[go: up one dir, main page]

DE60119025T8 - Herstellungsverfahren für ein optisches Element - Google Patents

Herstellungsverfahren für ein optisches Element Download PDF

Info

Publication number
DE60119025T8
DE60119025T8 DE60119025T DE60119025T DE60119025T8 DE 60119025 T8 DE60119025 T8 DE 60119025T8 DE 60119025 T DE60119025 T DE 60119025T DE 60119025 T DE60119025 T DE 60119025T DE 60119025 T8 DE60119025 T8 DE 60119025T8
Authority
DE
Germany
Prior art keywords
image
partition walls
substrate
plasma
optical element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE60119025T
Other languages
English (en)
Other versions
DE60119025T2 (de
DE60119025D1 (de
Inventor
Takeshi Canon Kabushiki Kaisha Okada
Katsuhiko Canon Kabushiki Kaisha Takano
Junichi Canon Kabushiki Kaisha Sakamoto
Shoji Canon Kabushiki Kaisha Shiba
Kenichi Canon Kabushiki Kaisha Iwata
Hiroshi Canon Kabushiki Kaisha Taniuchi
Takehito Canon Kabushiki Kaisha Nishida
Yoshikatsu Canon Kabushiki Kaisha Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000165584A external-priority patent/JP3854782B2/ja
Priority claimed from JP2000311411A external-priority patent/JP4677085B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE60119025D1 publication Critical patent/DE60119025D1/de
Publication of DE60119025T2 publication Critical patent/DE60119025T2/de
Application granted granted Critical
Publication of DE60119025T8 publication Critical patent/DE60119025T8/de
Active legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Filters (AREA)
  • Electroluminescent Light Sources (AREA)
  • Glass Compositions (AREA)
  • Optical Integrated Circuits (AREA)
DE60119025T 2000-06-02 2001-05-31 Herstellungsverfahren für ein optisches Element Active DE60119025T8 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000165584A JP3854782B2 (ja) 2000-06-02 2000-06-02 光学素子とその製造方法
JP2000165584 2000-06-02
JP2000311411 2000-10-12
JP2000311411A JP4677085B2 (ja) 2000-10-12 2000-10-12 光学素子の製造方法

Publications (3)

Publication Number Publication Date
DE60119025D1 DE60119025D1 (de) 2006-06-01
DE60119025T2 DE60119025T2 (de) 2006-12-07
DE60119025T8 true DE60119025T8 (de) 2007-04-12

Family

ID=26593204

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60119025T Active DE60119025T8 (de) 2000-06-02 2001-05-31 Herstellungsverfahren für ein optisches Element

Country Status (7)

