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DE68916045D1 - Halbleiteranordnung und Verfahren zum Herstellen derselben. - Google Patents

Halbleiteranordnung und Verfahren zum Herstellen derselben.

Info

Publication number
DE68916045D1
DE68916045D1 DE68916045T DE68916045T DE68916045D1 DE 68916045 D1 DE68916045 D1 DE 68916045D1 DE 68916045 T DE68916045 T DE 68916045T DE 68916045 T DE68916045 T DE 68916045T DE 68916045 D1 DE68916045 D1 DE 68916045D1
Authority
DE
Germany
Prior art keywords
manufacturing
same
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68916045T
Other languages
English (en)
Other versions
DE68916045T2 (de
Inventor
Der Velden Johannes Wilhel Van
Henricus Godefridus Rafae Maas
Iersel-Schiffmacher Margue Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE68916045D1 publication Critical patent/DE68916045D1/de
Publication of DE68916045T2 publication Critical patent/DE68916045T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00—Bipolar junction transistors [BJT]
    • H10D10/40—Vertical BJTs
    • H10D10/441—Vertical BJTs having an emitter-base junction ending at a main surface of the body and a base-collector junction ending at a lateral surface of the body
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27—Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/281—Base electrodes for bipolar transistors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/125—Polycrystalline passivation
DE68916045T 1988-01-25 1989-01-19 Halbleiteranordnung und Verfahren zum Herstellen derselben. Expired - Fee Related DE68916045T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8800157A NL8800157A (nl) 1988-01-25 1988-01-25 Halfgeleiderinrichting en werkwijze ter vervaardiging daarvan.

Publications (2)

Publication Number Publication Date
DE68916045D1 true DE68916045D1 (de) 1994-07-21
DE68916045T2 DE68916045T2 (de) 1995-03-23

Family

ID=19851645

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68916045T Expired - Fee Related DE68916045T2 (de) 1988-01-25 1989-01-19 Halbleiteranordnung und Verfahren zum Herstellen derselben.

Country Status (7)

Country Link
US (2) US4969026A (de)
EP (1) EP0326211B1 (de)
JP (1) JPH0713973B2 (de)
KR (1) KR970011641B1 (de)
CN (1) CN1018112B (de)
DE (1) DE68916045T2 (de)
NL (1) NL8800157A (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6147424A (ja) * 1984-08-10 1986-03-07 Sumitomo Chem Co Ltd ジアルキルベンゼンのパラ選択的脱アルキル化方法
US5150184A (en) * 1989-02-03 1992-09-22 Texas Instruments Incorporated Method for forming emitters in a BiCMOS process
US5221856A (en) * 1989-04-05 1993-06-22 U.S. Philips Corp. Bipolar transistor with floating guard region under extrinsic base
JPH03206621A (ja) * 1990-01-09 1991-09-10 Oki Electric Ind Co Ltd 半導体集積回路装置の製造方法
JP2971246B2 (ja) * 1992-04-15 1999-11-02 株式会社東芝 ヘテロバイポーラトランジスタの製造方法
US5869881A (en) * 1994-12-20 1999-02-09 Electronics And Telecommunications Research Institute Pillar bipolar transistor
GB2296377A (en) * 1994-12-20 1996-06-26 Korea Electronics Telecomm Pillar bipolar transistors
KR0171000B1 (ko) * 1995-12-15 1999-02-01 양승택 자동 정의된 베이스 전극을 갖는 바이폴라 트랜지스터 구조 및 그 제조방법
KR0182000B1 (ko) * 1995-12-28 1999-04-15 김광호 바이폴라 트랜지스터의 제조방법
FR2756974B1 (fr) 1996-12-10 1999-06-04 Sgs Thomson Microelectronics Transistor bipolaire a isolement par caisson
US6309975B1 (en) 1997-03-14 2001-10-30 Micron Technology, Inc. Methods of making implanted structures
EP1128422A1 (de) * 2000-02-22 2001-08-29 Infineon Technologies AG Verfahren zur Herstellung eines bipolaren Transistors im BiCMOS-Prozess
CN108063162B (zh) * 2017-12-18 2020-08-28 南京溧水高新创业投资管理有限公司 双极晶体管的制作方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE31580E (en) * 1967-06-08 1984-05-01 U.S. Philips Corporation Insulated gate field-effect transistor comprising a mesa channel and a thicker surrounding oxide
JPS561556A (en) * 1979-06-18 1981-01-09 Hitachi Ltd Semiconductor device
US4338138A (en) * 1980-03-03 1982-07-06 International Business Machines Corporation Process for fabricating a bipolar transistor
JPS61164262A (ja) * 1985-01-17 1986-07-24 Toshiba Corp 半導体装置
JPS61166071A (ja) * 1985-01-17 1986-07-26 Toshiba Corp 半導体装置及びその製造方法
EP0199497B1 (de) * 1985-04-10 1992-01-02 Fujitsu Limited Verfahren zum Herstellen eines selbtsausrichtenden Bipolartransistors
JPH0834215B2 (ja) * 1986-05-30 1996-03-29 株式会社日立製作所 半導体装置
US4746623A (en) * 1986-01-29 1988-05-24 Signetics Corporation Method of making bipolar semiconductor device with wall spacer
US4680085A (en) * 1986-04-14 1987-07-14 Ovonic Imaging Systems, Inc. Method of forming thin film semiconductor devices
JPS6362272A (ja) * 1986-09-02 1988-03-18 Seiko Instr & Electronics Ltd 半導体装置の製造方法
JPS63215068A (ja) * 1987-03-04 1988-09-07 Nippon Telegr & Teleph Corp <Ntt> 半導体装置およびその製造方法
JPS6489365A (en) * 1987-09-29 1989-04-03 Nec Corp Semiconductor device

Also Published As

Publication number Publication date
CN1034827A (zh) 1989-08-16
EP0326211A1 (de) 1989-08-02
CN1018112B (zh) 1992-09-02
KR890012359A (ko) 1989-08-26
JPH0713973B2 (ja) 1995-02-15
US4969026A (en) 1990-11-06
EP0326211B1 (de) 1994-06-15
US5024956A (en) 1991-06-18
NL8800157A (nl) 1989-08-16
DE68916045T2 (de) 1995-03-23
JPH025432A (ja) 1990-01-10
KR970011641B1 (ko) 1997-07-12

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee