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JPS6034802B2 - Thermal head for thermal recording device - Google Patents

Thermal head for thermal recording device

Info

Publication number
JPS6034802B2
JPS6034802B2 JP52122624A JP12262477A JPS6034802B2 JP S6034802 B2 JPS6034802 B2 JP S6034802B2 JP 52122624 A JP52122624 A JP 52122624A JP 12262477 A JP12262477 A JP 12262477A JP S6034802 B2 JPS6034802 B2 JP S6034802B2
Authority
JP
Japan
Prior art keywords
thermal
thermal head
heating resistor
quartz
glazed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52122624A
Other languages
Japanese (ja)
Other versions
JPS5455449A (en
Inventor
昌久 福井
利民 原
義章 白戸
晄 新見
芳興 櫨本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP52122624A priority Critical patent/JPS6034802B2/en
Priority to US05/906,359 priority patent/US4296309A/en
Priority to DE19782821950 priority patent/DE2821950A1/en
Publication of JPS5455449A publication Critical patent/JPS5455449A/en
Priority to US06/552,013 priority patent/US4545881A/en
Publication of JPS6034802B2 publication Critical patent/JPS6034802B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C7/00Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/006Thin film resistors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/10Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/12Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Electronic Switches (AREA)
  • Non-Adjustable Resistors (AREA)

Description

【発明の詳細な説明】 本発明は熱記録装置に用いられるサーマルヘッドを製作
するに際し、発熱抵抗体を形成する基板及び前記基板上
に棚化ジルコニウム発熱抵抗体を形成したサーマルヘッ
ド‘こ関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a substrate on which a heating resistor is formed and a thermal head in which a shelved zirconium heating resistor is formed on the substrate when manufacturing a thermal head used in a thermal recording device. It is.

熱記録方法は、無騒音、メンテナンスフリー、低コスト
及び印字品質が優れている等のため、近年各方面から注
目され、研究開発がなされている。しかし、静電記録あ
るいは通電記録等の方式に比較し記録速度が小さく、フ
ァクシミリ、電算機用プリンター等に使用するためには
、一層の高速化が望まれている。
Thermal recording methods are noiseless, maintenance-free, low cost, and have excellent printing quality, so they have attracted attention from various quarters in recent years and have been researched and developed. However, the recording speed is lower than that of electrostatic recording or current recording, and further speeding up is desired for use in facsimiles, computer printers, and the like.

熱記録の高速化を図るためには配線方法、電気回路等の
改良と共にサーマルヘッドの発熱抵抗値の高温度使用で
の耐久性の改善が必要とされている。
In order to increase the speed of thermal recording, it is necessary to improve wiring methods, electric circuits, etc., as well as improve the durability of the heating resistance of the thermal head when used at high temperatures.

従来、薄膜製造技術で製造されるサーマルヘッド(以下
薄膜サーマルヘッド)用基板には1 表面が極めて平滑
であること 2 発熱抵抗体で生じた熱を効率良く、感熱紙に伝達し
、しかも蓄熱による基板温度の上昇の少ないこと3 反
り、ねじれのない平坦性の良いこと(抵抗体及び電極等
の微細パターンを製作する際フオトェッチ技術を用いる
ため)4 発熱抵抗体の劣化を生じしめるアルカリイオ
ンの少ないこと等が要求される。
Conventionally, substrates for thermal heads (hereinafter referred to as thin-film thermal heads) manufactured using thin-film manufacturing technology have the following characteristics: 1. The surface is extremely smooth. 2. The heat generated by the heat-generating resistor is efficiently transferred to the thermal paper, and the heat generated by the heating resistor is efficiently transferred to the thermal paper. 3. Low rise in substrate temperature 3. Good flatness with no warping or twisting (because photo-etch technology is used to produce fine patterns for resistors, electrodes, etc.) 4. Low alkali ions that can cause deterioration of heating resistors etc. are required.

これらの諸条件より一般にアルミナ上にガラス層を被覆
したグレーズドセラミックスが賞用されている。
Due to these conditions, glazed ceramics made of alumina coated with a glass layer are generally preferred.

また、グレーズドセラミツクスのガラス層には以下のこ
とが必要とされる。
Additionally, the glass layer of glazed ceramics requires the following:

1 アルミナとの熱膨張係数が類似していること(平坦
性をえるため)2 ァルミナとの密着性が良いこと 3 平滑なグレーズ面が得られること これらの諸条件を満足させるグレーズドセラミックスの
グレーズ層は軟化温度の高いものは得にくく、最高使用
温度が限定されているのが現状である。
1. The coefficient of thermal expansion is similar to that of alumina (to achieve flatness). 2. Good adhesion to alumina. 3. A smooth glazed surface can be obtained. Glazed ceramic glaze layer that satisfies these conditions. Currently, it is difficult to obtain a material with a high softening temperature, and the maximum use temperature is currently limited.

一方熱記録の高速化への要求により、サーマルヘッド発
熱抵抗体は従来にも増して、高温度での耐久性が必要と
されている。
On the other hand, due to the demand for faster thermal recording, thermal head heating resistors are required to be more durable at high temperatures than ever before.

以上の点を種々検討の結果、サーマルヘッドの高温度で
の耐久性を向上させるためには、発熱抵抗体の改善と共
に発熱抵抗体を形成さす基板の改良が必要であることが
判明した。
As a result of various studies on the above points, it has been found that in order to improve the durability of the thermal head at high temperatures, it is necessary to improve the heating resistor as well as the substrate on which the heating resistor is formed.

本発明は上記の点に鑑み、なされたものであり、グレー
ズドセラミツクス上のガラス層と発熱抵抗体の間に石英
(Si02)を介在させ、グレーズドセラミックスの特
長を損うことなく、ガラス層の耐熱性が低いという欠点
を改良することにより、高温度での使用に耐え熱記録の
高速化に有用なサーマルヘッドを提供するものである。
The present invention has been made in view of the above points, and by interposing quartz (Si02) between the glass layer on the glazed ceramics and the heating resistor, the heat resistance of the glass layer is improved without impairing the features of the glazed ceramics. By improving the drawback of low performance, the present invention provides a thermal head that can withstand use at high temperatures and is useful for increasing the speed of thermal recording.

本発明において、グレーズミれる基板の熱伝導性の良い
物質としては、アルミナ、ベリリア、マグネシア等の酸
化物を主成分として競結させたものが使用される。又、
発熱抵抗体としては、棚化ジルコニウム等の棚化物系発
熱抵抗体が経時的に安定で、抵抗値調整が可能であり、
特に高固有抵抗値の設定が可能なので、耐熱性の良い基
板と組合せて使用される。
In the present invention, as a material having good thermal conductivity for the substrate that is glazed, a material composed mainly of oxides such as alumina, beryllia, and magnesia and bonded together is used. or,
As a heating resistor, shelved zirconium or other shelved heating resistors are stable over time, and their resistance value can be adjusted.
In particular, since it is possible to set a high specific resistance value, it is used in combination with a substrate with good heat resistance.

第1図は従来のサーマルヘッドの一例で、グレーズドセ
ラミックス基板1上に発熱抵抗体2、引出し導体3,4
、その上に保護層5,6を彼膜している。
Figure 1 shows an example of a conventional thermal head, in which a heating resistor 2, lead-out conductors 3 and 4 are placed on a glazed ceramic substrate 1.
, and protective layers 5 and 6 are formed thereon.

第2図は本発明のサ−マルヘツドでグレーズドセラミッ
クス上に石英薄膜7が被覆されているのが特徴である。
FIG. 2 shows a thermal head according to the present invention, which is characterized in that a quartz thin film 7 is coated on glazed ceramics.

他は第1図と同様である。以下に本発明を実施例で示す
The rest is the same as in FIG. The present invention will be illustrated below with examples.

実施例 0.63側のアルミナ板上を、50ムのK20十Na2
0=0.9%で、軟化点620ooのガラス層で被覆し
たグレーズドセラミックス上に石英(Si02)板ター
ゲットを用い、アルゴン雰囲気中で高周波スパッタ法で
石英の4種類の厚さの薄膜を形成させた。
Example 0.63 side alumina plate was covered with 50 μm of K20 and Na2.
Using a quartz (Si02) plate target on glazed ceramics coated with a glass layer with a softening point of 0.9% and a softening point of 620 oo, thin films of four different thicknesses of quartz were formed by high-frequency sputtering in an argon atmosphere. Ta.

この基板上に棚化ジルコニウムターゲットを用いアルゴ
ン中で高周波スパッタ法で800オングストローム(A
)の発熱抵抗体を付着させ、さらにTi,Auを電子ビ
ーム蒸着法で各々50△及び1.5山凧の薄膜を形成さ
せた。次に選択フオトェッチングにより発熱抵抗体及び
引出し導体を作製した。
On this substrate, a shelved zirconium target with a thickness of 800 angstroms (A
) was attached, and then Ti and Au were deposited using electron beam evaporation to form thin films of 50Δ and 1.5mm, respectively. Next, a heating resistor and lead-out conductor were fabricated by selective photoetching.

続いて石英及び酸化タンタルを各々2仏及び8山高速ス
パッタ法で付着させた。これらの工程により作製したサ
ーマルヘッド1こ矩形の電気パルスを50HZのサイク
ルで、1発熱抵抗体当りパルス中2.8hsでIW及び
パルス中1.仇hsで2.4Wで、1時間パルスを与え
た後の発熱抵抗体の抵抗値の変化率は第1表に示す通り
である。
Subsequently, quartz and tantalum oxide were deposited by high-speed sputtering with 2 sputters and 8 sputters, respectively. One rectangular electrical pulse of the thermal head produced by these steps is applied at a cycle of 50Hz, IW for 2.8hs during the pulse per one heating resistor, and 1.5Hz during the pulse. Table 1 shows the rate of change in the resistance value of the heating resistor after applying a pulse of 2.4 W for 1 hour.

第1表※抵抗値変化%=三声ミX・oo Roテスト前抵抗値 Rテスト後抵抗値}このときの記
録濃度はマイクロデンシトメータで測定し0.6以上で
あった。
Table 1 *Resistance value change %=Three voices X・oo Resistance value before Ro test R Resistance value after test} The recorded density at this time was measured with a microdensitometer and was 0.6 or more.

なお、第1表中tl}〜{小ま本発明によるものであり
、比較例mはグレーズドセラミックス上に、じかに発熱
抵抗体を付けたものであり、その他の製造条件は同じで
ある。
In Table 1, tl} to {small are based on the present invention, and Comparative Example m has a heating resistor directly attached to the glazed ceramics, and the other manufacturing conditions are the same.

さらに実施例1のサーマルヘッドをlmS,2.4Wで
50斑寺間の長時間テストを行ったところ、抵抗値変化
率は十2.8%であり、その寿命が500時間以上であ
ることが判り、同じテストで比較例は5畑時間で断線し
、本発明の効果が認められた。
Furthermore, when the thermal head of Example 1 was subjected to a long-term test at lmS and 2.4W for 50 cycles, the resistance value change rate was 12.8%, indicating that its lifespan was over 500 hours. In the same test, the wire of the comparative example broke after 5 field hours, demonstrating the effectiveness of the present invention.

次に、実施例5〜12として前記棚化ジルコニウム発熱
抵抗体を他の棚化物発熱抵抗体に変えた例を示す。この
サーマルヘッドの石英層の厚さは2仏のでその他の構成
は実施例1と同じとした。また、比較例2〜9として、
実施例5〜12の構成から石英層を除いたものを用意し
た。以上のサーマルヘッド‘こ対して矩形の電気パルス
を50HZのサイクルで、1発熱抵抗体当りパルス中1
.仇hsで2.4Wの条件で1時間印加した後の抵抗変
化率を第2表に示す。第2表 以上のようにグレーズドセラミックス上に石英薄膜を被
覆することによりグレーズドセラミックスの表面平滑性
、熱伝導性質等の利点を損うことなく、その最高使用温
度が低いという欠点を改善することができ、本発明は熱
記録装置の高速化を発展させる上で極めて有用なもので
ある。
Next, as Examples 5 to 12, examples will be shown in which the shelved zirconium heating resistor is replaced with another shelved zirconium heating resistor. The thickness of the quartz layer of this thermal head was 2 mm, so the other configurations were the same as in Example 1. In addition, as Comparative Examples 2 to 9,
The structures of Examples 5 to 12 except that the quartz layer was removed were prepared. A rectangular electric pulse is applied to the above thermal head at a cycle of 50Hz, with 1 pulse per heating resistor.
.. Table 2 shows the rate of change in resistance after applying 2.4 W at 2 hs for 1 hour. As shown in Table 2, by coating glazed ceramics with a quartz thin film, it is possible to improve the drawback of low maximum operating temperature without sacrificing the advantages of glazed ceramics such as surface smoothness and thermal conductivity. Therefore, the present invention is extremely useful in increasing the speed of thermal recording devices.

なお、本発明は上記の実施例に限定されるものではなく
、例えばガラスを被覆した基板に熱伝導率の大きい、ベ
リリア、サファイア又は金属等から選択でき、又、石英
薄膜の形成法は高速スパッタ、電子ビーム蒸着、イオン
プレーティング等の蒸着法又はC.V.D等の化学的方
法によることが可能である。
Note that the present invention is not limited to the above-mentioned embodiments. For example, the substrate coated with glass can be selected from materials with high thermal conductivity such as beryllia, sapphire, or metal, and the method for forming the quartz thin film is high-speed sputtering. , electron beam evaporation, ion plating, or C.I. V. It is possible to use a chemical method such as D.

石英層は薄すぎると下地の影響を受けやすくて効果が少
なく、厚くするのは生産コストが高くなるとともに、サ
ーマルヘッドの篭熱が生じて高速記録を行うのに好まし
くない。
If the quartz layer is too thin, it will be easily influenced by the underlying material and will have little effect; if it is too thick, the production cost will increase and the thermal head will generate heat, making it undesirable for high-speed recording.

従って石英層の厚さの好ましい範囲は0.2〜50山肌
、特に好ましい範囲は0.5〜loAmである。さらに
、ニクロム合金、窒化タンタル等の発熱抵受;失墓童亭
主繁華袋要篤選な岸陰サ−マルヘッド及びハイブリッド
集積回路用基板等にも使用することができる。
Therefore, a preferable range of the thickness of the quartz layer is 0.2 to 50 am, and a particularly preferable range is 0.5 to loAm. Furthermore, it can also be used for heat generating resistors such as nichrome alloys and tantalum nitride; for thermal heads and substrates for hybrid integrated circuits, which are highly recommended.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来のサーマルヘッドの断面による説明図であ
り、第2図は本発明によるサーマルヘッドの断面による
説明図である。 1・・・・・・グレーズドセラミックス基板、2・…・
・発熱抵抗体、3,4・…・・引出し導体、5,6・・
・・・・保護層、7・・・・・・石英薄膜。 第1図 第2図
FIG. 1 is an explanatory sectional view of a conventional thermal head, and FIG. 2 is an explanatory sectional view of a thermal head according to the present invention. 1... Glazed ceramics substrate, 2...
・Heating resistor, 3, 4... Output conductor, 5, 6...
...Protective layer, 7...Quartz thin film. Figure 1 Figure 2

Claims (1)

【特許請求の範囲】 1 熱伝導性の良い物質にガラス層を被覆したグレーズ
ド基板と、該グレーズド基板に被覆された石英層と、該
石英層上に配された発熱抵抗体とを有することを特徴と
する熱記録装置用サーマルヘツド。 2 石英層の厚さが0.2〜50μmである特許請求の
範囲第1項記載のサーマルヘツド。 3 発熱抵抗体が硼化ジルコニウムである特許請求の範
囲第1項ないし第2項記載のサーマルヘツド。
[Scope of Claims] 1. A glazed substrate made of a material with good thermal conductivity coated with a glass layer, a quartz layer coated on the glazed substrate, and a heating resistor disposed on the quartz layer. Thermal head for thermal recording devices with special features. 2. The thermal head according to claim 1, wherein the quartz layer has a thickness of 0.2 to 50 μm. 3. The thermal head according to claims 1 and 2, wherein the heating resistor is zirconium boride.
JP52122624A 1977-05-19 1977-10-13 Thermal head for thermal recording device Expired JPS6034802B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP52122624A JPS6034802B2 (en) 1977-10-13 1977-10-13 Thermal head for thermal recording device
US05/906,359 US4296309A (en) 1977-05-19 1978-05-15 Thermal head
DE19782821950 DE2821950A1 (en) 1977-05-19 1978-05-19 Head for thermal printing with stable resistance - obtd. by sputtering a metal boride resistance heating element onto a glazed substrate
US06/552,013 US4545881A (en) 1977-05-19 1983-11-16 Method for producing electro-thermal transducer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52122624A JPS6034802B2 (en) 1977-10-13 1977-10-13 Thermal head for thermal recording device

Publications (2)

Publication Number Publication Date
JPS5455449A JPS5455449A (en) 1979-05-02
JPS6034802B2 true JPS6034802B2 (en) 1985-08-10

Family

ID=14840559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52122624A Expired JPS6034802B2 (en) 1977-05-19 1977-10-13 Thermal head for thermal recording device

Country Status (1)

Country Link
JP (1) JPS6034802B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56550U (en) * 1979-06-16 1981-01-06
US4612433A (en) * 1983-12-28 1986-09-16 Pentel Kabushiki Kaisha Thermal head and manufacturing method thereof
JPS60141569A (en) * 1983-12-28 1985-07-26 Pentel Kk Thermal head
JPS6112357A (en) * 1984-06-29 1986-01-20 Hitachi Ltd Thermal recording head

Also Published As

Publication number Publication date
JPS5455449A (en) 1979-05-02

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