彩色胆固醇型液晶显示器及其制造方法 |
KR100903101B1 (ko) * | 2005-02-07 | 2009-06-16 | 삼성모바일디스플레이주식회사 | 유기전계 발광표시장치 및 그의 제조방법 |
TWI345082B (en) * | 2005-03-18 | 2011-07-11 | Hon Hai Prec Ind Co Ltd | Method for manufacturing color filter |
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CN100405092C (zh) * | 2005-06-17 | 2008-07-23 | 虹创科技股份有限公司 | 彩色滤光片和其制备方法 |
JP4752349B2 (ja) * | 2005-06-23 | 2011-08-17 | 大日本印刷株式会社 | パターン形成体およびその製造方法 |
CN100565308C (zh) * | 2005-07-04 | 2009-12-02 | 财团法人工业技术研究院 | 模块化显示元件及其制造方法 |
US7371487B2 (en) * | 2005-11-25 | 2008-05-13 | Samsung Electronics Co., Ltd. | Method of fabricating black matrix of a color filter |
KR101326575B1 (ko) * | 2005-12-30 | 2013-11-08 | 엘지디스플레이 주식회사 | 액정표시장치의 컬러필터 제조방법 |
JP2007194113A (ja) * | 2006-01-20 | 2007-08-02 | Hitachi Displays Ltd | 電子装置の製造方法 |
US20070184363A1 (en) * | 2006-02-04 | 2007-08-09 | Kim Sung-Woong | Method of manufacturing a black matrix of color filter |
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US7736936B2 (en) * | 2006-08-29 | 2010-06-15 | Semiconductor Energy Laboratory Co., Ltd. | Method of forming display device that includes removing mask to form opening in insulating film |
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US7768598B2 (en) * | 2007-03-06 | 2010-08-03 | Toppan Printing Co., Ltd. | Substrate having pattern, color filter, liquid crystal display and method of manufacturing color filter |
JP4479737B2 (ja) * | 2007-03-07 | 2010-06-09 | セイコーエプソン株式会社 | 発光装置およびその製造方法ならびに電子機器 |
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JP4596287B2 (ja) * | 2008-09-19 | 2010-12-08 | カシオ計算機株式会社 | シリコンを含む膜のドライエッチング方法 |
KR101112064B1 (ko) * | 2009-07-27 | 2012-02-13 | 엘지디스플레이 주식회사 | 액정표시장치용 컬러필터 기판의 제조방법 |
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KR20120089505A (ko) * | 2010-12-10 | 2012-08-13 | 삼성전자주식회사 | 표시 장치 및 그 제조 방법 |
US9535315B2 (en) | 2011-10-31 | 2017-01-03 | Applied Materials, Inc. | Method of fabricating a color filter array using a multilevel structure |
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JP6314983B2 (ja) | 2013-06-27 | 2018-04-25 | 三菱ケミカル株式会社 | 偏光素子、及び偏光素子の製造方法 |
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CN111816777A (zh) * | 2019-04-11 | 2020-10-23 | 陕西坤同半导体科技有限公司 | 一种oled发光器件及其制作方法 |
CN114333567B (zh) * | 2020-09-30 | 2023-12-08 | 京东方科技集团股份有限公司 | 黑矩阵结构及其制造方法、显示基板、显示装置 |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4356429A (en) | 1980-07-17 | 1982-10-26 | Eastman Kodak Company | Organic electroluminescent cell |
JPS5975205A (ja) | 1982-10-25 | 1984-04-27 | Seiko Epson Corp | カラ−フイルタの製造方法 |
US4539507A (en) | 1983-03-25 | 1985-09-03 | Eastman Kodak Company | Organic electroluminescent devices having improved power conversion efficiencies |
US5015856A (en) * | 1990-03-28 | 1991-05-14 | E. I. Du Pont De Nemours And Company | Automated process for permeability determinations of barrier resins |
JPH04123005A (ja) | 1990-09-14 | 1992-04-23 | Toray Ind Inc | カラーフィルタ製造法 |
JPH05241012A (ja) | 1992-02-26 | 1993-09-21 | Toray Ind Inc | 液晶表示用カラ−フィルタの製造方法 |
JPH05241011A (ja) | 1992-03-02 | 1993-09-21 | Toray Ind Inc | 液晶表示用カラ−フィルタの製造方法 |
JP3412857B2 (ja) * | 1992-05-13 | 2003-06-03 | キヤノン株式会社 | インク、画像形成方法、インクジェット記録方法、インクジェット記録ユニット、インクカートリッジおよびインクジェット記録装置 |
JPH06244392A (ja) * | 1993-02-17 | 1994-09-02 | Sharp Corp | 固体撮像装置およびその製造方法 |
JP3332515B2 (ja) | 1993-11-24 | 2002-10-07 | キヤノン株式会社 | カラーフィルタ、その製造方法及び液晶パネル |
TW417034B (en) | 1993-11-24 | 2001-01-01 | Canon Kk | Color filter, method for manufacturing it, and liquid crystal panel |
ATE207620T1 (de) | 1994-01-28 | 2001-11-15 | Canon Kk | Farbfilter, verfahren zu seiner herstellung, und flüssigkristalltafel |
JP3014923B2 (ja) | 1994-06-24 | 2000-02-28 | キヤノン株式会社 | カラーフィルターおよびその製造方法ならびにそのフィルターを用いた液晶表示装置 |
JP3190219B2 (ja) * | 1994-12-15 | 2001-07-23 | キヤノン株式会社 | 液晶用カラーフィルターの製造方法及び液晶用カラーフィルター及び該カラーフィルターを具備する液晶パネル |
JP3576627B2 (ja) | 1995-01-25 | 2004-10-13 | キヤノン株式会社 | カラーフィルタの製造方法及び液晶表示装置 |
US6039437A (en) * | 1995-01-31 | 2000-03-21 | Canon Kabushiki Kaisha | Ink-jet head and ink-jet printing apparatus incorporating the same |
JP3143591B2 (ja) | 1995-09-14 | 2001-03-07 | キヤノン株式会社 | 表示装置 |
JP3305212B2 (ja) | 1995-11-09 | 2002-07-22 | キヤノン株式会社 | 液晶素子用の基板、液晶素子、およびそれらの製造方法 |
JPH09230129A (ja) | 1996-02-26 | 1997-09-05 | Asahi Glass Co Ltd | カラーフィルタの製造方法及びそれを用いた液晶表示素子 |
JP3841487B2 (ja) * | 1996-07-16 | 2006-11-01 | 日本無機株式会社 | ラシヒリングとその製造方法 |
JP3927654B2 (ja) | 1996-08-07 | 2007-06-13 | キヤノン株式会社 | カラーフィルタおよび液晶表示装置の製造方法 |
JP3996979B2 (ja) * | 1996-08-08 | 2007-10-24 | キヤノン株式会社 | カラーフィルターの製造方法、カラーフィルター及び液晶表示装置 |
JPH10104417A (ja) * | 1996-09-30 | 1998-04-24 | Canon Inc | カラーフィルター、これを用いた液晶素子、及びこれらの製造方法、該製造方法に用いられるインクジェット用インク |
US5888679A (en) | 1997-03-27 | 1999-03-30 | Canon Kabushiki Kaisha | Production process of color filter, color filter produced thereby and liquid crystal display device using such color filter |
JPH10288707A (ja) | 1997-04-15 | 1998-10-27 | Toppan Printing Co Ltd | ブラックマトリックス及びそれを用いたカラーフィルタ及びそれらの製造方法 |
JPH10332925A (ja) | 1997-06-02 | 1998-12-18 | Canon Inc | カラーフィルタ基板とその製造方法、該基板を用いた液晶素子 |
JPH112716A (ja) * | 1997-06-13 | 1999-01-06 | Canon Inc | カラーフィルタ、これを用いた液晶素子及びこれらの製造方法、並びに該製造方法に用いられるインクジェット用インク |
JP3424896B2 (ja) | 1997-07-18 | 2003-07-07 | 富士写真光機株式会社 | 内視鏡の管路取付け構造 |
US5891014A (en) | 1997-07-18 | 1999-04-06 | Fuji Photo Optical Co., Ltd. | Passage structure in endoscope and adapter used when washing passages in endoscope |
US6195147B1 (en) | 1997-08-01 | 2001-02-27 | Canon Kabushiki Kaisha | Liquid crystal substrate with optical modulation region having different alignment control forces |
EP0989778B1 (de) * | 1998-03-17 | 2008-09-10 | Seiko Epson Corporation | Verfahren zur herstellung einer strukturierten dünnschichtvorrichtung |
JP3646510B2 (ja) | 1998-03-18 | 2005-05-11 | セイコーエプソン株式会社 | 薄膜形成方法、表示装置およびカラーフィルタ |
JP2000018771A (ja) | 1998-07-03 | 2000-01-18 | Daikin Ind Ltd | 空気調和機の凝縮器の補助冷却装置 |
JP2000035511A (ja) | 1998-07-16 | 2000-02-02 | Asahi Glass Co Ltd | カラーフィルタの製造方法及びそれを用いた液晶表示素子 |
DE69938023T2 (de) * | 1998-07-31 | 2009-01-15 | Canon K.K. | Farbfilter, Verfahren zur Herstellung des Farbfilters, den Farbfilter aufweisende Flüssigkristall-Vorrichtung und Herstellungsverfahren für eine Schwarzmatrix |
KR100565738B1 (ko) * | 1999-01-29 | 2006-03-29 | 엘지.필립스 엘시디 주식회사 | 잉크젯 컬러필터 액정표시소자 및 그 제조 방법 |
US6630274B1 (en) * | 1998-12-21 | 2003-10-07 | Seiko Epson Corporation | Color filter and manufacturing method therefor |
CN1174265C (zh) * | 1998-12-21 | 2004-11-03 | 精工爱普生股份株式会社 | 彩色过滤器、具有该彩色过滤器的液晶显示装置、电光学装置、电子仪器及其制造方法 |
US7122790B2 (en) * | 2000-05-30 | 2006-10-17 | The Penn State Research Foundation | Matrix-free desorption ionization mass spectrometry using tailored morphology layer devices |
DE60119025T8 (de) * | 2000-06-02 | 2007-04-12 | Canon K.K. | Herstellungsverfahren für ein optisches Element |
-
2001
- 2001-05-31 DE DE60119025T patent/DE60119025T8/de active Active
- 2001-05-31 EP EP01113276A patent/EP1160590B1/de not_active Expired - Lifetime
- 2001-05-31 AT AT01113276T patent/ATE324603T1/de not_active IP Right Cessation
- 2001-05-31 US US09/867,492 patent/US6677243B2/en not_active Expired - Fee Related
- 2001-06-01 CN CNB011259248A patent/CN1205489C/zh not_active Expired - Fee Related
- 2001-06-01 CN CN2005100068166A patent/CN100406994C/zh not_active Expired - Fee Related
- 2001-06-01 TW TW090113382A patent/TW514592B/zh not_active IP Right Cessation
- 2001-06-02 KR KR10-2001-0030949A patent/KR100424030B1/ko not_active IP Right Cessation
-
2003
- 2003-08-05 US US10/633,523 patent/US7354520B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100424030B1 (ko) | 2004-03-22 |
EP1160590A2 (de) | 2001-12-05 |
CN1205489C (zh) | 2005-06-08 |
ATE324603T1 (de) | 2006-05-15 |
US20040058063A1 (en) | 2004-03-25 |
CN1641447A (zh) | 2005-07-20 |
DE60119025T2 (de) | 2006-12-07 |
TW514592B (en) | 2002-12-21 |
EP1160590B1 (de) | 2006-04-26 |
KR20010110183A (ko) | 2001-12-12 |
US20020014470A1 (en) | 2002-02-07 |
DE60119025D1 (de) | 2006-06-01 |
US7354520B2 (en) | 2008-04-08 |
CN1336567A (zh) | 2002-02-20 |
CN100406994C (zh) | 2008-07-30 |
EP1160590A3 (de) | 2004-06-09 |
US6677243B2 (en) | 2004-01-13 |
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