DE68920130D1 - Flüssigkristallanzeige mit aktiver Matrix. - Google Patents
Flüssigkristallanzeige mit aktiver Matrix.Info
- Publication number
- DE68920130D1 DE68920130D1 DE68920130T DE68920130T DE68920130D1 DE 68920130 D1 DE68920130 D1 DE 68920130D1 DE 68920130 T DE68920130 T DE 68920130T DE 68920130 T DE68920130 T DE 68920130T DE 68920130 D1 DE68920130 D1 DE 68920130D1
- Authority
- DE
- Germany
- Prior art keywords
- liquid crystal
- crystal display
- active matrix
- matrix
- active
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004973 liquid crystal related substance Substances 0.000 title 1
- 239000011159 matrix material Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136213—Storage capacitors associated with the pixel electrode
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
- Liquid Crystal Display Device Control (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20078288A JPH0816756B2 (ja) | 1988-08-10 | 1988-08-10 | 透過型アクティブマトリクス液晶表示装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68920130D1 true DE68920130D1 (de) | 1995-02-02 |
DE68920130T2 DE68920130T2 (de) | 1995-06-22 |
Family
ID=16430101
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68920130T Expired - Fee Related DE68920130T2 (de) | 1988-08-10 | 1989-08-10 | Flüssigkristallanzeige mit aktiver Matrix. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5054887A (de) |
EP (1) | EP0376437B1 (de) |
JP (1) | JPH0816756B2 (de) |
DE (1) | DE68920130T2 (de) |
Families Citing this family (61)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2620240B2 (ja) * | 1987-06-10 | 1997-06-11 | 株式会社日立製作所 | 液晶表示装置 |
US5231039A (en) * | 1988-02-25 | 1993-07-27 | Sharp Kabushiki Kaisha | Method of fabricating a liquid crystal display device |
US5225364A (en) * | 1989-06-26 | 1993-07-06 | Oki Electric Industry Co., Ltd. | Method of fabricating a thin-film transistor matrix for an active matrix display panel |
JP3009438B2 (ja) * | 1989-08-14 | 2000-02-14 | 株式会社日立製作所 | 液晶表示装置 |
DE69117785T2 (de) * | 1990-03-27 | 1997-02-06 | Canon Kk | Dünnschicht-Halbleiterbauelement |
FR2662290B1 (fr) * | 1990-05-15 | 1992-07-24 | France Telecom | Procede de realisation d'un ecran d'affichage a matrice active et a condensateurs de stockage et ecran obtenu par ce procede. |
JP3226223B2 (ja) * | 1990-07-12 | 2001-11-05 | 株式会社東芝 | 薄膜トランジスタアレイ装置および液晶表示装置 |
JPH0475034A (ja) * | 1990-07-17 | 1992-03-10 | Sharp Corp | アクティブマトリクス表示装置及びその製造方法 |
US5153142A (en) * | 1990-09-04 | 1992-10-06 | Industrial Technology Research Institute | Method for fabricating an indium tin oxide electrode for a thin film transistor |
US5402254B1 (en) * | 1990-10-17 | 1998-09-22 | Hitachi Ltd | Liquid crystal display device with tfts in which pixel electrodes are formed in the same plane as the gate electrodes with anodized oxide films before the deposition of silicon |
JP3024661B2 (ja) * | 1990-11-09 | 2000-03-21 | セイコーエプソン株式会社 | アクティブマトリクス基板及びその製造方法 |
US5206749A (en) | 1990-12-31 | 1993-04-27 | Kopin Corporation | Liquid crystal display having essentially single crystal transistors pixels and driving circuits |
US5666175A (en) * | 1990-12-31 | 1997-09-09 | Kopin Corporation | Optical systems for displays |
US5362671A (en) * | 1990-12-31 | 1994-11-08 | Kopin Corporation | Method of fabricating single crystal silicon arrayed devices for display panels |
US5528397A (en) * | 1991-12-03 | 1996-06-18 | Kopin Corporation | Single crystal silicon transistors for display panels |
EP0499979A3 (en) | 1991-02-16 | 1993-06-09 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device |
JP2873632B2 (ja) | 1991-03-15 | 1999-03-24 | 株式会社半導体エネルギー研究所 | 半導体装置 |
US6713783B1 (en) | 1991-03-15 | 2004-03-30 | Semiconductor Energy Laboratory Co., Ltd. | Compensating electro-optical device including thin film transistors |
JPH0572553A (ja) * | 1991-09-11 | 1993-03-26 | Hitachi Ltd | 液晶表示装置およびその製造方法 |
US6979840B1 (en) * | 1991-09-25 | 2005-12-27 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistors having anodized metal film between the gate wiring and drain wiring |
JP2907629B2 (ja) * | 1992-04-10 | 1999-06-21 | 松下電器産業株式会社 | 液晶表示パネル |
JP3245959B2 (ja) * | 1992-06-05 | 2002-01-15 | 松下電器産業株式会社 | 液晶画像表示装置の製造方法 |
JPH05341315A (ja) * | 1992-06-08 | 1993-12-24 | Hitachi Ltd | 薄膜トランジスタ基板、液晶表示パネルおよび液晶表示装置 |
US5707746A (en) * | 1992-09-25 | 1998-01-13 | Sharp Kabushiki Kaisha | Thin film transistor device with advanced characteristics by improved matching between a glass substrate and a silicon nitride layer |
JP2924506B2 (ja) * | 1992-10-27 | 1999-07-26 | 日本電気株式会社 | アクティブマトリックス型液晶表示装置の画素構造 |
CA2150573A1 (en) * | 1992-12-01 | 1994-06-09 | David Waechter | Thin film transistor having a triple layer dielectric gate insulator, method of fabricating such a thin film transistor and an active matrix display having a plurality of such thin film transistors |
JP3098345B2 (ja) * | 1992-12-28 | 2000-10-16 | 富士通株式会社 | 薄膜トランジスタマトリクス装置及びその製造方法 |
DE4339721C1 (de) * | 1993-11-22 | 1995-02-02 | Lueder Ernst | Verfahren zur Herstellung einer Matrix aus Dünnschichttransistoren |
US5483366A (en) * | 1994-07-20 | 1996-01-09 | David Sarnoff Research Center Inc | LCD with hige capacitance pixel having an ITO active region/poly SI pixel region electrical connection and having poly SI selection line extensions along pixel edges |
JPH08172202A (ja) * | 1994-12-20 | 1996-07-02 | Sharp Corp | 薄膜トランジスタおよびその製造方法 |
JP2900229B2 (ja) | 1994-12-27 | 1999-06-02 | 株式会社半導体エネルギー研究所 | 半導体装置およびその作製方法および電気光学装置 |
KR0145900B1 (ko) * | 1995-02-11 | 1998-09-15 | 김광호 | 박막 트랜지스터 액정디스플레이 소자 및 그 제조방법 |
US5834327A (en) * | 1995-03-18 | 1998-11-10 | Semiconductor Energy Laboratory Co., Ltd. | Method for producing display device |
KR100303134B1 (ko) * | 1995-05-09 | 2002-11-23 | 엘지.필립스 엘시디 주식회사 | 액정표시소자및그제조방법. |
FR2737314B1 (fr) * | 1995-07-28 | 1997-08-29 | Thomson Lcd | Procede de fabrication d'une matrice active pour ecran plat, ecran a cristaux liquides comportant une matrice active obtenue selon ledit procede et procede d'adressage d'un tel ecran |
KR100205388B1 (ko) * | 1995-09-12 | 1999-07-01 | 구자홍 | 액정표시장치 및 그 제조방법 |
JPH09236826A (ja) * | 1995-09-28 | 1997-09-09 | Sharp Corp | 液晶表示素子およびその製造方法 |
EP1338914A3 (de) | 1995-11-21 | 2003-11-19 | Samsung Electronics Co., Ltd. | Verfahren zur Herstellung von Flüssigkristallanzeigevorrichtungen |
KR100190041B1 (ko) * | 1995-12-28 | 1999-06-01 | 윤종용 | 액정표시장치의 제조방법 |
JP3205501B2 (ja) * | 1996-03-12 | 2001-09-04 | シャープ株式会社 | アクティブマトリクス表示装置およびその修正方法 |
US6383899B1 (en) | 1996-04-05 | 2002-05-07 | Sharp Laboratories Of America, Inc. | Method of forming polycrystalline semiconductor film from amorphous deposit by modulating crystallization with a combination of pre-annealing and ion implantation |
JPH1010583A (ja) * | 1996-04-22 | 1998-01-16 | Sharp Corp | アクティブマトリクス基板の製造方法、およびそのアクティブマトリクス基板 |
KR100209620B1 (ko) * | 1996-08-31 | 1999-07-15 | 구자홍 | 액정 표시 장치 및 그 제조방법 |
KR100241287B1 (ko) * | 1996-09-10 | 2000-02-01 | 구본준 | 액정표시소자 제조방법 |
JPH10229197A (ja) * | 1997-02-17 | 1998-08-25 | Sanyo Electric Co Ltd | 薄膜トランジスタ、薄膜トランジスタの製造方法 |
JP3376379B2 (ja) * | 1997-02-20 | 2003-02-10 | 富士通ディスプレイテクノロジーズ株式会社 | 液晶表示パネル、液晶表示装置及びその製造方法 |
JP3592535B2 (ja) * | 1998-07-16 | 2004-11-24 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
US6124164A (en) * | 1998-09-17 | 2000-09-26 | Micron Technology, Inc. | Method of making integrated capacitor incorporating high K dielectric |
JP2000275663A (ja) * | 1999-03-26 | 2000-10-06 | Hitachi Ltd | 液晶表示装置とその製造方法 |
JP4744757B2 (ja) * | 1999-07-21 | 2011-08-10 | イー インク コーポレイション | アクティブマトリクス駆動電子ディスプレイの性能を高めるための蓄電キャパシタの使用 |
KR100647775B1 (ko) * | 2004-12-01 | 2006-11-23 | 엘지.필립스 엘시디 주식회사 | 박막 트랜지스터 기판 및 제조 방법 |
TWI257646B (en) * | 2005-09-05 | 2006-07-01 | Innolux Display Corp | Thin film transistor array substrate and method of manufacturing the same |
KR100962795B1 (ko) | 2005-12-26 | 2010-06-10 | 샤프 가부시키가이샤 | 액티브 매트릭스 기판, 표시 장치, tv 수상기 |
TWI304655B (en) * | 2006-04-07 | 2008-12-21 | Innolux Display Corp | Thin film transistor and method of manufacturing the same |
CN100529866C (zh) * | 2006-04-19 | 2009-08-19 | 群康科技(深圳)有限公司 | 液晶显示器制造方法 |
TWI339303B (en) * | 2006-12-15 | 2011-03-21 | Chimei Innolux Corp | Liquid crystal panel |
JP5182993B2 (ja) * | 2008-03-31 | 2013-04-17 | 株式会社半導体エネルギー研究所 | 表示装置及びその作製方法 |
WO2011070901A1 (en) * | 2009-12-11 | 2011-06-16 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
JP5735255B2 (ja) | 2010-10-28 | 2015-06-17 | 株式会社ハイレックスコーポレーション | 係留装置及びそれを用いたステアリング係留機構 |
TWI422940B (zh) * | 2010-12-16 | 2014-01-11 | Innolux Corp | 陣列基板的形成方法 |
CN110797353A (zh) * | 2019-11-12 | 2020-02-14 | 京东方科技集团股份有限公司 | 阵列基板、显示面板和显示装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3671820A (en) * | 1970-04-27 | 1972-06-20 | Rudolph R Haering | High voltage thin-film transistor |
JPS5922029A (ja) * | 1982-07-28 | 1984-02-04 | Matsushita Electric Ind Co Ltd | マトリクス表示パネルの製造方法 |
JPS6045219A (ja) * | 1983-08-23 | 1985-03-11 | Toshiba Corp | アクテイブマトリクス型表示装置 |
GB2169746B (en) * | 1984-11-13 | 1988-09-14 | Sharp Kk | Thin film transistor |
US4571816A (en) * | 1984-12-11 | 1986-02-25 | Rca Corporation | Method of making a capacitor with standard self-aligned gate process |
JPS62285464A (ja) * | 1986-06-03 | 1987-12-11 | Matsushita Electric Ind Co Ltd | 薄膜トランジスタアレイ基板及びその製造方法 |
EP0288011A3 (de) * | 1987-04-20 | 1991-02-20 | Hitachi, Ltd. | Flüssigkristallanzeigeeinrichtung und Steuerungsverfahren dafür |
JPH01291467A (ja) * | 1988-05-19 | 1989-11-24 | Toshiba Corp | 薄膜トランジスタ |
JP3351026B2 (ja) * | 1993-06-04 | 2002-11-25 | 松下電器産業株式会社 | 電気湯沸かし器 |
-
1988
- 1988-08-10 JP JP20078288A patent/JPH0816756B2/ja not_active Expired - Lifetime
-
1989
- 1989-08-09 US US07/391,244 patent/US5054887A/en not_active Expired - Lifetime
- 1989-08-10 EP EP89308162A patent/EP0376437B1/de not_active Expired - Lifetime
- 1989-08-10 DE DE68920130T patent/DE68920130T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0376437B1 (de) | 1994-12-21 |
JPH0248639A (ja) | 1990-02-19 |
JPH0816756B2 (ja) | 1996-02-21 |
US5054887A (en) | 1991-10-08 |
EP0376437A2 (de) | 1990-07-04 |
DE68920130T2 (de) | 1995-06-22 |
EP0376437A3 (en) | 1990-10-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8328 | Change in the person/name/address of the agent |
Free format text: PATENTANWAELTE MUELLER & HOFFMANN, 81667 MUENCHEN |
|
8339 | Ceased/non-payment of the annual fee |