[go: up one dir, main page]

CN1531090A - 半导体装置、电子设备及它们的制造方法,以及电子仪器 - Google Patents

半导体装置、电子设备及它们的制造方法,以及电子仪器 Download PDF

Info

Publication number
CN1531090A
CN1531090A CNA2004100397309A CN200410039730A CN1531090A CN 1531090 A CN1531090 A CN 1531090A CN A2004100397309 A CNA2004100397309 A CN A2004100397309A CN 200410039730 A CN200410039730 A CN 200410039730A CN 1531090 A CN1531090 A CN 1531090A
Authority
CN
China
Prior art keywords
carrier substrate
semiconductor chip
semiconductor
semiconductor device
addition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CNA2004100397309A
Other languages
English (en)
Other versions
CN100342538C (zh
Inventor
青栁哲理
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of CN1531090A publication Critical patent/CN1531090A/zh
Application granted granted Critical
Publication of CN100342538C publication Critical patent/CN100342538C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/561Batch processing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/563Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3121Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
    • H01L23/3128Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L24/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of semiconductor or other solid state devices
    • H01L25/03Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of semiconductor or other solid state devices
    • H01L25/03Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H10D89/00
    • H01L25/0657Stacked arrangements of devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of semiconductor or other solid state devices
    • H01L25/03Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes
    • H01L25/10Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices having separate containers
    • H01L25/105Assemblies consisting of a plurality of semiconductor or other solid state devices all the devices being of a type provided for in a single subclass of subclasses H10B, H10F, H10H, H10K or H10N, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/023Redistribution layers [RDL] for bonding areas
    • H01L2224/0237Disposition of the redistribution layers
    • H01L2224/02377Fan-in arrangement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/05001Internal layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/05001Internal layers
    • H01L2224/05005Structure
    • H01L2224/05009Bonding area integrally formed with a via connection of the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/05001Internal layers
    • H01L2224/0502Disposition
    • H01L2224/05025Disposition the internal layer being disposed on a via connection of the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0556Disposition
    • H01L2224/0557Disposition the external layer being disposed on a via connection of the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/1302Disposition
    • H01L2224/13025Disposition the bump connector being disposed on a via connection of the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16135Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/16145Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45117Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/45124Aluminium (Al) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48095Kinked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83192Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
    • H01L2225/04All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same main group of the same subclass of class H10
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06555Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking
    • H01L2225/06558Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking the devices having passive surfaces facing each other, i.e. in a back-to-back arrangement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
    • H01L2225/04All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same main group of the same subclass of class H10
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06555Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking
    • H01L2225/06568Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking the devices decreasing in size, e.g. pyramidical stack
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
    • H01L2225/10All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
    • H01L2225/1011All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
    • H01L2225/1017All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement the lowermost container comprising a device support
    • H01L2225/1023All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement the lowermost container comprising a device support the support being an insulating substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes
    • H01L2225/10All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10
    • H01L2225/1011All the devices being of a type provided for in the same main group of the same subclass of class H10, e.g. assemblies of rectifier diodes the devices having separate containers the devices being integrated devices of class H10 the containers being in a stacked arrangement
    • H01L2225/1047Details of electrical connections between containers
    • H01L2225/1058Bump or bump-like electrical connections, e.g. balls, pillars, posts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01015Phosphorus [P]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01028Nickel [Ni]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/0105Tin [Sn]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01074Tungsten [W]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01075Rhenium [Re]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1532Connection portion the connection portion being formed on the die mounting surface of the substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1532Connection portion the connection portion being formed on the die mounting surface of the substrate
    • H01L2924/1533Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate
    • H01L2924/15331Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Wire Bonding (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

可在抑制载体基板的挠曲的同时,实现不同种类芯片的3维安装结构。在通过ACF接合双面安装半导体芯片23a、23b的半导体组件PK11上,层叠引线接合连接堆叠结构的半导体芯片33a、33b的半导体组件PK12。

