CN109116593B - Method for exposing master plate - Google Patents
Method for exposing master plate Download PDFInfo
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- CN109116593B CN109116593B CN201810873781.3A CN201810873781A CN109116593B CN 109116593 B CN109116593 B CN 109116593B CN 201810873781 A CN201810873781 A CN 201810873781A CN 109116593 B CN109116593 B CN 109116593B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
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- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention provides a motherboard exposure method. The mother board exposure method is characterized in that a left exposure area in a photomask corresponding to each line of liquid crystal panels and a non-panel area adjacent to each line of liquid crystal panels is set to be a right pattern area corresponding to the liquid crystal panels, a right exposure area is set to be a left pattern area corresponding to the liquid crystal panels, and a center exposure area is set to be a center pattern area corresponding to the liquid crystal panels and a non-panel area adjacent to each line of liquid crystal panels.
Description
Technical Field
The invention relates to the technical field of display, in particular to a motherboard exposure method.
Background
Thin Film Transistors (TFTs) are the main driving elements in current Liquid Crystal Displays (LCDs) and Active Matrix Organic electroluminescent displays (AMOLEDs), and are directly related to the Display performance of flat panel displays.
Most of the existing liquid crystal displays in the market are backlight liquid crystal displays (lcds), which include a liquid crystal display panel and a backlight module (backlight module). The liquid crystal display panel operates on the principle that liquid crystal molecules are poured between a Thin Film Transistor (TFT) Substrate and a Color Filter (CF) Substrate, pixel voltage and common voltage are applied to the two substrates, and the rotation direction of the liquid crystal molecules is controlled by an electric field formed between the pixel voltage and the common voltage to refract light of a backlight module to generate a picture.
With the change of consumption habits of people, large-sized liquid crystal panels are more and more favored by consumers, and the market demand for large-sized (larger than 65 inches) liquid crystal panels is more and more. Most of the existing generation lines in panel factories are 6 generation lines and 8.5 generation lines, and the size of a liquid crystal panel of 65 inches or more is larger than the mask sizes of the 6 generation lines and the 8.5 generation lines, so that the mask splicing design is required when designing a mask corresponding to a large-sized liquid crystal panel. When the liquid crystal display panel is typeset on a large panel, if a spare area (dummy area) is arranged on the large panel, patterns of light hood parts are exposed in the spare area during exposure, the density of the patterns in the middle and the edge of the liquid crystal display panel is ensured to be equal, the phenomenon of over-etching or insufficient etching due to small density of the edge of the liquid crystal display panel when etching is avoided, the uniformity and the quality of the liquid crystal display panel are influenced, the pattern of the spare area cannot appear on the final finished liquid crystal display panel, and the dummy area is called as the dummy area. In the existing photomask splicing design method, after exposure of the liquid crystal panel is finished, extra exposure action (shot) is required to finish exposure of a dummy area, so that extra capacity is increased, production efficiency is reduced, and production cost of products is improved.
Disclosure of Invention
The invention aims to provide a motherboard exposure method which can reduce the exposure times of a photomask, save the productivity, improve the production efficiency and reduce the production cost of a panel.
In order to achieve the above object, the present invention provides a method for exposing a master, comprising the steps of:
step S1, providing a motherboard, wherein the motherboard comprises a panel area and a non-panel area adjacent to the panel area; the panel area comprises a plurality of liquid crystal panels arranged in an array; each liquid crystal panel comprises a left pattern area, a center pattern area and a right pattern area which are sequentially connected;
step S2, providing a light shield corresponding to each row of liquid crystal panel and the non-panel area adjacent to each row of liquid crystal panel, wherein the light shield comprises a left exposure area corresponding to the right pattern area of the liquid crystal panel, at least two center exposure areas corresponding to the center pattern area of the liquid crystal panel and a right exposure area corresponding to the left pattern area of the liquid crystal panel; the central exposure area also corresponds to a non-panel area adjacent to each row of the liquid crystal panel;
step S3, exposing each row of liquid crystal panel and the non-panel area adjacent to each row of liquid crystal panel simultaneously through the light shield, and completing the exposure of the liquid crystal panel and the non-panel area adjacent to the liquid crystal panel simultaneously through one exposure.
When the panel area is positioned at the right side of the motherboard, the non-panel area is positioned at the left side of the motherboard; in step S3, the right exposure area corresponding to the left pattern area of the liquid crystal panel and the center exposure area corresponding to the non-panel area adjacent to each row of the liquid crystal panel are exposed simultaneously, and the exposure of the left pattern area of the liquid crystal panel and the non-panel area adjacent to the left pattern area of the liquid crystal panel is completed simultaneously by one exposure.
The left exposure area simultaneously corresponds to a non-panel area adjacent to each row of the liquid crystal panel.
When the panel area is positioned at the left side of the motherboard, the non-panel area is positioned at the right side of the motherboard; in step S3, the left exposure area corresponding to the right pattern area of the liquid crystal panel and the center exposure area corresponding to the non-panel area adjacent to each row of the liquid crystal panel are exposed simultaneously, and the exposure of the right pattern area of the liquid crystal panel and the non-panel area corresponding to the right pattern area of the liquid crystal panel is completed simultaneously by one exposure.
The right exposure area simultaneously corresponds to a non-panel area adjacent to each row of the liquid crystal panel.
When the panel area is positioned in the central area of the motherboard, the non-panel areas are positioned on the left side and the right side of the motherboard; in step S3, the left exposure area corresponding to the right pattern area of the liquid crystal panel and the center exposure area corresponding to the non-panel area adjacent to each row of the liquid crystal panel are simultaneously exposed, and the exposure of the right pattern area of the liquid crystal panel and the non-panel area adjacent to the right pattern area of the liquid crystal panel is simultaneously completed by one exposure, or the right exposure area corresponding to the left pattern area of the liquid crystal panel and the center exposure area corresponding to the non-panel area adjacent to each row of the liquid crystal panel are simultaneously exposed, and the exposure of the left pattern area of the liquid crystal panel and the non-panel area adjacent to the left pattern area of the liquid crystal panel is simultaneously completed by one exposure.
The panel region includes three liquid crystal panels arranged in a vertical direction.
Each liquid crystal panel comprises a display area and a frame area surrounding the display area; the left exposure area, the center exposure area and the right exposure area all comprise a first exposure area corresponding to the display area and a second exposure area corresponding to the frame area.
The left exposure area, the center exposure area and the right exposure area all further comprise mosaic areas adjacent to the first exposure area.
The invention has the beneficial effects that: the exposure method of the mother board of the invention sets the left exposure area in the photomask corresponding to each line of liquid crystal panel and the non-panel area adjacent to each line of liquid crystal panel to correspond to the right pattern area of the liquid crystal panel, sets the right exposure area to correspond to the left pattern area of the liquid crystal panel, sets the center exposure area to correspond to the center pattern area of the liquid crystal panel and the non-panel area adjacent to each line of liquid crystal panel, can simultaneously expose each line of liquid crystal panel and the non-panel area adjacent to each line of liquid crystal panel through the photomask, simultaneously completes the exposure of the liquid crystal panel and the non-panel area adjacent to the liquid crystal panel through one-time exposure, does not need to independently expose the non-panel area through extra exposure action, can reduce the exposure times of the photomask, save the productivity, improve the production efficiency and reduce the production cost of the panel.
Drawings
For a better understanding of the nature and technical aspects of the present invention, reference should be made to the following detailed description of the invention, taken in conjunction with the accompanying drawings, which are provided for purposes of illustration and description and are not intended to limit the invention.
In the drawings, there is shown in the drawings,
FIG. 1 is a flow chart of a method of exposing a master according to the present invention;
FIG. 2 is a schematic diagram of a liquid crystal panel on the right side of a mother board according to the exposure method of the mother board of the present invention;
FIG. 3 is a schematic diagram of a liquid crystal panel on the left side of a mother substrate according to the exposure method of the mother substrate of the present invention;
FIG. 4 is a schematic diagram of a liquid crystal panel in the central region of a mother board according to the exposure method of the mother board of the present invention;
FIG. 5 is a schematic diagram of a mask for performing a method of exposing a master according to a preferred embodiment of the present invention;
fig. 6 and 7 are schematic views of another preferred embodiment of a mask in the method for exposing a master according to the present invention.
Detailed Description
To further illustrate the technical means and effects of the present invention, the following detailed description is given with reference to the preferred embodiments of the present invention and the accompanying drawings.
Referring to fig. 1, the present invention provides a method for exposing a mother substrate, comprising the steps of:
step S1, providing a motherboard 10, wherein the motherboard 10 comprises a panel area 11 and a non-panel area (dummy area) 12 adjacent to the panel area 11; the panel area 11 includes a plurality of liquid crystal panels 13 arranged in an array; each liquid crystal panel 13 comprises a left side pattern area, a center pattern area and a right side pattern area which are connected in sequence;
step S2, providing a photo-mask 20 corresponding to each row of the liquid crystal panel 13 and the non-panel area 12 adjacent to each row of the liquid crystal panel 13, wherein the photo-mask 20 comprises a left exposure area 23 corresponding to the right pattern area of the liquid crystal panel 13, at least two center exposure areas 22 corresponding to the center pattern area of the liquid crystal panel 13 and a right exposure area 21 corresponding to the left pattern area of the liquid crystal panel 13; the central exposure region 22 also corresponds to the non-panel region 12 adjacent to each row of the liquid crystal panels 13 at the same time;
in step S3, each row of the liquid crystal panels 13 and the non-panel area 12 adjacent to each row of the liquid crystal panels 13 are simultaneously exposed through the mask 20, and the liquid crystal panels 13 and the non-panel area 12 adjacent to the liquid crystal panels 13 are simultaneously exposed through one exposure.
It should be noted that, in the present invention, the left exposure area 23 of the photo-mask 20 is set to correspond to the right pattern area of the liquid crystal panel 13, the right exposure area 21 is set to correspond to the left pattern area of the liquid crystal panel 13, the center exposure area 22 is set to correspond to the center pattern area of the liquid crystal panel 13 and the non-panel area 12 adjacent to each row of the liquid crystal panel 13, each row of the liquid crystal panel 13 and the non-panel area 12 adjacent to each row of the liquid crystal panel 13 can be simultaneously exposed through the photo-mask 20, and the exposure of the liquid crystal panel 13 and the non-panel area 12 adjacent to the liquid crystal panel 13 can be simultaneously completed through one exposure.
Specifically, the present invention is described by taking a liquid crystal panel 13 having a size of 65 inches and a mother board 10 of generation 8.5 as an example, the liquid crystal panel 13 of 65 inches has a length of 1440mm and a width of 810mm, and the mother board 10 of generation 8.5 has a length of 2200mm and a width of 2500mm, so that at most three liquid crystal panels 13 of 65 inches are formed on the mother board 10 of generation 8.5 in the vertical direction, that is, at most three liquid crystal panels 13 of 65 inches can be cut, and the panel region 11 includes three liquid crystal panels 13 arranged in the vertical direction. In addition, because the size of the liquid crystal panel 13 is large and the size of the exposure area of the mask itself is limited, the present invention requires at least two central exposure areas 22 to expose the central pattern area of the liquid crystal panel 13.
As shown in fig. 2, when the panel area 11 is located on the right side of the mother substrate 10, the non-panel area 12 is located on the left side of the mother substrate 10, so in step S3, only the right exposure area 21 corresponding to the left pattern area of the liquid crystal panel 13 and the center exposure area 22 corresponding to the non-panel area 12 adjacent to each row of the liquid crystal panel 13 need to be exposed at the same time, and the left pattern area of the liquid crystal panel 13 and the non-panel area 12 adjacent to the left pattern area of the liquid crystal panel 13 are exposed at the same time by one exposure, which can save the number of exposure times when exposing three liquid crystal panels 13 compared to the prior art in which the non-panel area 12 is exposed separately by adopting an extra exposure action; and the width of the non-panel area 12 is wider, the invention can also arrange the left exposure area 23 to simultaneously correspond to the non-panel area 12 adjacent to each row of the liquid crystal panel 13, and simultaneously expose the non-panel area 12 through the central exposure area 22 and the left exposure area 23.
Specifically, when the panel area 11 is located on the right side of the mother board 10, and the non-panel areas 12 are located on the left side of the mother board 10, the specific exposure method of the present invention for one liquid crystal panel 13 and its adjacent non-panel area 12 is: firstly, simultaneously exposing the left exposure area 23 and the center exposure area 22 which are positioned in the non-panel area 12 and the right exposure area 21 which is positioned in the panel area 11 and blocking other exposure areas, then exposing the center exposure area 22 which is positioned in the panel area 11 and is close to the right exposure area 21 and blocking other exposure areas, then exposing the center exposure area 22 which is positioned in the panel area 11 and is close to the left exposure area 23 and blocking other exposure areas, and finally exposing the left exposure area 23 which is positioned in the panel area 11 and blocking other exposure areas; therefore, the invention can complete the patterning of one liquid crystal panel 13 and the adjacent non-panel area 12 only by 4 times of exposure.
As shown in fig. 3, when the panel region 11 is located at the left side of the mother substrate 10, the non-panel region 12 is located at the right side of the mother substrate 10, so in step S3, only the left exposure region 23 corresponding to the right pattern region of the liquid crystal panel 13 and the center exposure region 22 corresponding to the non-panel region 12 adjacent to each row of the liquid crystal panel 13 need to be exposed at the same time, and the exposure of the right pattern region of the liquid crystal panel 13 and the non-panel region 12 adjacent to the right pattern region of the liquid crystal panel 13 is completed at the same time by one exposure, which can save the number of exposure times when exposing three liquid crystal panels 13 compared to the prior art in which the non-panel region 12 is exposed separately by using an extra exposure action; and the width of the non-panel area 12 is wider, the present invention can also set the right side exposure area 21 to correspond to the non-panel area 12 adjacent to each line of liquid crystal panel 13 at the same time, and expose the non-panel area 12 through the center exposure area 22 and the right side exposure area 21 at the same time.
Specifically, when the panel area 11 is located on the left side of the mother board 10, and the non-panel area 12 is located on the right side of the mother board 10, the specific exposure method of the present invention to one liquid crystal panel 13 and its adjacent non-panel area 12 is: firstly, simultaneously exposing the right exposure area 21 and the center exposure area 22 which are positioned in the non-panel area 12 and the left exposure area 23 which is positioned in the panel area 11 and blocking other exposure areas, then exposing the center exposure area 22 which is positioned in the panel area 11 and is close to the left exposure area 23 and blocking other exposure areas, then exposing the center exposure area 22 which is positioned in the panel area 11 and is close to the right exposure area 21 and blocking other exposure areas, and finally exposing the right exposure area 21 which is positioned in the panel area 11 and blocking other exposure areas; therefore, the invention can complete the patterning of one liquid crystal panel 13 and the adjacent non-panel area 12 only by 4 times of exposure.
As shown in fig. 4, when the panel region 11 is located in the center region of the mother substrate 10, the non-panel regions 12 are located on the left and right sides of the mother substrate 10, and thus in step S3, the left exposure region 23 corresponding to the right side pattern region of the liquid crystal panel 13 and the center exposure region 22 corresponding to the non-panel region 12 adjacent to each line of the liquid crystal panel 13 are simultaneously exposed, and the exposure of the right side pattern region of the liquid crystal panel 13 and the non-panel region 12 adjacent to the right side pattern region of the liquid crystal panel 13 is simultaneously completed by one exposure, or the right exposure region 21 corresponding to the left side pattern region of the liquid crystal panel 13 and the center exposure region 22 corresponding to the non-panel region 12 adjacent to each line of the liquid crystal panel 13 are simultaneously completed by one exposure, and the exposure of the left side pattern region of the liquid crystal panel 13 and the non-panel region 12 adjacent to the left side pattern region of the liquid crystal panel 13 is separately performed by an additional exposure action compared to the prior art, 6 exposure times can be saved when three liquid crystal panels 13 are exposed; and the non-panel regions 12 on the left and right sides of the mother substrate 10 are narrower in width, the present invention only needs to expose the non-panel regions 12 on the left and right sides of the mother substrate 10 through the central exposure region 22.
Specifically, when the panel region 11 is located in the central region of the mother board 10, and the non-panel regions 12 are located on the left and right sides of the mother board 10, the specific exposure method of the present invention for one liquid crystal panel 13 and its adjacent non-panel regions 12 is: firstly, simultaneously exposing the central exposure area 22 of the non-panel area 12 positioned on the left side of the panel area 11 and the right exposure area 21 positioned on the right side of the panel area 11 and blocking other exposure areas, then exposing the central exposure area 22 positioned on the panel area 11 and close to the right exposure area 21 and blocking other exposure areas, then exposing the central exposure area 22 positioned on the panel area 11 and close to the left exposure area 23 and blocking other exposure areas, and finally, simultaneously exposing the left exposure area 23 positioned on the panel area 11 and the central exposure area 22 positioned on the non-panel area 12 positioned on the right side of the panel area 11 and blocking other exposure areas; therefore, the invention can complete the patterning of one liquid crystal panel 13 and the adjacent non-panel area 12 only by 4 times of exposure.
Specifically, referring to fig. 5, each of the liquid crystal panels 13 includes a display area and a frame area surrounding the display area; the left exposure area 23, the center exposure area 22 and the right exposure area 21 each include a first exposure area 201 corresponding to the display area and a second exposure area 202 corresponding to the frame area.
Specifically, referring to fig. 6 and 7, each of the left exposure area 23, the center exposure area 22 and the right exposure area 21 further includes a mosaic area 24 adjacent to the first exposure area 201, the mosaic areas 24 of the two adjacent exposure areas are spliced together to overlap to form a complete pattern, so as to disperse the exposure difference at the joint between the two adjacent exposure areas to the whole mosaic area 24, reduce the splicing defect (Stitching Mura) caused by the exposure difference at the joint between the two adjacent exposure areas, and improve the product quality of the liquid crystal panel.
In summary, in the mother board exposure method of the present invention, the left exposure area in the photo-mask corresponding to each line of liquid crystal panels and the non-panel area adjacent to each line of liquid crystal panels is set to correspond to the right pattern area of the liquid crystal panels, the right exposure area is set to correspond to the left pattern area of the liquid crystal panels, and the center exposure area is set to correspond to the center pattern area of the liquid crystal panels and the non-panel area adjacent to each line of liquid crystal panels.
As described above, it will be apparent to those skilled in the art that other various changes and modifications may be made based on the technical solution and concept of the present invention, and all such changes and modifications are intended to fall within the scope of the appended claims.
Claims (8)
1. A method for exposing a master, comprising the steps of:
step S1, providing a motherboard (10), wherein the motherboard (10) comprises a panel area (11) and a non-panel area (12) adjacent to the panel area (11); the panel area (11) comprises a plurality of liquid crystal panels (13) which are arranged in an array; each liquid crystal panel (13) comprises a left pattern area, a center pattern area and a right pattern area which are sequentially connected;
step S2, providing a light cover (20) corresponding to each row of the liquid crystal panel (13) and the non-panel area (12) adjacent to each row of the liquid crystal panel (13), wherein the light cover (20) comprises a left exposure area (23) corresponding to the right pattern area of the liquid crystal panel (13), at least two center exposure areas (22) corresponding to the center pattern area of the liquid crystal panel (13) and a right exposure area (21) corresponding to the left pattern area of the liquid crystal panel (13); the central exposure area (22) also simultaneously corresponds to a non-panel area (12) adjacent to each row of liquid crystal panels (13);
step S3, exposing each row of liquid crystal panels (13) and the non-panel area (12) adjacent to each row of liquid crystal panels (13) simultaneously through the photomask (20), and completing the exposure of the liquid crystal panels (13) and the non-panel area (12) adjacent to the liquid crystal panels (13) simultaneously through one-time exposure;
each liquid crystal panel (13) comprises a display area and a frame area surrounding the display area; the left exposure area (23), the center exposure area (22) and the right exposure area (21) comprise a first exposure area (201) corresponding to the display area and a second exposure area (202) corresponding to the frame area.
2. The motherboard exposure method as recited in claim 1, characterized in that when the panel area (11) is located on the right side of the motherboard (10), the non-panel area (12) is located on the left side of the motherboard (10); in the step S3, the right exposure region 21 corresponding to the left pattern region of the liquid crystal panel 13 and the center exposure region 22 corresponding to the non-panel region 12 adjacent to each row of the liquid crystal panel 13 are simultaneously exposed, and the exposure of the left pattern region of the liquid crystal panel 13 and the non-panel region 12 adjacent to the left pattern region of the liquid crystal panel 13 is simultaneously completed by one exposure.
3. The mother substrate exposure method according to claim 2, wherein the left side exposure region (23) also corresponds to a non-panel region (12) adjacent to each row of the liquid crystal panel (13) at the same time.
4. The motherboard exposure method as recited in claim 1, characterized in that when the panel area (11) is located on the left side of the motherboard (10), the non-panel area (12) is located on the right side of the motherboard (10); in the step S3, the left exposure region 23 corresponding to the right pattern region of the liquid crystal panel 13 and the center exposure region 22 corresponding to the non-panel region 12 adjacent to each row of the liquid crystal panel 13 are simultaneously exposed, and the exposure of the right pattern region of the liquid crystal panel 13 and the non-panel region 12 corresponding to the right pattern region of the liquid crystal panel 13 is simultaneously completed by one exposure.
5. The mother substrate exposure method according to claim 4, wherein the right side exposure region (21) also corresponds to the non-panel region (12) adjacent to each row of the liquid crystal panel (13) at the same time.
6. The motherboard exposing method as recited in claim 1, wherein when the panel area (11) is located in the central area of the motherboard (10), the non-panel areas (12) are located on the left and right sides of the motherboard (10); in the step S3, the left side exposure region (23) corresponding to the right side pattern region of the liquid crystal panel (13) and the center exposure region (22) corresponding to the non-panel region (12) adjacent to each row of the liquid crystal panel (13) are simultaneously exposed, and the exposure of the right side pattern region of the liquid crystal panel (13) and the non-panel region (12) adjacent to the right side pattern region of the liquid crystal panel (13) is simultaneously completed by one exposure, or the right side exposure region (21) corresponding to the left side pattern region of the liquid crystal panel (13) and the center exposure region (22) corresponding to the non-panel region (12) adjacent to each row of the liquid crystal panel (13) are simultaneously exposed, and the exposure of the left side pattern region of the liquid crystal panel (13) and the non-panel region (12) adjacent to the left side pattern region of the liquid crystal panel (13) are simultaneously completed by one exposure.
7. The mother board exposure method according to claim 1, wherein the panel region (11) includes three liquid crystal panels (13) arranged in a vertical direction.
8. The master exposure method according to claim 1, wherein each of the left exposure area (23), the center exposure area (22), and the right exposure area (21) further comprises a mosaic area (24) adjacent to the first exposure area (201).
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810873781.3A CN109116593B (en) | 2018-08-02 | 2018-08-02 | Method for exposing master plate |
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| CN201810873781.3A CN109116593B (en) | 2018-08-02 | 2018-08-02 | Method for exposing master plate |
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| CN109116593B true CN109116593B (en) | 2021-07-20 |
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| CN110875343A (en) * | 2019-11-28 | 2020-03-10 | 上海华力微电子有限公司 | Layout structure, mask and production method of super-large pixel splicing product |
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