WO2008123340A1 - Light-shielding resin composition for color filter, and color filter - Google Patents
Light-shielding resin composition for color filter, and color filter Download PDFInfo
- Publication number
- WO2008123340A1 WO2008123340A1 PCT/JP2008/055829 JP2008055829W WO2008123340A1 WO 2008123340 A1 WO2008123340 A1 WO 2008123340A1 JP 2008055829 W JP2008055829 W JP 2008055829W WO 2008123340 A1 WO2008123340 A1 WO 2008123340A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- solvent
- amount
- color filter
- resin composition
- contained
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title abstract 5
- 239000002904 solvent Substances 0.000 abstract 12
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 abstract 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 abstract 4
- 229940058015 1,3-butylene glycol Drugs 0.000 abstract 2
- YSIKHBWUBSFBRZ-UHFFFAOYSA-N 3-methoxypropanoic acid Chemical group COCCC(O)=O YSIKHBWUBSFBRZ-UHFFFAOYSA-N 0.000 abstract 2
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 abstract 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 2
- 235000019437 butane-1,3-diol Nutrition 0.000 abstract 2
- UYAAVKFHBMJOJZ-UHFFFAOYSA-N diimidazo[1,3-b:1',3'-e]pyrazine-5,10-dione Chemical compound O=C1C2=CN=CN2C(=O)C2=CN=CN12 UYAAVKFHBMJOJZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000000049 pigment Substances 0.000 abstract 2
- 229940116423 propylene glycol diacetate Drugs 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
- Paints Or Removers (AREA)
Abstract
Disclosed is a light-shielding resin composition for a color filter, which is excellent in drying-preventive property in an ejecting part of a coating apparatus, drying property in a substrate coated with the resin composition, storage stability and the like. Also disclosed is a color filter. Specifically, the light-shielding resin composition for a color filter comprises a black pigment, an acrylic photosensitive resin having a biphenylolefin skeleton, a photopolymerization initiator, and a solvent; has a viscosity of 1.0 to 10.0 mPa s at ambient temperature; contains the black pigment in an amount of 45 to 65 wt% and the acrylic photosensitive resin in an amount of 8 to 35 wt% relative to the total amount of the solid contents other than the solvent; and contains the solvent in an amount of 80 to 90 wt%; wherein the solvent comprises a first solvent which is a solvent having one acetoxy group in the molecule, a second solvent which is selected from a solvent having a 3-methoxypropionic acid skeleton and cyclopentanone, and a third solvent which is selected from propylene glycol diacetate and 1,3-butylene glycol, and wherein the solvent having one acetoxy group in the molecule is contained in an amount of 45 to 75 wt%, the solvent having a 3-methoxypropionic acid skeleton is contained in an amount of 25 to 40 wt%, cyclopentanone is contained in an amount of 20 to 35 wt%, propylene glycol diacetate is contained in an amount of 1 to 15 wt%, and 1,3-butylene glycol is contained in an amount of 0.1 to 5 wt%, relative to the total amount of the solvent. The color filter comprises a cured film produced from the light-shielding resin composition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009509156A JPWO2008123340A1 (en) | 2007-03-30 | 2008-03-27 | Light-shielding resin composition for color filter and color filter |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007091504 | 2007-03-30 | ||
JP2007-091504 | 2007-03-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008123340A1 true WO2008123340A1 (en) | 2008-10-16 |
Family
ID=39830828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/055829 WO2008123340A1 (en) | 2007-03-30 | 2008-03-27 | Light-shielding resin composition for color filter, and color filter |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2008123340A1 (en) |
TW (1) | TWI437283B (en) |
WO (1) | WO2008123340A1 (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012027448A (en) * | 2010-06-21 | 2012-02-09 | Nippon Steel Chem Co Ltd | Photosensitive resin composition for black resist and color filter light shielding film |
JP2013164457A (en) * | 2012-02-09 | 2013-08-22 | Dainippon Printing Co Ltd | Resin composition for light-shielding layer formation, color filter comprising light-shielding layer composed of resin composition for light-shielding layer formation, and display device comprising color filter |
KR20150037529A (en) * | 2013-09-30 | 2015-04-08 | 신닛테츠 수미킨 가가쿠 가부시키가이샤 | Black photosensitive resin composition, cured film thereof, and colour filter or touch panel made by using that film |
JP2016065992A (en) * | 2014-09-25 | 2016-04-28 | 東京応化工業株式会社 | Photosensitive resin composition |
JP2017146575A (en) * | 2015-03-31 | 2017-08-24 | Jnc株式会社 | Polymerizable liquid crystal composition and optically anisotropic body |
KR101792797B1 (en) * | 2011-04-04 | 2017-11-02 | 삼성디스플레이 주식회사 | Thin film transistor array panel and manufacturing the same |
JP2019086781A (en) * | 2017-11-09 | 2019-06-06 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | Colored photosensitive resin composition, color filter manufactured using the same, and display device including the color filter |
