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JPS62214968A - Thermal head - Google Patents

Thermal head

Info

Publication number
JPS62214968A
JPS62214968A JP5852486A JP5852486A JPS62214968A JP S62214968 A JPS62214968 A JP S62214968A JP 5852486 A JP5852486 A JP 5852486A JP 5852486 A JP5852486 A JP 5852486A JP S62214968 A JPS62214968 A JP S62214968A
Authority
JP
Japan
Prior art keywords
thermal head
substrate
thermal
thick
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5852486A
Other languages
Japanese (ja)
Inventor
Nobuyuki Yoshiike
信幸 吉池
Atsushi Nishino
敦 西野
Yoshihiro Watanabe
善博 渡辺
Akihiko Yoshida
昭彦 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP5852486A priority Critical patent/JPS62214968A/en
Publication of JPS62214968A publication Critical patent/JPS62214968A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/335Structure of thermal heads

Landscapes

  • Electronic Switches (AREA)

Abstract

PURPOSE:To enable manufacture at low cost without sacrificing printing quality and recording speed by forming a thermal resistor on an enameled substrate using thin film technology and also forming a conductor for lead electrode with thick film technology. CONSTITUTION:A thin film 2 of thermal resistor composed of a mixture of TiB2-SiC is formed and patternized on an enameled substrate 1 using a low- alkali crystalline glass such as Mg2B2O6, BaMg2Si2O7. The resistance value of the thermal resistor is approx. 6mum thick using an Au conductive paste through application and sintering process. Next, a thick film glass layer 4 is formed into a thermal head. The enameled substrate 1 is used as an insulation substrate and a radiation substrate of a thermal head, thus radially dissipating an accumulated energy of the thermal head to the outside of the system effectively as radiation energy. Consequently a low cost thermal head which enables high-quality printing can be obtained.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、ファクシミリやプリンタ等の感熱印刷用のサ
ーマルヘッドに関し、特に低コストで印字品質の高いサ
ーマルヘッドに関スル。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a thermal head for thermal printing in facsimile machines, printers, etc., and particularly to a thermal head that is low cost and has high print quality.

従来の技術 感熱印刷用のサーマルヘッドは、その発熱抵抗体及びリ
ード電極用導電体の形成法の相違により薄膜サーマルヘ
ッドと厚膜サーマルヘッドに大別される。
BACKGROUND OF THE INVENTION Thermal heads for thermal printing are broadly classified into thin-film thermal heads and thick-film thermal heads, depending on the method of forming the heating resistor and conductor for lead electrodes.

薄膜サーマルヘッドは、蒸着技術やスパッタ技術とホト
リソ(光蝕刻)技術等のいわゆる薄膜技術を用いて形成
するのに対し、厚膜サーマルヘッドはスクリーン印刷等
のいわゆる厚膜技術を用いる。薄膜サーマルヘッドは発
熱抵抗体の抵抗値の均一化による印字品質の向上と優れ
た熱応答性による高速記録が可能である。しかし、製造
工程が多く製造コストが高いという欠点を有する。−万
、厚膜サーマルヘッドは、製造コストが安価で耐久性が
優れているが、抵抗値のバラツキが大きく印字品質が低
い点と消費電力が大きい欠点を有する。
Thin-film thermal heads are formed using so-called thin-film techniques such as vapor deposition, sputtering, and photolithography, while thick-film thermal heads use so-called thick-film techniques such as screen printing. The thin-film thermal head improves printing quality by making the resistance value of the heating resistor uniform, and enables high-speed recording due to its excellent thermal response. However, it has the disadvantage of requiring many manufacturing steps and high manufacturing cost. - Thick film thermal heads are inexpensive to manufacture and have excellent durability, but have the drawbacks of large variations in resistance, low printing quality, and high power consumption.

発明が解決しようとする問題点 本発明は、厚膜サーマルヘッドが抱えている印字品質の
低さと記録速度が遅いこと、すなわち消貴電力が大きい
ことの問題点と、薄膜サーマルヘッドが抱えている高コ
ストの問題点を解決することを目的とする。
Problems to be Solved by the Invention The present invention solves the problems that thick-film thermal heads have, such as poor print quality and slow recording speed, that is, the large amount of waste power, and the problems that thin-film thermal heads have. The purpose is to solve the problem of high cost.

問題点を解決するための手段 本発明は、ホーロ基板上に発熱抵抗体を薄膜技術で形成
し、リード電極用導電体を厚膜技術で形成するものであ
る。
Means for Solving the Problems According to the present invention, a heating resistor is formed on a hollow substrate using a thin film technique, and a conductor for a lead electrode is formed using a thick film technique.

作用 本発明によシ、薄膜サーマルヘッドの特長である印字品
質の高さと記録速度の速さを損うことなく低コスト化が
可能となる。
Function: According to the present invention, it is possible to reduce costs without impairing the high print quality and high recording speed, which are the features of thin film thermal heads.

本発明のサーマルヘッドが従来例と本質的に異なる点は
、従来はサーマルヘッド用セラミック基板と放熱基板と
が必要であったが、本発明で用いる低アルカリ性結晶化
ガラスからなるホーロ基板は、サーマルヘッドの絶縁基
板と放熱基板とを兼ね、ヘッド部で発生する印字用エネ
ルギー以外の蓄熱エネルギーを効率的に放射エネルギー
として系外に輻射放散できることである。
The thermal head of the present invention is essentially different from conventional examples. Conventionally, a ceramic substrate and a heat dissipation substrate were required for the thermal head, but the hollow substrate made of low alkaline crystallized glass used in the present invention is It serves as both an insulating substrate and a heat dissipation substrate of the head, and can efficiently radiate the stored thermal energy other than the printing energy generated in the head portion as radiant energy to the outside of the system.

この絶縁性に優れた低アルカリガラスセラミックスはL
i2O、Na2O及びに2oの群から選ばれる一価アル
カリ性成分を2重量%以下で、アルカリ土類成分(Ba
O、MgO、CaO、ZnO)を少なくとも16重量%
以上を含有し、ガラスセラミックスの熱膨張係数数が(
60〜160 ) Xl 0””’°C−1の物性を有
し、かつ、ホーロ層は、一部、Mg2B2O5、BaM
g2Si207の結晶層を有しているガラスセラミック
スが本発明の目的に最も適している。
This low alkali glass ceramic with excellent insulation properties is L
A monovalent alkaline component selected from the group of i2O, Na2O and Ni2O is contained in an amount of 2% by weight or less, and an alkaline earth component (Ba
O, MgO, CaO, ZnO) at least 16% by weight
The thermal expansion coefficient number of glass ceramics is (
60 to 160)
Glass ceramics having a crystalline layer of g2Si207 are most suitable for the purposes of the present invention.

このようなガラスセラミックスのホーロ層を形成可能な
ガラスフリットを超微粉砕して、微量の水分を含有する
アルコール電解質を用い、電気泳動法を用いて、ガラス
フリット微粒子を電気泳動電着し、所望の焼成温度で焼
成し、ホーロ基板を調製する。
Glass frit that can form such a hollow layer of glass ceramics is ultrafinely pulverized, and glass frit fine particles are electrophoretically electrodeposited using an alcohol electrolyte containing a trace amount of water to form the desired material. A hollow substrate is prepared by firing at a firing temperature of .

実施例 以下、本発明の詳細な説明する。Example The present invention will be explained in detail below.

実施例1 第1図は、サーマルヘッドの一実施例の断面図である。Example 1 FIG. 1 is a sectional view of one embodiment of a thermal head.

1は基板で、Mg2B2O5、BaMg28i207の
ような低アルカリ性の結晶化ガラスを用いたホーロ基板
である。2は発熱抵抗体でTiB2− SiCの混合体
からなる薄膜であり、RFスパッタ法により形成し、ド
ライエツチング法でパターン化した。
Reference numeral 1 denotes a substrate, which is a hollow substrate made of low alkaline crystallized glass such as Mg2B2O5 or BaMg28i207. Reference numeral 2 denotes a heating resistor, which is a thin film made of a TiB2-SiC mixture, which was formed by RF sputtering and patterned by dry etching.

この時発熱抵抗体の抵抗値は、約3X10−20・αで
あった。3はリード電極であり、第1表に示したように
ムUの導電性ペーストをいわゆる厚膜技術を用いて基板
全面もしくはパターン状にスクリーン印刷法により塗布
し乾燥・焼結した厚み約6μmのものである。なお、全
面塗布の場合は、焼結後ホトリソ工程及びウェットエツ
チング工程によシバターン化した。表には、焼結条件と
ともにリード電極作成後の発熱抵抗体の抵抗変化を示す
At this time, the resistance value of the heating resistor was approximately 3×10 −20·α. 3 is a lead electrode, and as shown in Table 1, a conductive paste of about 6 μm is coated on the entire surface of the substrate or in a pattern by screen printing using so-called thick film technology, dried and sintered. It is something. In the case of full-surface coating, a pattern was formed by a photolithography process and a wet etching process after sintering. The table shows the sintering conditions as well as the change in resistance of the heating resistor after the lead electrodes were created.

(以下余白) 4は保護層兼耐摩耗層で、スクリーン印刷法で形成した
厚膜ガラス層である。なお、パターン形成したサーマル
ヘッドは、8本/ mmのものである。
(The following is a blank space) 4 is a protective layer and wear-resistant layer, which is a thick glass layer formed by a screen printing method. Note that the pattern-formed thermal head has 8 pieces/mm.

黒1から黒4のヘッドにおいて、ドツト当りo、oes
 Wから0.3Wの電力を供給することにより通常の印
字ができた。第1表において、ムU電極の焼結温度が低
い程、焼結時の発熱抵抗体の抵抗変化が小さく所望の抵
抗値が得られた。また、ムU電極は、予め全面に印刷し
、焼結後にパターン化する方が、最初からパターン状に
印刷したものに比べ、同じ焼結条件下における抵抗体の
高抵抗化が抑制できた。
o, oes per dot for black 1 to black 4 heads
Normal printing was possible by supplying power of 0.3W from W. In Table 1, the lower the sintering temperature of the M-U electrode, the smaller the resistance change of the heating resistor during sintering, and the smaller the desired resistance value was obtained. Further, when the MuU electrode was printed on the entire surface in advance and patterned after sintering, the increase in resistance of the resistor could be suppressed under the same sintering conditions, compared to when the pattern was printed from the beginning.

さらに、同一ヘッド内の抵抗値は、±6%(轟1〜3)
と、従来の厚膜技術だけで形成されたヘッド(バラツキ
±16%)に比ベバラツキが小さく高信頼性のサーマル
ヘッドが得られた。また、本サーマルヘッドの作製工程
は、薄膜技術だけで形成されるヘッドに比べ約半分の工
程である。
Furthermore, the resistance value within the same head is ±6% (Todoroki 1 to 3)
Thus, a highly reliable thermal head with less variation was obtained compared to a head formed using only conventional thick film technology (with variation of ±16%). Furthermore, the manufacturing process for this thermal head is about half that of a head formed using only thin film technology.

実施例2 第2図は第2の実施例の断面図である。1はホーロ基板
で、その上に予めスクリーン印刷法によりムUの厚膜リ
ード電極(厚み6〜10μm)3を設ける。2はスパッ
タ法により形成したTa5iO)C系の発熱抵抗体であ
り、シート抵抗が5000/口であった。発熱部のパタ
ーン化は、ドライエツチング法により行なった。4は耐
摩耗層でSiCを4μm設けである。第2表に、作製し
たヘッドの抵抗値のバラツキを示す。
Embodiment 2 FIG. 2 is a sectional view of a second embodiment. Reference numeral 1 denotes a hollow substrate, on which thick film lead electrodes (6 to 10 μm thick) 3 are provided in advance by screen printing. No. 2 was a Ta5iO)C-based heating resistor formed by sputtering, and had a sheet resistance of 5000/hole. Patterning of the heat generating portion was performed by dry etching. 4 is a wear-resistant layer made of SiC with a thickness of 4 μm. Table 2 shows the variation in resistance values of the manufactured heads.

第2表 第2表から、&7〜8のサーマルヘッドの抵抗値のバラ
ツキは、従来の厚膜技術だけで形成されるもの(バラツ
キ±16%)に比べ小さく、かつ、薄膜技術だけで形成
されるヘッドよりも大巾な工程数の削減ができた。
Table 2 From Table 2, it can be seen that the variations in resistance values of thermal heads &7 to 8 are smaller than those formed using only conventional thick film technology (variation ±16%), and those formed using only thin film technology. The number of processes can be significantly reduced compared to conventional heads.

また基板にホーロ基板を用いることでリード電極の基板
に対する付着力を向上させることができた。
Furthermore, by using a hollow substrate as the substrate, it was possible to improve the adhesion of the lead electrode to the substrate.

本発明は、上記の実施例に限定されるものではなく、発
熱抵抗体は、τasiz 、 Tie 、 ZrB 。
The present invention is not limited to the above embodiments, and the heating resistor may be τasiz, Tie, or ZrB.

NiCr 、 NbSi 、τ&2N等の金属化合物で
も良い。
Metal compounds such as NiCr, NbSi, and τ&2N may also be used.

また、リード電極は、pt 等の貴金属の厚膜焼結体で
良い。また、焼結条件は、発熱抵抗体の焼結時の組成変
化を考慮して、必要に応じて、N2ガス雰囲気を用いて
もよい。耐摩耗層は、ダイヤモンドライクカーボン、 
Ta205 、 SiCを含有したガラス等の硬質材料
でも良い。
Further, the lead electrode may be a thick film sintered body of a noble metal such as PT. Further, regarding the sintering conditions, an N2 gas atmosphere may be used as necessary, taking into consideration the compositional change of the heating resistor during sintering. The wear-resistant layer is diamond-like carbon,
A hard material such as glass containing Ta205 or SiC may also be used.

発明の効果 本発明は、低コストでかつ抵抗体の均一化による印字品
質の向上を可能としたサーマルヘッドを提供するもので
ある。
Effects of the Invention The present invention provides a thermal head which is low in cost and can improve printing quality by making resistors uniform.

【図面の簡単な説明】[Brief explanation of drawings]

第1図及び第2図は、本発明によるサーマルヘッドの実
施例を示す縦断面図である。 1・・・・・・ホーロ基板、2・・・・・・発熱抵抗体
、3・・・・・・リード電極、4・・・・・・耐摩耗層
1 and 2 are longitudinal sectional views showing an embodiment of a thermal head according to the present invention. DESCRIPTION OF SYMBOLS 1...Hollow board, 2...Heating resistor, 3...Lead electrode, 4...Wear-resistant layer.

Claims (4)

【特許請求の範囲】[Claims] (1)ホーロ基板上に、薄膜抵抗体からなる発熱体と、
厚膜導電体からなる電力供給用リード電極とを設けたこ
とを特徴とするサーマルヘッド。
(1) A heating element made of a thin film resistor on a hollow substrate,
A thermal head characterized by being provided with a power supply lead electrode made of a thick film conductor.
(2)ホーロ基板上に発熱体を設け、その上に電力供給
用リード電極を設けた特許請求の範囲第1項記載のサー
マルヘッド。
(2) The thermal head according to claim 1, wherein a heating element is provided on the hollow substrate, and a lead electrode for power supply is provided on the heating element.
(3)電力供給用リード電極をホーロ基板と発熱体との
間に設けた特許請求の範囲第1項記載のサーマルヘッド
(3) The thermal head according to claim 1, wherein a lead electrode for power supply is provided between the hollow substrate and the heating element.
(4)ホーロ基板が、金属基板の表面を低アルカリ性結
晶化ガラスで被覆したものである特許請求の範囲第1項
記載のサーマルヘッド。
(4) The thermal head according to claim 1, wherein the hollow substrate is a metal substrate whose surface is coated with low-alkaline crystallized glass.
JP5852486A 1986-03-17 1986-03-17 Thermal head Pending JPS62214968A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5852486A JPS62214968A (en) 1986-03-17 1986-03-17 Thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5852486A JPS62214968A (en) 1986-03-17 1986-03-17 Thermal head

Publications (1)

Publication Number Publication Date
JPS62214968A true JPS62214968A (en) 1987-09-21

Family

ID=13086815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5852486A Pending JPS62214968A (en) 1986-03-17 1986-03-17 Thermal head

Country Status (1)

Country Link
JP (1) JPS62214968A (en)

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