Description

半导体装置、电子设备及它们的制造方法,以及电子仪器
技术领域
本发明涉及一种半导体装置、电子设备、电子仪器、半导体装置的制造方法和电子设备的制造方法,尤其适用于半导体组件(封装)等的层叠结构。
背景技术
在现有的半导体装置中,为了实现半导体芯片安装时的空间节省,例如有专利文献1中公开的那样经载体基板进行3维安装半导体芯片的方法。
专利文献1:特开平10-284683号公报
但是,在经载体基板进行3维安装半导体芯片的方法中,由于载体基板表面的线性膨胀系数不同,所以载体基板的挠曲大。
发明内容
因此,本发明的目的在于提供一种在抑制载体基板的挠曲的同时、可实现不同种类芯片的3维安装结构的半导体装置、电子设备、电子仪器、半导体装置的制造方法和电子设备的制造方法。
为了解决上述问题,根据本发明之一形态的半导体装置,其特征在于,具备:第1载体基板;面朝下安装在所述第1载体基板上的第1半导体芯片;面朝下安装在所述第1载体基板背面的第2半导体芯片;第2载体基板;装载在所述第2载体基板上的第3半导体芯片;和突出电极,以连接所述第2载体基板与所述第1载体基板,使所述第2载体基板保持在所述第1半导体芯片上。
由此,可在第1载体基板的表里设置材料物性相等的半导体芯片,可降低第1载体基板的表里线膨胀系数的差异。因此,可在抑制第1载体基板挠曲的同时,在第1载体基板上层叠第2载体基板,可在确保第1载体基板与第2载体基板的连接可靠性的同时,实现不同种类芯片的3维安装结构。
根据本发明之一形态的半导体装置,其特征在于,将所述第2载体基板固定在第1载体基板上,以跨在所述第1半导体芯片上。
由此,可重叠配置第1半导体芯片与第3半导体芯片,使安装多个半导体芯片时的安装面积降低,可实现半导体芯片安装时的空间节省。
另外,根据本发明之一形态的半导体装置,其特征在于,具备密封所述第3半导体芯片的密封件。
由此,可保护第3半导体芯片不被腐蚀或破坏等,可使第3半导体芯片的可靠性提高。
另外,根据本发明之一形态的半导体装置,其特征在于,所述密封件是模制树脂。
由此,可使包含第2载体基板的不同种类组件层叠在第1载体基板上,即使在半导体芯片的种类不同的情况下,也可实现半导体芯片的3维安装结构。
另外,根据本发明之一形态的半导体装置,其特征在于,所述密封件的侧壁与所述第2载体基板的侧壁位置一致。
由此,可在抑制在第1载体基板上层叠第2载体基板时的高度增大的同时,用密封第3半导体芯片的密封件来增强第2载体基板的单面整体,并可以不进行密封件的单元分割就可密封第3半导体芯片,使装载在第2载体基板上的第3半导体芯片的装载面积增大。
另外,根据本发明之一形态的半导体装置,其特征在于,所述第1半导体芯片和所述第2半导体芯片,通过压接接合连接于所述第1载体基板上。
由此,可实现将第1半导体芯片和第2半导体芯片连接在第1载体基板上时的低温化,可降低实际使用时的第1载体基板的挠曲。
另外,根据本发明之一形态的半导体装置,其特征在于,包含所述第1载体基板的半导体装置与包含所述第2载体基板的半导体装置在相等温度下的弹性系数不同。
由此,可由一个载体基板来抑制在另一载体基板中产生的挠曲,可使第1载体基板与第2载体基板之间的连接可靠性提高。
另外,根据本发明之一形态的半导体装置,其特征在于,装载所述第1半导体芯片和所述第2半导体芯片的第1载体基板是倒装片安装的球状栅格阵列,装载所述第3半导体芯片的第2载体基板是模制密封的球状栅格阵列或芯片尺寸组件。
由此,可抑制3维安装结构的高度增大,使不同种类的组件层叠,即使在半导体芯片的种类不同的情况下,也可实现半导体芯片安装时的空间节省。
另外,根据本发明之一形态的半导体装置,其特征在于,所述第3半导体芯片包含层叠多个芯片的结构。
由此,可在第1半导体芯片上层叠多个种类或尺寸不同的第3半导体芯片,可具有各种功能,同时,可实现半导体芯片安装时的空间节省。
另外,根据本发明之一形态的半导体装置,其特征在于,所述第3半导体芯片包含将多个芯片并列配置在第2载体基板上的结构。
由此,可在抑制第3半导体芯片层叠时的高度增大的同时,将多个第3半导体芯片配置在第1半导体芯片上,在抑制3维安装时的连接可靠性恶化的同时,实现半导体芯片安装时的空间节省。
另外,根据本发明之一形态的半导体装置,其特征在于,具备第1载体基板;面朝下安装在所述第1载体基板表面和背面的至少一方的面上的第1半导体芯片;第2载体基板;装载在所述第2载体基板上的第2半导体芯片;装载在所述第2载体基板的背面的第3半导体芯片;和连接所述第2载体基板与所述第1载体基板的突出电极。
由此,可在第2载体基板的表里设置材料物性相等的半导体芯片,可降低第2载体基板的表里线膨胀系数的差异。因此,可在抑制第2载体基板挠曲的同时,在第1载体基板上层叠第2载体基板,可在确保第1载体基板与第2载体基板的连接可靠性的同时,实现不同种类芯片的3维安装结构。
另外,根据本发明之一形态的半导体装置,其特征在于,具备载体基板;面朝下安装在所述载体基板上的第1半导体芯片;面朝下安装在所述第1载体基板背面的第2半导体芯片;在电极衬垫的形成面上形成再配置配线层的第3半导体芯片;和突出电极,以连接所述第3半导体芯片与所述载体基板,使所述第3半导体芯片保持在所述第1半导体芯片上。
由此,即使在半导体芯片的种类或尺寸不同的情况下,也不会使载体基板插在第1半导体芯片与第3半导体芯片之间,可在第1半导体芯片上倒装片安装第3半导体芯片,同时,可在第1载体基板的背面分别设置材料物性相等的第1和第2半导体芯片,可降低第1载体基板的表里线膨胀系数的差异。
因此,可在抑制第1载体基板的挠曲的同时,在第1载体基板上层叠第3半导体芯片,在确保第3半导体芯片与第1载体基板的连接可靠性的同时,实现半导体芯片安装时的空间节省。
另外,根据本发明之一形态的电子设备,其特征在于,具备第1载体基板;装载在所述第1载体基板上的第1电子零件;装载在所述第1载体基板的背面的第2电子零件;第2载体基板;装载在所述第2载体基板上的第3电子零件;突出电极,以连接所述第2载体基板与所述第1载体基板,使所述第2载体基板保持在所述第1电子零件上;和密封所述第3电子零件的密封件。
由此,可在抑制第1载体基板的挠曲的同时,在第1电子零件上层叠包装不同的第3电子零件,可在确保不同组件间的连接可靠性的同时,实现不同种类部件的3维安装结构。
另外,根据本发明之一形态的电子仪器,其特征在于,具备第1载体基板;装载在所述第1载体基板上的第1半导体芯片;装载在所述第1载体基板背面的第2半导体芯片;第2载体基板;装载在所述第2载体基板上的第3半导体芯片;突出电极,以连接所述第2载体基板与所述第1载体基板,使所述第2载体基板保持在所述第1半导体芯片上;密封所述第3半导体芯片的密封件;和安装所述第1载体基板的母基板。
由此,可在抑制第1载体基板的挠曲的同时,在第1半导体芯片上层叠包装不同的第3半导体芯片,可在确保不同种类组件间的连接可靠性的同时,实现不同种类芯片的3维安装结构。
另外,根据本发明之一形态的半导体装置的制造方法,其特征在于,具备如下工序:即,将第1半导体芯片面朝下安装在第1载体基板上的工序;将第2半导体芯片面朝下安装在所述第1载体基板的背面的工序;将第3半导体芯片安装在第2载体基板上的工序;在所述第2载体基板中形成突出电极的工序;用密封树脂密封安装在所述第2载体基板上的第3半导体芯片的工序;和经所述突出电极来连接所述第2载体基板与所述第1载体基板,使所述第2载体基板保持在所述第1半导体芯片上的工序。
由此,可在第1载体基板的背面分别设置第1和第2半导体芯片的状态下,在第1载体基板上层叠第2载体基板。因此,可在抑制第1载体基板的挠曲的同时,在第1半导体芯片上层叠包装不同的第3半导体芯片,可在确保不同组件间的连接可靠性的同时,实现不同种类芯片的3维安装结构。
另外,根据本发明之一形态的半导体装置的制造方法,其特征在于,由所述密封树脂密封所述第3半导体芯片的工序具备:由密封树脂一体模制成形安装在所述第2载体基板上的多个第3半导体芯片的工序;和对每个所述第3半导体芯片切断通过所述密封树脂模制成形的所述第2载体基板的工序。
由此,可对各个第3半导体芯片单元分割密封树脂,用密封树脂来密封第3半导体芯片,同时,可用密封树脂来增强第2载体基板的单面整体。
因此,即使在第3半导体芯片的种类或尺寸不同的情况下,也可通用模制成形时的模具,可提高密封树脂工序的效率,同时,因为不需单元分割用的空间,所以可使装载在第2载体基板上的第3半导体芯片的装载面积增大。
另外,根据本发明之一形态的电子设备的制造方法,其特征在于,具备如下工序:即,将第1电子零件面朝下安装在第1载体基板上的工序;将第2电子零件面朝下安装在所述第1载体基板的背面的工序;将第3电子零件安装在第2载体基板上的工序;在所述第2载体基板中形成突出电极的工序;用密封树脂密封安装在所述第2载体基板上的第3电子零件的工序;和经所述突出电极来连接所述第2载体基板与所述第1载体基板,使所述第2载体基板保持在所述第1电子零件上的工序。
由此,可在第1载体基板的表背面分别设置第1和第2电子零件的状态下,在第1载体基板上层叠第2载体基板。因此,可在抑制第1载体基板的挠曲的同时,在第1电子零件上层叠包装不同的第3电子零件,可在确保不同种类组件间的连接可靠性的同时,实现不同种类部件的3维安装结构。
附图说明
图1是表示根据实施方式1的半导体装置的结构的截面图。
图2是表示根据实施方式2的半导体装置的结构的截面图。
图3是表示根据实施方式3的半导体装置的结构的截面图。
图4是表示根据实施方式4的半导体装置的制造方法的截面图。
图5是表示根据实施方式4的半导体装置的制造方法的截面图。
图6是表示根据实施方式5的半导体装置的制造方法的截面图。
图7是表示根据实施方式6的半导体装置的结构的截面图。
图8是表示根据实施方式7的半导体装置的结构的截面图。
图中,
21、31、41、51、61、61a~61c、71、81、101、111、201、321、331--载体基板,22a、22c、32a、32c、42a、42c、52a、52c、72a、72b、82、102a、102c、112a、112c、202a、202c、322a、322c、332a、332c-岸面,22b、32b、42b、52b、102b、112b、202b、322b、332b-内部配线,23a、23b、33a、33b、43a、43b、53a、53b、62a~62c、73a、73b、103a、103b、113a~113c、203a、203b、211、323、333a~333c-半导体芯片,24a、24b、26、36、44a、44b、46、55a、56、65a~65c、74a、74b、77、83、104a、104b、121、123、204a、204b、206、218、324、326、334c、336-突出电极,25a、25b、45a、45b、54a、75a、75b、105a、105b、205a、205b、325、335c-各向异性导电片,34a、34b、54b、334a、334b-粘接层,35a、35b、55b、63a~63c、335a、335b-导电性引线,37、57、64、64a~64c、84、120a、120b、122、337-密封树酯,76-焊剂,78-隔板,114a~114c、212-电极衬垫,115a~115c、117a~117c、213-绝缘膜,116a~116c-贯通孔,118a~118c-导电膜,119a~119c-贯通电极,214-应力缓和层,215-再配置配线,216-焊料抗蚀剂膜层,217-开口部,PK11、PK12、PK21、PK22、PK31、PK32、PK41、PK42、PK51、PK52、PK61、PK62-半导体组件
具体实施方式
下面,参照附图来说明根据本发明实施方式的半导体装置、电子设备和其制造方法。
图1是表示根据本发明实施方式1的半导体装置的结构的截面图。在该实施方式1中,在通过ACF接合双面安装半导体芯片(或半导体压模)23a、23b的半导体组件PK11上,层叠引线接合连接堆叠结构的半导体芯片(或半导体压模)33a、33b的半导体组件PK12。
图1中,在半导体组件PK11中设置载体基板21,在载体基板21的两个面中分别形成岸面22a、22c,同时,在载体基板21内形成内部配线22b。另外,在载体基板21的背面中分别倒装片安装半导体芯片23a、23b,在半导体芯片23a、23b中分别设置用于倒装片安装的突出电极24a、24b。另外,分别设置在半导体芯片23a、23b中的突出电极24a、24b分别经各向异性导电片25a、25b分别ACF((An isotropic ConductiveFilm)接合在岸面22c、22a上。另外,在设置在载体基板21背面的岸面22a上,设置用于将载体基板21安装在母基板上的突出电极26。
这里,通过在载体基板21的背面分别装载半导体芯片23a、23b,可降低载体基板21的背面的线膨胀系数的差异,降低载体基板21的挠曲。另外,通过用ACF接合将半导体芯片23a、23b安装在载体基板21上,不需引线接合或模制密封用的空间,可实现3维安装时的空间节省,同时,可实现将半导体芯片23接合在载体基板21上时的低温化,可降低实际使用时的载体基板21的挠曲。
另外,最好装载在载体基板21背面的半导体芯片23a、23b的厚度和尺寸相等,但半导体芯片23a、23b的厚度或尺寸也可不同。
另一方面,在半导体组件PK12中设置载体基板31,在载体基板31的两个面中分别形成岸面32a、32c,同时,在载体基板31内形成内部配线32b。另外,在载体基板31上经粘接层34a面朝上安装半导体芯片33a,半导体芯片33经导电性引线35a引线接合连接于岸面32c上。并且,在半导体芯片33a上,避开导电性引线35a,面朝上安装半导体芯片33b,半导体芯片33b经粘接层34b固定在半导体芯片33a上,同时,经导电性引线35b引线接合连接于岸面32c上。
另外,在设置在载体基板31背面的岸面32a上,设置将载体基板31安装在载体基板21上的突出电极36,使载体基板31保持在半导体芯片23a上。这里,避开半导体芯片23a的装载区域来配置突出电极36,例如可将突出电极36配置在载体基板31背面的周围。另外,通过使突出电极36与设置在载体基板21上的岸面22c接合,可将载体基板31安装在载体基板21上。
由此,可在抑制载体基板21的挠曲的同时,在半导体芯片23a、23b上层叠包装不同的半导体芯片33a、33b。因此,在可确保载体基板21、31间的连接可靠性的同时,层叠不同种类组件PK11、PK12,可实现不同种类的半导体芯片23a、23b、33a、33b的3维安装结构。
另外,用密封树脂37来密封半导体芯片33a、33b,密封树脂37例如可通过使用环氧树脂等热固化性树脂的模制成形等来形成。
这里,通过模制成形在半导体芯片33a、33b的安装面侧的载体基板31的单面整体中形成密封树脂37,即使在载体基板31上安装各种半导体芯片33a、33b的情况下,也可能用模制成形时的模具,提高密封树脂工序的效率,同时,因为不需要单元分割密封树脂37的空间,所以可使装载在载体基板31上的半导体芯片33a、33b的装载面积增大。
另外,作为载体基板21、31,例如可使用双面基板、多层配线基板、内建基板、带状基板或薄膜基板等,作为载体基板21、31的材质,例如可使用聚酰亚胺树脂、玻璃环氧树脂、BT树脂、芳族聚酰胺与环氧树脂的合成、或陶瓷等。另外,作为突出电极24a、24b、26、36,例如可使用由Au突块、焊锡材料等覆盖的Cu突块或Ni突块、或焊锡球等。这里,作为突出电极26、36,例如由于使用焊锡球,通过使用能用的BGA,可层叠不同种类组件PK11、PK12彼此,可能采用生产线。另外,作为导电性引线35a、35b,例如可使用Au引线或Al引线等。另外,在上述实施方式中,说明了为了将载体基板31安装在载体基板21上,而在载体基板31的岸面32a上设置突出电极36的方法,但也可将突出电极36设置在载体基板21的岸面22c上。
另外,在上述实施方式中,说明了通过ACF接合将半导体芯片23安装在载体基板11上的方法,但例如也可使用NCF(Nonconductive Film)接合、ACP(An isotropic Conductive Paste)接合、NCP(NonconductivePaste)接合等其它粘接剂接合,或使用焊锡接合或合金接合等金属接合。并且,在上述实施方式中,举例说明了在载体基板11的表背面上仅分别安装1个半导体芯片23a、23b的方法,但也可在载体基板21的表背面上分别安装多个半导体芯片。
图2是表示根据实施方式2的半导体装置的结构的截面图。在实施方式2中,在通过ACF接合双面安装半导体芯片43a、43b的半导体组件PK21上,层叠分别倒装片安装和引线接合连接堆叠结构的半导体芯片53a、53b的半导体组件PK22。
图2中,在半导体组件PK21中设置载体基板41,在载体基板41的两个面中分别形成岸面42a、42c,同时,在载体基板41内形成内部配线42b。另外,在载体基板41的表背面中分别倒装片安装半导体芯片43a、43b,在半导体芯片43a、43b中分别设置用于倒装片安装的突出电极44a、44b。另外,分别设置在半导体芯片43a、43b中的突出电极44a、44b分别经各向异性导电片45a、45b分别ACF接合在岸面42c、42a上。另外,在设置在载体基板41背面的岸面42a上,设置用于将载体基板41安装在母基板上的突出电极46。
这里,通过在载体基板41的表背面分别装载半导体芯片43a、43b,可降低载体基板41的表背面的线膨胀系数的差异,降低载体基板41的挠曲。另外,通过用ACF接合将半导体芯片43a、43b安装在载体基板41上,不需引线接合或模制密封用的空间,可实现3维安装时的空间节省,同时,可实现将半导体芯片43a、43b接合在载体基板41上时的低温化,可降低实际使用时的载体基板41的挠曲。
另一方面,在半导体组件PK22中设置载体基板51,在载体基板51的两个面分别形成岸面52a、52c,同时,在载体基板51内形成内部配线52b。另外,在载体基板51上面朝上安装半导体芯片53a,在半导体芯片53a上设置用于倒装片安装的突出电极55a。另外,设置在半导体芯片53a上的突出电极55a经各向异性导电片54aACF接合在岸面52c上。并且,在半导体芯片53a上,面朝上安装半导体芯片53b,半导体芯片53b经粘接层54b固定在半导体芯片53a上,同时,经导电性引线55b引线接合连接于岸面52c上。
这里,通过在面朝下安装的半导体芯片53a上面朝上安装半导体芯片53b,可不插入载体基板地在半导体芯片53a上层叠尺寸与半导体芯片53a相等或比其大的半导体芯片53b,可缩小安装面积。
另外,在设置在载体基板51背面的岸面52a上,设置将载体基板51安装在载体基板41上的突出电极56,使载体基板51保持在半导体芯片43a上。这里,避开半导体芯片43a的装载区域来配置突出电极56,例如可将突出电极56配置在载体基板51背面的周围。另外,通过使突出电极56与设置在载体基板41上的岸面42c接合,可将载体基板51安装在载体基板41上。
由此,可在抑制载体基板41的挠曲的同时,在半导体芯片43上层叠包装不同的半导体芯片53a、53b。因此,在可确保载体基板41、51间的连接可靠性的同时,层叠不同种类组件PK11、PK12,可实现不同种类的半导体芯片43a、43b、53a、53b的3维安装结构。
另外,作为突出电极46、56,例如可使用焊锡球。由此,通过使用能用的BGA,可层叠不同种类组件PK11、PK12彼此,可能采用生产线。
另外,用密封树脂57来密封半导体芯片53a、53b,密封树脂57例如可通过使用环氧树脂等热固化性树脂的模制成形等来形成。
这里,通过模制成形在半导体芯片53a、53b的安装面侧的载体基板51的单面整体中形成密封树脂57,即使在载体基板51上安装各种半导体芯片53a、53b的情况下,也可能用模制成形时的模具,提高密封树脂工序的效率,同时,因为不需要单元分割密封树脂57的空间,所以可使装载在载体基板51上的半导体芯片53a、53b的装载面积增大。
图3是表示根据实施方式3的半导体装置的结构的截面图。在实施方式3中,在由密封树脂64一体模制成形多个半导体芯片62a~62c之后,通过切断成每个半导体芯片62a~62c,在分别安装半导体芯片62a~62c的载体基板61a~61c的单面整体中分别形成密封树脂64a~64c。
图3(a)中,在载体基板61中设置装载多个半导体芯片62a~62c的装载区域。另外,将多个半导体芯片62a~62c安装在载体基板61上,分别经导电性引线63a~63c引线接合连接在载体基板61上。另外,除引线接合连接半导体芯片62a~62c的方法外,也可将半导体芯片62a~62c倒装片安装在载体基板61上,或将半导体芯片62a~62c的层叠结构安装在载体基板61上。
接着,如图3(b)所示,由密封树脂64一体模制成形安装在载体基板61上的多个半导体芯片62a~62c。这里,通过由密封树脂64一体模制成形多个半导体芯片62a~62c,即使在载体基板61上安装各种半导体芯片62a~62c的情况下,也可通用模制成形时的模具,可提高密封树脂工序的效率,同时,因为不需要单元分割密封树脂64的空间,所以可使装载在载体基板61上的半导体芯片62a~62c的装载面积增大。
接着,如图3(c)所示,在各载体基板61a~61c的背面形成焊锡球等突出电极65a~65c。另外,如图3(d)所示,通过每个各半导体芯片62a~62c切断载体基板61和密封树脂64,向分别由密封树脂64a~64c密封的载体基板61a~61c分割半导体芯片62a~62c。
这里,通过一体切断载体基板61及密封树脂64,可在半导体芯片62a~62c的安装面侧的载体基板61a~61c的单面整体中分别形成密封树脂64a~64c。因此,可抑制制造工序的复杂化,同时,可使突出电极65a~65c的配置区域的刚性提高,可使载体基板61a~61c的挠曲降低。另外,也可在切断成各个片后形成突出电极65a~65c。
图4、图5是表示根据实施方式4的半导体装置的制造方法的截面图。另外,该实施方式4是在通过ACF接合双面安装半导体芯片73a、73b的半导体组件PK31上层叠由密封树脂84密封的半导体组件PK32的。
图4(a)中,设置载体基板71,在载体基板71的两个面上分别形成岸面72a、72b。另外,在载体基板71的背面分别粘贴各向异性导电片75a、75b,使隔板78粘贴在各向异性导电片75b上。另外,隔板78例如最好由PET等构成。
接着,如图4(b)所示,边进行半导体芯片73a的定位,边将半导体芯片73a压在各向异性导电片75a上。另外,当对半导体芯片73a施压时,如图4(c)所示,剥离各向异性导电片75b上的隔板78。另外,如图(d)所示,边进行半导体芯片73b的定位,边在各向异性导电片75b上压着半导体芯片73b。
另外,一旦将半导体芯片73a、73b分别压着在各向异性导电片75a、75b上,则边加热临时压着半导体芯片73a、73b的载体基板71,边从上下施加负荷。另外,如图4(e)所示,分别经突出电极74a、74b使半导体芯片73a、73b,ACF接合在载体基板71上,制造双面安装半导体芯片73a、73b的半导体组件PK31。
接着,在图5(a)中,在半导体组件PK32中设置载体基板81,在载体基板81的背面形成岸面82,在岸面82上设置焊锡球等的突出电极83。另外,在载体基板81上安装半导体芯片,用密封树脂84来密封安装半导体芯片的载体基板81的单面整体。另外,也可在载体基板81上安装引线接合连接的半导体芯片,或倒装片安装半导体芯片,或安装半导体芯片的层叠结构。
另外,在半导体组件PK31上层叠半导体组件PK32的情况下,在载体基板71的岸面72b上提供焊剂76。另外,也可在载体基板71的岸面72b上提供焊锡膏来代替焊剂76。
接着,如图5(b)所示,在半导体组件PK31上安装半导体组件PK32,通过进行回流处理,使突出电极83接合在岸面72b上。
接着,如图5(c)所示,在设置在载体基板71的背面的岸面72a上,形成将载体基板71安装在母基板上的突出电极77。
图6是表示根据实施方式5的半导体装置的制造方法的截面图。另外,该实施方式5,在将半导体芯片103a、103b倒装片安装在两个面上的载体基板101上,使3维安装堆叠结构的半导体芯片113a~113c。
图6中,在半导体组件PK41中设置载体基板101,在载体基板101的两个面中分别形成岸面102a、102c,同时,在载体基板101内形成内部配线102b。另外,在载体基板101的两个面中分别倒装片安装半导体芯片103a、103b,在半导体芯片103a、103b中分别设置用于倒装片安装的突出电极104a、104b。
另外,分别设置在半导体芯片103a、103b中的突出电极104a、104b分别经各向异性导电片105a、105b分别ACF接合在岸面102c、102a上。另外,在半导体芯片103a、103b安装在载体基板101上的情况下,作使用ACF接合的方法外,还可使用NCF接合等其它粘接剂接合,或使用焊锡接合或合金接合等金属接合。另外,在设置在载体基板101背面的岸面102a上,设置将载体基板101安装在母基板上的突出电极106。这里,通过在载体基板101的背面分别装载半导体芯片103a、103b,可降低载体基板101背面的线膨胀系数的差异,可降低载体基板101的挠曲。
另一方面,在半导体组件PK42中设置载体基板111,在载体基板111的两个面中分别形成岸面112a、112c,同时,在载体基板111内形成内部配线112b。
另外,在半导体芯片113a~113c中分别设置电极衬垫114a~114c,各电极衬垫114a~114c露出,分别设置绝缘膜115a~115c。另外,在半导体芯片113a~113c中,例如对应于各电极衬垫114a~114c的位置,分别形成贯通孔116a~116c,在贯通孔116a~116c内,分别经绝缘膜117a~117c和导电膜118a~118c,分别形成贯通电极119a~119c。
另外,形成贯通电极119a~119c的半导体芯片113a~113c分别经贯通电极119a~119c层叠,分别向半导体芯片113a~113c之间的间隙中注入树脂120a、120b。
另外,在形成于半导体芯片113a中的贯通电极119a上,设置倒装片安装半导体芯片113a~113c的层叠结构的突出电极121。另外,在设置在载体基板111上的岸面112c上接合突出电极121的同时,用密封树脂122来密封安装在载体基板111上的半导体芯片113a的表面,将半导体芯片113a~113c的层叠结构安装在载体基板111上。
另外,在设置在载体基板111背面的岸面112a上,设置将载体基板111安装在载体基板101上的突出电极123,使载体基板111保持在半导体芯片103a上。
这里,突出电极123避开半导体芯片103a的装载区域配置,例如可在载体基板111的周围配置突出电极123。另外,通过使突出电极123接合在设置在载体基板101上的岸面102c上,可将载体基板111安装在载体基板101上。
由此,可在抑制载体基板101的挠曲的同时,将半导体芯片111a~111c的层叠结构安装在半导体芯片103a上。
因此,可在确保载体基板101、111之间的连接可靠性的同时,层叠不同种类组件PK41、PK42,可在抑制层叠时的高度增大的同时,实现不同种类半导体芯片103a、103b、113a~113c的3维安装结构。
另外,作为突出电极104a、104b、106、121、123,例如可使用由Au突块、由焊锡材料等覆盖的Cu突块或Ni突块、或焊锡球等。另外,在上述实施方式中,说明了将半导体芯片113a~113c的3层结构安装在载体基板111上的方法,但安装在载体基板111上的半导体芯片的层叠结构也可以是2层或4层以上。
图7是表示根据实施方式6的半导体装置的结构的截面图。另外,本实施方式6是在将半导体芯片203a、203b倒装片安装在两个面上的载体基板201上3维安装W-CSP(晶片等级芯片尺寸组件)。
图7中,在半导体组件PK51中设置载体基板201,在载体基板201的两个面中分别形成岸面202a、202c,同时,在载体基板201内形成内部配线202b。另外,在载体基板201的两个面中分别倒装片安装半导体芯片203a、203b,在半导体芯片203a、203b中分别设置用于倒装片安装的突出电极204a、204b。
另外,分别设置在半导体芯片203a、203b中的突出电极204a、204b分别经各向异性导电片205a、205b分别ACF接合在岸面202c、202a上。另外,在设置在载体基板201背面的岸面202a上,设置将载体基板201安装在母基板上的突出电极206。这里,通过在载体基板201的背面分别装载半导体芯片203a、203b,可降低载体基板201背面的线膨胀系数的差异,可降低载体基板201的挠曲。
另一方面,在半导体组件PK52中设置载体基板211,在半导体芯片211中设置电极衬垫212,同时,电极衬垫212露出,设置绝缘膜213。另外,在半导体芯片211上,露出电极衬垫212,形成应力缓和层214,在电极衬垫212上形成在应力缓和层214上延伸的再配置配线215。另外,在再配置配线215上形成焊料抗蚀剂膜216,在焊料抗蚀剂膜216中形成使再配置配线215在应力缓和层214上露出的开口部217。另外,在经开口部217露出的再配置配线215上,设置将半导体芯片211面朝下安装在载体基板201上的突出电极218,使半导体组件PK52保持在半导体芯片203a上。
这里,突出电极218避开半导体芯片203a的装载区域配置,例如可在半导体芯片211的周围配置突出电极218。另外,通过将突出电极218接合在设置在载体基板201上的岸面202c上,可将半导体组件PK52安装在载体基板201上。
由此,可在抑制载体基板201的挠曲的同时,在将半导体芯片203a、203b倒装片安装在两个面上的载体基板201上层叠W-CSP。因此,即使在半导体芯片203a、203b、211的种类或尺寸不同的情况下,也可不在半导体芯片203、211间插入载体基板,在半导体芯片203上3维安装半导体芯片211,同时,可使载体基板201、211之间的连接可靠性提高,抑制3维安装的半导体芯片203a、203b、211的可靠性恶化,同时,可实现半导体芯片203a、203b、211安装时的空间节省。
另外,在将半导体组件PK52安装在载体基板201上的情况下,例如可使用ACF接合或NCF接合等粘接剂接合,也可使用焊锡接合或合金接合等金属接合。另外,作为突出电极204a、204b、206、218,例如可使用由Au突块、焊锡材料等覆盖的Cu突块或Ni突块、或焊锡球等。另外,在上述实施方式中,举例说明了在倒装片安装在载体基板201上的1个半导体芯片203a上安装半导体组件PK52的方法,但也可在倒装片安装在载体基板201上的多个半导体芯片上安装半导体组件PK52。
图8是表示根据实施方式7的半导体装置的结构的截面图。该实施方式7是在通过ACF接合安装半导体芯片323的半导体组件PK61上,在表面安装堆叠结构的半导体芯片333a、333b的同时,层叠在背面安装半导体芯片333c的半导体组件PK62。
图8中,在半导体组件PK61中设置载体基板321,在载体基板321的两个面中分别形成岸面322a、322c,同时,在载体基板321内形成内部配线322b。另外,在载体基板321的背面倒装片安装半导体芯片323,在半导体芯片,323中设置用于倒装片安装的突出电极324。另外,设置在半导体芯片323中的突出电极324经各向异性导电片325 ACF接合在岸面322a上。另外,在设置在载体基板321背面的岸面322a上,设置将载体基板321安装在母基板上的突出电极326。
这里,通过ACF接合将半导体芯片323安装在载体基板321上,由此不必用于引线接合或模制密封的空间,可实现3维安装时的空间节省,同时,可实现将半导体芯片323安装在载体基板321上时的低温化,可降低实际使用时载体基板321的挠曲。
另一方面,在半导体组件PK62中设置载体基板331,在载体基板331的两个面中分别形成岸面322a、322c,同时,在载体基板331内形成内部配线332b。另外,在载体基板331经粘接层334a面朝上安装半导体芯片333a,半导体芯片333经导电性引线335a引线接合连接在岸面332c上。并且,在半导体芯片333a上,避开导电性引线335a,面朝上安装半导体芯片333b,半导体芯片333b经粘接层334b固定在半导体芯片333a上,同时,经导电性引线335b引线接合连接在岸面332c上。
另外,在载体基板331的背面,倒装片安装半导体芯片333c,在半导体芯片333c中,设置用于倒装片安装的突出电极334c。另外,设置在半导体芯片333c中的突出电极334c经各向异性导电片325c ACF接合在岸面332a上。并且,在设置在载体基板331背面的岸面332a上,设置将载体基板331安装在载体基板321上的突出电极336。另外,通过使突出电极336接合在设置在载体基板321上的岸面322c上,可将载体基板31安装在载体基板321上。
这里,通过在载体基板301的表面装载半导体芯片333a、333b,同时,在载体基板331的背面装载半导体芯片333c,可降低载体基板331背面的线膨胀系数的差异,可降低载体基板331的挠曲。
因此,可在抑制载体基板331的挠曲的同时,在半导体芯片323上层叠包装不同的半导体芯片333a~333c。结果,在确保载体基板321、331之间的连接可靠性的同时,可层叠不同种类组件PK61、PK62,可实现不同种类的半导体芯片323、333a~333c的3维安装结构。
另外,用密封树脂337来密封半导体芯片333a、333b,密封树脂337例如通过使用环氧树脂等热固化性树脂的模制成形等来形成。
另外,在上述实施方式中,说明了在载体基板的两个面中装载半导体芯片的方法,但也可在载体基板的一个面中装载半导体芯片,在载体基板的另一个面中装载伪芯片。由此,作为伪芯片,除半导体类材料外,可使用金属类材料、陶瓷类材料或树脂类材料等,对可装载在载体基板上的材料没有限制,所以可精密控制载体基板的挠曲状态。
另外,上述半导体装置和电子零件例如可适用于液晶显示装置、便携电话、便携信息终端、视频摄像机、数码相机、MD(Mini Disc)播放器等电子仪器中,可实现电子仪器的小型、轻量化,同时,可提高电子仪器的可靠性。
另外,在上述实施方式中,举例说明了安装半导体芯片或半导体组件的方法,但本发明不一定限于安装半导体芯片或半导体组件的方法,例如也可安装弹性表面波(SAW)元件等陶瓷元件、光调制器或光开关等光学元件、磁传感器或生物传感器等各种传感器类等。

Claims (17)

1、一种半导体装置,其特征在于,具备:
第1载体基板;
面朝下安装在所述第1载体基板上的第1半导体芯片;
面朝下安装在所述第1载体基板背面的第2半导体芯片;
第2载体基板;
装载在所述第2载体基板上的第3半导体芯片;和
突出电极,以连接所述第2载体基板与所述第1载体基板,使所述第2载体基板保持在所述第1半导体芯片上。
2、根据权利要求1所述的半导体装置,其特征在于,将所述第2载体基板固定在第1载体基板上,以跨在所述第1半导体芯片上。
3、根据权利要求1或2所述的半导体装置,其特征在于,具备密封所述第3半导体芯片的密封件。
4、根据权利要求3所述的半导体装置,其特征在于,所述密封件是模制树脂。
5、根据权利要求4所述的半导体装置,其特征在于,所述密封件的侧壁与所述第2载体基板的侧壁位置一致。
6、根据权利要求1~5中的任意1项所述的半导体装置,其特征在于,所述第1半导体芯片和所述第2半导体芯片通过压接接合连接于所述第1载体基板上。
7、根据权利要求1~6中的任意1项所述的半导体装置,其特征在于,包含所述第1载体基板的半导体装置与包含所述第2载体基板的半导体装置在相等温度下的弹性系数不同。
8、根据权利要求1~7中的任意1项所述的半导体装置,其特征在于,装载所述第1半导体芯片和所述第2半导体芯片的第1载体基板是倒装片安装的球状栅格阵列,装载所述第3半导体芯片的第2载体基板是模制密封的球状栅格阵列或芯片尺寸组件。
9、根据权利要求1~8中的任意1项所述的半导体装置,其特征在于,所述第3半导体芯片包含层叠多个芯片的结构。
10、根据权利要求1~9中的任意1项所述的半导体装置,其特征在于,所述第3半导体芯片包含将多个芯片并列配置在第2载体基板上的结构。
11、一种半导体装置,其特征在于,具备:
第1载体基板;
面朝下安装在所述第1载体基板表面和背面至少其中的任一方面上的第1半导体芯片;
第2载体基板;
装载在所述第2载体基板上的第2半导体芯片;
装载在所述第2载体基板背面的第3半导体芯片;和
连接所述第2载体基板与所述第1载体基板的突出电极。
12、一种半导体装置,其特征在于,具备:
载体基板;
面朝下安装在所述载体基板上的第1半导体芯片;
面朝下安装在所述第1载体基板的背面的第2半导体芯片;
在电极衬垫的形成面上形成再配置配线层的第3半导体芯片;和
突出电极,以连接所述第3半导体芯片与所述载体基板,使所述第3半导体芯片保持在所述第1半导体芯片上。
13、一种电子设备,其特征在于,具备:
第1载体基板;
装载在所述第1载体基板上的第1电子零件;
装载在所述第1载体基板的背面的第2电子零件;
第2载体基板;
装载在所述第2载体基板上的第3电子零件;
突出电极,以连接所述第2载体基板与所述第1载体基板,使所述第2载体基板保持在所述第1电子零件上;和
密封所述第3电子零件的密封件。
14、一种电子仪器,其特征在于,具备:
第1载体基板;
装载在所述第1载体基板上的第1半导体芯片;
装载在所述第1载体基板的背面的第2半导体芯片;
第2载体基板;
装载在所述第2载体基板上的第3半导体芯片;
突出电极,以连接所述第2载体基板与所述第1载体基板,使所述第2载体基板保持在所述第1半导体芯片上;
密封所述第3半导体芯片的密封件;和
安装所述第1载体基板的母基板。
15、一种半导体装置的制造方法,其特征在于,具备:
将第1半导体芯片面朝下安装在第1载体基板上的工序;
将第2半导体芯片面朝下安装在所述第1载体基板的背面的工序;
将第3半导体芯片安装在第2载体基板上的工序;
在所述第2载体基板上形成突出电极的工序;
用密封树脂密封安装在所述第2载体基板上的第3半导体芯片的工序;和
经所述突出电极来连接所述第2载体基板与所述第1载体基板,使所述第2载体基板保持在所述第1半导体芯片上的工序。
16、根据权利要求15所述的半导体装置的制造方法,其特征在于,
由所述密封树脂密封所述第3半导体芯片的工序具备:
由密封树脂一体模制成形安装在所述第2载体基板上的多个第3半导体芯片的工序;和
对每个所述第3半导体芯片切断通过所述密封树脂模制成形的所述第2载体基板的工序。
17、一种电子设备的制造方法,其特征在于,具备:
将第1电子零件面朝下安装在第1载体基板上的工序;
将第2电子零件面朝下安装在所述第1载体基板的背面的工序;
将第3电子零件安装在第2载体基板上的工序;
在所述第2载体基板上形成突出电极的工序;
用密封树脂密封安装在所述第2载体基板上的第3电子零件的工序;和
经所述突出电极来连接所述第2载体基板与所述第1载体基板,使所述第2载体基板保持在所述第1电子零件上的工序。
CNB2004100397309A 2003-03-18 2004-03-16 半导体装置、电子设备及它们的制造方法,以及电子仪器 Expired - Fee Related CN100342538C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003074220A JP3680839B2 (ja) 2003-03-18 2003-03-18 半導体装置および半導体装置の製造方法
JP2003074220 2003-03-18

Publications (2)

Publication Number Publication Date
CN1531090A true CN1531090A (zh) 2004-09-22
CN100342538C CN100342538C (zh) 2007-10-10

Family

ID=33289924

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004100397309A Expired - Fee Related CN100342538C (zh) 2003-03-18 2004-03-16 半导体装置、电子设备及它们的制造方法,以及电子仪器

Country Status (3)

Country Link
US (1) US20040222508A1 (zh)
JP (1) JP3680839B2 (zh)
CN (1) CN100342538C (zh)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100373614C (zh) * 2004-11-08 2008-03-05 日月光半导体制造股份有限公司 多晶片的封装结构
CN104880265A (zh) * 2014-02-27 2015-09-02 精工爱普生株式会社 力检测装置、以及机械臂
CN105023915A (zh) * 2014-04-22 2015-11-04 矽品精密工业股份有限公司 堆栈式封装件及其制法
CN105720049A (zh) * 2014-12-15 2016-06-29 英特尔公司 负鼠晶片封装叠加设备

Families Citing this family (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200504895A (en) * 2003-06-04 2005-02-01 Renesas Tech Corp Semiconductor device
JP4269806B2 (ja) * 2003-06-30 2009-05-27 カシオ計算機株式会社 半導体装置およびその製造方法
TWI283467B (en) * 2003-12-31 2007-07-01 Advanced Semiconductor Eng Multi-chip package structure
JP4353845B2 (ja) * 2004-03-31 2009-10-28 富士通株式会社 半導体装置の製造方法
JP4512545B2 (ja) 2005-10-27 2010-07-28 パナソニック株式会社 積層型半導体モジュール
JP2007123501A (ja) * 2005-10-27 2007-05-17 Alps Electric Co Ltd 半田端子の形成方法
US7462509B2 (en) * 2006-05-16 2008-12-09 International Business Machines Corporation Dual-sided chip attached modules
US7901989B2 (en) * 2006-10-10 2011-03-08 Tessera, Inc. Reconstituted wafer level stacking
US7829438B2 (en) * 2006-10-10 2010-11-09 Tessera, Inc. Edge connect wafer level stacking
US8513789B2 (en) 2006-10-10 2013-08-20 Tessera, Inc. Edge connect wafer level stacking with leads extending along edges
US8569876B2 (en) 2006-11-22 2013-10-29 Tessera, Inc. Packaged semiconductor chips with array
US7791199B2 (en) * 2006-11-22 2010-09-07 Tessera, Inc. Packaged semiconductor chips
US7952195B2 (en) * 2006-12-28 2011-05-31 Tessera, Inc. Stacked packages with bridging traces
US8405196B2 (en) * 2007-03-05 2013-03-26 DigitalOptics Corporation Europe Limited Chips having rear contacts connected by through vias to front contacts
US7994643B2 (en) * 2007-04-04 2011-08-09 Samsung Electronics Co., Ltd. Stack package, a method of manufacturing the stack package, and a digital device having the stack package
JP4864810B2 (ja) * 2007-05-21 2012-02-01 新光電気工業株式会社 チップ内蔵基板の製造方法
EP2186134A2 (en) 2007-07-27 2010-05-19 Tessera, Inc. Reconstituted wafer stack packaging with after-applied pad extensions
KR101588723B1 (ko) 2007-07-31 2016-01-26 인벤사스 코포레이션 실리콘 쓰루 비아를 사용하는 반도체 패키지 공정
WO2009020572A2 (en) * 2007-08-03 2009-02-12 Tessera Technologies Hungary Kft. Stack packages using reconstituted wafers
US8043895B2 (en) 2007-08-09 2011-10-25 Tessera, Inc. Method of fabricating stacked assembly including plurality of stacked microelectronic elements
US20090212381A1 (en) * 2008-02-26 2009-08-27 Tessera, Inc. Wafer level packages for rear-face illuminated solid state image sensors
US20100053407A1 (en) * 2008-02-26 2010-03-04 Tessera, Inc. Wafer level compliant packages for rear-face illuminated solid state image sensors
US8680662B2 (en) 2008-06-16 2014-03-25 Tessera, Inc. Wafer level edge stacking
US20170117214A1 (en) 2009-01-05 2017-04-27 Amkor Technology, Inc. Semiconductor device with through-mold via
KR20120068985A (ko) 2009-03-13 2012-06-27 테세라, 인코포레이티드 본드 패드를 통과하여 연장된 비아를 갖는 마이크로전자 소자를 포함하는 적층형 마이크로전자 어셈블리
US8791575B2 (en) 2010-07-23 2014-07-29 Tessera, Inc. Microelectronic elements having metallic pads overlying vias
US8796135B2 (en) 2010-07-23 2014-08-05 Tessera, Inc. Microelectronic elements with rear contacts connected with via first or via middle structures
US8847376B2 (en) * 2010-07-23 2014-09-30 Tessera, Inc. Microelectronic elements with post-assembly planarization
US9640437B2 (en) 2010-07-23 2017-05-02 Tessera, Inc. Methods of forming semiconductor elements using micro-abrasive particle stream
US8610259B2 (en) 2010-09-17 2013-12-17 Tessera, Inc. Multi-function and shielded 3D interconnects
US8847380B2 (en) 2010-09-17 2014-09-30 Tessera, Inc. Staged via formation from both sides of chip
KR101059490B1 (ko) 2010-11-15 2011-08-25 테세라 리써치 엘엘씨 임베드된 트레이스에 의해 구성된 전도성 패드
US8637968B2 (en) 2010-12-02 2014-01-28 Tessera, Inc. Stacked microelectronic assembly having interposer connecting active chips
US8587126B2 (en) 2010-12-02 2013-11-19 Tessera, Inc. Stacked microelectronic assembly with TSVs formed in stages with plural active chips
US8736066B2 (en) 2010-12-02 2014-05-27 Tessera, Inc. Stacked microelectronic assemby with TSVS formed in stages and carrier above chip
US8610264B2 (en) 2010-12-08 2013-12-17 Tessera, Inc. Compliant interconnects in wafers
US8810025B2 (en) * 2011-03-17 2014-08-19 Taiwan Semiconductor Manufacturing Company, Ltd. Reinforcement structure for flip-chip packaging
US9543269B2 (en) * 2011-03-22 2017-01-10 Nantong Fujitsu Microelectronics Co., Ltd. System-level packaging methods and structures
WO2012126377A1 (en) 2011-03-22 2012-09-27 Nantong Fujitsu Microelectronics Co., Ltd. System-level packaging methods and structures
US9414484B2 (en) 2011-11-09 2016-08-09 Intel Corporation Thermal expansion compensators for controlling microelectronic package warpage
JP5865220B2 (ja) * 2012-09-24 2016-02-17 ルネサスエレクトロニクス株式会社 半導体装置
KR102495916B1 (ko) 2015-08-13 2023-02-03 삼성전자 주식회사 반도체 패키지
KR101784354B1 (ko) 2016-03-11 2017-10-12 서울과학기술대학교 산학협력단 그물망형 스트레쳐블 패키징 장치
US10593565B2 (en) 2017-01-31 2020-03-17 Skyworks Solutions, Inc. Control of under-fill with a packaging substrate having an integrated trench for a dual-sided ball grid array package
KR102592327B1 (ko) 2018-10-16 2023-10-20 삼성전자주식회사 반도체 패키지
KR102739235B1 (ko) 2019-09-24 2024-12-05 삼성전자주식회사 반도체 패키지
US11362027B2 (en) 2020-02-28 2022-06-14 Amkor Technology Singapore Holding Pte. Ltd. Semiconductor devices and methods of manufacturing semiconductor devices

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08115989A (ja) * 1994-08-24 1996-05-07 Fujitsu Ltd 半導体装置及びその製造方法
US5994166A (en) * 1997-03-10 1999-11-30 Micron Technology, Inc. Method of constructing stacked packages
JP2964983B2 (ja) * 1997-04-02 1999-10-18 日本電気株式会社 三次元メモリモジュール及びそれを用いた半導体装置
JP2000208698A (ja) * 1999-01-18 2000-07-28 Toshiba Corp 半導体装置
JP3201353B2 (ja) * 1998-08-04 2001-08-20 日本電気株式会社 半導体装置とその製造方法
US6133634A (en) * 1998-08-05 2000-10-17 Fairchild Semiconductor Corporation High performance flip chip package
WO2000049656A1 (fr) * 1999-02-17 2000-08-24 Hitachi, Ltd. Dispositif semi-conducteur et procede de fabrication associe
US6023097A (en) * 1999-03-17 2000-02-08 Chipmos Technologies, Inc. Stacked multiple-chip module micro ball grid array packaging
US6034425A (en) * 1999-03-17 2000-03-07 Chipmos Technologies Inc. Flat multiple-chip module micro ball grid array packaging
JP2001156212A (ja) * 1999-09-16 2001-06-08 Nec Corp 樹脂封止型半導体装置及びその製造方法
JP3798597B2 (ja) * 1999-11-30 2006-07-19 富士通株式会社 半導体装置
US6731009B1 (en) * 2000-03-20 2004-05-04 Cypress Semiconductor Corporation Multi-die assembly
JP2001352035A (ja) * 2000-06-07 2001-12-21 Sony Corp 多層半導体装置の組立治具及び多層半導体装置の製造方法
US6734539B2 (en) * 2000-12-27 2004-05-11 Lucent Technologies Inc. Stacked module package
JP2003218150A (ja) * 2002-01-23 2003-07-31 Fujitsu Media Device Kk モジュール部品
JP2003318361A (ja) * 2002-04-19 2003-11-07 Fujitsu Ltd 半導体装置及びその製造方法
US6903458B1 (en) * 2002-06-20 2005-06-07 Richard J. Nathan Embedded carrier for an integrated circuit chip
JP2004179232A (ja) * 2002-11-25 2004-06-24 Seiko Epson Corp 半導体装置及びその製造方法並びに電子機器
JP4096774B2 (ja) * 2003-03-24 2008-06-04 セイコーエプソン株式会社 半導体装置、電子デバイス、電子機器、半導体装置の製造方法及び電子デバイスの製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100373614C (zh) * 2004-11-08 2008-03-05 日月光半导体制造股份有限公司 多晶片的封装结构
CN104880265A (zh) * 2014-02-27 2015-09-02 精工爱普生株式会社 力检测装置、以及机械臂
CN104880265B (zh) * 2014-02-27 2020-01-07 精工爱普生株式会社 力检测装置、以及机械臂
CN105023915A (zh) * 2014-04-22 2015-11-04 矽品精密工业股份有限公司 堆栈式封装件及其制法
CN105023915B (zh) * 2014-04-22 2018-02-02 矽品精密工业股份有限公司 堆栈式封装件的制法
CN105720049A (zh) * 2014-12-15 2016-06-29 英特尔公司 负鼠晶片封装叠加设备

Also Published As

Publication number Publication date
JP2004281921A (ja) 2004-10-07
CN100342538C (zh) 2007-10-10
JP3680839B2 (ja) 2005-08-10
US20040222508A1 (en) 2004-11-11

Similar Documents

Publication Publication Date Title
CN100342538C (zh) 半导体装置、电子设备及它们的制造方法,以及电子仪器
CN1532932A (zh) 半导体装置及其制造方法、电子设备、电子仪器
CN1291490C (zh) 半导体器件及用于小型电子设备的照相机组件
CN1259024C (zh) 用于指纹识别的半导体装置
CN1185698C (zh) 半导体装置及其制造方法、电路板以及电子设备
CN1161834C (zh) 半导体器件及其制造方法
CN1519931A (zh) 半导体器件、电子设备及它们的制造方法和电子仪器
CN1622328A (zh) 半导体器件及其制造方法
CN1445851A (zh) 轻薄叠层封装半导体器件及其制造工艺
CN1459855A (zh) 半导体器件及其制造方法
CN1723556A (zh) 可叠置的半导体器件及其制造方法
CN1641873A (zh) 多芯片封装、其中使用的半导体器件及其制造方法
CN1830084A (zh) 具有堆叠的集成电路的集成电路封装和其方法
JP2005045251A (ja) スタック半導体チップbgaパッケージ及びその製造方法
CN1360344A (zh) 一种半导体器件的制造方法和一种半导体器件
CN1449232A (zh) 电路部件内装模块及其制造方法
CN1758433A (zh) 半导体器件及其制造方法
CN1835222A (zh) 半导体器件及其制造方法
CN1531091A (zh) 半导体装置、电子设备、载体基板及它们的制法、电子仪器
CN1505150A (zh) 半导体装置及其制造方法
CN1190843C (zh) 半导体装置及其制造方法
CN1519930A (zh) 半导体器件、电子设备及它们的制造方法和电子仪器
CN2636411Y (zh) 多芯片封装结构
CN1819190A (zh) 半导体器件
CN1577840A (zh) 半导体器件的堆叠封装

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20071010

Termination date: 20170316