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DE3884679D1 - Niederschlagung von amorphen Silizium zur Herstellung dielektrischer Zwischenschichten für halbleiter Speicherzellen. - Google Patents

Niederschlagung von amorphen Silizium zur Herstellung dielektrischer Zwischenschichten für halbleiter Speicherzellen.

Info

Publication number
DE3884679D1
DE3884679D1 DE88109247T DE3884679T DE3884679D1 DE 3884679 D1 DE3884679 D1 DE 3884679D1 DE 88109247 T DE88109247 T DE 88109247T DE 3884679 T DE3884679 T DE 3884679T DE 3884679 D1 DE3884679 D1 DE 3884679D1
Authority
DE
Germany
Prior art keywords
precipitation
production
memory cells
semiconductor memory
amorphous silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE88109247T
Other languages
English (en)
Other versions
DE3884679T2 (de
Inventor
Mark Douglas Griswold
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motorola Solutions Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Application granted granted Critical
Publication of DE3884679D1 publication Critical patent/DE3884679D1/de
Publication of DE3884679T2 publication Critical patent/DE3884679T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0411—Manufacture or treatment of FETs having insulated gates [IGFET] of FETs having floating gates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/32105—Oxidation of silicon-containing layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/32055—Deposition of semiconductive layers, e.g. poly - or amorphous silicon layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/68—Floating-gate IGFETs
    • H10D30/6891—Floating-gate IGFETs characterised by the shapes, relative sizes or dispositions of the floating gate electrode
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/031—Manufacture or treatment of data-storage electrodes
    • H10D64/035—Manufacture or treatment of data-storage electrodes comprising conductor-insulator-conductor-insulator-semiconductor structures

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Non-Volatile Memory (AREA)
  • Semiconductor Memories (AREA)
DE88109247T 1987-06-26 1988-06-10 Niederschlagung von amorphen Silizium zur Herstellung dielektrischer Zwischenschichten für halbleiter Speicherzellen. Expired - Fee Related DE3884679T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/066,672 US4748133A (en) 1987-06-26 1987-06-26 Deposition of amorphous silicon for the formation of interlevel dielectrics in semiconductor memory devices

Publications (2)

Publication Number Publication Date
DE3884679D1 true DE3884679D1 (de) 1993-11-11
DE3884679T2 DE3884679T2 (de) 1994-02-03

Family

ID=22070967

Family Applications (1)

Application Number Title Priority Date Filing Date
DE88109247T Expired - Fee Related DE3884679T2 (de) 1987-06-26 1988-06-10 Niederschlagung von amorphen Silizium zur Herstellung dielektrischer Zwischenschichten für halbleiter Speicherzellen.

Country Status (5)

Country Link
US (1) US4748133A (de)
EP (1) EP0296418B1 (de)
JP (1) JPS6433973A (de)
KR (1) KR970003904B1 (de)
DE (1) DE3884679T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5572054A (en) * 1990-01-22 1996-11-05 Silicon Storage Technology, Inc. Method of operating a single transistor non-volatile electrically alterable semiconductor memory device
US5242848A (en) * 1990-01-22 1993-09-07 Silicon Storage Technology, Inc. Self-aligned method of making a split gate single transistor non-volatile electrically alterable semiconductor memory device
JPH0799771B2 (ja) * 1992-06-26 1995-10-25 インターナショナル・ビジネス・マシーンズ・コーポレイション 皮膜中の応力を制御する方法
JPH06216392A (ja) * 1993-01-20 1994-08-05 Mitsubishi Electric Corp 半導体装置の製造方法
US5298447A (en) * 1993-07-22 1994-03-29 United Microelectronics Corporation Method of fabricating a flash memory cell
JP3313840B2 (ja) * 1993-09-14 2002-08-12 富士通株式会社 半導体装置の製造方法
US5712177A (en) * 1994-08-01 1998-01-27 Motorola, Inc. Method for forming a reverse dielectric stack
US5665620A (en) * 1994-08-01 1997-09-09 Motorola, Inc. Method for forming concurrent top oxides using reoxidized silicon in an EPROM
JP3598197B2 (ja) * 1997-03-19 2004-12-08 株式会社ルネサステクノロジ 半導体装置
KR100588873B1 (ko) * 1998-12-30 2006-08-18 주식회사 하이닉스반도체 플래쉬 메모리 소자의 플로팅 게이트 형성 방법
US20040007733A1 (en) * 2002-06-26 2004-01-15 Macronix International Co., Ltd. Floating gate memory cell and forming method
US6872972B2 (en) * 2003-07-16 2005-03-29 Macronix International Co., Ltd. Method for forming silicon film with changing grain size by thermal process
CN100353566C (zh) * 2003-10-20 2007-12-05 旺宏电子股份有限公司 具变换粒径的硅结构的半导体组件及其形成方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS606108B2 (ja) * 1976-07-07 1985-02-15 株式会社東芝 半導体装置の製造方法
US4282540A (en) * 1977-12-23 1981-08-04 International Business Machines Corporation FET Containing stacked gates
US4370798A (en) * 1979-06-15 1983-02-01 Texas Instruments Incorporated Interlevel insulator for integrated circuit with implanted resistor element in second-level polycrystalline silicon
JPS5626472A (en) * 1979-08-13 1981-03-14 Hitachi Ltd Semiconductor memory
DE3037744A1 (de) * 1980-10-06 1982-05-19 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen einer monolithisch integrierten zwei-transistor-speicherzelle in mos-technik
JPS5836506B2 (ja) * 1980-11-20 1983-08-09 富士通株式会社 半導体記憶装置
JPS5933880A (ja) * 1982-08-19 1984-02-23 Nec Corp 半導体装置の製造方法
EP0153889A3 (de) * 1984-02-29 1988-08-10 Fairchild Semiconductor Corporation Deprogrammierunempfindliches EPROM-Verfahren
JPS60189971A (ja) * 1984-03-09 1985-09-27 Toshiba Corp 半導体装置の製造方法
US4679171A (en) * 1985-02-07 1987-07-07 Visic, Inc. MOS/CMOS memory cell
JPS61240656A (ja) * 1985-04-18 1986-10-25 Toshiba Corp 半導体装置の製造方法
JPS6257224A (ja) * 1985-09-06 1987-03-12 Toshiba Corp 半導体装置の製造方法

Also Published As

Publication number Publication date
KR890001190A (ko) 1989-03-18
DE3884679T2 (de) 1994-02-03
EP0296418B1 (de) 1993-10-06
EP0296418A2 (de) 1988-12-28
EP0296418A3 (en) 1990-06-06
JPS6433973A (en) 1989-02-03
US4748133A (en) 1988-05-31
KR970003904B1 (ko) 1997-03-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee