DE69019706D1 - Positiv-arbeitende Photolackzusammensetzung. - Google Patents

Positiv-arbeitende Photolackzusammensetzung.

Info

Publication number: DE69019706D1
Authority: DE; Germany
Prior art keywords: photoresist composition; positive working; working photoresist; positive; composition
Prior art date: 1989-12-28
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE69019706T

Other languages

English (en)

Other versions

DE69019706T2 (de

Inventor

Takamasa Yamada

Shoji Kawata

Masayuki Oie

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Zeon Corp

Original Assignee

Nippon Zeon Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-12-28

Filing date

1990-11-09

Publication date

1995-06-29

1990-11-09 Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd

1995-06-29 Application granted granted Critical

1995-06-29 Publication of DE69019706D1 publication Critical patent/DE69019706D1/de

1995-09-21 Publication of DE69019706T2 publication Critical patent/DE69019706T2/de

2010-11-10 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Materials For Photolithography (AREA)

DE69019706T 1989-12-28 1990-11-09 Positiv-arbeitende Photolackzusammensetzung. Expired - Fee Related DE69019706T2 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP1342193A JPH061377B2 (ja)	1989-12-28	1989-12-28	ポジ型レジスト組成物

Publications (2)

Publication Number	Publication Date
DE69019706D1 true DE69019706D1 (de)	1995-06-29
DE69019706T2 DE69019706T2 (de)	1995-09-21

Family

ID=18351839

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69019706T Expired - Fee Related DE69019706T2 (de)	1989-12-28	1990-11-09	Positiv-arbeitende Photolackzusammensetzung.

Country Status (4)

Country	Link
US (1)	US5112719A (de)
EP (1)	EP0435437B1 (de)
JP (1)	JPH061377B2 (de)
DE (1)	DE69019706T2 (de)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2629990B2 (ja) *	1989-12-20	1997-07-16	住友化学工業株式会社	ポジ型レジスト用組成物
JP2927013B2 (ja) *	1990-02-20	1999-07-28	ジェイエスアール株式会社	感放射線性樹脂組成物
KR0184870B1 (ko) *	1990-02-20	1999-04-01	아사구라 다기오	감방사선성 수지 조성물
JP2629403B2 (ja) *	1990-04-28	1997-07-09	東レ株式会社	ポジ型フォトレジスト組成物
JP2813034B2 (ja) *	1990-06-01	1998-10-22	東京応化工業株式会社	ポジ型感光性樹脂組成物
US5395727A (en) *	1990-06-05	1995-03-07	Sumitomo Chemical Company, Limited	Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol
JPH0450851A (ja) *	1990-06-14	1992-02-19	Sumitomo Chem Co Ltd	ポジ型感放射線性レジスト組成物
US5413896A (en) *	1991-01-24	1995-05-09	Japan Synthetic Rubber Co., Ltd.	I-ray sensitive positive resist composition
US5376497A (en) *	1991-04-26	1994-12-27	Nippon Zeon Co., Ltd.	Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compound additive
US5362597A (en) *	1991-05-30	1994-11-08	Japan Synthetic Rubber Co., Ltd.	Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester
US5296330A (en) *	1991-08-30	1994-03-22	Ciba-Geigy Corp.	Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive
JP3039048B2 (ja) *	1991-11-01	2000-05-08	住友化学工業株式会社	ポジ型感放射線性レジスト組成物
US5306594A (en) *	1991-11-04	1994-04-26	Ocg Microelectronic Materials, Inc.	Radiation-sensitive compositions using novolak resins made from a substituted bis(hydroxyphenyl)methane and a bis-(methylol)-cresol
JPH05158233A (ja) *	1991-12-04	1993-06-25	Fuji Photo Film Co Ltd	ポジ型フオトレジスト組成物
JP2761822B2 (ja) *	1992-02-12	1998-06-04	富士写真フイルム株式会社	ポジ型フオトレジスト組成物
US5318875A (en) *	1992-02-12	1994-06-07	Fuji Photo Film Co., Ltd.	Positive quinonediazide photoresist composition containing select hydroxyphenol additive
US5384228A (en) *	1992-04-14	1995-01-24	Tokyo Ohka Kogyo Co., Ltd.	Alkali-developable positive-working photosensitive resin composition
JPH05323605A (ja) *	1992-05-27	1993-12-07	Sumitomo Chem Co Ltd	ポジ型レジスト組成物
JP2944327B2 (ja) *	1992-09-14	1999-09-06	富士写真フイルム株式会社	ポジ型感光性平版印刷版
EP0599779A1 (de) *	1992-10-29	1994-06-01	OCG Microelectronic Materials AG	Hochauflösender negativ arbeitender Photoresist mit grossem Prozessspielraum
US5278021A (en) *	1993-04-05	1994-01-11	Ocg Microelectronic Materials, Inc.	O-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articles
US5283374A (en) *	1993-04-05	1994-02-01	Ocg Microelectronic Materials, Inc.	Selected phenolic derivatives of 4-(4-hydroxyphenyl)-cyclohexanone and their use as sensitivity enhancers for radiation sensitive mixtures
JP2626479B2 (ja) *	1993-06-29	1997-07-02	日本ゼオン株式会社	ポジ型レジスト組成物
JP3130188B2 (ja) *	1993-08-31	2001-01-31	富士写真フイルム株式会社	ポジ型感光性平版印刷版
JPH07199455A (ja) *	1993-12-28	1995-08-04	Tokyo Ohka Kogyo Co Ltd	ポジ型ホトレジスト組成物
DE69519781T2 (de) *	1994-10-05	2001-06-07	Arakawa Chemical Industries, Ltd.	Strahlungsempfindliche Harzzusammensetzung
EP0801327B1 (de) *	1994-12-28	2002-10-16	Nippon Zeon Co., Ltd.	Positivarbeitende resistzusammensetzung
US5685491A (en) *	1995-01-11	1997-11-11	Amtx, Inc.	Electroformed multilayer spray director and a process for the preparation thereof
EP0831370A4 (de) *	1995-01-17	1999-08-18	Nippon Zeon Co	Positiv arbeitende photolackzusammensetzung
JPH0954437A (ja)	1995-06-05	1997-02-25	Fuji Photo Film Co Ltd	化学増幅型ポジレジスト組成物
US5656413A (en) *	1995-09-28	1997-08-12	Hoechst Celanese Corporation	Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom
JP3485139B2 (ja) *	1996-01-30	2004-01-13	東京応化工業株式会社	ポジ型ホトレジスト組成物
TW502135B (en)	1996-05-13	2002-09-11	Sumitomo Bakelite Co	Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same
US5622611A (en) *	1996-05-22	1997-04-22	Amtx, Inc.	Electroformed multilayer flow regulator incorporating force-generating means for selectively constricting the fluid flow path, and a process for the preparation thereof
SG78412A1 (en)	1999-03-31	2001-02-20	Ciba Sc Holding Ag	Oxime derivatives and the use thereof as latent acids
JP2000347397A (ja)	1999-06-04	2000-12-15	Jsr Corp	感放射線性樹脂組成物およびその層間絶縁膜への使用
JP2001033951A (ja) *	1999-07-06	2001-02-09	Clariant Internatl Ltd	感光性樹脂組成物および感光性樹脂組成物のドライエッチング耐性向上方法
JP2002040654A (ja)	2000-07-31	2002-02-06	Sumitomo Bakelite Co Ltd	ポジ型感光性樹脂組成物
US6908717B2 (en)	2000-10-31	2005-06-21	Sumitomo Bakelite Company Limited	Positive photosensitive resin composition, process for its preparation, and semiconductor devices
JP3750994B2 (ja) *	2001-11-16	2006-03-01	東京応化工業株式会社	ポジ型ホトレジスト組成物および傾斜インプランテーションプロセス用薄膜レジストパターンの形成方法
KR101758398B1 (ko)	2009-09-11	2017-07-14	제이에스알 가부시끼가이샤	감방사선성 조성물 및 신규 화합물
KR102537349B1 (ko)	2015-02-02	2023-05-26	바스프 에스이	잠재성 산 및 그의 용도

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL247588A (de) *	1959-01-21
JPS5280022A (en) *	1975-12-26	1977-07-05	Fuji Photo Film Co Ltd	Light solubilizable composition
US4365019A (en) *	1981-08-06	1982-12-21	Eastman Kodak Company	Positive-working resist quinone diazide containing composition and imaging method having improved development rates
JPS60150047A (ja) *	1984-01-17	1985-08-07	Fuji Photo Film Co Ltd	ポジ型感光性組成物
US4626492A (en) *	1985-06-04	1986-12-02	Olin Hunt Specialty Products, Inc.	Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
JPS6284035A (ja) *	1985-10-08	1987-04-17	Mitsui Petrochem Ind Ltd	トリフエノ−ル系化合物
DE3784549D1 (de) *	1986-05-02	1993-04-15	Hoechst Celanese Corp	Positiv-arbeitendes lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial.
DE3724791A1 (de) *	1987-07-27	1989-02-09	Merck Patent Gmbh	Positiv-fotoresist-zusammensetzungen
US4950637A (en) *	1988-04-13	1990-08-21	Kanzaki Paper Manufacturing Co. Ltd.	Heat sensitive recording material
US4983492A (en) *	1988-06-06	1991-01-08	Shipley Company Inc.	Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol

1989
- 1989-12-28 JP JP1342193A patent/JPH061377B2/ja not_active Expired - Fee Related
1990
- 1990-10-26 US US07/603,355 patent/US5112719A/en not_active Expired - Lifetime
- 1990-11-09 DE DE69019706T patent/DE69019706T2/de not_active Expired - Fee Related
- 1990-11-09 EP EP90312293A patent/EP0435437B1/de not_active Expired - Lifetime

Also Published As

Publication number	Publication date
EP0435437B1 (de)	1995-05-24
JPH061377B2 (ja)	1994-01-05
DE69019706T2 (de)	1995-09-21
JPH03200252A (ja)	1991-09-02
EP0435437A1 (de)	1991-07-03
US5112719A (en)	1992-05-12

Publication	Publication Date	Title
DE69019706D1 (de)	1995-06-29	Positiv-arbeitende Photolackzusammensetzung.
DE68915148D1 (de)	1994-06-09	Fotoresist-zusammensetzung.
DE69014913D1 (de)	1995-01-26	Lichtempfindliche Zusammensetzung.
FR2654932B1 (fr)	1993-08-13	Composition anorexigene.
EP0673996A3 (de)	1997-05-02	Reinigungsmittelzusammensetzungen.
DE69027099D1 (de)	1996-06-27	Positiv arbeitende Photolackzusammensetzung
EP0573056A3 (de)	1994-10-12	Positiv arbeitende Photolackzusammensetzung.
DE68914176D1 (de)	1994-05-05	Photopolymerisierbare Zusammensetzung.
FI904801A0 (fi)	1990-09-28	Komposition.
NO901838L (no)	1990-10-29	Emulgerbare pasticidiske faststoff-sammensetninger.
DE59009431D1 (de)	1995-08-31	Photoresist.
DE69033212D1 (de)	1999-08-26	Positiv arbeitende Photolack-Zusammensetzung
DE68920112D1 (de)	1995-02-02	Waschmittelzusammensetzung.
DE3853694D1 (de)	1995-06-08	Photolackzusammensetzung.
FI906418A0 (fi)	1990-12-27	Eldfast komposition.
DE69009322D1 (de)	1994-07-07	Polymerisierbare Zusammensetzung.
AR244544A1 (es)	1993-11-30	Composicion desodorante.
DE69012475D1 (de)	1994-10-20	Lichtempfindliche Zusammensetzungen.
DE69028476D1 (de)	1996-10-17	Positive arbeitende Fotolackzusammensetzungen
DE69017477D1 (de)	1995-04-13	Photohärtbare Zusammensetzungen.
DE69220612D1 (de)	1997-08-07	Positivarbeitende Photoresistzusammensetzung
FI903713A0 (fi)	1990-07-24	Lokal spironolaktonkomposition.
NO904241D0 (no)	1990-09-28	Pakkeseddel.
EP0570884A3 (de)	1995-06-07	Positivarbeitende Resistzusammensetzung.
EP0571988A3 (de)	1994-11-09	Positiv arbeitende Photolackzusammensetzung.

Legal Events

Date	Code	Title	Description
1996-06-20	8364	No opposition during term of opposition
2004-09-23	8339	Ceased/non-payment of the annual fee