JP2010199615A5

JP2010199615A5 - Exposure method and exposure apparatus

Info

Publication number: JP2010199615A5
Application number: JP2010108741A
Authority: JP
Filing date: 2010-05-10
Publication date: 2012-04-19
Anticipated expiration: 2024-05-26

Description

本発明の第１の態様によれば、マスク（Ｍ）のパターン（ＭＰ）の像を、投影光学系（ＰＬ）と基板（Ｐ）の間の液体（１）を介して基板上に投影することによって基板を露光する露光方法であって、前記液体に入射する露光光（ＥＬ）の分布に応じてパターン像の投影状態を調整することと、前記調整された投影状態で基板を露光することを含む露光方法が提供される。また、本発明の態様によれば、マスクのパターンの像を、投影光学系と基板の間の液体を介して基板上に投影することによって基板を露光する露光方法であって、前記基板を保持して移動可能な基板ステージ上に配置された温度センサを使って、前記液体の温度分布を計測することと、基板ステージ上の基板を露光することとを含む露光方法が提供される。また、本発明の態様によれば、所定パターンの像を液体を介して基板に投影することによって基板を露光する露光装置であって、前記パターンの像を基板に投影する投影光学系と、前記投影光学系の像面付近に移動可能に配置され、前記液体の温度を計測する温度センサとを備える露光装置が提供される。また、本発明の態様によれば、所定パターンの像を液体を介して基板に投影することによって基板を露光する露光装置であって、前記パターンの像を基板に投影する投影光学系と、露光中に前記基板を移動するための基板ステージと、前記液体の温度を計測するために前記所定方向と垂直な方向に互いに離れて配置された複数のセンサ素子を有する温度センサとを備える露光装置が提供される。 According to the first aspect of the present invention, an image of the pattern (MP) of the mask (M) is projected onto the substrate via the liquid (1) between the projection optical system (PL) and the substrate (P). An exposure method for exposing a substrate by adjusting a projection state of a pattern image according to a distribution of exposure light (EL) incident on the liquid, and exposing the substrate in the adjusted projection state An exposure method is provided. According to another aspect of the present invention, there is provided an exposure method for exposing a substrate by projecting an image of a mask pattern onto the substrate via a liquid between the projection optical system and the substrate, and holding the substrate An exposure method is provided that includes measuring the temperature distribution of the liquid using a temperature sensor disposed on a movable substrate stage and exposing the substrate on the substrate stage. According to an aspect of the present invention, there is provided an exposure apparatus that exposes a substrate by projecting an image of a predetermined pattern onto the substrate via a liquid, the projection optical system that projects the image of the pattern onto the substrate, An exposure apparatus is provided that includes a temperature sensor that is movably disposed near the image plane of the projection optical system and that measures the temperature of the liquid. According to another aspect of the present invention, there is provided an exposure apparatus that exposes a substrate by projecting an image of a predetermined pattern onto the substrate via a liquid, the projection optical system that projects the image of the pattern onto the substrate, and exposure An exposure apparatus comprising: a substrate stage for moving the substrate therein; and a temperature sensor having a plurality of sensor elements arranged apart from each other in a direction perpendicular to the predetermined direction for measuring the temperature of the liquid. Provided.

Claims

An exposure method for exposing a substrate by projecting an image of a mask pattern onto the substrate via a liquid between the projection optical system and the substrate,
Measuring a temperature distribution of the liquid using a temperature sensor disposed on a movable substrate stage holding the substrate;
Exposing the substrate on the substrate stage.

The exposure method according to claim 1, wherein the temperature sensor is detachable from the substrate stage.

The exposure method according to claim 1, wherein the temperature distribution of the liquid is generated by irradiation with the exposure light.

An exposure apparatus that exposes a substrate by projecting an image of a predetermined pattern onto the substrate through a liquid,
A projection optical system that projects an image of the pattern onto a substrate;
An exposure apparatus comprising: a temperature sensor that is movably disposed near an image plane of the projection optical system and measures the temperature of the liquid.

The exposure apparatus according to claim 4, further comprising a movable member that holds the temperature sensor.

The exposure apparatus according to claim 5, wherein the temperature sensor is detachable from the movable member.

The exposure apparatus according to claim 5, wherein the movable member is a substrate stage that can move while holding the substrate.

The liquid supply mechanism which supplies a liquid on the said board | substrate is further provided, The said liquid supply mechanism adjusts the temperature of the liquid supplied on the said board | substrate based on the measurement result of the said temperature sensor. The exposure apparatus according to any one of the above.

The substrate is exposed while being moved in a predetermined direction, and the temperature sensor has a plurality of sensor elements arranged apart from each other in a direction perpendicular to the predetermined direction. Exposure device.

An exposure apparatus that exposes a substrate by projecting an image of a predetermined pattern onto the substrate through a liquid,
A projection optical system that projects an image of the pattern onto a substrate;
A substrate stage for moving the substrate during exposure;
An exposure apparatus comprising a temperature sensor having a plurality of sensor elements arranged apart from each other in a direction perpendicular to the predetermined direction in order to measure the temperature of the liquid.

The exposure apparatus according to claim 10, wherein the plurality of sensor elements are arranged in the vicinity of a projection region of the projection optical system.

And a liquid recovery mechanism for recovering the liquid on the substrate at a plurality of positions separated from each other in a direction perpendicular to the predetermined direction, wherein the plurality of sensor elements are configured to control the temperature of the liquid recovered at the plurality of positions. The exposure apparatus according to claim 10 or 11, wherein each of the exposure apparatuses performs measurement.

Based on the temperature information of the liquid measured using the temperature sensor, the projection state of the pattern image is adjusted so that a desired pattern image is projected onto the substrate via the projection optical system and the liquid. The exposure apparatus according to claim 10, further comprising an adjusting unit.

The exposure apparatus according to claim 13, wherein the adjustment unit adjusts a positional relationship between an image plane formed through the projection optical system and the liquid and the substrate surface.

The liquid supply mechanism which supplies a liquid on the said board | substrate is further provided, The said adjustment means adjusts the temperature of the liquid supplied from the said liquid supply mechanism based on the measurement result of the said temperature sensor. Exposure equipment.

The liquid supply mechanism for supplying a liquid onto the substrate is further provided, and the liquid supply mechanism adjusts the temperature of the liquid supplied onto the substrate based on the measurement result of the temperature sensor. The exposure apparatus according to any one of the above.

The exposure apparatus according to claim 12, further comprising a liquid supply mechanism that supplies liquid onto the substrate, wherein the liquid supply mechanism supplies liquids having different temperatures from a plurality of positions.