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CN101561524B - Colored filter and manufacturing method thereof - Google Patents

Colored filter and manufacturing method thereof Download PDF

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Publication number
CN101561524B
CN101561524B CN2008100890239A CN200810089023A CN101561524B CN 101561524 B CN101561524 B CN 101561524B CN 2008100890239 A CN2008100890239 A CN 2008100890239A CN 200810089023 A CN200810089023 A CN 200810089023A CN 101561524 B CN101561524 B CN 101561524B
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China
Prior art keywords
black matrix
ink
manufacturing
colored filter
reacted
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CN2008100890239A
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CN101561524A (en
Inventor
陈伟源
王宇宁
周景瑜
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Abstract

The present invention relates to a colored filter, comprising a base plate and a black matrix positioned on the base plate, The black matrix limits a plurality of sub-pixel regions and a plurality of color layers formed by a ink-jet method and positioned in the sub-pixel regions, and the black matrix comprises the following materials by weight percent: not more than 55 of carbon soot, 15-95 of macromolecular polymers and not more than 25 of other additives, and the macromolecular polymers comprises nonreactive fluorocarbon resin or nonreactive siloxane resine. The black matrix single layer structure of the colored filter can achieve the effect of the traditional black matrix and the dead wall two-layer structure during an ink-jet method processing procedure of the colored filter. The present invention also provides a manufacturing method of the colored filter, which omits a step of manufacturing a dead wall, thereby shortening the manufacturing procedure time and reducing the cost.

Description

Colored filter and manufacture method thereof
Technical field
The present invention relates to a kind of colored filter and a kind of manufacturing method of color filters.
Background technology
Because LCD (Liquid Crystal Display, LCD) be the assembly of non-active illuminating, must see through inner backlight light source is provided, the GTG that collocation drive IC and liquid crystal control form black, white dichromatism shows, see through colored filter (Color Filter again, CF) red (R), green (G), blue (B) three kinds of color layers provide form and aspect, form colored display frame, so colored filter are the key part and component of LCD colorize.
Colored filter is to reach high resolving power, high color contrast and is the appearance of avoiding occurring light leakage phenomena between each time of LCD pixel that (Black Matrix BM) separates three kinds of color layers of red, green, blue respectively to utilize black matrix.The material of black matrix is generally metal, as chromium, or organic material, as the carbon black resin material.Crome metal is a kind of to the disadvantageous element of environment, and too loaded down with trivial details in processing procedure.Therefore, be a development trend with the black matrix of carbon black resin made.
When tradition utilization pigment dispersing-light lithography method is deceived matrix with the carbon black resin made,, deceive the matrix exposure not exclusively because of too thick meeting makes, and optical density (OD) (Optical Density) value is wanted height because the final thickness of black matrix that requires is thinner relatively.And the conventional carbon black resin material takes away because of being subjected to carbon black to be difficult for being developed, and is again the influence of discontinuous phase in the flatness of exposure imaging rear surface, and than out-of-flatness.So when making colored filter with ink-jet method, ink physically just is easier to wetted because the carbon black resin material surface is coarse; In addition, conventional carbon black resin material surface energy is too high, and is very good to the compatibility of ink, so under two reasons, can make the phenomenon of adjacent color ink generation colour mixture.Common solution is for forming a barricade layer on the black matrix of tradition.But thus, the simple advantage of ink-jet method processing procedure promptly is difficult for highlighting.
Summary of the invention
In view of this, be necessary to provide a kind of and in making, can save colored filter and a kind of manufacturing method of color filters that forms the barricade layer.
A kind of colored filter, it comprises that a substrate, is positioned at the black matrix on the substrate, this black matrix limits the several times pixel region and is arranged in the plurality of colors layer that several times pixel region forms by ink-jet method.Should comprise by black matrix composition: 55wt% and following carbon black, high molecular polymer and 25wt% and other following additive of 15 to 95wt%.Described high molecular polymer comprises non-reacted fluoroplast or non-reacted silicone resin.
A kind of manufacturing method of color filters may further comprise the steps:
On a substrate, form a black matrix, should comprise by black matrix composition: 55wt% and following carbon black, high molecular polymer and 25wt% and other following additive of 15 to 95wt%, described high molecular polymer comprises non-reacted fluoroplast or non-reacted silicone resin, and this black matrix limits the several times pixel region;
Utilize ink-jet method that ink is filled to the several times pixel region by an ink discharge device;
Ink in the dry solidification several times pixel region, thus some color layers formed.
A kind of manufacturing method of color filters may further comprise the steps:
The photoresist that provides the black matrix of an ink-jet method color filter producing process to use, this photoresist is formed and is comprised: account for all curable compositions in the photoresist ratio 55wt% and following carbon black, account for monomer or the oligomer or the macromolecule resin of the ratio 15 to 95wt% of all curable compositions in the photoresist, and accounting for the ratio 25wt% of all curable compositions in the photoresist and other following additive, described monomer or oligomer or macromolecule resin comprise non-reacted fluoroplast or non-reacted silicone resin;
This photoresist of coating on a substrate, drying then, exposure is developed and is solidified this photoresist layer and form black matrix, and this black matrix limits several times pixel region;
Utilize ink-jet method that ink is filled to the several times pixel region by an ink discharge device;
Ink in the dry solidification several times pixel region, thus the plurality of colors layer formed.
Compared to prior art, the black matrix single layer structure of described colored filter can be reached black matrix of tradition and the double-deck effect of barricade in the ink-jet method color filter producing process.Described manufacturing method of color filters has been saved the step of making barricade, reduces when making worker, and cost reduces.
Description of drawings
The structural representation of a kind of colored filter that Fig. 1 provides for first embodiment of the invention.
The schematic flow sheet of a kind of method for manufacturing colored filtering substrate that Fig. 2 to Fig. 6 provides for second embodiment of the invention.
Embodiment
Below in conjunction with accompanying drawing the embodiment of the invention is described in further detail.
See also Fig. 1, the colored filter 100 that the present invention's first example provides, this colored filter 100 comprise a substrate 102, be arranged in the black matrix 106 on the substrate 102 and be positioned at the plurality of colors layer 114 of several times pixel region that is limited by black matrix 106.
Substrate 102 can adopt the substrate of glass or plastic plate or silicon.The composition of black matrix 106 comprises: 55wt% and following carbon black, high molecular polymer and 25wt% and other following additive of 15 to 95wt%.
Preferably, the thickness of black matrix 106 is preferably 0.3 to 2.5 μ m greater than 0.1 micron (μ m).
Preferably, the preferred proportion of carbon black is 15 to 45wt%.The content ratio of carbon black can obtain the black higher flatness of matrix less than 55wt%, and better less than 45wt% meeting flatness.
Preferably, the preferred proportion of high molecular polymer is 25 to 85wt%.This high molecular polymer comprises the compound of fluorine element or siloxane.The compound of this fluorine element or siloxane can be non-reacted fluoroplast or non-reacted silicone resin, before the reaction that this compound forms resin occurs in black matrix and forms; The condensate that can also be constituted for the plain monomer of reactive F and oligomer or reactive siloxane monomer and oligomer, this compound forms polymeric reaction and occurs in the process that black matrix forms.In addition, the compound of this fluorine element or siloxane, its functional group is except that comprising fluorine or siloxy, still can comprise other functional group, as acrylic group, hydroxyl (OH), the hydrogen cyanide base (HCN), amino (NH), isocyanate group (NCO), carboxyl (COOH), sulfydryl (SH), epoxy radicals, phenyl ring (Aromatic Ring), amide group (Amide), lipid (Ester), ammoniacum (Urethane), siloxane (Siloxane), sulfide (Sulfide), vinyl (Vinyl), acid anhydrides (Anhydride), urea resin (Urea), carbonic acid (Carbonate), phosphoric acid fat (PhosphateEster), sulfone (Sulfone) etc., so can be the condensate that the plain acryl oligomer of plain acryl resin of fluorine or fluorine is constituted, or the condensate that constituted of siloxane acryl resin or siloxane acryl oligomer.
If the compound of this fluorine element or siloxane is non-reacted fluoroplast or non-reacted silicone resin, the preferred proportion of then non-reacted fluoroplast or non-reacted silicone resin is 0.01 to 30wt%, is preferably 0.01 to 5wt%.If the condensate that the compound of this fluorine element or siloxane plain monomer that is reactive F and oligomer or reactive siloxane monomer and oligomer are constituted, then the preferred proportion of the plain monomer of reactive F and oligomer or reactive siloxane monomer and oligomer is 5 to 95wt%, is preferably 15 to 60wt%.The fluorine element of capacity or the composition of silicone compounds help to reduce surface energy, make the compatibility variation of ink, to solve the problem of adjacent color ink generation colour mixture.The excessive fluorine element or the composition of silicone compounds, it is residual then to take place easily to develop in the process of making black matrix 106.Above-mentioned embodiment forms black matrix 106, if use surface tension to conclude its surface energy with contact angle as the mensuration liquid of 30dyne/cm (dynes per centimeter), then the above contact angle of 20 degree is operable, but 25 spend to 70 the degree between can be better angle, best angle should be 35 spend to 65 the degree between.
In addition, remaining high molecular polymer then comprises the high molecular polymer that monomer or oligomer and light initiator form or comprises macromolecule resin.Macromolecule resin includes but not limited to acryl resin, and monomer or oligomer include but not limited to one or more in trimethylolpropane triacrylate, pentaerythritol triacrylate, tetramethylol methane tetraacrylate, dipentaerythritol five acrylate and the dipentaerythritol acrylate.
Preferably, other additive comprises remaining initiator in reaction back or spreading agent.
Wherein, this initiator comprises the light initiator.This light initiator comprises: two (dimethyl amido) benzophenone (4,4-bis (dimethylamino)), two (diethyl amido) benzophenone (4,4 '-Bis (Diethylamino) Benzophenone), methoxybenzene-two (trichloromethyl)-triazine (2-(4-Methoxyphenyl)-4,6-Bis (Trichloromethyl)-1,3,5-Triazine), three (trichloromethyl) triazine (Tris (trichloromethyl)-1,3,5-triazine),
Figure GSB00000418691200041
819, 369,
Figure GSB00000418691200043
2959,
Figure GSB00000418691200044
379,
Figure GSB00000418691200045
184,
Figure GSB00000418691200046
784,
Figure GSB00000418691200047
250,
Figure GSB00000418691200048
907, 651,
Figure GSB000004186912000410
OXE01,
Figure GSB000004186912000411
OXE02,
Figure GSB000004186912000412
500,
Figure GSB000004186912000413
1800, 1000,
Figure GSB000004186912000415
1700,
Figure GSB000004186912000416
BP,
Figure GSB000004186912000417
1173, CGI 242,
Figure GSB000004186912000418
1173, CGI-552, TPO, TPO-L,
Figure GSB000004186912000421
200,
Figure GSB000004186912000422
107,
Figure GSB000004186912000423
184,
Figure GSB000004186912000424
284, KAYACURE DETX-S, KAYACURE CTX, KAYACURE BMS or KAYACURE BP-100 etc.
The colored filter 100 that present embodiment provides only needs to make black matrix 106 single layer structures and just can reach ink-jet method and make the black matrix of tradition in the color filter producing process and the double-deck effect of barricade.
See also Fig. 2 to Fig. 6, the manufacture method of the colored filter 100 that a kind of first embodiment provides is provided for second embodiment of the invention.This method may further comprise the steps.
Step 1: on a substrate 102, form a black matrix 106, as shown in Figure 2.Should deceive the composition of matrix 106 forms identical with the black matrix of first embodiment.
Can comprise step by step following in forming black matrix 106 on the substrate 102: (1) utilizes dry film method (DryFilm Lamination), wet type rotary process (Wet Spin Coating), wet type crack method (Wet SlitCoating) or crack rotary process (Slit and Spin Coating) to be coated with above-mentioned black matrix material on the surface of this substrate 102, coating thickness is greater than 0.1 μ m, be preferably 0.3 to 2.5 μ m, to form continuous film; (2) after drying should be deceived the matrix material layer, utilize the mask exposure machine, the light shield that will have predetermined black matrix pattern is arranged between this black matrix material layer and exposure machine light source, and exposure should be deceived the matrix material layer; (3) utilize visualization way, the black matrix material layer of non-black matrix pattern part is removed; (4) thus solidifying remaining black matrix material forms the black matrix of being located on the substrate surface 106, this black matrix 106 limits several times pixel regions 108, as shown in Figure 2.
This substrate 102 can adopt the substrate of glass or plastic plate or silicon.
Preferably, in the present embodiment, the upper surface 1062 of black matrix 106 forms an outstanding cambered surface.This outstanding cambered surface can form by deceiving matrix material collocation exposure and development conditions.When structure of this outstanding cambered surface can prevent by ink-jet method ink jet to several times pixel region 108, the situation that adjacent twice pixel region, 108 inks mix mutually occurred.The upper surface 1062 that is understandable that black matrix 106 can also be other shape, as pyramid, taper shape etc., just can make the upper surface 1062 of black matrix 106 form at least two differing heights the zone can, and needn't exceed with specific embodiment.
Step 3: utilize ink-jet method that ink 112 is filled in several times pixel region 108, as shown in Figure 3 by an ink discharge device 110.This ink discharge device can be selected Thermal Bubble Ink-jet Printer device (Thermal BubbleInk Jet Printing Apparatus) or piezoelectric ink jet device (Piezoelectric Ink Jet PrintingApparatus) for use.
Ink 112 forms ink layer 112 ' in inferior pixel region 108, as shown in Figure 4.Ink-jet method comprises synchronous ink-jet method and substep ink-jet method.Ink-jet method is to spray required RGB three chromatic inks simultaneously in several times pixel region 108 synchronously.The substep ink-jet method is for spraying successively with chromatic ink in several times pixel region 108 that forms the same color layer, so need just can finish whole ink-jets three times.
Step 4: the ink layer 112 ' in the dry solidification time pixel region 108 and the color layers 114 that forms, as shown in Figure 1.This step is mainly by a vacuum plant, a heating arrangement or a light-emitting device, ink in the inferior pixel region 108 112 is carried out dry solidification, perhaps adopt any two or wantonly three kinds of above-mentioned three's mode to carry out dry solidification, and light-emitting device comprise the UV-light luminous irradiation unit.
In addition, also can adopt a vacuum extractor or/and a heating arrangement, after the solvent evaporates in the ink, utilize a light-emitting device, as the UV-light luminous irradiation unit, the ink layer 112 ' of receiving space is cured, adopts a heating arrangement again, the ink layer 112 ' of receiving space is further solidified; Maybe can adopt a vacuum extractor or/and a heating arrangement, after the solvent evaporates in the ink layer 112 ', adopt a heating arrangement again, the ink layer 112 ' of receiving space is further solidified.
The manufacture method of the colored filter 100 of this enforcement can further comprise step 5: form a protective seam 116 or a conductive layer 118 that covers this black matrix 106 and color layers 114 on this substrate 102; or form a protective seam 116 and a conductive layer 118 successively simultaneously, as shown in Figure 5.
In addition; remove as previously mentioned; directly form a protective seam 116 or a conductive layer 118; or form successively outside a protective seam 116 and the conductive layer 118 simultaneously; can before formation one protective seam 116 or a conductive layer 118, utilize and grind or etching mode in addition, black matrix 106 is polished with respect to color layers 114 outstanding parts; as shown in Figure 6, to reach the requirement of flatness.
Be appreciated that above-mentioned steps five step by step in, the processing procedure of conductive layer can adopt vacuum sputtering apparatus to carry out technologies such as sputter, protective seam then can adopt processing procedures such as rotary coating or crack coating.
The manufacturing method of color filters that present embodiment provides has been saved the step of making barricade, reduces when making worker, and cost reduces.
The present invention also provides one the 3rd embodiment that a kind of manufacturing method of color filters is provided.The method difference that this method and second embodiment provide is, provides the photoresist of the black matrix of preparation earlier, so the method for the colored filter that the 3rd embodiment provides may further comprise the steps.
Step 1: prepare the photoresist that the black matrix of an ink-jet method color filter producing process is used, this photoresist is formed and is comprised: account for all curable compositions in the photoresist ratio 55wt% and following carbon black, account for monomer or the oligomer or the macromolecule resin of the ratio 15 to 95wt% of all curable compositions in the photoresist, and account for the ratio 25wt% of all curable compositions in the photoresist and other following additive.Described monomer or oligomer or macromolecule resin comprise the compound of fluorine element or siloxane.
Preferably, to account for the preferred proportion of all curable compositions in the photoresist be 15 to 45wt% to carbon black.
Preferably, to account for the preferred proportion of all curable compositions in the photoresist be 25 to 85wt% for monomer or oligomer or macromolecule resin.
This monomer or oligomer or macromolecule resin also comprise the compound of fluorine element or siloxane.The compound of this fluorine element or siloxane can be non-reacted fluoroplast or non-reacted silicone resin, can also be the plain monomer of reactive F and oligomer or reactive siloxane monomer and oligomer.In addition, the compound of this fluorine element or siloxane, its functional group is except that comprising fluorine or siloxy, still can comprise other functional group, as acrylic group, hydroxyl (OH), the hydrogen cyanide base (HCN), amino (NH), isocyanate group (NCO), carboxyl (COOH), sulfydryl (SH), epoxy radicals, phenyl ring (Aromatic Ring), amide group (Amide), lipid (Ester), ammoniacum (Urethane), siloxane (Siloxane), sulfide (Sulfide), vinyl (Vinyl), acid anhydrides (Anhydride), urea resin (Urea), carbonic acid (Carbonate), phosphoric acid fat (Phosphate Ester), sulfone (Sulfone) etc., so can be plain acryl resin of fluorine or the plain acryl oligomer of fluorine, or siloxane acryl resin or siloxane acryl oligomer.If the compound of this fluorine element or siloxane is non-reacted fluoroplast or non-reacted silicone resin, all curable composition preferred proportion that account in the photoresist of then non-reacted fluoroplast or non-reacted silicone resin are 0.01 to 30wt%, are preferably 0.01 to 5wt%.If the compound of this fluorine element or siloxane is reactive F element monomer and oligomer or reactive siloxane monomer and oligomer, then all curable composition preferred proportion that account in the photoresist of the plain monomer of reactive F and oligomer or reactive siloxane monomer and oligomer are 5 to 95wt%, are preferably 15 to 60wt%.
In addition, remaining macromolecule resin includes but not limited to acryl resin, and monomer or oligomer include but not limited to one or more in trimethylolpropane triacrylate, pentaerythritol triacrylate, tetramethylol methane tetraacrylate, dipentaerythritol five acrylate and the dipentaerythritol acrylate.
Preferably, other additive comprises initiator.Wherein, this initiator comprises the light initiator.This light initiator comprises: two (dimethyl amido) benzophenone (4,4-bis (dimethylamino)), two (diethyl amido) benzophenone (4,4 '-Bis (Diethylamino) Benzophenone), methoxybenzene-two (trichloromethyl)-triazine (2-(4-Methoxyphenyl)-4,6-Bis (Trichloromethyl)-1,3,5-Triazine), three (trichloromethyl) triazine (Tris (trichloromethyl)-1,3,5-triazine), 819,
Figure GSB00000418691200072
369,
Figure GSB00000418691200073
2959,
Figure GSB00000418691200074
379, 184,
Figure GSB00000418691200076
784,
Figure GSB00000418691200077
250,
Figure GSB00000418691200078
907,
Figure GSB00000418691200079
651,
Figure GSB000004186912000710
OXE01,
Figure GSB000004186912000711
500,
Figure GSB000004186912000712
1800,
Figure GSB000004186912000713
1000,
Figure GSB000004186912000714
1700, BP,
Figure GSB000004186912000716
1173, CGI 242,
Figure GSB000004186912000717
1173, CGI-552,
Figure GSB000004186912000718
TPO,
Figure GSB000004186912000719
TPO-L,
Figure GSB000004186912000720
200,
Figure GSB000004186912000721
107,
Figure GSB000004186912000722
184 or
Figure GSB000004186912000723
284 etc.
In addition, photoresist still comprises one or more solvent except that comprising above-mentioned all curable compositions.This solvent can be organic solvent, can comprise following several big class: ester class, ethers, pure ethers, ketone, alcohols, polyalcohols derivant and nitrogenous series solvent etc.Concrete, this solvent can preferably be selected following material for use: methoxybutanol, isopropyl alcohol, butanols, phenmethylol, butyl ether, the ethylene glycol propyl ether, ethylene glycol butyl ether, the ethylene glycol hexyl ether, ethylene glycol phenyl ether, the ethylene glycol butyl ether acetate, the diethylene glycol methyl ether, the diethylene glycol ethylether, the diethylene glycol butyl ether, the diethylene glycol hexyl ether, the triethylene glycol methyl ether, the triethylene glycol ethylether, the triethylene glycol butyl ether, methyl proxitol, dipropylene glycol methyl ether, the tripropylene glycol methyl ether, propylene glycol methyl ether acetate, the dipropylene glycol methyl ether acetate, propylene glycol butyl ether, the dipropylene glycol butyl ether, the tripropylene glycol butyl ether, propylene glycol phenyl ether, ethyl acetate, butyl acetate, ethyl benzoate, ethoxyl ethyl propionate, acetone, MEK, methyl amylketone, methylisobutylketone, diisobutyl ketone, isophorone, cyclohexanone, 2-gives a tongue-lashing and coughs up pyridine ketone, N-methyl-2 is given a tongue-lashing and is coughed up pyridine ketone etc.
Step 2: coating this photoresist and form black matrix on a substrate, this black matrix limits several times pixel region.
This photoresist of coating on this substrate and form black matrix and can comprise step by step following: (1) utilizes dry film method (Dry Film Lamination), wet type rotary process (Wet Spin Coating), wet type crack method (Wet Slit Coating) or crack rotary process (Slit and Spin Coating) be coated withs one on the surface of this substrate to deceive the photoresist layer that matrix is used, coating thickness is greater than 0.1 μ m, be preferably 0.3 to 2.5 μ m, to form continuous film; (2) behind dry this photoresist layer, utilize the mask exposure machine, the light shield that will have predetermined black matrix pattern is arranged between this black matrix material layer and exposure machine light source, and exposure should be deceived the matrix material layer; (3) utilize visualization way, the black matrix material layer of non-black matrix pattern part is removed; (4) thus solidifying remaining black matrix material forms the black matrix of being located on the substrate surface, this black matrix limits several times pixel region.This monomer or oligomer are behind above-mentioned exposure chemical reaction, and developing solidify to form high molecular polymer, and macromolecule resin directly forms the black matrix of high molecular polymer.
Because the ratio that carbon black accounts for all curable compositions in the photoresist is less than 55wt%, preferred proportion is 15 to 45wt%, and it is more complete to be exposed the exposure of machine light source.
Preferably, black matrix thickness is preferably 0.3 to 2.5 μ m greater than 0.1 μ m.
Preferably, the upper surface of black matrix forms an outstanding cambered surface.This outstanding cambered surface can form by this material collocation exposure and development conditions.When structure of this outstanding cambered surface can prevent by ink-jet method ink jet to several times pixel region, the situation that adjacent twice pixel region ink mixes mutually occurred.The upper surface that is understandable that black matrix can also be other shape, as pyramid, taper shape etc., just can make the upper surface of black matrix form at least two differing heights the zone can, and needn't exceed with specific embodiment.
Step 3: utilize ink-jet method that ink is filled to the several times pixel region by an ink discharge device.
This ink discharge device can be selected Thermal Bubble Ink-jet Printer device (Thermal Bubble Ink Jet PrintingApparatus) or piezoelectric ink jet device (Piezoelectric Ink Jet Printing Apparatus) for use.The ink-jet method that this step 3 is used comprises synchronous ink-jet method and substep ink-jet method.Ink-jet method is to spray required RGB three chromatic inks simultaneously in several times pixel region synchronously, and by the heating and the mode that vacuumizes ink layer is carried out dried.The substep ink-jet method is for to spray with chromatic ink in several times pixel region of designed group unit pattern successively, and by heating and the mode that vacuumizes is carried out dried to homochromy ink layer.
Step 4: the ink in the dry solidification several times pixel region, and form the plurality of colors layer.
Follow-up operation, as polish black matrix, forming a protective seam and a conductive layer etc., can carry out one by one with reference to the manufacturing method of color filters that second embodiment of the invention provides.
The manufacturing method of color filters that present embodiment provides has been saved the step of making barricade, reduces when making worker, and cost reduces.
Percentage composition in the respective embodiments described above all is mass percents that each constituent accounts for all curable compositions.
Be understandable that, for the person of ordinary skill of the art, can make other various corresponding changes and distortion by technical conceive according to the present invention, and all these change the protection domain that all should belong to claim of the present invention with distortion.

Claims (23)

1. colored filter is characterized in that: comprises,
One substrate;
One is positioned at the black matrix on the substrate, should comprise by black matrix composition: 55wt% and following carbon black, high molecular polymer and 25wt% and other following additive of 15 to 95wt%, described high molecular polymer comprises non-reacted fluoroplast or non-reacted silicone resin, and this black matrix limits the several times pixel region; And
Be arranged in the plurality of colors layer that several times pixel region forms by ink-jet method.
2. colored filter as claimed in claim 1 is characterized in that the thickness of described black matrix is greater than 0.1 micron.
3. colored filter as claimed in claim 2 is characterized in that, the thickness of described black matrix is 0.3 to 2.5 micron.
4. colored filter as claimed in claim 1 is characterized in that, the ratio of described carbon black is 15 to 45wt%.
5. colored filter as claimed in claim 1 is characterized in that, the ratio of described high molecular polymer is 25 to 85wt%.
6. colored filter as claimed in claim 1 is characterized in that, the ratio of described non-reacted fluoroplast or non-reacted silicone resin is 0.01 to 30wt%.
7. colored filter as claimed in claim 1 is characterized in that, the ratio of described non-reacted fluoroplast or non-reacted silicone resin is 0.01 to 5wt%.
8. colored filter as claimed in claim 1 is characterized in that, described black matrix is that the contact angle of the mensuration liquid of 30 dynes per centimeter is spent greater than 20 to surface tension.
9. colored filter as claimed in claim 8 is characterized in that, described black matrix is that the contact angle of the mensuration liquid of 30 dynes per centimeter is spent between 70 degree 25 to surface tension.
10. colored filter as claimed in claim 8 is characterized in that, described black matrix is that the contact angle of the mensuration liquid of 30 dynes per centimeter is spent between 65 degree 35 to surface tension.
11. a manufacturing method of color filters may further comprise the steps:
On a substrate, form a black matrix, should comprise by black matrix composition: 55wt% and following carbon black, high molecular polymer and 40wt% and other following additive of 15 to 95wt%, described high molecular polymer comprises non-reacted fluoroplast or non-reacted silicone resin, and this black matrix limits the several times pixel region;
Utilize ink-jet method that ink is filled to the several times pixel region by an ink discharge device;
Ink in the dry solidification several times pixel region, thus some color layers formed.
12. manufacturing method of color filters as claimed in claim 11 is characterized in that, described ink-jet method comprises synchronous ink-jet method or substep ink-jet method.
13. manufacturing method of color filters as claimed in claim 11; it is characterized in that; described method for manufacturing colored filtering substrate further comprises a step: form the protective seam or the conductive layer that cover black matrix and color layers on this substrate, or form a protective seam and a conductive layer simultaneously successively.
14. manufacturing method of color filters as claimed in claim 11 is characterized in that, described black matrix thickness is greater than 0.1 micron.
15. manufacturing method of color filters as claimed in claim 14 is characterized in that, described black matrix thickness is 0.3 to 2.5 micron.
16. manufacturing method of color filters as claimed in claim 11 is characterized in that, described black matrix is that the contact angle of the mensuration liquid of 30 dynes per centimeter is spent greater than 20 to surface tension.
17. manufacturing method of color filters as claimed in claim 16 is characterized in that, described black matrix is that the contact angle of the mensuration liquid of 30 dynes per centimeter is spent between 70 degree 25 to surface tension.
18. manufacturing method of color filters as claimed in claim 16 is characterized in that, described black matrix is that the contact angle of the mensuration liquid of 30 dynes per centimeter is spent between 65 degree 35 to surface tension.
19. a manufacturing method of color filters may further comprise the steps:
The photoresist that provides the black matrix of an ink-jet method color filter producing process to use, this photoresist is formed and is comprised: account for all curable compositions in the photoresist ratio 55wt% and following carbon black, account for monomer or the oligomer or the macromolecule resin of the ratio 15 to 95wt% of all curable compositions in the photoresist, and accounting for the ratio 25wt% of all curable compositions in the photoresist and other following additive, described monomer or oligomer or macromolecule resin comprise non-reacted fluoroplast or non-reacted silicone resin;
This photoresist of coating on a substrate, drying then, exposure is developed and is solidified this photoresist layer and form black matrix, and this black matrix limits several times pixel region;
Utilize ink-jet method that ink is filled to the several times pixel region by an ink discharge device;
Ink in the dry solidification several times pixel region, and form the plurality of colors layer.
20. manufacturing method of color filters as claimed in claim 19 is characterized in that, described black matrix thickness is greater than 0.1 micron.
21. manufacturing method of color filters as claimed in claim 20 is characterized in that, described black matrix thickness is 0.3 to 2.5 micron.
22. manufacturing method of color filters as claimed in claim 19 is characterized in that, the ratio that described non-reacted fluoroplast or non-reacted silicone resin account for all curable compositions in the photoresist is 0.01 to 30wt%.
23. manufacturing method of color filters as claimed in claim 19 is characterized in that, the ratio that described non-reacted fluoroplast or non-reacted silicone resin account for all curable compositions in the photoresist is 0.01 to 5wt%.
CN2008100890239A 2008-04-15 2008-04-15 Colored filter and manufacturing method thereof Expired - Fee Related CN101561524B (en)

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TWI439739B (en) * 2011-11-17 2014-06-01 E Ink Holdings Inc Color filter and display device having the same
CN105259696A (en) * 2015-11-16 2016-01-20 深圳市华星光电技术有限公司 Manufacturing method for color filter substrate
KR20200038301A (en) * 2017-09-21 2020-04-10 후지필름 가부시키가이샤 Method of manufacturing a near-infrared cut filter, laminate and kit
CN109239938A (en) * 2018-10-11 2019-01-18 京东方科技集团股份有限公司 Optical alignment structure and preparation method thereof, fingerprint identification device

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CN101045807A (en) * 2006-03-30 2007-10-03 新日铁化学株式会社 Light shading resin composition for color filter and color filter
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