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KR101345427B1 - 착색층 형성용 감방사선성 조성물 및 컬러 필터 - Google Patents

착색층 형성용 감방사선성 조성물 및 컬러 필터 Download PDF

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Publication number
KR101345427B1
KR101345427B1 KR1020070027480A KR20070027480A KR101345427B1 KR 101345427 B1 KR101345427 B1 KR 101345427B1 KR 1020070027480 A KR1020070027480 A KR 1020070027480A KR 20070027480 A KR20070027480 A KR 20070027480A KR 101345427 B1 KR101345427 B1 KR 101345427B1
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KR
South Korea
Prior art keywords
weight
meth
colored layer
solvent
acrylate
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KR1020070027480A
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English (en)
Korean (ko)
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KR20070095801A (ko
Inventor
히로끼 오하라
고지 히라노
신고 나루세
Original Assignee
제이에스알 가부시끼가이샤
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
KR1020070027480A 2006-03-22 2007-03-21 착색층 형성용 감방사선성 조성물 및 컬러 필터 Active KR101345427B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2006-00078037 2006-03-22
JP2006078037A JP4904869B2 (ja) 2006-03-22 2006-03-22 着色層形成用感放射線性組成物およびカラーフィルタ

Publications (2)

Publication Number Publication Date
KR20070095801A KR20070095801A (ko) 2007-10-01
KR101345427B1 true KR101345427B1 (ko) 2013-12-27

Family

ID=38630737

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070027480A Active KR101345427B1 (ko) 2006-03-22 2007-03-21 착색층 형성용 감방사선성 조성물 및 컬러 필터

Country Status (5)

Country Link
JP (1) JP4904869B2 (ja)
KR (1) KR101345427B1 (ja)
CN (1) CN101042532B (ja)
SG (1) SG136094A1 (ja)
TW (1) TWI414885B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4987404B2 (ja) * 2006-09-28 2012-07-25 株式会社Ｄｎｐファインケミカル カラーフィルタ用感光性樹脂組成物
JP5224030B2 (ja) * 2007-03-22 2013-07-03 Ｊｓｒ株式会社 熱硬化性樹脂組成物、保護膜および保護膜の形成方法
JP5535814B2 (ja) * 2009-09-14 2014-07-02 富士フイルム株式会社 光重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、液晶表示装置、平版印刷版原版、並びに、新規化合物
JP2011148950A (ja) * 2010-01-25 2011-08-04 Fujifilm Corp 硬化性組成物、カラーフィルタおよびその製造方法
CN102445853B (zh) * 2010-10-12 2013-10-16 京东方科技集团股份有限公司 感光树脂组合物、彩色滤光片及其制备方法
TWI518455B (zh) * 2011-08-30 2016-01-21 Asahi Glass Co Ltd A negative photosensitive resin composition, a partition wall, a black matrix, and an optical element
JP2013195973A (ja) * 2012-03-22 2013-09-30 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
US9790393B2 (en) * 2013-03-13 2017-10-17 Cabot Corporation Coatings having filler-polymer compositions with combined low dielectric constant, high resistivity, and optical density properties and controlled electrical resistivity, devices made therewith, and methods for making same
JP6460836B2 (ja) * 2015-02-26 2019-01-30 東京応化工業株式会社 非回転式塗布用組成物及び樹脂組成物膜形成方法
JP6695369B2 (ja) * 2017-02-16 2020-05-20 住友化学株式会社 硬化性樹脂組成物、硬化膜及び表示装置
CN107490817A (zh) * 2017-10-09 2017-12-19 青岛海信电器股份有限公司 Qdcf、其加工方法及应用
US20230185190A1 (en) * 2021-12-10 2023-06-15 Samsung Sdi Co., Ltd. Photosensitive resin composition, photosensitive resin layer using the same and color filter

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62251739A (ja) * 1986-04-24 1987-11-02 Fuji Photo Film Co Ltd 感光性組成物
JPH0667420A (ja) * 1992-08-19 1994-03-11 Nippon Zeon Co Ltd ポジ型レジスト組成物
JPH086244A (ja) * 1994-06-17 1996-01-12 Shin Etsu Chem Co Ltd 感放射線性レジスト組成物
WO2001007941A1 (fr) * 1999-07-28 2001-02-01 Matsushita Electric Industrial Co., Ltd. Procede de fabrication d'un filtre colore, filtre colore et dispositif a cristaux liquides
TWI300795B (en) * 2001-08-21 2008-09-11 Mitsubishi Chem Corp Curable resin composition for die coating and process for producing color filter
JP4108303B2 (ja) * 2001-08-23 2008-06-25 三菱化学株式会社 硬化性樹脂組成物、カラーフィルタ、カラーフィルタの製造方法、および液晶表示装置
JP2004144976A (ja) * 2002-10-24 2004-05-20 Toray Ind Inc カラーフィルター用着色ペーストおよびカラーフィルター
JP4627617B2 (ja) * 2003-05-23 2011-02-09 東洋インキ製造株式会社 着色組成物、カラーフィルタの製造方法およびブラックマトリックス基板の製造方法
JP2007148258A (ja) * 2005-11-30 2007-06-14 Daicel Chem Ind Ltd レジスト組成物
JP4835210B2 (ja) * 2006-03-10 2011-12-14 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、カラーフィルタおよびカラーフィルタの製造方法

Also Published As

Publication number Publication date
SG136094A1 (en) 2007-10-29
CN101042532B (zh) 2012-04-25
JP2007256407A (ja) 2007-10-04
CN101042532A (zh) 2007-09-26
TWI414885B (zh) 2013-11-11
KR20070095801A (ko) 2007-10-01
TW200804975A (en) 2008-01-16
JP4904869B2 (ja) 2012-03-28

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