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TWI593470B - Substrate processing apparatus, substrate processing method, substrate manufacturing apparatus, and substrate manufacturing method - Google Patents

Substrate processing apparatus, substrate processing method, substrate manufacturing apparatus, and substrate manufacturing method Download PDF

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Publication number
TWI593470B
TWI593470B TW104114403A TW104114403A TWI593470B TW I593470 B TWI593470 B TW I593470B TW 104114403 A TW104114403 A TW 104114403A TW 104114403 A TW104114403 A TW 104114403A TW I593470 B TWI593470 B TW I593470B
Authority
TW
Taiwan
Prior art keywords
substrate
nozzle
nozzles
fluid
liquid
Prior art date
Application number
TW104114403A
Other languages
English (en)
Chinese (zh)
Other versions
TW201601850A (zh
Inventor
Yuichi Imaoka
Akinori Iso
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Publication of TW201601850A publication Critical patent/TW201601850A/zh
Application granted granted Critical
Publication of TWI593470B publication Critical patent/TWI593470B/zh

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  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW104114403A 2014-05-13 2015-05-06 Substrate processing apparatus, substrate processing method, substrate manufacturing apparatus, and substrate manufacturing method TWI593470B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014099121 2014-05-13
JP2015089659A JP6258892B2 (ja) 2014-05-13 2015-04-24 基板処理装置及び基板処理方法

Publications (2)

Publication Number Publication Date
TW201601850A TW201601850A (zh) 2016-01-16
TWI593470B true TWI593470B (zh) 2017-08-01

Family

ID=54933460

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104114403A TWI593470B (zh) 2014-05-13 2015-05-06 Substrate processing apparatus, substrate processing method, substrate manufacturing apparatus, and substrate manufacturing method

Country Status (2)

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JP (1) JP6258892B2 (ja)
TW (1) TWI593470B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI603421B (zh) * 2016-07-04 2017-10-21 盟立自動化股份有限公司 溼式製程設備
JP2018108892A (ja) * 2016-12-28 2018-07-12 芝浦メカトロニクス株式会社 浮上搬送装置および基板処理装置
CN108249159B (zh) 2016-12-28 2020-02-14 芝浦机械电子株式会社 浮起搬运装置以及基板处理装置
KR101864713B1 (ko) * 2017-05-02 2018-06-05 김문환 일체형 세탁장치
CN108515463B (zh) * 2018-05-31 2025-01-21 长沙矿冶研究院有限责任公司 一种高压水射流板带材清理装置及水射流清理线

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201227816A (en) * 2010-11-17 2012-07-01 Samsung Mobile Display Co Ltd System and method for cleaning substrate

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3323385B2 (ja) * 1995-12-21 2002-09-09 大日本スクリーン製造株式会社 基板洗浄装置および基板洗浄方法
JP2007103883A (ja) * 2005-10-07 2007-04-19 Sharp Corp 基板洗浄方法および基板洗浄装置
JP2010258125A (ja) * 2009-04-23 2010-11-11 Dainippon Screen Mfg Co Ltd 基板処理装置
JP5710921B2 (ja) * 2010-09-22 2015-04-30 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201227816A (en) * 2010-11-17 2012-07-01 Samsung Mobile Display Co Ltd System and method for cleaning substrate

Also Published As

Publication number Publication date
TW201601850A (zh) 2016-01-16
JP2015231617A (ja) 2015-12-24
JP6258892B2 (ja) 2018-01-10

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