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KR101460571B1 - 경화성 조성물, 이것을 사용한 컬러필터와 그 제조방법, 및고체촬상소자 - Google Patents

경화성 조성물, 이것을 사용한 컬러필터와 그 제조방법, 및고체촬상소자 Download PDF

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KR101460571B1
KR101460571B1 KR1020080003874A KR20080003874A KR101460571B1 KR 101460571 B1 KR101460571 B1 KR 101460571B1 KR 1020080003874 A KR1020080003874 A KR 1020080003874A KR 20080003874 A KR20080003874 A KR 20080003874A KR 101460571 B1 KR101460571 B1 KR 101460571B1
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KR20080067302A (ko
Inventor
타에코 나카시마
유시 카네코
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후지필름 가부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/112—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
    • C07D295/135—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
KR1020080003874A 2007-01-15 2008-01-14 경화성 조성물, 이것을 사용한 컬러필터와 그 제조방법, 및고체촬상소자 Expired - Fee Related KR101460571B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007006296 2007-01-15
JPJP-P-2007-00006296 2007-01-15
JPJP-P-2007-00196579 2007-07-27
JP2007196579A JP5178081B2 (ja) 2007-01-15 2007-07-27 カラーフィルタ形成用硬化性組成物、これを用いたカラーフィルタ及びその製造方法、並びに固体撮像素子

Publications (2)

Publication Number Publication Date
KR20080067302A KR20080067302A (ko) 2008-07-18
KR101460571B1 true KR101460571B1 (ko) 2014-11-13

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KR1020080003874A Expired - Fee Related KR101460571B1 (ko) 2007-01-15 2008-01-14 경화성 조성물, 이것을 사용한 컬러필터와 그 제조방법, 및고체촬상소자

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JP (1) JP5178081B2 (ja)
KR (1) KR101460571B1 (ja)
CN (1) CN101226333B (ja)
TW (1) TWI442178B (ja)

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Publication number Priority date Publication date Assignee Title
JP5135820B2 (ja) * 2007-02-20 2013-02-06 Ｊｓｒ株式会社 アルカリ可溶性重合体、着色層形成用感放射線性組成物、カラーフィルタおよび液晶表示素子
JP5340102B2 (ja) 2008-10-03 2013-11-13 富士フイルム株式会社 分散組成物、重合性組成物、遮光性カラーフィルタ、固体撮像素子、液晶表示装置、ウェハレベルレンズ、及び撮像ユニット
JP5701576B2 (ja) * 2009-11-20 2015-04-15 富士フイルム株式会社 分散組成物及び感光性樹脂組成物、並びに固体撮像素子
TWI543993B (zh) 2010-03-25 2016-08-01 富士軟片股份有限公司 黑色硬化型組成物、用於固態攝像元件的遮光彩色濾光片及其製造方法、固態攝像元件、晶圓級透鏡及攝影模組
KR101453771B1 (ko) * 2010-11-08 2014-10-23 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
CN102660300B (zh) * 2012-04-28 2014-02-12 深圳市华星光电技术有限公司 液晶介质组合物、使用其的液晶显示器及其制作方法
JP5976575B2 (ja) * 2012-08-31 2016-08-23 富士フイルム株式会社 低屈折率膜形成用硬化性組成物、光学部材セットの製造方法及び硬化性組成物の製造方法
JP2016160393A (ja) * 2015-03-04 2016-09-05 Jsr株式会社 硬化性樹脂組成物、表示素子用硬化膜、その形成方法及び表示素子
CN109298597A (zh) * 2018-09-03 2019-02-01 浙江福斯特新材料研究院有限公司 一种高光敏性和抗电镀性能优异的感光性树脂组合物及应用
TWI781550B (zh) * 2020-03-18 2022-10-21 南韓商三星Ｓｄｉ股份有限公司 感光性樹脂組成物、使用其的感光性樹脂層及顯示裝置
JP2023121726A (ja) * 2022-02-21 2023-08-31 住友化学株式会社 硬化性組成物、硬化膜及び表示装置
JP2024061630A (ja) * 2022-10-20 2024-05-07 住友化学株式会社 硬化性組成物、硬化膜及び表示装置

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JPH08297366A (ja) * 1995-04-27 1996-11-12 Toppan Printing Co Ltd 感光性着色組成物とそれを用いたカラーフィルタ
JP2004536352A (ja) * 2001-07-26 2004-12-02 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 感光性樹脂組成物

Also Published As

Publication number Publication date
JP2008197613A (ja) 2008-08-28
TW200903153A (en) 2009-01-16
CN101226333B (zh) 2012-11-14
JP5178081B2 (ja) 2013-04-10
CN101226333A (zh) 2008-07-23
KR20080067302A (ko) 2008-07-18
TWI442178B (zh) 2014-06-21

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