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TWI456343B - Light-shielding resin composition for color filter and color filter - Google Patents

Light-shielding resin composition for color filter and color filter Download PDF

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Publication number
TWI456343B
TWI456343B TW096107793A TW96107793A TWI456343B TW I456343 B TWI456343 B TW I456343B TW 096107793 A TW096107793 A TW 096107793A TW 96107793 A TW96107793 A TW 96107793A TW I456343 B TWI456343 B TW I456343B
Authority
TW
Taiwan
Prior art keywords
solvent
weight
color filter
resin composition
propylene glycol
Prior art date
Application number
TW096107793A
Other languages
Chinese (zh)
Other versions
TW200736827A (en
Inventor
Yasutake Murata
Kenichi Fujino
Original Assignee
Nippon Steel & Sumikin Chem Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel & Sumikin Chem Co filed Critical Nippon Steel & Sumikin Chem Co
Publication of TW200736827A publication Critical patent/TW200736827A/en
Application granted granted Critical
Publication of TWI456343B publication Critical patent/TWI456343B/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Paints Or Removers (AREA)

Claims (4)

一種濾色片用遮光性樹脂組成物，其特徵為：係含有溶劑80至90重量%，以及除去溶劑之固形分之樹脂組成物，其中，相對於該固形分，丙烯酸系感光性樹脂為8至35重量%、黑色顏料為45至65重量%、HLB值在8以下之矽系界面活性劑為0.003至0.02重量%，或HLB值在8以下之氟系界面活性劑為0.1至1.0重量%、以及光聚合起始劑，該樹脂組成物在常溫中之黏度為1.0至10.0mPa‧s，且相對於全溶劑，含有30至40重量%之丙二醇單甲基醚乙酸酯或丙二醇單乙基醚乙酸酯之第一溶劑、0至25重量%之丙二醇二乙酸酯的第二溶劑、20至50重量%之分子內具有3-乙氧基丙酸結構之第三溶劑、以及10至30重量%之具有1個羰基之脂環式化合物的第四溶劑；第一溶劑在常壓中之沸點為140℃至180℃，第三溶劑在常壓中之沸點為160℃至190℃，第四溶劑在常壓中之沸點為160℃至190℃。 A light-shielding resin composition for a color filter, which comprises a resin composition containing 80 to 90% by weight of a solvent and a solid component from which a solvent is removed, wherein the acrylic photosensitive resin is 8 with respect to the solid content. Up to 35% by weight, the black pigment is 45 to 65% by weight, the lanthanum surfactant having an HLB value of 8 or less is 0.003 to 0.02% by weight, or the fluorine-based surfactant having an HLB value of 8 or less is 0.1 to 1.0% by weight. And a photopolymerization initiator having a viscosity at room temperature of 1.0 to 10.0 mPa·s and containing 30 to 40% by weight of propylene glycol monomethyl ether acetate or propylene glycol monoethyl ester relative to the total solvent a first solvent of the ether ether acetate, a second solvent of 0 to 25% by weight of propylene glycol diacetate, 20 to 50% by weight of a third solvent having a 3-ethoxypropionic acid structure in the molecule, and 10 a fourth solvent having a carbonyl alicyclic compound of 30% by weight; the first solvent has a boiling point of 140 ° C to 180 ° C at normal pressure, and the third solvent has a boiling point of 160 ° C to 190 ° C at normal pressure The fourth solvent has a boiling point of 160 ° C to 190 ° C at normal pressure. 一種濾色片，其特徵為具有申請專利範圍第1項之濾色片用遮光性樹脂組成物的硬化膜。 A color filter comprising a cured film of a light-blocking resin composition for a color filter according to claim 1 of the patent application. 一種濾色片用遮光性樹脂組成物，其特徵為：係含有溶劑80至90重量%，以及除去溶劑之固形分之樹脂組成物，其中，相對於該固形分，丙烯酸系感光性樹脂為8至35重量%、黑色顏料為45至65重量%、HLB值在8以下之矽系界面活性劑為0.003至0.02重量%，或HLB值在8以下之氟系界面活性劑為0.1至1.0重量%、以 及光聚合起始劑，該樹脂組成物在常溫中之黏度為1.0至10.0mPa‧s，且相對於全溶劑，含有30至40重量%之丙二醇單甲基醚乙酸酯或丙二醇單乙基醚乙酸酯之第一溶劑、0至25重量%之丙二醇二乙酸酯的第二溶劑、20至50重量%之分子內具有3-乙氧基丙酸結構之第三溶劑、以及10至30重量%之環己酮的第四溶劑；第一溶劑在常壓中之沸點為140℃至180℃，第三溶劑在常壓中之沸點為160℃至190℃。 A light-shielding resin composition for a color filter, which comprises a resin composition containing 80 to 90% by weight of a solvent and a solid component from which a solvent is removed, wherein the acrylic photosensitive resin is 8 with respect to the solid content. Up to 35% by weight, the black pigment is 45 to 65% by weight, the lanthanum surfactant having an HLB value of 8 or less is 0.003 to 0.02% by weight, or the fluorine-based surfactant having an HLB value of 8 or less is 0.1 to 1.0% by weight. To And a photopolymerization initiator which has a viscosity at room temperature of 1.0 to 10.0 mPa·s and contains 30 to 40% by weight of propylene glycol monomethyl ether acetate or propylene glycol monoethyl group relative to the total solvent. a first solvent of ether acetate, a second solvent of 0 to 25% by weight of propylene glycol diacetate, 20 to 50% by weight of a third solvent having a 3-ethoxypropionic acid structure in the molecule, and 10 to A fourth solvent of 30% by weight of cyclohexanone; the first solvent has a boiling point of 140 ° C to 180 ° C at normal pressure, and the third solvent has a boiling point of 160 ° C to 190 ° C at normal pressure. 一種濾色片，其特徵為具有申請專利範圍第3項之濾色片用遮光性樹脂組成物的硬化膜。 A color filter comprising a cured film of a light-blocking resin composition for a color filter of claim 3 of the patent application.
TW096107793A 2006-03-30 2007-03-07 Light-shielding resin composition for color filter and color filter TWI456343B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006093948A JP4828275B2 (en) 2006-03-30 2006-03-30 Light-shielding resin composition for color filter and color filter

Publications (2)

Publication Number Publication Date
TW200736827A TW200736827A (en) 2007-10-01
TWI456343B true TWI456343B (en) 2014-10-11

Family

ID=38674583

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096107793A TWI456343B (en) 2006-03-30 2007-03-07 Light-shielding resin composition for color filter and color filter

Country Status (4)

Country Link
JP (1) JP4828275B2 (en)
KR (1) KR101051403B1 (en)
CN (1) CN101045807B (en)
TW (1) TWI456343B (en)

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WO2008123340A1 (en) * 2007-03-30 2008-10-16 Nippon Steel Chemical Co., Ltd. Light-shielding resin composition for color filter, and color filter
KR101607705B1 (en) * 2007-11-22 2016-03-30 토요잉크Sc홀딩스주식회사 Green colored composition for color filter, and color filter
CN101497759A (en) * 2008-01-31 2009-08-05 Jsr株式会社 Resin composition for forming color filter by ink jetting, color filter and liquid crystal display device
JP4593638B2 (en) * 2008-02-18 2010-12-08 ダイセル化学工業株式会社 Method for producing ester solvent
JP5156442B2 (en) * 2008-03-13 2013-03-06 東京応化工業株式会社 Colored photosensitive resin composition, black matrix, color filter, and liquid crystal display
JP2009237362A (en) * 2008-03-27 2009-10-15 Fujifilm Corp Polymerizable composition, color filter and method for manufacturing the same, and liquid crystal display
CN101561524B (en) * 2008-04-15 2011-11-30 鸿富锦精密工业（深圳）有限公司 Colored filter and manufacturing method thereof
JP5291405B2 (en) * 2008-07-31 2013-09-18 東京応化工業株式会社 Colored photosensitive resin composition, color filter, and liquid crystal display
JP5607346B2 (en) 2009-01-06 2014-10-15 住友化学株式会社 Photosensitive resin composition, coating film, pattern and display device
JP5416434B2 (en) * 2009-03-03 2014-02-12 新日鉄住金化学株式会社 Photosensitive resin composition for black resist and color filter light-shielding film
JP2010275327A (en) * 2010-09-15 2010-12-09 Daicel Chem Ind Ltd Ester solvent
JP5485433B2 (en) * 2013-02-08 2014-05-07 東京応化工業株式会社 Colored photosensitive resin composition, color filter, and liquid crystal display
KR101988257B1 (en) * 2013-03-28 2019-06-12 동우 화인켐 주식회사 Colored photosensitive resin composition
KR102134633B1 (en) * 2016-11-25 2020-07-16 삼성에스디아이 주식회사 Photosensitive resin composition, black pixel defining layer using the same and display device
KR102371945B1 (en) * 2017-11-03 2022-03-08 동우 화인켐 주식회사 Colored Photosensitive Resin Composition, Color Filter and Display Device
KR102397084B1 (en) * 2017-11-21 2022-05-11 동우 화인켐 주식회사 Colored Photosensitive Resin Composition, Color Filter and Display Device
JP7376978B2 (en) * 2018-05-22 2023-11-09 日鉄ケミカル＆マテリアル株式会社 Photosensitive resin composition, method for producing cured product, and method for producing display device
KR20210061011A (en) 2019-11-19 2021-05-27 롬엔드하스전자재료코리아유한회사 Photosensitive resin composition and insulating layer prepared therefrom
TW202132362A (en) * 2020-02-14 2021-09-01 日商富士軟片股份有限公司 Photosensitive composition, method for forming pixel, method for producing optical filter, method for producing solid-state imaging element, and method for producing image display device

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TW200502700A (en) * 2003-05-23 2005-01-16 Toyo Ink Mfg Co Colored composition, method of manufacturing color filter, and method of manufacturing black matrix

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JP3978255B2 (en) * 1997-06-24 2007-09-19 Ａｚエレクトロニックマテリアルズ株式会社 Lithographic cleaning agent
JPH1124245A (en) * 1997-07-07 1999-01-29 Sumitomo Chem Co Ltd Photosensitive liquid for forming a colored image and a method for producing a color filter using the same
JP3915271B2 (en) * 1998-09-24 2007-05-16 Ｊｓｒ株式会社 Radiation sensitive composition for color filter
JP2003330174A (en) * 2002-05-14 2003-11-19 Sumitomo Chem Co Ltd Colored photosensitive resin composition
TWI313397B (en) * 2003-03-28 2009-08-11 Sumitomo Chemical Co Colored photosensitive resin composition
TWI342983B (en) * 2003-07-16 2011-06-01 Sumitomo Chemical Co Coloring photosensitive resin composition
JP2005300994A (en) * 2004-04-13 2005-10-27 Jsr Corp Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel
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TW200428152A (en) * 2003-06-02 2004-12-16 Adms Technology Co Ltd Positive photoresist composition for spinless (slit) coating

Also Published As

Publication number Publication date
JP4828275B2 (en) 2011-11-30
CN101045807B (en) 2011-09-14
KR101051403B1 (en) 2011-07-22
CN101045807A (en) 2007-10-03
JP2007271687A (en) 2007-10-18
KR20070098575A (en) 2007-10-05
TW200736827A (en) 2007-10-01

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