JP2019191549A (en) * | 2018-08-06 | 2019-10-31 | 東洋インキScホールディングス株式会社 | Black composition, black coated film, and laminate |
CN110515268A (en) * | 2018-05-22 | 2019-11-29 | 日铁化学材料株式会社 | Photosensitive resin composition, cured product of the photosensitive resin composition, and display device containing the cured product |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5302097B2 (en) * | 2009-05-18 | 2013-10-02 | 新日鉄住金化学株式会社 | Ink composition, method for forming colored film using the same, and colored film |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003302642A (en) * | 2002-04-10 | 2003-10-24 | Jsr Corp | Radiation sensitive resin composition to be used for formation of spacer by ink jet method, spacer and liquid crystal display element |
JP2003307614A (en) * | 2002-02-15 | 2003-10-31 | Jsr Corp | Semitransmission type color filter, radiation sensitive composition and color liquid crystal display element |
JP2005092003A (en) * | 2003-09-19 | 2005-04-07 | Fuji Photo Film Co Ltd | Dye-containing negative type curable composition, color filter, and its manufacturing method |
JP2005234045A (en) * | 2004-02-17 | 2005-09-02 | Fujifilm Electronic Materials Co Ltd | Color resin composition |
JP2007249117A (en) * | 2006-03-20 | 2007-09-27 | Nippon Steel Chem Co Ltd | Resin composition for color filter and color filter |
JP2007271687A (en) * | 2006-03-30 | 2007-10-18 | Nippon Steel Chem Co Ltd | Light shielding resin composition for color filter, and color filter |
-
2008
- 2008-03-27 WO PCT/JP2008/055829 patent/WO2008123340A1/en active Application Filing
- 2008-03-27 TW TW97111025A patent/TWI437283B/en not_active IP Right Cessation
- 2008-03-27 JP JP2009509156A patent/JPWO2008123340A1/en not_active Withdrawn
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003307614A (en) * | 2002-02-15 | 2003-10-31 | Jsr Corp | Semitransmission type color filter, radiation sensitive composition and color liquid crystal display element |
JP2003302642A (en) * | 2002-04-10 | 2003-10-24 | Jsr Corp | Radiation sensitive resin composition to be used for formation of spacer by ink jet method, spacer and liquid crystal display element |
JP2005092003A (en) * | 2003-09-19 | 2005-04-07 | Fuji Photo Film Co Ltd | Dye-containing negative type curable composition, color filter, and its manufacturing method |
JP2005234045A (en) * | 2004-02-17 | 2005-09-02 | Fujifilm Electronic Materials Co Ltd | Color resin composition |
JP2007249117A (en) * | 2006-03-20 | 2007-09-27 | Nippon Steel Chem Co Ltd | Resin composition for color filter and color filter |
JP2007271687A (en) * | 2006-03-30 | 2007-10-18 | Nippon Steel Chem Co Ltd | Light shielding resin composition for color filter, and color filter |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012027448A (en) * | 2010-06-21 | 2012-02-09 | Nippon Steel Chem Co Ltd | Photosensitive resin composition for black resist and color filter light shielding film |
KR101792797B1 (en) * | 2011-04-04 | 2017-11-02 | 삼성디스플레이 주식회사 | Thin film transistor array panel and manufacturing the same |
JP2013164457A (en) * | 2012-02-09 | 2013-08-22 | Dainippon Printing Co Ltd | Resin composition for light-shielding layer formation, color filter comprising light-shielding layer composed of resin composition for light-shielding layer formation, and display device comprising color filter |
KR102180283B1 (en) | 2013-09-30 | 2020-11-18 | 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 | Black photosensitive resin composition, cured film thereof, and colour filter or touch panel made by using that film |
KR20150037529A (en) * | 2013-09-30 | 2015-04-08 | 신닛테츠 수미킨 가가쿠 가부시키가이샤 | Black photosensitive resin composition, cured film thereof, and colour filter or touch panel made by using that film |
JP2015069098A (en) * | 2013-09-30 | 2015-04-13 | 新日鉄住金化学株式会社 | Black photosensitive resin composition and cured film thereof, and color filter and touch panel having the cured film |
CN104516197A (en) * | 2013-09-30 | 2015-04-15 | 新日铁住金化学株式会社 | Black photosensitive resin component and hardened film thereof, color filter having the harden film and touch panel |
TWI624725B (en) * | 2013-09-30 | 2018-05-21 | 新日鐵住金化學股份有限公司 | Black photosensitive resin composition and cured film thereof, and color filter and touch panel having such cured film |
JP2016065992A (en) * | 2014-09-25 | 2016-04-28 | 東京応化工業株式会社 | Photosensitive resin composition |
JP2017146575A (en) * | 2015-03-31 | 2017-08-24 | Jnc株式会社 | Polymerizable liquid crystal composition and optically anisotropic body |
JP2019086781A (en) * | 2017-11-09 | 2019-06-06 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | Colored photosensitive resin composition, color filter manufactured using the same, and display device including the color filter |
CN110515268A (en) * | 2018-05-22 | 2019-11-29 | 日铁化学材料株式会社 | Photosensitive resin composition, cured product of the photosensitive resin composition, and display device containing the cured product |
JP2019191549A (en) * | 2018-08-06 | 2019-10-31 | 東洋インキScホールディングス株式会社 | Black composition, black coated film, and laminate |
Also Published As
Publication number | Publication date |
---|---|
JPWO2008123340A1 (en) | 2010-07-15 |
TW200903047A (en) | 2009-01-16 |
TWI437283B (en) | 2014-05-11 |
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