Country Link
US (2) US6677243B2 (de)
EP (1) EP1160590B1 (de)
KR (1) KR100424030B1 (de)
CN (2) CN1205489C (de)
AT (1) ATE324603T1 (de)
DE (1) DE60119025T8 (de)
TW (1) TW514592B (de)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9713074D0 (en) * 1997-06-21 1997-08-27 Cambridge Display Tech Ltd Electrically-conducting colour filters for use in organic light-emitting displays
DE60119025T8 (de) * 2000-06-02 2007-04-12 Canon K.K. Herstellungsverfahren für ein optisches Element
JP2003084123A (ja) * 2001-06-29 2003-03-19 Seiko Epson Corp カラーフィルタ基板、カラーフィルタ基板の製造方法、液晶表示装置、電気光学装置、電気光学装置の製造方法及び電子機器
US6810919B2 (en) 2002-01-11 2004-11-02 Seiko Epson Corporation Manufacturing method for display device, display device, manufacturing method for electronic apparatus, and electronic apparatus
KR100786835B1 (ko) * 2002-01-21 2007-12-20 삼성에스디아이 주식회사 액정 표시 소자와 이의 제조 방법
KR20020025918A (ko) * 2002-02-15 2002-04-04 박병주 습식 공정으로 제작된 유기 반도체 디바이스 및 유기전계발광 소자
JP2003237060A (ja) * 2002-02-20 2003-08-26 Seiko Epson Corp デバイスの製造装置及び製造方法、デバイスの製造装置の駆動方法
JP3838964B2 (ja) 2002-03-13 2006-10-25 株式会社リコー 機能性素子基板の製造装置
JP2003273111A (ja) * 2002-03-14 2003-09-26 Seiko Epson Corp 成膜方法及びその方法を用いて製造したデバイス、並びにデバイスの製造方法
DE10236404B4 (de) * 2002-08-02 2008-01-10 Samsung SDI Co., Ltd., Suwon Verfahren zur Herstellung eines Substrates
JP4165692B2 (ja) * 2002-08-05 2008-10-15 大日本印刷株式会社 エレクトロルミネッセント素子の製造方法
KR100542740B1 (ko) * 2002-11-11 2006-01-11 삼성전자주식회사 가스 플라즈마 생성 방법 및 장치, 플라즈마 생성용 가스조성물 및 이를 이용한 반도체 장치의 제조 방법
DE10310524A1 (de) * 2003-03-11 2004-09-23 Micronas Gmbh Verfahren zum Ätzen einer Probe sowie Ätzanlage
JP4628109B2 (ja) * 2003-04-25 2011-02-09 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2004363560A (ja) * 2003-05-09 2004-12-24 Seiko Epson Corp 基板、デバイス、デバイス製造方法、アクティブマトリクス基板の製造方法及び電気光学装置並びに電子機器
US7833612B2 (en) 2003-09-12 2010-11-16 Samsung Mobile Display Co., Ltd. Substrate for inkjet printing and method of manufacturing the same
DE10343351B4 (de) * 2003-09-12 2017-01-05 Samsung Display Co., Ltd. Substrat zum Tintenstrahldrucken und Verfahren zu dessen Herstellung
US20050069713A1 (en) * 2003-09-30 2005-03-31 Rahul Gupta Capillary coating method
CN100568457C (zh) * 2003-10-02 2009-12-09 株式会社半导体能源研究所 半导体装置的制造方法
US20050153114A1 (en) * 2004-01-14 2005-07-14 Rahul Gupta Printing of organic electronic devices
US20050170643A1 (en) * 2004-01-29 2005-08-04 Semiconductor Energy Laboratory Co., Ltd. Forming method of contact hole, and manufacturing method of semiconductor device, liquid crystal display device and EL display device
GB0402559D0 (en) * 2004-02-05 2004-03-10 Cambridge Display Tech Ltd Molecular electronic device fabrication methods and structures
US7416977B2 (en) * 2004-04-28 2008-08-26 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing display device, liquid crystal television, and EL television
JP4464210B2 (ja) * 2004-06-29 2010-05-19 東北パイオニア株式会社 有機elパネルの形成方法
JP4175298B2 (ja) * 2004-07-07 2008-11-05 セイコーエプソン株式会社 カラーフィルタとその製造方法及び電気光学装置並びに電子機器
JP2006098555A (ja) * 2004-09-28 2006-04-13 Dainippon Printing Co Ltd カラーフィルタおよびその製造方法
US20060084276A1 (en) * 2004-10-14 2006-04-20 Janet Yu Methods for surface treatment and structure formed therefrom
US20060108905A1 (en) 2004-11-25 2006-05-25 Samsung Electronics Co., Ltd. Mold for fabricating barrier rib and method of fabricating two-layered barrier rib using same
US8334012B2 (en) * 2004-12-20 2012-12-18 Palo Alto Research Center Incorporated Method for preprinting and/or reliquifying subpixels to achieve color uniformity in color filters
CN100439980C (zh) * 2005-01-07 2008-12-03 财团法人工业技术研究院 彩色胆固醇型液晶显示器及其制造方法
KR100903101B1 (ko) * 2005-02-07 2009-06-16 삼성모바일디스플레이주식회사 유기전계 발광표시장치 및 그의 제조방법
TWI345082B (en) * 2005-03-18 2011-07-11 Hon Hai Prec Ind Co Ltd Method for manufacturing color filter
KR20060117034A (ko) * 2005-05-12 2006-11-16 삼성전자주식회사 표시장치 및 이의 제조 방법
CN100405092C (zh) * 2005-06-17 2008-07-23 虹创科技股份有限公司 彩色滤光片和其制备方法
JP4752349B2 (ja) * 2005-06-23 2011-08-17 大日本印刷株式会社 パターン形成体およびその製造方法
CN100565308C (zh) * 2005-07-04 2009-12-02 财团法人工业技术研究院 模块化显示元件及其制造方法
US7371487B2 (en) * 2005-11-25 2008-05-13 Samsung Electronics Co., Ltd. Method of fabricating black matrix of a color filter
KR101326575B1 (ko) * 2005-12-30 2013-11-08 엘지디스플레이 주식회사 액정표시장치의 컬러필터 제조방법
JP2007194113A (ja) * 2006-01-20 2007-08-02 Hitachi Displays Ltd 電子装置の製造方法
US20070184363A1 (en) * 2006-02-04 2007-08-09 Kim Sung-Woong Method of manufacturing a black matrix of color filter
CN101038351B (zh) * 2006-03-17 2011-03-02 奇美电子股份有限公司 彩色滤光片基板的返工方法
US7736936B2 (en) * 2006-08-29 2010-06-15 Semiconductor Energy Laboratory Co., Ltd. Method of forming display device that includes removing mask to form opening in insulating film
TWI345802B (en) * 2006-10-25 2011-07-21 Ind Tech Res Inst Methods for repairing patterned structure of electronic devices
US7768598B2 (en) * 2007-03-06 2010-08-03 Toppan Printing Co., Ltd. Substrate having pattern, color filter, liquid crystal display and method of manufacturing color filter
JP4479737B2 (ja) * 2007-03-07 2010-06-09 セイコーエプソン株式会社 発光装置およびその製造方法ならびに電子機器
KR101037782B1 (ko) * 2007-04-05 2011-05-27 주식회사 엘지화학 컬러필터의 제조방법 및 이에 의해 제조된 컬러필터
JP4576412B2 (ja) * 2007-09-05 2010-11-10 シャープ株式会社 着色マイクロレンズアレイの製造方法、カラー固体撮像素子およびその製造方法、カラー表示装置の製造方法、電子情報機器の製造方法
JP4596287B2 (ja) * 2008-09-19 2010-12-08 カシオ計算機株式会社 シリコンを含む膜のドライエッチング方法
KR101112064B1 (ko) * 2009-07-27 2012-02-13 엘지디스플레이 주식회사 액정표시장치용 컬러필터 기판의 제조방법
WO2011030604A1 (ja) * 2009-09-09 2011-03-17 シャープ株式会社 カラーフィルタ基板、液晶表示パネル及び液晶表示装置
US8336783B2 (en) * 2010-04-19 2012-12-25 George Monemvasitis Polymeric thread with miniature pattern and fluorescent taggant for anti-counterfeit applications and method of making same
KR101826069B1 (ko) 2010-10-26 2018-03-23 삼성디스플레이 주식회사 유기발광표시장치 및 그 제조방법
KR20120089505A (ko) * 2010-12-10 2012-08-13 삼성전자주식회사 표시 장치 및 그 제조 방법
US9535315B2 (en) 2011-10-31 2017-01-03 Applied Materials, Inc. Method of fabricating a color filter array using a multilevel structure
CN109298601A (zh) * 2012-09-18 2019-02-01 旭化成株式会社 感光性树脂组合物
KR20140090275A (ko) * 2012-11-21 2014-07-17 삼성전자주식회사 잉크젯 프린팅 기법을 이용한 도전성 패턴 형성 방법
JP6314983B2 (ja) 2013-06-27 2018-04-25 三菱ケミカル株式会社 偏光素子、及び偏光素子の製造方法
WO2015088920A1 (en) * 2013-12-13 2015-06-18 The North Face Apparel Corp. Plasma treatments for coloration of textiles
JP2016045236A (ja) * 2014-08-20 2016-04-04 Jsr株式会社 着色組成物、着色硬化膜及び表示素子
JP6575239B2 (ja) * 2015-09-02 2019-09-18 セイコーエプソン株式会社 機能素子の製造方法
CN107634071B (zh) 2017-10-17 2020-05-26 京东方科技集团股份有限公司 显示基板母板及其制作方法、显示基板、显示装置
CN108205220A (zh) * 2018-01-16 2018-06-26 青岛海信电器股份有限公司 黑矩阵基板及其制备方法、彩色滤光片、显示面板及设备
CN111816777A (zh) * 2019-04-11 2020-10-23 陕西坤同半导体科技有限公司 一种oled发光器件及其制作方法
CN114333567B (zh) * 2020-09-30 2023-12-08 京东方科技集团股份有限公司 黑矩阵结构及其制造方法、显示基板、显示装置

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4356429A (en) 1980-07-17 1982-10-26 Eastman Kodak Company Organic electroluminescent cell
JPS5975205A (ja) 1982-10-25 1984-04-27 Seiko Epson Corp カラ−フイルタの製造方法
US4539507A (en) 1983-03-25 1985-09-03 Eastman Kodak Company Organic electroluminescent devices having improved power conversion efficiencies
US5015856A (en) * 1990-03-28 1991-05-14 E. I. Du Pont De Nemours And Company Automated process for permeability determinations of barrier resins
JPH04123005A (ja) 1990-09-14 1992-04-23 Toray Ind Inc カラーフィルタ製造法
JPH05241012A (ja) 1992-02-26 1993-09-21 Toray Ind Inc 液晶表示用カラ−フィルタの製造方法
JPH05241011A (ja) 1992-03-02 1993-09-21 Toray Ind Inc 液晶表示用カラ−フィルタの製造方法
JP3412857B2 (ja) * 1992-05-13 2003-06-03 キヤノン株式会社 インク、画像形成方法、インクジェット記録方法、インクジェット記録ユニット、インクカートリッジおよびインクジェット記録装置
JPH06244392A (ja) * 1993-02-17 1994-09-02 Sharp Corp 固体撮像装置およびその製造方法
JP3332515B2 (ja) 1993-11-24 2002-10-07 キヤノン株式会社 カラーフィルタ、その製造方法及び液晶パネル
TW417034B (en) 1993-11-24 2001-01-01 Canon Kk Color filter, method for manufacturing it, and liquid crystal panel
ATE207620T1 (de) 1994-01-28 2001-11-15 Canon Kk Farbfilter, verfahren zu seiner herstellung, und flüssigkristalltafel
JP3014923B2 (ja) 1994-06-24 2000-02-28 キヤノン株式会社 カラーフィルターおよびその製造方法ならびにそのフィルターを用いた液晶表示装置
JP3190219B2 (ja) * 1994-12-15 2001-07-23 キヤノン株式会社 液晶用カラーフィルターの製造方法及び液晶用カラーフィルター及び該カラーフィルターを具備する液晶パネル
JP3576627B2 (ja) 1995-01-25 2004-10-13 キヤノン株式会社 カラーフィルタの製造方法及び液晶表示装置
US6039437A (en) * 1995-01-31 2000-03-21 Canon Kabushiki Kaisha Ink-jet head and ink-jet printing apparatus incorporating the same
JP3143591B2 (ja) 1995-09-14 2001-03-07 キヤノン株式会社 表示装置
JP3305212B2 (ja) 1995-11-09 2002-07-22 キヤノン株式会社 液晶素子用の基板、液晶素子、およびそれらの製造方法
JPH09230129A (ja) 1996-02-26 1997-09-05 Asahi Glass Co Ltd カラーフィルタの製造方法及びそれを用いた液晶表示素子
JP3841487B2 (ja) * 1996-07-16 2006-11-01 日本無機株式会社 ラシヒリングとその製造方法
JP3927654B2 (ja) 1996-08-07 2007-06-13 キヤノン株式会社 カラーフィルタおよび液晶表示装置の製造方法
JP3996979B2 (ja) * 1996-08-08 2007-10-24 キヤノン株式会社 カラーフィルターの製造方法、カラーフィルター及び液晶表示装置
JPH10104417A (ja) * 1996-09-30 1998-04-24 Canon Inc カラーフィルター、これを用いた液晶素子、及びこれらの製造方法、該製造方法に用いられるインクジェット用インク
US5888679A (en) 1997-03-27 1999-03-30 Canon Kabushiki Kaisha Production process of color filter, color filter produced thereby and liquid crystal display device using such color filter
JPH10288707A (ja) 1997-04-15 1998-10-27 Toppan Printing Co Ltd ブラックマトリックス及びそれを用いたカラーフィルタ及びそれらの製造方法
JPH10332925A (ja) 1997-06-02 1998-12-18 Canon Inc カラーフィルタ基板とその製造方法、該基板を用いた液晶素子
JPH112716A (ja) * 1997-06-13 1999-01-06 Canon Inc カラーフィルタ、これを用いた液晶素子及びこれらの製造方法、並びに該製造方法に用いられるインクジェット用インク
JP3424896B2 (ja) 1997-07-18 2003-07-07 富士写真光機株式会社 内視鏡の管路取付け構造
US5891014A (en) 1997-07-18 1999-04-06 Fuji Photo Optical Co., Ltd. Passage structure in endoscope and adapter used when washing passages in endoscope
US6195147B1 (en) 1997-08-01 2001-02-27 Canon Kabushiki Kaisha Liquid crystal substrate with optical modulation region having different alignment control forces
EP0989778B1 (de) * 1998-03-17 2008-09-10 Seiko Epson Corporation Verfahren zur herstellung einer strukturierten dünnschichtvorrichtung
JP3646510B2 (ja) 1998-03-18 2005-05-11 セイコーエプソン株式会社 薄膜形成方法、表示装置およびカラーフィルタ
JP2000018771A (ja) 1998-07-03 2000-01-18 Daikin Ind Ltd 空気調和機の凝縮器の補助冷却装置
JP2000035511A (ja) 1998-07-16 2000-02-02 Asahi Glass Co Ltd カラーフィルタの製造方法及びそれを用いた液晶表示素子
DE69938023T2 (de) * 1998-07-31 2009-01-15 Canon K.K. Farbfilter, Verfahren zur Herstellung des Farbfilters, den Farbfilter aufweisende Flüssigkristall-Vorrichtung und Herstellungsverfahren für eine Schwarzmatrix
KR100565738B1 (ko) * 1999-01-29 2006-03-29 엘지.필립스 엘시디 주식회사 잉크젯 컬러필터 액정표시소자 및 그 제조 방법
US6630274B1 (en) * 1998-12-21 2003-10-07 Seiko Epson Corporation Color filter and manufacturing method therefor
CN1174265C (zh) * 1998-12-21 2004-11-03 精工爱普生股份株式会社 彩色过滤器、具有该彩色过滤器的液晶显示装置、电光学装置、电子仪器及其制造方法
US7122790B2 (en) * 2000-05-30 2006-10-17 The Penn State Research Foundation Matrix-free desorption ionization mass spectrometry using tailored morphology layer devices
DE60119025T8 (de) * 2000-06-02 2007-04-12 Canon K.K. Herstellungsverfahren für ein optisches Element

Also Published As

Publication number Publication date
KR100424030B1 (ko) 2004-03-22
EP1160590A2 (de) 2001-12-05
CN1205489C (zh) 2005-06-08
ATE324603T1 (de) 2006-05-15
US20040058063A1 (en) 2004-03-25
CN1641447A (zh) 2005-07-20
DE60119025T2 (de) 2006-12-07
TW514592B (en) 2002-12-21
EP1160590B1 (de) 2006-04-26
KR20010110183A (ko) 2001-12-12
US20020014470A1 (en) 2002-02-07
DE60119025D1 (de) 2006-06-01
US7354520B2 (en) 2008-04-08
CN1336567A (zh) 2002-02-20
CN100406994C (zh) 2008-07-30
EP1160590A3 (de) 2004-06-09
US6677243B2 (en) 2004-01-13

Similar Documents

Publication Publication Date Title
DE60119025D1 (de) Herstellungsverfahren für ein optisches Element
PL1621258T3 (pl) Sposób wytwarzania cienkich folii organicznych
ATE514181T1 (de) Verfahren zur ausbildung eines dielektrischen films
WO2002043124A3 (fr) Procede de fabrication d'un substrat contenant une couche mince sur un support et substrat obtenu par ce procede
JP2007243192A (ja) 電子装置の製造方法及びエンボス加工具
JP2009532245A (ja) リソグラフィ・インプリント・システム
EP1343206A3 (de) Elektrolumineszentes Gerät und deren Herstellungsverfahren
EP1123898A4 (de) Zusammengesetzter zeolithfilm und verfahren zur herstellung desselben
TW200603275A (en) Semiconductor device and fabrication method thereof
DE60238752D1 (de) Ein verfahren zum erzeugen einer hohlen struktur aus einer silizium-struktur
WO2007040718A3 (en) Multi-source method and system for forming an oxide layer
JP2008265344A (ja) レーザによるカラーマーキング方法
ATE197525T1 (de) Verfahren zum herstellen von strukturierungen
CA2266803A1 (en) Method for producing needle diamond-type structure
TW200501225A (en) Method and apparatus for bilayer photoresist dry development
CN103476594A (zh) 利用等离子体预处理的rgb印刷方法及用于其的等离子体装置
ATE252661T1 (de) Strukturierte, mit polyolefin beschichtete substrate und verfahren zur deren herstellung
Ono et al. The role of silanol groups on the reaction of SiO2 and anhydrous hydrogen fluoride gas
JP2006167849A (ja) マイクロ構造体の製造方法
ATE503854T1 (de) Verfahren zur herstellung eines schichtsystems umfassend einen metallischen träger und eine anodenfunktionsshicht
JP2004182586A5 (de)
DE50006834D1 (de) Verfahren und mittel zur herstellung hydrophober schichten auf fluoridschichten und optische substrate
KR930020593A (ko) 고체 표면 가공방법
ATE505569T1 (de) Verfahren zur herstellung einer struktur mit wenigstens einer lagegenauen zone von einem oder mehreren halbleiter-nanokristallen
US20110132768A1 (en) Method for forming imprinting roller

Legal Events

Date Code Title Description
8381 Inventor (new situation)

Inventor name: OKADA, TAKESHI, CANAN KABUSHIKI KAISHA, TOKYO, JP

Inventor name: TAKANO, KATSUHIKO, CANON KABUSHIKI KAISHA, TOKYO,

Inventor name: SAKAMOTO, JUNICHI, CANON KABUSHIKI KAISHA, TOKYO,

Inventor name: SHIBA, SHOJI, CANON KABUSHIKI KAISHA, TOKYO, JP

Inventor name: IWATA, KENICHI, CANON KABUSHIKI KAISHA, TOKYO, JP

Inventor name: TANIUCHI, HIROSHI, CANON KABUSHIKI KAISHA, TOKYO,

Inventor name: NISHIDA, TAKEHITO, CANON KABUSHIKI KAISHA, TOKYO,

Inventor name: OKADA, YOSHIKATSU, CANON KABUSHIKI KAISHA, TOKYO,

8381 Inventor (new situation)

Inventor name: OKADA, YOSHIKATSU, CANON KABUSHIKI KAISHA, TOK, JP

Inventor name: NISHIDA, TAKEHITO, CANON KABUSHIKI KAISHA, TOK, JP

Inventor name: TANIUCHI, HIROSHI, CANON KABUSHIKI KAISHA, TOK, JP

Inventor name: IWATA, KENICHI, CANON KABUSHIKI KAISHA, TOKYO, JP

Inventor name: SHIBA, SHOJI, CANON KABUSHIKI KAISHA, TOKYO, JP

Inventor name: SAKAMOTO, JUNICHI, CANON KABUSHIKI KAISHA, TOK, JP

Inventor name: TAKANO, KATSUHIKO, CANON KABUSHIKI KAISHA, TOK, JP

Inventor name: OKADA, TAKESHI, CANON KABUSHIKI KAISHA, TOKYO, JP

8364 No opposition during term of opposition