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TW365641B - Clean room - Google Patents

Clean room

Info

Publication number
TW365641B
TW365641B TW086104483A TW86104483A TW365641B TW 365641 B TW365641 B TW 365641B TW 086104483 A TW086104483 A TW 086104483A TW 86104483 A TW86104483 A TW 86104483A TW 365641 B TW365641 B TW 365641B
Authority
TW
Taiwan
Prior art keywords
chemical
air conditioning
clean room
areas
adopted
Prior art date
Application number
TW086104483A
Other languages
Chinese (zh)
Inventor
Koji Ezaki
Hakushi Shibuya
Takaaki Fukumoto
Hitoshi Nagafune
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of TW365641B publication Critical patent/TW365641B/en

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Ventilation (AREA)

Abstract

This invention is to provide a clean room which, in a semiconductor device manufacturing process, can completely prevent diffusion of chemical materials from a manufacturing device that uses the chemical materials and which can control air conditioning at low cost to meet the need for preventing chemical pollution when conveying or storing semiconductor wafers. A clean room 1 is divided into a plurality of areas whose air conditioning systems are independent of one another, and in a second clean room 1b where a manufacturing device 6a leaking chemical materials is placed, a chemical filter is installed on a circulation duct 13 and an air conditioning method by which air from which chemical mist produced in a working zone 5 has been removed is circulated to a ceiling chamber 4 is adopted to prevent the diffusion of the chemical mist to the areas with different air conditioning systems. In a first clean room 1a where conveyors 7a, 7b and storage devices 8a, 8b or the like are installed, an air conditioning method by which chemical-free air is supplied locally to only the required areas is adopted.
TW086104483A 1996-09-20 1997-04-09 Clean room TW365641B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8249529A JPH1096332A (en) 1996-09-20 1996-09-20 Clean room

Publications (1)

Publication Number Publication Date
TW365641B true TW365641B (en) 1999-08-01

Family

ID=17194345

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086104483A TW365641B (en) 1996-09-20 1997-04-09 Clean room

Country Status (5)

Country Link
JP (1) JPH1096332A (en)
KR (1) KR19980024008A (en)
CN (1) CN1135331C (en)
DE (1) DE19723954A1 (en)
TW (1) TW365641B (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2951949B1 (en) * 1998-07-03 1999-09-20 富士電機総設株式会社 Local air conditioning system for clean room
JP3375294B2 (en) * 1998-12-17 2003-02-10 東京エレクトロン株式会社 Processing apparatus, processing system, and method for supplying clean air in the apparatus
JP3287337B2 (en) * 1999-07-14 2002-06-04 日本電気株式会社 Fan filter unit
JP3476395B2 (en) * 1999-09-24 2003-12-10 Ｎｅｃエレクトロニクス株式会社 Clean room and clean room air conditioning method
DE10029200A1 (en) * 2000-02-21 2001-08-23 Data Disc Robots Gmbh Production line for manufacturing optical data media has process climate control with conditioned air fed to limited region of production line and only air free of particles to other regions
JP2002147811A (en) 2000-11-08 2002-05-22 Sharp Corp Cleanroom
JP3631993B2 (en) * 2001-11-21 2005-03-23 株式会社織部精機製作所 Disaster prevention shelter system
JP2005340435A (en) * 2004-05-26 2005-12-08 Alps Electric Co Ltd Clean sheet
DE102004049520A1 (en) * 2004-10-11 2006-04-13 Alfred Reinicke Process and plant for the ventilation of clean rooms
CN100434642C (en) * 2005-12-05 2008-11-19 亚翔系统集成科技（苏州）有限公司 Modularized mfg. process factory building for liquid crystal display
CN100472142C (en) * 2006-06-12 2009-03-25 亚翔工程股份有限公司 Clean room and air conditioning method thereof
JP4378652B2 (en) * 2007-01-10 2009-12-09 株式会社ダイフク Purified air ventilation-type goods storage facility
US9435552B2 (en) 2007-12-14 2016-09-06 Ge-Hitachi Nuclear Energy Americas Llc Air filtration and handling for nuclear reactor habitability area
DE102007062813B4 (en) 2007-12-21 2009-11-12 Khs Ag Partition, in particular for housing packaging machines for food
DE102008005606B3 (en) 2008-01-22 2010-04-15 Khs Ag Device for sealing vertical joints between plate-shaped wall elements
JP5408909B2 (en) * 2008-06-05 2014-02-05 株式会社竹中工務店 Clean room
CN104748265B (en) * 2015-03-10 2017-09-26 芜湖锐进医疗设备有限公司 Medical electric Ju Zuan clean rooms air cleaning system
CN105666528B (en) * 2016-03-29 2018-12-07 威格气体纯化科技（苏州）股份有限公司 Dust free room circulation filter, dust free room and glove box
CN106760700A (en) * 2016-11-28 2017-05-31 中国铁塔股份有限公司长春市分公司 A kind of base station machine room
CN106760675B (en) * 2017-01-22 2019-01-18 中联西北工程设计研究院有限公司 The high precision temperature control room in ultra-clean space and temperature control method
JP6911799B2 (en) * 2018-03-15 2021-07-28 信越半導体株式会社 Clean booth for silicon polycrystalline filling work
CN110469160B (en) * 2019-08-12 2024-08-27 中国电子工程设计院有限公司 Clean room arrangement structure with secondary humidification system and clean production factory building
KR102686948B1 (en) * 2019-07-23 2024-07-19 차이나 일렉트로닉스 엔지니어링 디자인 인스티튜트 컴퍼니 리미티드 Clean workplace controllable in partition mode
US11649975B2 (en) 2019-12-04 2023-05-16 Hitachi Global Life Solutions, Inc. Air conditioning system
BE1031344B1 (en) * 2023-02-15 2024-09-16 Abn Cleanroom Tech N V DESIGN AND METHOD FOR VENTILATING A CLIMATE CHAMBER

Also Published As

Publication number Publication date
CN1177709A (en) 1998-04-01
DE19723954A1 (en) 1998-03-26
CN1135331C (en) 2004-01-21
JPH1096332A (en) 1998-04-14
KR19980024008A (en) 1998-07-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees