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DE69208580D1 - Photopolymerisierbare Zusammensetzung - Google Patents

Photopolymerisierbare Zusammensetzung

Info

Publication number
DE69208580D1
DE69208580D1 DE69208580T DE69208580T DE69208580D1 DE 69208580 D1 DE69208580 D1 DE 69208580D1 DE 69208580 T DE69208580 T DE 69208580T DE 69208580 T DE69208580 T DE 69208580T DE 69208580 D1 DE69208580 D1 DE 69208580D1
Authority
DE
Germany
Prior art keywords
photopolymerizable composition
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69208580T
Other languages
English (en)
Other versions
DE69208580T2 (de
Inventor
Hideki Nagasaka
Masaaki Tsuchiyama
Toshiyuki Urano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Publication of DE69208580D1 publication Critical patent/DE69208580D1/de
Application granted granted Critical
Publication of DE69208580T2 publication Critical patent/DE69208580T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DE69208580T 1991-10-18 1992-10-08 Photopolymerisierbare Zusammensetzung Expired - Fee Related DE69208580T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3271363A JP3070184B2 (ja) 1991-10-18 1991-10-18 光重合性組成物及び感光材料

Publications (2)

Publication Number Publication Date
DE69208580D1 true DE69208580D1 (de) 1996-04-04
DE69208580T2 DE69208580T2 (de) 1996-09-19

Family

ID=17499033

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69208580T Expired - Fee Related DE69208580T2 (de) 1991-10-18 1992-10-08 Photopolymerisierbare Zusammensetzung

Country Status (4)

Country Link
US (1) US5607817A (de)
EP (1) EP0537630B1 (de)
JP (1) JP3070184B2 (de)
DE (1) DE69208580T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69620723T2 (de) 1995-12-22 2002-12-05 Mitsubishi Chemical Corp., Tokio/Tokyo Fotopolymerisierbare Zusammensetzung für einen Farbfilter, Farbfilter und Flüssigkristallanzeigevorrichtung
US7714995B2 (en) * 1997-09-22 2010-05-11 Kla-Tencor Corporation Material independent profiler
EP1742096A4 (de) 2004-04-26 2008-10-01 Mitsubishi Chem Corp Blaufarbige zusammensetzung für ein farbfilter, farbfilter und farbfilter-display-einrichtung
JP4538350B2 (ja) * 2005-03-18 2010-09-08 富士フイルム株式会社 感光性組成物および画像記録材料並びに画像記録方法
US8451401B2 (en) 2006-04-19 2013-05-28 Mitsubishi Chemical Corporation Color image display device
EP3045965B1 (de) 2008-02-07 2020-05-27 Mitsubishi Chemical Corporation Rotemittierender mn4+-aktivierter fluoridleuchtstoff
EP3147335A1 (de) 2015-09-23 2017-03-29 BYK-Chemie GmbH Farbmittelzusammensetzungen mit netz- und/oder dispergiermittel mit geringer aminzahl
US20200347171A1 (en) 2017-11-15 2020-11-05 Byk-Chemie Gmbh Block co-polymer
KR102407377B1 (ko) 2017-11-15 2022-06-13 비와이케이-케미 게엠베하 블록 공중합체
WO2021096751A1 (en) * 2019-11-13 2021-05-20 Piedmont Chemical Industries, LLC Photopolymerization synergist

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
JPS5815503A (ja) * 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
JPS5956403A (ja) * 1982-09-27 1984-03-31 Mitsubishi Chem Ind Ltd 光重合性組成物
JPH0629285B2 (ja) * 1983-10-14 1994-04-20 三菱化成株式会社 光重合性組成物
DE3717038A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
DE3717037A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien
JP2538992B2 (ja) * 1987-07-21 1996-10-02 三菱化学株式会社 光重合性組成物

Also Published As

Publication number Publication date
EP0537630A1 (de) 1993-04-21
JP3070184B2 (ja) 2000-07-24
EP0537630B1 (de) 1996-02-28
DE69208580T2 (de) 1996-09-19
JPH05107761A (ja) 1993-04-30
US5607817A (en) 1997-03-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee