DE69130125D1 - Positiv arbeitende Photolackzusammensetzung - Google Patents

Positiv arbeitende Photolackzusammensetzung

Info

Publication number: DE69130125D1
Authority: DE; Germany
Prior art keywords: photoresist composition; positive working; working photoresist; positive; composition
Prior art date: 1990-02-01
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE69130125T

Other languages

English (en)

Other versions

DE69130125T3 (de

DE69130125T2 (de

Inventor

Kazuya Uenishi

Shinji Sakaguchi

Tadayoshi Kokubo

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fujifilm Corp

Original Assignee

Fuji Photo Film Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1990-02-01

Filing date

1991-01-31

Publication date

1998-10-15

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=12089548&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69130125(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1991-01-31 Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd

1998-10-15 Publication of DE69130125D1 publication Critical patent/DE69130125D1/de

1999-05-06 Application granted granted Critical

1999-05-06 Publication of DE69130125T2 publication Critical patent/DE69130125T2/de

2003-01-16 Publication of DE69130125T3 publication Critical patent/DE69130125T3/de

2011-02-01 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
- C07C309/76—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2602/00—Systems containing two condensed rings
- C07C2602/02—Systems containing two condensed rings the rings having only two atoms in common
- C07C2602/04—One of the condensed rings being a six-membered aromatic ring
- C07C2602/10—One of the condensed rings being a six-membered aromatic ring the other ring being six-membered, e.g. tetraline

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Materials For Photolithography (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

DE69130125T 1990-02-01 1991-01-31 Positiv arbeitende Photolackzusammensetzung Expired - Fee Related DE69130125T3 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2022679A JP2761786B2 (ja)	1990-02-01	1990-02-01	ポジ型フオトレジスト組成物

Publications (3)

Publication Number	Publication Date
DE69130125D1 true DE69130125D1 (de)	1998-10-15
DE69130125T2 DE69130125T2 (de)	1999-05-06
DE69130125T3 DE69130125T3 (de)	2003-01-16

Family

ID=12089548

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69130125T Expired - Fee Related DE69130125T3 (de)	1990-02-01	1991-01-31	Positiv arbeitende Photolackzusammensetzung

Country Status (5)

Country	Link
US (1)	US5565300A (de)
EP (1)	EP0440238B2 (de)
JP (1)	JP2761786B2 (de)
KR (1)	KR0170399B1 (de)
DE (1)	DE69130125T3 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE4137325A1 (de) *	1991-11-13	1993-05-19	Hoechst Ag	Lichtempfindliches gemisch auf der basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches material
US5221592A (en) *	1992-03-06	1993-06-22	Hoechst Celanese Corporation	Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester
JP3094652B2 (ja) *	1992-05-18	2000-10-03	住友化学工業株式会社	ポジ型レジスト組成物
JP3466218B2 (ja) *	1992-06-04	2003-11-10	住友化学工業株式会社	ポジ型レジスト組成物
JP2744557B2 (ja) *	1992-09-11	1998-04-28	富士写真フイルム株式会社	感光性樹脂組成物
EP0644460B1 (de) *	1993-09-20	1999-12-08	Fuji Photo Film Co., Ltd.	Positiv arbeitende Photoresistzusammensetzung
US5609982A (en) *	1993-12-17	1997-03-11	Fuji Photo Film Co., Ltd.	Positive-working photoresist composition
JP3503839B2 (ja)	1994-05-25	2004-03-08	富士写真フイルム株式会社	ポジ型感光性組成物
JP3278306B2 (ja)	1994-10-31	2002-04-30	富士写真フイルム株式会社	ポジ型フォトレジスト組成物
US5541033A (en) *	1995-02-01	1996-07-30	Ocg Microelectronic Materials, Inc.	Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions
DE69604114T2 (de) *	1995-04-10	2000-03-02	Shipley Co., L.L.C.	Gemische von photoaktiven Zusammensetzungen enthaltendes Fotoresist
US5750310A (en) *	1995-04-27	1998-05-12	Fuji Photo Film Co., Ltd.	Positive photoresist composition
JP2002207291A (ja) *	2001-01-11	2002-07-26	Toyo Gosei Kogyo Kk	ナフトキノンジアジド系感光剤溶液の製造方法
CA2574588A1 (en) *	2004-07-23	2006-02-09	Polnox Corporation	Anti-oxidant macromonomers and polymers and methods of making and using the same
WO2006039810A1 (en) *	2004-10-13	2006-04-20	St-Jean Photochimie Inc.	Photoactive compositions and preparation thereof
EP1828104A1 (de) *	2004-12-03	2007-09-05	Polnox Corporation	Synthese von antioxidierenden makromonomeren auf anilin- und phenolbasis und entsprechenden polymeren
US7799948B2 (en)	2005-02-22	2010-09-21	Polnox Corporation	Nitrogen and hindered phenol containing dual functional macromolecular antioxidants: synthesis, performances and applications
CA2606303A1 (en)	2005-03-25	2006-10-05	Polnox Corporation	Alkylated and polymeric macromolecular antioxidants and methods of making and using the same
US7705176B2 (en)	2005-10-27	2010-04-27	Polnox Corporation	Macromolecular antioxidants based on sterically hindered phenols and phosphites
US20070149660A1 (en)	2005-10-27	2007-06-28	Vijayendra Kumar	Stabilized polyolefin compositions
WO2007064843A1 (en)	2005-12-02	2007-06-07	Polnox Corporation	Lubricant oil compositions
WO2008005358A2 (en)	2006-07-06	2008-01-10	Polnox Corporation	Novel macromolecular antioxidants comprising differing antioxidant moieties: structures, methods of making and using the same
US7767853B2 (en)	2006-10-20	2010-08-03	Polnox Corporation	Antioxidants and methods of making and using the same
WO2015077635A2 (en)	2013-11-22	2015-05-28	Polnox Corporation	Macromolecular antioxidants based on dual type moiety per molecule: structures methods of making and using the same
CN106133604B (zh) *	2014-03-13	2019-09-06	三菱瓦斯化学株式会社	保护剂组合物和保护剂图案形成方法
TWI659013B (zh)	2014-03-13	2019-05-11	日商三菱瓦斯化學股份有限公司	化合物、樹脂、微影蝕刻用底層膜形成材料、微影蝕刻用底層膜、圖型形成方法、及化合物或樹脂的純化方法
KR102527656B1 (ko)	2015-03-30	2023-05-02	미쯔비시 가스 케미칼 컴파니, 인코포레이티드	레지스트 기재, 레지스트 조성물 및 레지스트 패턴 형성방법
CN107428646B (zh)	2015-03-30	2021-03-02	三菱瓦斯化学株式会社	化合物、树脂、和它们的纯化方法、及其应用
US20180251695A1 (en)	2017-03-01	2018-09-06	Polnox Corporation	Macromolecular Corrosion (McIn) Inhibitors: Structures, Methods Of Making And Using The Same

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3100856A1 (de) *	1981-01-14	1982-08-12	Hoechst Ag, 6000 Frankfurt	Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
US4587196A (en) *	1981-06-22	1986-05-06	Philip A. Hunt Chemical Corporation	Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
US4499171A (en) *	1982-04-20	1985-02-12	Japan Synthetic Rubber Co., Ltd.	Positive type photosensitive resin composition with at least two o-quinone diazides
JPS61185741A (ja) *	1985-02-13	1986-08-19	Mitsubishi Chem Ind Ltd	ポジ型フオトレジスト組成物
US4626492A (en) *	1985-06-04	1986-12-02	Olin Hunt Specialty Products, Inc.	Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
US5215857A (en) *	1985-08-07	1993-06-01	Japan Synthetic Rubber Co., Ltd.	1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent
EP0227487B1 (de) *	1985-12-27	1992-07-15	Japan Synthetic Rubber Co., Ltd.	Strahlungsempfindliche positiv arbeitende Kunststoffzusammensetzung
JPS6343134A (ja) *	1986-08-11	1988-02-24	Mitsubishi Chem Ind Ltd	ポジ型フオトレジスト組成物
JPS63178228A (ja) *	1987-01-20	1988-07-22	Fuji Photo Film Co Ltd	ポジ型フオトレジスト組成物
JPH0814696B2 (ja) *	1987-09-17	1996-02-14	富士写真フイルム株式会社	感光性樹脂組成物
JP2552891B2 (ja) *	1988-01-26	1996-11-13	富士写真フイルム株式会社	ポジ型フオトレジスト組成物
JP2552900B2 (ja) *	1988-06-07	1996-11-13	富士写真フイルム株式会社	ポジ型フオトレジスト組成物
US5059507A (en) *	1988-06-13	1991-10-22	Sumitomo Chemical Company, Limited	Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin
JP2800186B2 (ja) *	1988-07-07	1998-09-21	住友化学工業株式会社	集積回路製作用ポジ型レジスト組成物の製造方法
US5001040A (en) *	1988-07-11	1991-03-19	Olin Hunt Specialty Products Inc.	Process of forming resist image in positive photoresist with thermally stable phenolic resin
JP2715480B2 (ja) *	1988-10-13	1998-02-18	住友化学工業株式会社	ポジ型レジスト用組成物
US4957846A (en) *	1988-12-27	1990-09-18	Olin Hunt Specialty Products Inc.	Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group
JP2700918B2 (ja) *	1989-04-26	1998-01-21	富士写真フイルム株式会社	ポジ型フオトレジスト組成物
US5019478A (en) *	1989-10-30	1991-05-28	Olin Hunt Specialty Products, Inc.	Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures

1990
- 1990-02-01 JP JP2022679A patent/JP2761786B2/ja not_active Expired - Lifetime
1991
- 1991-01-30 US US07/647,904 patent/US5565300A/en not_active Expired - Lifetime
- 1991-01-31 EP EP91101307A patent/EP0440238B2/de not_active Expired - Lifetime
- 1991-01-31 DE DE69130125T patent/DE69130125T3/de not_active Expired - Fee Related
- 1991-02-01 KR KR1019910001749A patent/KR0170399B1/ko not_active IP Right Cessation

Also Published As

Publication number	Publication date
JP2761786B2 (ja)	1998-06-04
KR0170399B1 (ko)	1999-03-20
EP0440238A3 (en)	1991-12-11
JPH03228057A (ja)	1991-10-09
DE69130125T3 (de)	2003-01-16
DE69130125T2 (de)	1999-05-06
US5565300A (en)	1996-10-15
EP0440238A2 (de)	1991-08-07
EP0440238B1 (de)	1998-09-09
KR920000008A (ko)	1992-01-10
EP0440238B2 (de)	2002-06-05

Publication	Publication Date	Title
DE69126834D1 (de)	1997-08-21	Positiv arbeitende Photoresistzusammensetzung
DE69130125D1 (de)	1998-10-15	Positiv arbeitende Photolackzusammensetzung
DE69329408D1 (de)	2000-10-19	Positiv arbeitende Photolackzusammensetzung
DE69027099D1 (de)	1996-06-27	Positiv arbeitende Photolackzusammensetzung
DE69131529D1 (de)	1999-09-23	Positiv arbeitende lichtempfindliche Harzzusammensetzung
DE69423800D1 (de)	2000-05-11	Positiv arbeitende fotoempfindliche Zusammensetzung
DE69033212D1 (de)	1999-08-26	Positiv arbeitende Photolack-Zusammensetzung
DE69232042D1 (de)	2001-10-11	Positiv-arbeitende lichtempfindliche Zusammensetzung
DE69327678D1 (de)	2000-03-02	Positiv arbeitende Resistzusammensetzung
DE69019706D1 (de)	1995-06-29	Positiv-arbeitende Photolackzusammensetzung.
DE68926019D1 (de)	1996-04-25	Positiv arbeitende hochempfindliche Photolack-Zusammensetzung
DE3751743D1 (de)	1996-04-25	Positiv arbeitende photoempfindliche Kunststoffzusammensetzung
DE69129955D1 (de)	1998-09-17	Photolackzusammensetzung
DE69500160D1 (de)	1997-04-03	Positiv arbeitende Fotoresistzusammensetzung
DE69608167D1 (de)	2000-06-15	Positiv arbeitende Photoresistzusammensetzung
DE69703310D1 (de)	2000-11-23	Positiv arbeitende photoempfindliche Zusammensetzung
DE69421982D1 (de)	2000-01-13	Positiv arbeitende Photoresistzusammensetzung
DE69510888D1 (de)	1999-08-26	Positiv arbeitende Fotoresist-Zusammensetzung
DE69229332D1 (de)	1999-07-08	Positiv-arbeitende Resistzusammensetzung
DE69121001D1 (de)	1996-08-29	Positiv arbeitende Fotolackzusammensetzung
DE69424884D1 (de)	2000-07-20	Positiv arbeitende Photoresistzusammensetzung
DE69031785D1 (de)	1998-01-22	Lichtempfindliche Zusammensetzung
DE69220612D1 (de)	1997-08-07	Positivarbeitende Photoresistzusammensetzung
DE69123873D1 (de)	1997-02-13	Photoresistzusammensetzung
DE69028476D1 (de)	1996-10-17	Positive arbeitende Fotolackzusammensetzungen

Legal Events

Date	Code	Title	Description
1999-09-16	8363	Opposition against the patent
2002-08-08	8366	Restricted maintained after opposition proceedings
2007-09-20	8327	Change in the person/name/address of the patent owner	Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP
2010-11-18	8339	Ceased/non-payment of the annual fee