KR19980024008A - 클린 룸 - Google Patents
클린 룸 Download PDFInfo
- Publication number
- KR19980024008A KR19980024008A KR1019970014470A KR19970014470A KR19980024008A KR 19980024008 A KR19980024008 A KR 19980024008A KR 1019970014470 A KR1019970014470 A KR 1019970014470A KR 19970014470 A KR19970014470 A KR 19970014470A KR 19980024008 A KR19980024008 A KR 19980024008A
- Authority
- KR
- South Korea
- Prior art keywords
- air
- chemical
- clean room
- air conditioning
- ceiling
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Ventilation (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP249529 | 1996-09-20 | ||
JP8249529A JPH1096332A (ja) | 1996-09-20 | 1996-09-20 | クリーンルーム |
Publications (1)
Publication Number | Publication Date |
---|---|
KR19980024008A true KR19980024008A (ko) | 1998-07-06 |
Family
ID=17194345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019970014470A KR19980024008A (ko) | 1996-09-20 | 1997-04-18 | 클린 룸 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPH1096332A (zh) |
KR (1) | KR19980024008A (zh) |
CN (1) | CN1135331C (zh) |
DE (1) | DE19723954A1 (zh) |
TW (1) | TW365641B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100376349B1 (ko) * | 1999-07-14 | 2003-03-15 | 엔이씨 일렉트로닉스 코포레이션 | 클린룸용 팬 필터 유닛 |
KR100643252B1 (ko) * | 2004-05-26 | 2006-11-10 | 알프스 덴키 가부시키가이샤 | 클린유닛 |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2951949B1 (ja) * | 1998-07-03 | 1999-09-20 | 富士電機総設株式会社 | クリーンルームの局所空調システム |
JP3375294B2 (ja) * | 1998-12-17 | 2003-02-10 | 東京エレクトロン株式会社 | 処理装置、処理システムおよび該装置における清浄エアの供給方法 |
JP3476395B2 (ja) * | 1999-09-24 | 2003-12-10 | Necエレクトロニクス株式会社 | クリーンルーム及びクリーンルームの空調方法 |
DE10029200A1 (de) * | 2000-02-21 | 2001-08-23 | Data Disc Robots Gmbh | Prozeßklimatisierung |
JP2002147811A (ja) | 2000-11-08 | 2002-05-22 | Sharp Corp | クリーンルーム |
JP3631993B2 (ja) * | 2001-11-21 | 2005-03-23 | 株式会社織部精機製作所 | 防災シェルターシステム |
DE102004049520A1 (de) * | 2004-10-11 | 2006-04-13 | Alfred Reinicke | Verfahren und Anlage zur Belüftung von Reinräumen |
CN100434642C (zh) * | 2005-12-05 | 2008-11-19 | 亚翔系统集成科技(苏州)有限公司 | 用于液晶显示器的制作工序导向模块化厂房 |
CN100472142C (zh) * | 2006-06-12 | 2009-03-25 | 亚翔工程股份有限公司 | 无尘室及其空调方法 |
JP4378652B2 (ja) * | 2007-01-10 | 2009-12-09 | 株式会社ダイフク | 浄化空気通風式の物品保管設備 |
US9435552B2 (en) | 2007-12-14 | 2016-09-06 | Ge-Hitachi Nuclear Energy Americas Llc | Air filtration and handling for nuclear reactor habitability area |
DE102007062813B4 (de) | 2007-12-21 | 2009-11-12 | Khs Ag | Trennwand, insbesondere zur Einhausung von Verpackungsmaschinen für Lebensmittel |
DE102008005606B3 (de) | 2008-01-22 | 2010-04-15 | Khs Ag | Vorrichtung zur Abdichtung von Vertikalfugen zwischen plattenförmigen Wandelementen |
JP5408909B2 (ja) * | 2008-06-05 | 2014-02-05 | 株式会社竹中工務店 | クリーンルーム |
CN104748265B (zh) * | 2015-03-10 | 2017-09-26 | 芜湖锐进医疗设备有限公司 | 医用电动锯钻净化室空气净化系统 |
CN105666528B (zh) * | 2016-03-29 | 2018-12-07 | 威格气体纯化科技(苏州)股份有限公司 | 无尘室循环过滤装置、无尘室及手套箱 |
CN106760700A (zh) * | 2016-11-28 | 2017-05-31 | 中国铁塔股份有限公司长春市分公司 | 一种基站机房 |
CN106760675B (zh) * | 2017-01-22 | 2019-01-18 | 中联西北工程设计研究院有限公司 | 超净空间的高精度温控室及温控方法 |
JP6911799B2 (ja) * | 2018-03-15 | 2021-07-28 | 信越半導体株式会社 | シリコン多結晶充填作業用のクリーンブース |
CN110469160B (zh) * | 2019-08-12 | 2024-08-27 | 中国电子工程设计院有限公司 | 一种具有二次加湿系统的洁净室布置结构及洁净生产厂房 |
KR102686948B1 (ko) * | 2019-07-23 | 2024-07-19 | 차이나 일렉트로닉스 엔지니어링 디자인 인스티튜트 컴퍼니 리미티드 | 파티션 모드로 제어 가능한 청정 작업장 |
US11649975B2 (en) | 2019-12-04 | 2023-05-16 | Hitachi Global Life Solutions, Inc. | Air conditioning system |
BE1031344B1 (nl) * | 2023-02-15 | 2024-09-16 | Abn Cleanroom Tech N V | Inrichting en werkwijze voor het ventileren van een klimaatkamer |
-
1996
- 1996-09-20 JP JP8249529A patent/JPH1096332A/ja active Pending
-
1997
- 1997-04-09 TW TW086104483A patent/TW365641B/zh not_active IP Right Cessation
- 1997-04-18 KR KR1019970014470A patent/KR19980024008A/ko not_active Application Discontinuation
- 1997-06-06 DE DE19723954A patent/DE19723954A1/de not_active Withdrawn
- 1997-07-21 CN CNB971154422A patent/CN1135331C/zh not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100376349B1 (ko) * | 1999-07-14 | 2003-03-15 | 엔이씨 일렉트로닉스 코포레이션 | 클린룸용 팬 필터 유닛 |
KR100643252B1 (ko) * | 2004-05-26 | 2006-11-10 | 알프스 덴키 가부시키가이샤 | 클린유닛 |
Also Published As
Publication number | Publication date |
---|---|
CN1177709A (zh) | 1998-04-01 |
TW365641B (en) | 1999-08-01 |
DE19723954A1 (de) | 1998-03-26 |
CN1135331C (zh) | 2004-01-21 |
JPH1096332A (ja) | 1998-04-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR19980024008A (ko) | 클린 룸 | |
KR100250354B1 (ko) | 클린 룸 | |
KR100449975B1 (ko) | 반도체 장치용 크린룸 | |
EP0810634A2 (en) | Substrate treating system and substrate treating method | |
JPS63248449A (ja) | ドラフトチヤンバ | |
JP4346175B2 (ja) | マイクロエレクトロニクス素子製造システムおよびマイクロエレクトロニクス素子の製造方法 | |
JP3697275B2 (ja) | 局所クリーン化におけるインターフェイスボックス及びそのクリーンルーム | |
KR101017910B1 (ko) | 클린룸 시스템 | |
CN1177711A (zh) | 净化室 | |
JP2008263048A (ja) | 半導体製造装置および半導体装置の製造方法 | |
KR101207367B1 (ko) | 국부 밀폐구역을 갖는 반도체 클린 룸 | |
JP3354849B2 (ja) | クリーンルーム | |
KR102782894B1 (ko) | 로드포트모듈의 웨이퍼 용기의 습도저감장치 및 이를 구비한 반도체 공정장치 | |
JP2000065403A (ja) | クリーンルームを有する建屋及びクリーンルームの気流制御方法 | |
KR102789454B1 (ko) | 복수의 제습모듈을 포함하는 제습기 및 이를 포함하는 efem | |
KR102732244B1 (ko) | 습도 제어 efem | |
JPH10238833A (ja) | クリーンルーム | |
JP3144036B2 (ja) | 薬液処理装置及び薬液処理方法 | |
KR20090056137A (ko) | 클린룸의 강제배기구조 | |
JPH10340851A (ja) | 基板処理装置用の清浄空気供給装置 | |
KR20240147413A (ko) | 냉각 및 필터 기능을 구비한 제습 efem | |
KR20240093281A (ko) | 제습 efem | |
KR20240082967A (ko) | 제습 기능을 포함하는 efem | |
KR20240143055A (ko) | 히터를 이용하는 데시칸트 제습장치 및 그것을 포함하는 efem | |
JP2003017376A (ja) | 半導体製造装置および半導体製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19970418 |
|
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 19970418 Comment text: Request for Examination of Application |
|
PG1501 | Laying open of application | ||
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 19990929 Patent event code: PE09021S01D |
|
E601 | Decision to refuse application | ||
PE0601 | Decision on rejection of patent |
Patent event date: 20000613 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 19990929 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |