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DE69209356D1 - Positiv-arbeitende Resistzusammensetzung - Google Patents

Positiv-arbeitende Resistzusammensetzung

Info

Publication number
DE69209356D1
DE69209356D1 DE69209356T DE69209356T DE69209356D1 DE 69209356 D1 DE69209356 D1 DE 69209356D1 DE 69209356 T DE69209356 T DE 69209356T DE 69209356 T DE69209356 T DE 69209356T DE 69209356 D1 DE69209356 D1 DE 69209356D1
Authority
DE
Germany
Prior art keywords
resist composition
positive working
working resist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69209356T
Other languages
English (en)
Other versions
DE69209356T2 (de
Inventor
Shoji Kawata
Toshiaki Fujii
Teturyo Kusunoki
Motofumi Kashiwagi
Hiroshi Yagi
Kasuko Koito
Shinya Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Nippon Zeon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd
Application granted granted Critical
Publication of DE69209356D1 publication Critical patent/DE69209356D1/de
Publication of DE69209356T2 publication Critical patent/DE69209356T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE69209356T 1991-04-26 1992-04-23 Positiv-arbeitende Resistzusammensetzung Expired - Fee Related DE69209356T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP12471991 1991-04-26
JP25458991 1991-09-05

Publications (2)

Publication Number Publication Date
DE69209356D1 true DE69209356D1 (de) 1996-05-02
DE69209356T2 DE69209356T2 (de) 1996-09-05

Family

ID=26461340

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69209356T Expired - Fee Related DE69209356T2 (de) 1991-04-26 1992-04-23 Positiv-arbeitende Resistzusammensetzung

Country Status (4)

Country Link
US (1) US5376497A (de)
EP (1) EP0510983B1 (de)
KR (1) KR920020260A (de)
DE (1) DE69209356T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4401940A1 (de) * 1994-01-24 1995-07-27 Hoechst Ag Positiv arbeitendes Aufzeichnungsmaterial mit verbesserter Entwickelbarkeit
JPH0859530A (ja) * 1994-06-15 1996-03-05 Sumitomo Chem Co Ltd ポリヒドロキシ化合物及びそれを含有するポジ型レジスト組成物
DE69519781T2 (de) * 1994-10-05 2001-06-07 Arakawa Chemical Industries, Ltd. Strahlungsempfindliche Harzzusammensetzung
US5849461A (en) * 1995-08-01 1998-12-15 Shin-Etsu Chemical Co., Ltd. Chemically amplified positive resist composition
JPH0990622A (ja) * 1995-09-22 1997-04-04 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
TW460751B (en) * 1996-04-03 2001-10-21 Shipley Co Llc Photoresist composition
JP3943058B2 (ja) * 2003-07-16 2007-07-11 東京応化工業株式会社 ポジ型フォトレジスト組成物、及びレジストパターン形成方法
US7811342B1 (en) 2006-03-08 2010-10-12 Saint-Gobain Abrasives, Inc. Coated abrasive tools from non-blocked urethane prepolymer
US8638236B2 (en) * 2010-02-25 2014-01-28 Qualcomm Incorporated Methods and apparatus for applying tactile pressure sensors

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4931381A (en) * 1985-08-12 1990-06-05 Hoechst Celanese Corporation Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
DE3811040A1 (de) * 1988-03-31 1989-10-19 Ciba Geigy Ag Im nahen uv hochaufloesende positiv-fotoresists
DE3842896C2 (de) * 1988-04-22 1998-07-02 Tokyo Ohka Kogyo Co Ltd Positiv arbeitende lichtempfindliche Zusammensetzung
JPH02102315A (ja) * 1988-10-11 1990-04-13 Sakai Chem Ind Co Ltd パテイキユレート酸化触媒フイルター及び触媒器
JPH02102314A (ja) * 1988-10-12 1990-04-13 Toyota Autom Loom Works Ltd ディーゼルエンジン用排気浄化装置
JPH0342194A (ja) * 1989-07-10 1991-02-22 Mitsubishi Heavy Ind Ltd 舶用プロペラ
JPH061377B2 (ja) * 1989-12-28 1994-01-05 日本ゼオン株式会社 ポジ型レジスト組成物
DE69132694T2 (de) * 1990-03-08 2002-06-20 Fuji Photo Film Co., Ltd. Positiv arbeitende Photolackzusammensetzung
JP2711590B2 (ja) * 1990-09-13 1998-02-10 富士写真フイルム株式会社 ポジ型フオトレジスト組成物

Also Published As

Publication number Publication date
US5376497A (en) 1994-12-27
EP0510983B1 (de) 1996-03-27
EP0510983A1 (de) 1992-10-28
KR920020260A (ko) 1992-11-20
DE69209356T2 (de) 1996-09-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee