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JPS5688358A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5688358A
JPS5688358A JP16552679A JP16552679A JPS5688358A JP S5688358 A JPS5688358 A JP S5688358A JP 16552679 A JP16552679 A JP 16552679A JP 16552679 A JP16552679 A JP 16552679A JP S5688358 A JPS5688358 A JP S5688358A
Authority
JP
Japan
Prior art keywords
film
region
type region
window
windows
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16552679A
Other languages
Japanese (ja)
Other versions
JPS5712307B2 (en
Inventor
Toshio Nonaka
Tsukasa Watanabe
Jukichi Tsunako
Katsuzo Uenishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP16552679A priority Critical patent/JPS5688358A/en
Publication of JPS5688358A publication Critical patent/JPS5688358A/en
Publication of JPS5712307B2 publication Critical patent/JPS5712307B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Bipolar Transistors (AREA)

Abstract

PURPOSE:To eliminate the pitch displacement between the electrode pattern and the semiconductor device by covering an insulating film on one conductivity type region, simultaneously forming windows for mounting electrode terminal and for forming reverse conductivity type region when opening both the windows and then diffusing the reverse conductivity type region. CONSTITUTION:An N type layer 2 is epitaxially grown on an N type Si substrate 1, a P type region 3 is diffused therein, and an SiO2 film is covered on the entire surface including the region 3. Then, the windows 5 and 6 for mounting the electrode terminal on the film 4 and for diffusing the N type region 11 are simultaneously opened on the region 3, an SiO2 film 7 and an Si3N4 film 8 are laminated on the entire surface thereof. Thereafter, the laminated film on the window 6 is removed by etching it with the photoresist film as a mask, an SiO2 film 10 is covered on the bottom surface and the side walls in the window 6, ions are injected thereto, and it is heat treated, and an N type region 11 is thus formed in the region 11. Subsequently, the films 7, 8 are removed, and the window 5 thus formed previously is exposed.
JP16552679A 1979-12-21 1979-12-21 Manufacture of semiconductor device Granted JPS5688358A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16552679A JPS5688358A (en) 1979-12-21 1979-12-21 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16552679A JPS5688358A (en) 1979-12-21 1979-12-21 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5688358A true JPS5688358A (en) 1981-07-17
JPS5712307B2 JPS5712307B2 (en) 1982-03-10

Family

ID=15814060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16552679A Granted JPS5688358A (en) 1979-12-21 1979-12-21 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5688358A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759379A (en) * 1980-09-27 1982-04-09 Fujitsu Ltd Manufacture of semiconductor device
JPS61236162A (en) * 1985-04-11 1986-10-21 Rohm Co Ltd Manufacturing method of semiconductor device
JPS61236161A (en) * 1985-04-11 1986-10-21 Rohm Co Ltd Manufacturing method of semiconductor device
JPS61236163A (en) * 1985-04-11 1986-10-21 Rohm Co Ltd Manufacturing method of semiconductor device
JPS6314475A (en) * 1986-07-04 1988-01-21 Nec Corp Manufacture of semiconductor device
JPS63205959A (en) * 1987-02-21 1988-08-25 Matsushita Electric Works Ltd Manufacture of electrostatic induction semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759379A (en) * 1980-09-27 1982-04-09 Fujitsu Ltd Manufacture of semiconductor device
JPS61236162A (en) * 1985-04-11 1986-10-21 Rohm Co Ltd Manufacturing method of semiconductor device
JPS61236161A (en) * 1985-04-11 1986-10-21 Rohm Co Ltd Manufacturing method of semiconductor device
JPS61236163A (en) * 1985-04-11 1986-10-21 Rohm Co Ltd Manufacturing method of semiconductor device
JPS6314475A (en) * 1986-07-04 1988-01-21 Nec Corp Manufacture of semiconductor device
JPS63205959A (en) * 1987-02-21 1988-08-25 Matsushita Electric Works Ltd Manufacture of electrostatic induction semiconductor device

Also Published As

Publication number Publication date
JPS5712307B2 (en) 1982-03-10

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