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JPS642008A - Formation of diffraction grating - Google Patents

Formation of diffraction grating

Info

Publication number
JPS642008A
JPS642008A JP15828087A JP15828087A JPS642008A JP S642008 A JPS642008 A JP S642008A JP 15828087 A JP15828087 A JP 15828087A JP 15828087 A JP15828087 A JP 15828087A JP S642008 A JPS642008 A JP S642008A
Authority
JP
Japan
Prior art keywords
diffraction grating
resist
layer
antiphase
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15828087A
Other languages
Japanese (ja)
Other versions
JPH012008A (en
JP2730893B2 (en
Inventor
Hiroshi Sugimoto
Teruhito Matsui
Kenichi Otsuka
Yuji Abe
Toshiyuki Oishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP62158280A priority Critical patent/JP2730893B2/en
Publication of JPS642008A publication Critical patent/JPS642008A/en
Publication of JPH012008A publication Critical patent/JPH012008A/en
Priority to US07/947,981 priority patent/US5300190A/en
Priority to US08/172,824 priority patent/US5540345A/en
Application granted granted Critical
Publication of JP2730893B2 publication Critical patent/JP2730893B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/124—Geodesic lenses or integrated gratings

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Drying Of Semiconductors (AREA)
  • Semiconductor Lasers (AREA)
  • Optical Integrated Circuits (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE:To form simply a diffraction grating in antiphase to a resist shape on a substrate by forming a coating film layer on a diffraction grating layer formed of a resin without causing damage on the diffraction grating layer, forming a mask of an antiphase diffraction grating after removing a part on the diffraction grating, and etching a substrate using the mask. CONSTITUTION:A diffraction grating of a resist 2 comprising a resin material patterned on a substrate 1 is obtd. when a photosensitive resist comprising the resin material is subjected to interference fringes exposure and developed. In this case, when the process is carried out by the electron cyclotron resonance plasma CVD process, an SiNx layer 3 is formed on the resist 2 at low temp. without causing damage on the resist 2. The layer 3 on the resist 2 is removed by etching with buffer hydrofluoric acid utilizing the difference of etching speed. When the resist 2 is removed, a diffraction grating being in antiphase to the resist 2 by the effect of the layer 3 is formed. When this diffraction grating is used as mask, a diffraction grating being in antiphase to a resist shape is formed simply on the substrate 1.
JP62158280A 1987-06-24 1987-06-24 Diffraction grating manufacturing method Expired - Lifetime JP2730893B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP62158280A JP2730893B2 (en) 1987-06-24 1987-06-24 Diffraction grating manufacturing method
US07/947,981 US5300190A (en) 1987-06-24 1992-09-21 Process of producing diffraction grating
US08/172,824 US5540345A (en) 1987-06-24 1993-12-27 Process of producing diffraction grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62158280A JP2730893B2 (en) 1987-06-24 1987-06-24 Diffraction grating manufacturing method

Publications (3)

Publication Number Publication Date
JPS642008A true JPS642008A (en) 1989-01-06
JPH012008A JPH012008A (en) 1989-01-06
JP2730893B2 JP2730893B2 (en) 1998-03-25

Family

ID=15668149

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62158280A Expired - Lifetime JP2730893B2 (en) 1987-06-24 1987-06-24 Diffraction grating manufacturing method

Country Status (1)

Country Link
JP (1) JP2730893B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2915832A1 (en) * 2007-05-04 2008-11-07 Commissariat Energie Atomique METHOD OF MANUFACTURING PATTERNS WITHIN A POLYMER LAYER
JP2012533686A (en) * 2009-07-23 2012-12-27 エムエスゲー リトグラス アクチエンゲゼルシャフト Method for forming a structured coating on a substrate, a coated substrate, and a semi-finished product comprising the coated substrate

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS627001A (en) * 1985-07-04 1987-01-14 Kokusai Denshin Denwa Co Ltd <Kdd> Production of diffraction grating
JPS6217702A (en) * 1985-07-16 1987-01-26 Kokusai Denshin Denwa Co Ltd <Kdd> Production of diffraction grating
JPS6218561A (en) * 1985-07-17 1987-01-27 Fujitsu Ltd Uneven surface formation method
JPS62109389A (en) * 1985-11-07 1987-05-20 Nec Corp Manufacture of diffraction grating
JPS62165392A (en) * 1986-01-16 1987-07-21 Nec Corp Manufacture of diffraction grating

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS627001A (en) * 1985-07-04 1987-01-14 Kokusai Denshin Denwa Co Ltd <Kdd> Production of diffraction grating
JPS6217702A (en) * 1985-07-16 1987-01-26 Kokusai Denshin Denwa Co Ltd <Kdd> Production of diffraction grating
JPS6218561A (en) * 1985-07-17 1987-01-27 Fujitsu Ltd Uneven surface formation method
JPS62109389A (en) * 1985-11-07 1987-05-20 Nec Corp Manufacture of diffraction grating
JPS62165392A (en) * 1986-01-16 1987-07-21 Nec Corp Manufacture of diffraction grating

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2915832A1 (en) * 2007-05-04 2008-11-07 Commissariat Energie Atomique METHOD OF MANUFACTURING PATTERNS WITHIN A POLYMER LAYER
JP2008290230A (en) * 2007-05-04 2008-12-04 Commissariat A L'energie Atomique Method for producing pattern in polymer layer
EP1988566A3 (en) * 2007-05-04 2010-08-04 Commissariat à l'Énergie Atomique et aux Énergies Alternatives Method for creating patterns inside a polymer layer
US7846512B2 (en) 2007-05-04 2010-12-07 Commissariat A L'energie Atomique Method for producing patterns in a polymer layer
JP2012533686A (en) * 2009-07-23 2012-12-27 エムエスゲー リトグラス アクチエンゲゼルシャフト Method for forming a structured coating on a substrate, a coated substrate, and a semi-finished product comprising the coated substrate

Also Published As

Publication number Publication date
JP2730893B2 (en) 1998-03-25

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