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JPS5412566A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5412566A
JPS5412566A JP7660177A JP7660177A JPS5412566A JP S5412566 A JPS5412566 A JP S5412566A JP 7660177 A JP7660177 A JP 7660177A JP 7660177 A JP7660177 A JP 7660177A JP S5412566 A JPS5412566 A JP S5412566A
Authority
JP
Japan
Prior art keywords
mask
oxide film
forming
production
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7660177A
Other languages
Japanese (ja)
Inventor
Hiroshi Nozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP7660177A priority Critical patent/JPS5412566A/en
Publication of JPS5412566A publication Critical patent/JPS5412566A/en
Pending legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Element Separation (AREA)

Abstract

PURPOSE: To decrease junction capacitance by providing a mask in the gate oxide film forming regions of a semiconductor substrate, beforehand forming an inversion preventing layer and an oxide film on both sides thereof, removing the mask, providing gate oxide film and gate electrode here and forming source and drain regions by using these as a mask.
COPYRIGHT: (C)1979,JPO&Japio
JP7660177A 1977-06-29 1977-06-29 Production of semiconductor device Pending JPS5412566A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7660177A JPS5412566A (en) 1977-06-29 1977-06-29 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7660177A JPS5412566A (en) 1977-06-29 1977-06-29 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5412566A true JPS5412566A (en) 1979-01-30

Family

ID=13609835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7660177A Pending JPS5412566A (en) 1977-06-29 1977-06-29 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5412566A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5643744A (en) * 1979-09-18 1981-04-22 Seiko Epson Corp Manufacture of semiconductor device
JPS5710248A (en) * 1980-05-20 1982-01-19 Nec Corp Manufacture of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5643744A (en) * 1979-09-18 1981-04-22 Seiko Epson Corp Manufacture of semiconductor device
JPS5710248A (en) * 1980-05-20 1982-01-19 Nec Corp Manufacture of semiconductor device

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