JPS561534A - Manufacture of photomask - Google Patents
Manufacture of photomaskInfo
- Publication number
- JPS561534A JPS561534A JP7581579A JP7581579A JPS561534A JP S561534 A JPS561534 A JP S561534A JP 7581579 A JP7581579 A JP 7581579A JP 7581579 A JP7581579 A JP 7581579A JP S561534 A JPS561534 A JP S561534A
- Authority
- JP
- Japan
- Prior art keywords
- pinhole
- plate
- resist
- exposed
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000005530 etching Methods 0.000 abstract 2
- 230000005540 biological transmission Effects 0.000 abstract 1
- 230000008030 elimination Effects 0.000 abstract 1
- 238000003379 elimination reaction Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To simply correct a photomask, by selectively etching a pinhole portion to make it opaque. CONSTITUTION:If there is a pinhole 3 in a Cr film pattern 2 on a transparent glass plate 1, the pattern and the plate are coated with a positive resist 6 first. A part of the resist, the area of which is slightly larger than that of the pinhole, is exposed to light. Development is effected. Only the part of the transparent plate, which corresponds to the pinhole ad is exposed, is dipped in an etching agent to etch the part of the plate to roughen the surface of the part. The transmission factor of the surface to ultraviolet and visible rays is thus greatly reduced. This produces substantially the same effect as the elimination of the pinhole. The resist is finally removed for completion. According to this method, a mask of high accuracy can be manufactured.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7581579A JPS561534A (en) | 1979-06-15 | 1979-06-15 | Manufacture of photomask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7581579A JPS561534A (en) | 1979-06-15 | 1979-06-15 | Manufacture of photomask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS561534A true JPS561534A (en) | 1981-01-09 |
Family
ID=13587047
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7581579A Pending JPS561534A (en) | 1979-06-15 | 1979-06-15 | Manufacture of photomask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS561534A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6113281U (en) * | 1984-06-27 | 1986-01-25 | 株式会社日立製作所 | cold box |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5574544A (en) * | 1978-11-30 | 1980-06-05 | Mitsubishi Electric Corp | Photo mask correcting method |
-
1979
- 1979-06-15 JP JP7581579A patent/JPS561534A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5574544A (en) * | 1978-11-30 | 1980-06-05 | Mitsubishi Electric Corp | Photo mask correcting method |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6113281U (en) * | 1984-06-27 | 1986-01-25 | 株式会社日立製作所 | cold box |
| JPH0328281Y2 (en) * | 1984-06-27 | 1991-06-18 |
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